CN105629661B - Self-luminous photosensitive resin composition, color filter and image display device - Google Patents

Self-luminous photosensitive resin composition, color filter and image display device Download PDF

Info

Publication number
CN105629661B
CN105629661B CN201510812347.0A CN201510812347A CN105629661B CN 105629661 B CN105629661 B CN 105629661B CN 201510812347 A CN201510812347 A CN 201510812347A CN 105629661 B CN105629661 B CN 105629661B
Authority
CN
China
Prior art keywords
self
photosensitive resin
color filter
resin composition
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201510812347.0A
Other languages
Chinese (zh)
Other versions
CN105629661A (en
Inventor
金胄皓
王贤正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongwoo Fine Chem Co Ltd
Original Assignee
Dongwoo Fine Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Publication of CN105629661A publication Critical patent/CN105629661A/en
Application granted granted Critical
Publication of CN105629661B publication Critical patent/CN105629661B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Architecture (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Optical Filters (AREA)
  • Graft Or Block Polymers (AREA)

Abstract

The present invention relates to a self-luminous photosensitive resin composition, a color filter manufactured from the same, and an image display device including the color filter, and more particularly, to a self-luminous photosensitive resin composition including quantum dots, scattering particles, a photopolymerizable compound, a photopolymerization initiator, an alkali-soluble resin, and a solvent, and an image display device including a color filter manufactured using the same. The color filter having the above composition eliminates the decrease in light efficiency of the conventional color filter, and when it is introduced into an image display device, it ensures various color displays by maintaining excellent color reproduction characteristics and high light efficiency, thereby realizing high-quality vivid image quality.

Description

Self-luminous photosensitive resin composition, color filter and image display device
Technical Field
The present invention relates to a self-luminous photosensitive resin composition capable of realizing high-quality image quality by ensuring excellent color reproduction characteristics and high light efficiency, and a color filter and an image display device manufactured from the self-luminous photosensitive resin composition.
Background
The display industry is rapidly changing from CRT (cathode-ray tube) to flat panel displays represented by pdp (plasma display panel), OLED (organic light-emitting diode), LCD (liquid-crystal display), and the like. Among them, LCDs are widely used in image display devices used in almost all industries because of their advantages such as light weight, excellent resolution, and low power consumption, and a market is expected to expand considerably in the future.
For the LCD, white light generated from a light source passes through a liquid crystal cell while adjusting transmittance, and full color is realized by mixing three primary colors coming out through color filters of red, green, and blue.
The color filter is a thin film type optical member that extracts three colors of red, green, and blue from white light to form a fine pixel unit, and the size of one pixel is about several tens to several hundreds of micrometers. Such a color filter has a structure in which a black matrix layer, which is formed in a fixed pattern on a transparent substrate in order to shield a boundary portion between pixels, and pixel portions of three primary colors of a plurality of colors (usually red (R), green (G), and blue (B)) are arranged in a predetermined order to form each pixel.
Therefore, the color filter is a core component for displaying colors in the LCD, and is widely used for applications such as notebook computers, monitors, and mobile phone terminals with the spread of flat panel displays. In order to realize a brighter image quality and a quality advantage compared to other displays, a technique for manufacturing a color filter having high color purity, high projection, and low reflection is actively studied.
Generally, a color filter is manufactured by applying three or more hues to a transparent substrate by a pigment dispersion method, an electroplating method, a printing method, a dyeing method, a transfer method, an ink jet method, or the like. Recently, a pigment dispersion method using a pigment dispersion type photosensitive resin excellent in quality, level, and performance has become the mainstream.
A pigment dispersion method, which is one of methods for realizing a color filter, is a method of forming a colored film by repeating a series of processes of coating a photosensitive resin composition containing a colorant, an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, an epoxy resin, a solvent, and other additives on a transparent substrate providing a black matrix, exposing a pattern to be formed, removing a non-exposed portion with the solvent, and thermally curing, and is actively used for manufacturing LCDs such as mobile phones, notebook computers, monitors, and televisions.
Pigments have reached a limit to display more vivid and various hues that have been recently demanded in order to exist in the state of fine particles insoluble in a solvent. On the other hand, dyes are superior to pigments in color characteristics, and studies are being made to replace pigments with dyes. However, since the dye is also poor in durability to light and a solvent, there are problems in that the dye is improved or sufficient solubility is secured for a solvent used for producing a color filter although the dye is dissolved in the solvent.
Further, when a dye or a pigment is used as the colorant, a problem of lowering the transmission efficiency of the light source is caused. The aforementioned reduction in transmission efficiency results in a reduction in color reproducibility of the image display device, and it is eventually difficult to realize a high-quality screen.
For this reason, it has been proposed to use self-luminescent quantum dots instead of dyes and pigments, because of the performance requirements for further improvements in more various hue displays, high color reproducibility, and high brightness and contrast.
The quantum dots are self-luminescent by a light source for generating light in the visible and infrared regions. Quantum dots are smaller than the exciton Bohr radius, small crystals of II-IV, III-V, IV-VI materials, typically having diameters of 1nm to 20 nm. Due to quantum confinement effects (quantum confinement effects), the energy difference between the electronic states of a quantum dot is a function of both the composition and the physical size of the quantum dot. Thus, the optical and electronic properties of the quantum dots can be adjusted and tuned by varying the physical size of the quantum dots. The quantum dots absorb a wavelength shorter than an absorption initiation (onset) wavelength, and emit light at the absorption initiation wavelength. The bandwidth of the luminescence spectrum of a quantum dot is related to the temperature-dependent Doppler broadening (Doppler broadening), the Heisenberg Uncertainty Principle (Heisenberg incertation Principle) and the size distribution of the quantum dot. In the provided quantum dot, the emission bandwidth of the quantum dot can be controlled by changing the size. Therefore, the quantum dots can generate a color range which cannot be reached by common dyes and pigments.
However, quantum dots are essentially non-scattering particles due to the nanoscale size. Therefore, when light passes through a color filter including quantum dots, the light path length is very short as compared with the case of other dyes and pigments. On the basis of the insufficient thickness of the color filter, most of the light is absorbed by the quantum dots. For this reason, methods of adjusting the thickness of a color filter, increasing the concentration of quantum dots, introducing scattering particles, and the like have been proposed, but among them, when adjusting the thickness or the concentration, problems arise in terms of color uniformity.
For this reason, in a manner of introducing scattering particles in a color filter, korean patent laid-open No. 2010-0037283 mentions a liquid crystal display device having a light diffusion layer including scattering particles composed of an organic material, which is different from a color conversion medium layer including quantum dots. In this case, the number of layers increases, which causes problems such as complicated steps and an increase in thickness.
Korean patent publication No. 2014-0109327 proposes an illumination device including scattering particles composed of an inorganic material together with a layer including quantum dots. The size of the scattering particles used in this case is from several micrometers to several hundred micrometers (μm), and the particle size is too large, which causes a problem of deterioration in the quality of the coating film. In particular, when the size of the scattering particles is several hundreds of micrometers (μm), the thickness of the coating film must be at least a thickness at which the scattering particles are constantly dispersed, and the overall thickness of the color filter increases.
These patents expect the use of quantum dots and scattering particles to improve the light efficiency of the color filter, but the use of a multilayer structure has insufficient effect because the average particle diameter of the scattering particles used is on the order of micrometers (μm).
Patent document
Patent document 1: korean laid-open patent No. 2010-0037283
Patent document 2: korean laid-open patent No. 2014-0109327
Disclosure of Invention
Accordingly, the present applicant has found that the above problems can be solved without affecting brightness when using scattering particles of several hundreds nanometers in a specific content, and has completed the present invention.
Accordingly, an object of the present invention is to provide a self-luminous photosensitive resin composition which can secure excellent color reproduction characteristics and high light efficiency.
Another object of the present invention is to provide an image display device having a color filter containing the self-luminous photosensitive resin composition, which can realize high-quality and vivid image quality.
In order to achieve the above object, the present invention is characterized in that a self-luminous photosensitive resin composition includes quantum dots, scattering particles, a photopolymerizable compound, a photopolymerization initiator, an alkali-soluble resin, and a solvent, and the scattering particles are metal oxides having an average particle diameter of 30 to 1000 nm.
In this case, the metal oxide is characterized by containing one metal selected from the group consisting of Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, Ce, Ta, In, and a combination thereof.
In addition, the present invention is characterized by a color filter produced from the self-luminous photosensitive resin composition and an image display device including the color filter.
Effects of the invention
The self-luminous photosensitive resin composition can solve the problem of the light efficiency reduction of a color filter.
The image display device incorporating the color filter can realize vivid image quality by maintaining high brightness and ensuring excellent color reproduction characteristics and high light efficiency.
Drawings
Fig. 1 is a schematic diagram showing the operation of a color filter in an image display device.
Description of the symbols
1: substrate
3: color filter
Detailed Description
The invention provides a self-luminous photosensitive resin composition for a color filter of an image display device.
In particular, the present invention provides a self-luminous photosensitive resin composition comprising quantum dots and scattering particles as essential components in a color filter, wherein the quantum dots automatically emit light of a display hue, and thus the path of the automatically emitted light is increased by the scattering particles having an average particle diameter of several hundreds nanometers, thereby improving the overall light efficiency of the color filter. Further, by manufacturing the pixels of the color filter from the self-luminous photosensitive resin composition, an advantage that a fine pattern can be easily formed is secured.
The self-luminous photosensitive resin composition of the present invention comprises quantum dots and scattering particles, as well as a photopolymerizable compound, a photopolymerization initiator, an alkali-soluble resin, and a solvent.
Hereinafter, each component will be explained.
Quantum dots are nano-sized semiconductor substances. Atoms constitute molecules, and molecules constitute aggregates of small molecules called clusters to form nanoparticles, but when such nanoparticles specifically exhibit semiconductor properties, they are called quantum dots. The quantum dots receive energy from the outside to reach a floating state, and release energy based on the energy band gaps corresponding to the quantum dots.
The quantum dot of the present invention is not particularly limited as long as it can emit light by photoexcitation, and may be selected from the group consisting of, for example, II-IV semiconductor compounds, III-V semiconductor compounds, IV-VI semiconductor compounds, group IV elements, compounds containing the same, and combinations thereof. These may be used alone or in combination of two or more.
The aforementioned group II-IV semiconductor compound may be a double-element compound selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, and mixtures thereof; a ternary compound selected from the group consisting of CdSeS, CdSeTe, CdSTe, ZnSeS s, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HfZnSe, HgZnTe, and mixtures thereof; and a quaternary compound selected from the group consisting of CdZnSeS, CdZnSeTe, cdhgznsete, HgZnSeS, HgZnSeTe, and mixtures thereof, the aforementioned group III-V semiconductor compound being selected from the group consisting of a double-element compound selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof; a ternary compound selected from the group consisting of GaNP, GaNAs, GaNSb, GaGaAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, and mixtures thereof; and GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlN, InAlNAs, InAlN, InAlPAs, InAlGaPSb, and mixtures thereof, the group IV-VI semiconductor compound being selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe, and mixtures thereof; a ternary compound selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe and mixtures thereof; and four-element compounds selected from the group consisting of SnPbSSe, SnPbSeTe, SnPbSTe and mixtures thereof, the aforementioned group IV elements or compounds containing the same being selected from the group consisting of elemental compounds selected from the group consisting of Si, Ge and mixtures thereof; and a double element compound selected from the group consisting of SiC, SiGe and mixtures thereof.
In addition, the quantum dots may be homogeneous (homogeneous) single structures; core-shell (core-shell), gradient (gradient) structure and other double structures; or a hybrid structure thereof.
In the aforementioned double structure of the core shell, the substances constituting the core and the shell, respectively, may be constituted of the aforementioned semiconductor compounds different from each other. For example, the aforementioned core may include one or more selected from the group consisting of CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, HgInZnS, and ZnO, but is not limited thereto. The aforementioned shell may contain one or more substances selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, and HgSe, but is not limited thereto.
As in the case where the colored photosensitive resin composition used for manufacturing a general color filter contains colorants such as red, green, and blue to realize hue, the quantum dots of the present invention are also classified into quantum dots exhibiting red color, quantum dots exhibiting green color, and quantum dots exhibiting blue color, and the quantum dots of the present invention may be one selected from the aforementioned red, green, and blue colors, and combinations thereof.
The quantum dots can be synthesized by wet chemical process (wet chemical process), organic metal chemical deposition process or molecular beam epitaxy process.
The wet chemical process is a method of growing particles by putting a precursor substance into an organic solvent. In order to adjust the crystal growth by allowing the organic solvent to naturally coordinate to the surface of the quantum dot crystal and function as a dispersant during the crystal growth, the growth of nanoparticles can be controlled by a simple and inexpensive process by the vapor deposition method such as the metalorganic chemical deposition (MOCVD) or the Molecular Beam Epitaxy (MBE).
The content of the quantum dot of the present invention is not particularly limited, and may be, for example, 3 to 80% by weight, preferably 5 to 70% by weight, based on 100% by weight of the self-luminous photosensitive resin composition. In this case, if the content is less than 3% by weight, the light emission efficiency is only slight, and if it exceeds 80% by weight, the content of other components is relatively insufficient, and there is a problem that it is difficult to form a pixel pattern.
The scattering particles, which constitute the features of the present invention together with the aforementioned quantum dots, serve to increase the light efficiency of the color filter. Light irradiated from the light source is incident into the color filter at a critical angle, but at this time, the incident light, the self-emitting light automatically emitted through the quantum dots, meets the scattering particles and simultaneously enhances the light emitting efficiency by increasing the optical path, resulting in an increase in the light efficiency of the color filter.
The foregoing scattering particles may be all common inorganic materials, and preferably metal oxides are used.
The foregoing metal oxide may Be an oxide containing one metal selected from the group consisting of Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, Ce, Ta, In, and combinations thereof.
In particular, it may be selected from Al2O3、SiO2、ZnO、ZrO2、BaTiO3、TiO2、Ta2O5、Ti3O5、ITO、IZO、ATO、ZnO-Al、Nb2O3SnO, MgO, and combinations thereof. If necessary, a material surface-treated with a compound having an unsaturated bond such as acrylate may also be used.
The scattering particles have a limited average particle size and a limited content in the entire composition in order to sufficiently increase the emission intensity of the color filter.
The scattering particles may have an average particle diameter of 10 to 1000nm, and scattering particles in the range of 50 to 500nm are preferably used. In this case, if the particle size is too small, a sufficient scattering effect of light emitted from the quantum dots cannot be expected, and if it is too large, a uniform quality of the surface of the self-luminescent layer cannot be obtained due to precipitation in the composition, and thus the use is appropriately adjusted within the above range.
In addition, in the self-luminous photosensitive resin composition 100 weight%, can use 0.1 ~ 50 weight%, preferably uses 0.5 ~ 30 weight%. If the content of the scattering particles is less than the above range, the desired emission intensity cannot be secured, and if the content is outside the above range, the effect of increasing the emission intensity cannot be obtained, and the stability of the composition is lowered, and therefore, the composition is suitably used within the above range.
The photopolymerizable compound contained in the self-luminous photosensitive resin composition of the present invention is a compound polymerizable by the action of light or a photopolymerization initiator described later, and examples thereof include a monofunctional monomer, a bifunctional monomer, and other polyfunctional monomers.
Specific examples of the monofunctional monomer include nonylphenyl carbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexyl carbitol acrylate, 2-hydroxyethyl acrylate, and N-vinylpyrrolidone. Specific examples of the bifunctional monomer include 1, 6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, bisphenol a (acryloyloxyethyl) ether, 3-methyl-pentanediol di (meth) acrylate, propylene glycol dimethacrylate, and urethane (meth) acrylate.
Specific examples of the other polyfunctional monomer include trimethylolpropane tri (meth) acrylate, ethoxylated trimethylolpropane tri (meth) acrylate, propoxylated trimethylolpropane tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, ethoxylated dipentaerythritol hexa (meth) acrylate, propoxylated dipentaerythritol hexa (meth) acrylate, dipentaerythritol (poly) acrylate having a hydroxyl group or a carboxylic acid group represented by the following chemical formulae 1 and 2, and the like.
[ chemical formula 1]
Figure BDA0000853583540000081
(in the above chemical formula 1, R1Is an acrylate or methacrylate group, R2Is hydrogen, acryloyl or methacryloyl. )
[ chemical formula 2]
Figure BDA0000853583540000091
(in the above chemical formula 2, R3~R5The same OR different from each other, and independently is C1-C4 alkyl, acrylate group, methacrylate group OR-OR7. At this time, R3~R5At least one of (a) is an acrylate group or a methacrylate group, R7Is composed of
Figure BDA0000853583540000092
R6is-C (═ O) CH2CH2C(=O)OH。R8And R9Is an acrylate or methacrylate group, R10Is hydrogen, acryloyl, methacryloyl or-C (═ O) CH2CH2C(=O)OH。)
Among them, the photopolymerizable compound of the present invention may use a polyfunctional monomer having two or more functions, and more preferably, a pentafunctional photopolymerizable compound having a carboxylic acid group.
When a photopolymerizable compound having five or more functions is used, the formation of a pixel pattern is more excellent. In particular, in the case of a pentafunctional photopolymerizable compound containing a carboxylic acid group, a pixel pattern having excellent photoreactivity and excellent luminescence can be formed without lowering the luminescence characteristics due to the aggregation of quantum dot particles.
The content of the photopolymerizable compound is usually within a range of 5 to 70% by mass, preferably within a range of 10 to 60% by mass, based on 100% by mass of the self-luminous photosensitive resin composition. In this case, when the photopolymerizable compound is used in the above range, it is preferable that the pixel pattern is easily formed with respect to the light source. If the content is less than 5 mass%, the degree of photocuring by light is reduced, making it difficult to form a pixel pattern, whereas if the content exceeds 70 mass%, there is a problem that pattern peeling occurs.
The photopolymerization initiator is not particularly limited as long as it is a compound that initiates polymerization of the photopolymerizable compound, and may be one compound selected from the group consisting of triazine compounds, acetophenone compounds, biimidazole compounds, oxime compounds, and combinations thereof.
The self-luminous photosensitive resin composition containing the photopolymerization initiator has high sensitivity, and the pixel part intensity and the pattern property of the pixel of the color filter formed by using the composition are good.
Examples of the triazine compound include 2, 4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3, 5-triazine, 2, 4-bis (trichloromethyl) -6- (4-methoxynaphthyl) -1,3, 5-triazine, 2, 4-bis (trichloromethyl) -6-piperonyl-1, 3, 5-triazine, 2, 4-bis (trichloromethyl) -6- (4-methoxystyryl) -1,3, 5-triazine, 2, 4-bis (trichloromethyl) -6- [2- (5-methylfuran-2-yl) vinyl ] -1,3, 5-triazine, 2, 4-bis (trichloromethyl) -6- [2- (furan-2-yl) vinyl ] -1,3, 5-triazine, 2, 4-bis (trichloromethyl) -6- [2- (4-diethylamino-2-methylphenyl) vinyl ] -1,3, 5-triazine, 2, 4-bis (trichloromethyl) -6- [2- (3, 4-dimethoxyphenyl) vinyl ] -1,3, 5-triazine, and the like.
As the acetophenone compounds, for example, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzildimethylketal, 2-hydroxy-1- [4- (2-hydroxyethoxy) phenyl ] -2-methylpropan-1-one, 1-hydroxycyclohexylphenylketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 2-hydroxy-2-methyl-1- [4- (1-methylvinyl) phenyl ] propan-1-one, and the like can be mentioned, 2- (4-methylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) butan-1-one, and the like. In addition, compounds represented by the following chemical formula 3 may be mentioned.
[ chemical formula 3]
Figure BDA0000853583540000101
(in the above chemical formula 3, R1~R4Each independently represents hydrogen, halogen, hydroxyl, phenyl substituted or unsubstituted by alkyl having 1 to 12 carbon atoms, benzyl substituted or unsubstituted by alkyl having 1 to 12 carbon atoms, or naphthyl substituted or unsubstituted by alkyl having 1 to 12 carbon atoms. )
Specific examples of the compound represented by the above chemical formula 3 include 2-methyl-2-amino (4-morpholinophenyl) ethan-1-one, 2-ethyl-2-amino (4-morpholinophenyl) ethan-1-one, 2-propyl-2-amino (4-morpholinophenyl) ethan-1-one, 2-butyl-2-amino (4-morpholinophenyl) ethan-1-one, 2-methyl-2-amino (4-morpholinophenyl) propan-1-one, 2-methyl-2-amino- (4-morpholinophenyl) butan-1-one, 2-ethyl-2-amino (4-morpholinophenyl) propan-1-one, and mixtures thereof, 2-ethyl-2-amino (4-morpholinophenyl) butan-1-one, 2-methyl-2-methylamino- (4-morpholinophenyl) propan-1-one, 2-methyl-2-dimethylamino- (4-morpholinophenyl) propan-1-one, 2-methyl-2-diethylamino (4-morpholinophenyl) propan-1-one, and the like.
Examples of the bisimidazoles include 2,2 '-bis (2-chlorophenyl) -4,4',5,5 '-tetraphenylbiimidazole, 2' -bis (2, 3-dichlorophenyl) -4,4',5,5' -tetraphenylbiimidazole, 2 '-bis (2-chlorophenyl) -4,4',5,5 '-tetrakis (alkoxyphenyl) bisimidazole, 2' -bis (2-chlorophenyl) -4,4',5,5' -tetrakis (trialkoxyphenyl) bisimidazole, and imidazole compounds in which the phenyl group at the 4,4',5,5' position is replaced by an alkoxycarbonyl group. Among these, 2 '-bis (2-chlorophenyl) -4,4',5,5 '-tetraphenylbiimidazole and 2,2' -bis (2, 3-dichlorophenyl) -4,4',5,5' -tetraphenylbiimidazole are preferably used.
The oxime compound is represented by the following chemical formula 4-6.
[ chemical formula 4]
Figure BDA0000853583540000111
[ chemical formula 5]
Figure BDA0000853583540000112
[ chemical formula 6]
Figure BDA0000853583540000113
In addition, a photopolymerization initiator that is generally used may be additionally used if the effects of the present invention are not impaired. Examples thereof include benzoin compounds, benzophenone compounds, thioxanthone compounds, anthracene compounds, and other photopolymerization initiators. These may be used alone or in combination of two or more.
Examples of the benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether.
Examples of the benzophenone compound include benzophenone, o-benzoylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4 ' -methyldiphenylsulfide, 3',4,4' -tetrakis (t-butylperoxycarbonyl) benzophenone, 2,4, 6-trimethylbenzophenone, and 4,4' -bis (N, N ' -dimethylamino) benzophenone.
Examples of the thioxanthone compound include 2-isopropylthioxanthone, 2, 4-diethylthioxanthone, 2, 4-dichlorothioxanthone, and 1-chloro-4-propoxythioxanthone.
Examples of the anthracene compound include 9, 10-dimethoxyanthracene, 2-ethyl-9, 10-dimethoxyanthracene, 9, 10-diethoxyanthracene, and 2-ethyl-9, 10-diethoxyanthracene.
Further, 2,4, 6-trimethylbenzoyldiphenylphosphine oxide, 10-butyl-2-chloroacridone, 2-ethylanthraquinone, benzyl, 9, 10-phenanthrenequinone, camphorquinone, methyl phenylacetate, titanocene compound, etc. may be exemplified as other photopolymerization initiators.
In addition, when a photopolymerization initiator and a photopolymerization initiation auxiliary agent are used in combination, the sensitivity of the self-luminous photosensitive resin composition containing them is further improved, and the productivity in forming a color filter is improved, which is preferable.
The photopolymerization initiation auxiliary that can be used may preferably use one compound selected from the group consisting of amine compounds, carboxylic acid compounds, and combinations thereof.
Specific examples of the amine compound include aliphatic amine compounds such as triethanolamine, methyldiethanolamine and triisopropanolamine, and aromatic amine compounds such as methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, N-dimethyl-p-toluidine, 4' -bis (dimethylamino) benzophenone (commonly known as Michler's ketone) and 4,4' -bis (diethylamino) benzophenone. As the amine compound, an aromatic amine compound can be preferably used.
Specific examples of the carboxylic acid compound include aromatic heteroacetic acids such as phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, chlorophenylthioacetic acid, dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine and naphthyloxyacetic acid.
The content of the photopolymerization initiator is 0.1 to 20% by weight, preferably 0.5 to 15% by weight, based on 100% by weight of the total composition, and the content of the photopolymerization initiation auxiliary is usually 1 to 200 parts by weight, preferably 10 to 100 parts by weight, based on 100 parts by weight of the photopolymerization initiator.
When the content of the photopolymerization initiator is in the above range, the self-luminous photosensitive resin composition is preferably increased in sensitivity, and the strength of the pixel portion and the smoothness of the surface of the pixel portion tend to be good. In addition, if the content of the photopolymerization initiation auxiliary agent is in the above range, the sensitivity efficiency of the self-luminous photosensitive resin composition becomes further high, and the productivity of a color filter formed using the composition tends to be improved, which is preferable.
The alkali-soluble resin is reactive to the action of light or heat, has alkali solubility, and can be used as long as it is a binder resin that is soluble in an alkali developer used in a development stage for producing a color filter.
Preferably, the alkali-soluble resin is an alkali-soluble resin with an acid value of 20-200 (KOHmg/g). The acid value is a value measured as the amount (mg) of potassium hydroxide required for neutralizing 1g of the acrylic resin-based polymer, and is correlated with solubility. When the acid value of the resin is within the above range, the solubility in the developer is increased, the unexposed portion is easily dissolved, and the sensitivity is increased, so that there is an advantage that the residual film ratio (film remaining ratio) remaining at the time of pattern development of the exposed portion is improved.
In addition, the aforementioned alkali-soluble resin may be considered to define a molecular weight and a molecular weight distribution (Mw/Mn) in order to increase surface hardness for a color filter. Preferably, the alkali-soluble resin having a weight average molecular weight of 3000 to 200000Da, preferably 5000 to 100000Da, and a molecular weight distribution of 1.5 to 6.0, preferably 1.8 to 4.0, is directly polymerized or purchased. The alkali-soluble resin having a molecular weight and a molecular weight distribution within the above ranges not only improves hardness and a residual film ratio as described above, but also has excellent solubility in a non-exposed portion in a developer, and can improve resolution.
The alkali-soluble resin includes one selected from the group consisting of a polymer of a carboxyl group-containing unsaturated monomer, a copolymer of a monomer having an unsaturated bond copolymerizable with the monomer, and a combination thereof.
In this case, the carboxyl group-containing unsaturated monomer may be an unsaturated monocarboxylic acid, an unsaturated dicarboxylic acid, an unsaturated tricarboxylic acid, or the like. Specifically, examples of the unsaturated monocarboxylic acid include: acrylic acid, methacrylic acid, crotonic acid, alpha-chloroacrylic acid, cinnamic acid, and the like. Examples of the unsaturated dicarboxylic acid include: maleic acid, fumaric acid, itaconic acid, citraconic acid, mesaconic acid, and the like. The unsaturated polycarboxylic acid may be an acid anhydride, and specific examples thereof include maleic anhydride, itaconic anhydride, citraconic anhydride, and the like. The unsaturated polycarboxylic acid may be a mono (2-methacryloyloxyalkyl) ester thereof, and examples thereof include: succinic acid mono (2-acryloyloxyethyl) ester, succinic acid mono (2-methacryloyloxyethyl) ester, phthalic acid mono (2-acryloyloxyethyl) ester, phthalic acid mono (2-methacryloyloxy) ester, and the like. The unsaturated polycarboxylic acid may be a mono (meth) acrylate having a dicarboxylic polymer at both ends, and examples thereof include: omega-carboxy polycaprolactone monoacrylate, omega-carboxy polycaprolactone monomethacrylate and the like. These carboxyl group-containing monomers may be used alone or in combination of two or more.
Further, the monomer copolymerizable with the carboxyl group-containing unsaturated monomer may be one selected from the group consisting of aromatic vinyl compounds, unsaturated carboxylic acid ester compounds, unsaturated carboxylic acid aminoalkyl ester compounds, unsaturated carboxylic acid glycidyl ester compounds, carboxylic acid vinyl ester compounds, unsaturated ether compounds, vinyl cyanide compounds, unsaturated imide compounds, aliphatic conjugated diene compounds, bulky monomers having a monoacryl group or a monomethacryl group at the end of the molecular chain, bulky monomers, and combinations thereof.
More specifically, as the copolymerizable monomer, aromatic vinyl compounds such as styrene, α -methylstyrene, o-vinyltoluene, m-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-vinylbenzyl methyl ether, m-vinylbenzyl methyl ether, p-vinylbenzyl methyl ether, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, indene, etc.; methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-propyl acrylate, n-propyl methacrylate, isopropyl acrylate, isopropyl methacrylate, n-butyl acrylate, n-butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, sec-butyl acrylate, sec-butyl methacrylate, tert-butyl acrylate, tert-butyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl acrylate, 3-hydroxypropyl methacrylate, 2-hydroxybutyl acrylate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl acrylate, n-butyl acrylate, isopropyl methacrylate, n-butyl acrylate, n-butyl methacrylate, n-butyl acrylate, isobutyl acrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, allyl acrylate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate, phenyl methacrylate, 2-methoxyethyl acrylate, 2-methoxyethyl methacrylate, 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, methoxydiglycol acrylate, methoxydiglycol methacrylate, methoxydiglycol acrylate, methoxytriglycol methacrylate, methoxypropylene glycol acrylate, methoxypropylene glycol methacrylate, isobornyl acrylate, glycidyl methacrylate, Unsaturated carboxylic acid esters such as isobornyl methacrylate, dicyclopentadienyl acrylate, dicyclopentadienyl methacrylate, adamantyl (meth) acrylate, norbornyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl methacrylate, glycerol monoacrylate, and glycerol monomethacrylate; aminoalkyl esters of unsaturated carboxylic acids such as 2-aminoethyl acrylate, 2-aminoethyl methacrylate, 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2-aminopropyl acrylate, 2-aminopropyl methacrylate, 2-dimethylaminopropyl acrylate, 2-dimethylaminopropyl methacrylate, 3-aminopropyl acrylate, 3-aminopropyl methacrylate, 3-dimethylaminopropyl acrylate and 3-dimethylaminopropyl methacrylate; unsaturated carboxylic acid glycidyl esters such as glycidyl acrylate and glycidyl methacrylate; vinyl carboxylates such as vinyl acetate, vinyl propionate, vinyl butyrate, and vinyl benzoate; unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether and allyl glycidyl ether; vinyl cyanide compounds such as acrylonitrile, methacrylonitrile, α -chloroacrylonitrile, and vinylidene cyanide; unsaturated amides such as acrylamide, methacrylamide, α -chloroacrylamide, N-2-hydroxyethylacrylamide, and N-2-hydroxyethylmethacrylamide; unsaturated imides such as maleimide, N-phenylmaleimide and N-cyclohexylmaleimide; aliphatic conjugated dienes such as 1, 3-butadiene, isoprene and chloroprene; and giant monomers having a monoacryloyl group or a monomethacryloyloxy group at the terminal of a polymer molecular chain of polystyrene, polymethyl acrylate, polymethyl methacrylate, poly-n-butyl acrylate, poly-n-butyl methacrylate, or polysiloxane; giant monomers such as a monomer having a norbornyl skeleton, a monomer having an adamantane skeleton, and a monomer having a resin skeleton, which lower the dielectric constant.
When the content of the alkali-soluble resin is 5 to 80 wt%, preferably 10 to 70 wt%, based on 100 wt% of the total composition, and the content of the alkali-soluble resin is in the range of 5 to 80 wt%, the solubility in a developer is sufficient, a pattern is easily formed, a decrease in film at a pixel portion of an exposed portion during development is prevented, and the peeling-off property at a non-pixel portion becomes good.
The solvent may be used as long as it dissolves or disperses the above components, and is not particularly limited in the present invention. Typically, alkylene glycol monoalkyl ethers, alkylene glycol alkyl ether acetates, aromatic hydrocarbons, ketones, lower and higher alcohols, cyclic esters, and the like are mentioned. More specifically, the solvent includes ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, and diethylene glycol dibutyl ether; alkylene glycol alkyl ether acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate, and methoxyamyl acetate; aromatic hydrocarbons such as benzene, toluene, xylene, and trimethylbenzene; ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, and cyclohexanone; alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, and glycerol; esters such as ethyl 3-ethoxypropionate and methyl 3-methoxypropionate; cyclic esters such as gamma-butyrolactone.
Among the solvents, from the viewpoint of coatability and drying properties, organic solvents having a boiling point of 100 to 200 ℃ are preferable, esters such as alkylene glycol alkyl ether acetates, ketones, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, and the like are more preferable, and propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, and the like are further preferable. These solvents can be used alone or in combination of two or more.
Such a solvent may be used as the remainder to satisfy 100% by weight of the total composition. The content is a range selected in consideration of dispersion stability of the components and process easiness (coatability) in the manufacturing process.
The self-luminous photosensitive resin composition of the present invention can be used for producing a color filter by a wet coating method, and in this case, a roll coater, a spin coater, a slit coater (also referred to as a slot die coater), an ink jet type coating apparatus, or the like can be used as the wet coating method.
The invention provides a color filter manufactured by the self-luminous photosensitive resin composition.
When the color filter of the present invention is applied to an image display device, light from a light source is used for self-luminescence, and light path length is increased by scattering particles, so that more excellent light efficiency can be achieved. Further, since the light is emitted by light having a hue, color reproducibility is more excellent, and since light is emitted in all directions by photoluminescence, a viewing angle can be improved.
In particular, since the color filter is not formed separately with a layer containing scattering particles, but is formed as one layer containing both quantum dots and scattering particles, the process is simplified, and the color filter can be made thin.
The color filter includes a substrate and a pattern layer formed on an upper portion of the substrate.
The substrate is not particularly limited as long as it is a substrate of the color filter itself or a substrate located at a portion of the color filter such as a display device. For example, glass, silicon oxide (SiOx), or a polymer substrate may be used. Specifically, the polymer substrate may be Polyethersulfone (PES), Polycarbonate (PC), or the like.
The pattern layer is a layer containing the self-luminous photosensitive resin composition of the present invention, and may be a layer formed by applying the self-luminous photosensitive resin composition, exposing to a predetermined pattern, developing, and thermally curing.
According to an embodiment of the present invention, the pattern layer formed using the self-luminous photosensitive resin composition may include a red pattern layer containing red quantum dots, a green pattern layer containing green quantum dots, and a blue pattern layer containing blue quantum dots. When light is irradiated, the red pattern layer emits red light, the green pattern layer emits green light, and the blue pattern layer emits blue light.
In this case, when applied to an image display device, the light emitted from the light source is not particularly limited, but a light source emitting blue light can be used in terms of more excellent color reproducibility.
According to other embodiments of the present invention, the pattern layers may include only two color-phase pattern layers among a red pattern layer, a green pattern layer, and a blue pattern layer. At this time, the pattern layer further includes a transparent pattern layer not including quantum dots.
In the case of a pattern layer including only two hues, a light source that emits light having a wavelength that shows the remaining hues that it does not include may be used. For example, when a red pattern layer and a green pattern layer are included, a light source emitting blue light may be used. At the moment, the red quantum dots emit red light, the green quantum dots emit green light, and the transparent pattern layer directly enables the blue light to penetrate through to display the blue light.
The color filter including the substrate and the pattern layer may further include a partition wall formed between the patterns, and may further include a black matrix. In addition, a protective film formed on an upper portion of the pattern layer of the color filter may be further included.
Further, the present invention provides an image display device including the aforementioned color filter.
The image display device may be not only a general liquid crystal display device but also various image display devices such as an electroluminescence display device, a plasma display device, and a field emission display device.
The image display device of the present invention has excellent light efficiency, high brightness, excellent color reproducibility and wide viewing angle.
Hereinafter, preferred embodiments are provided for understanding the present invention, but these embodiments are only for illustrating the present invention and do not limit the scope of the appended claims, and it is apparent that those skilled in the art can make various modifications and variations to the embodiments within the scope of the scope and technical idea of the present invention, and such variations and modifications naturally fall within the scope of the appended claims.
Production example 1: synthesis of CdSe (core)/ZnS (shell) structured green quantum dot A-1
CdO (0.4mmol), zinc acetate (4mmol), oleic acid (5.5mL) and 1-octadecene (20mL) were placed in a reactor and heated at 150 ℃ for reaction. Thereafter, in order to remove the acetic acid formed by the substitution of zinc by oleic acid, the aforementioned reactants were placed under a vacuum of 100 mTorr for 20 minutes.
Thereafter, after heating to 310 ℃ to give a clear mixture, which was maintained at 310 ℃ for 20 minutes, 0.4mmol of Se powder and 2.3mmol of S powder were dissolved in 3mL of a solution of tri-n-octylphosphine (trioctylphosphine) in Se and S, and then rapidly injected into a container into which Cd (OA) had been put2(Cadmium oleate) and Zn (OA)2(zincoleate) solution in a reactor. The mixture thus obtained was allowed to grow at 310 ℃ for 5 minutes, and then the growth was stopped with an ice bath.
And then, precipitating with ethanol, separating the quantum dots by using a centrifugal separator, washing redundant impurities with chloroform and ethanol, and stabilizing with oleic acid to obtain the CdSe (core)/ZnS (shell) structured quantum dots A-1 with particle distribution with the total core particle diameter and shell thickness of 3-5 nm.
Production example 2: synthesis of alkali soluble resins
A flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel, and a nitrogen gas inlet tube was prepared, while 45 parts by weight of N-benzylmaleimide, 45 parts by weight of methacrylic acid, 10 parts by weight of tricyclodecyl methacrylate, 4 parts by weight of tert-butyl peroxy-2-ethylhexanoate, and 40 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA") were added thereto, followed by stirring and mixing to prepare a monomer dropping funnel, and 6 parts by weight of N-dodecyl glycol and 24 parts by weight of PGMEA were added thereto, followed by stirring and mixing to prepare a chain transfer agent dropping funnel.
Thereafter, 395 parts by weight of PGMEA was introduced into the flask, and after changing the atmosphere in the flask from air to nitrogen, the temperature of the flask was raised to 90 ℃ while stirring.
Subsequently, the monomer and the chain transfer agent were dropped from the dropping funnel. The mixture was dropped while maintaining 90 ℃ for 2 hours, and after 1 hour, the mixture was heated to 110 ℃ and maintained for 3 hours, and then introduced into a gas introduction tube to start bubbling of a mixed gas of 5/95(v/v) oxygen/nitrogen.
Subsequently, 10 parts by weight of glycidyl methacrylate, 0.4 part by weight of 2,2' -methylenebis (4-methyl-6-tert-butylphenol) and 0.8 part by weight of triethylamine were charged into a flask, and the reaction was continued at 110 ℃ for 8 hours, after which it was cooled to room temperature to obtain an alkali-soluble resin having a solid content of 29.1% by weight, a weight-average molecular weight of 32000 and an acid value of 114 mgKOH/g.
Examples 1 to 16 and comparative examples 1 to 6: manufacture of single-layer colour filters
As described in the following tables 1 to 4, the respective components were mixed, diluted with propylene glycol monomethyl ether acetate until the total solid content became 20 wt%, and then sufficiently stirred to obtain a self-luminous photosensitive resin composition. Table 1 shows the types of scattering particles used in examples and comparative examples. Furthermore, table 2 shows the use of scattering particles TiO2The compositions of the examples, Table 3 shows the use of Al2O3Examples of (3) and TiO2In different amounts, the compositions of the examples. On the basis of this, table 4 shows the composition used in the comparative example.
TABLE 1
Species of Average particle diameter Name of commodity Manufacturing company
E-1 TiO2 220nm TR-88 Huntsman corporation
E-2 TiO2 30nm TTO-55(C) Stone source
E-3 TiO2 130nm PT-401L Stone source
E-4 TiO2 210nm CR-63 Stone source
E-5 TiO2 500nm R-960 DuPont
E-6 TiO2 900nm R-902 DuPont
E-7 Al2O3 50nm 0.05 μm alumina powder Alied Corp Ltd
E-8 Al2O3 300nm 0.3 μm alumina powder Alied Corp Ltd
E-9 Al2O3 1000nm 1.0 μm alumina powder Alied Corp Ltd
E-10 SiO2 2000nm SYLYSIA 220A Fuji Co Ltd
E-11 SiO2 Fumed silica Arosil 200 Degussa Corp
TABLE 2
Figure BDA0000853583540000201
TABLE 3
Figure BDA0000853583540000202
Figure BDA0000853583540000211
TABLE 4
Figure BDA0000853583540000212
Color filters were produced using the self-luminous photosensitive resin compositions produced in examples 1 to 16 and comparative examples 1 to 6. That is, after the respective light-emitting photosensitive resin compositions were applied onto a glass substrate by spin coating, they were placed on a hot plate and held at a temperature of 100 ℃ for 3 minutes to form a thin film.
Then, a test photomask having a light-transmitting pattern of 20mm × 20mm square in length × width and a line width/space pattern of 1 μm to 100 μm was placed on the film, and the test photomask was irradiated with ultraviolet light with a space of 100 μm.
In this case, an ultra-high pressure mercury lamp (trade name: USH-250D) manufactured by USHIO Motor company was used as the ultraviolet light source, and 200mJ/cm was used in an atmosphere of air2The exposure (365nm) of (A) was irradiated with light without using a special filter.
The ultraviolet-irradiated film was immersed in a KOH aqueous solution developing solution having a pH of 10.5 for 80 seconds and then developed. The glass plate covered with the film was washed with distilled water, then, nitrogen gas was injected and dried, and the resultant was heated in a heating furnace at 150 ℃ for 10 minutes to produce a color filter. The film thickness of the fabricated self-luminous color filter was 5.0 μm.
Comparative example 7: manufacture of multilayer colour filters
In the composition of the foregoing example 1, the first composition containing 35 wt% of the scattering particles E-1 without the quantum dots and the second composition containing only the quantum dots a-1 without the scattering particles were manufactured.
The method of manufacturing the color filter was the same as that described above, but in comparative example 7, the first composition and the second composition were laminated in this order on the substrate.
Experimental example 1: determination of fine patterns
In the color filters manufactured using the self-luminous photosensitive resin compositions manufactured in the foregoing examples 1 to 16 and comparative examples 1 to 6, the pattern size obtained by a line width/space pattern mask designed to be 100 μm was measured by an OM apparatus (manufactured by ECLIPSE LV100POL nicol).
TABLE 5
Fine pattern
Example 1 10
Example 2 11
Example 3 9
Example 4 10
Example 5 13
Example 6 6
Example 7 2
Example 8 12
Example 9 9
Example 10 9
Example 11 10
Example 12 9
Example 13 12
Example 14 9
Example 15 10
Example 16 4
Comparative example 1 13
Comparative example 2 -10
Comparative example 3 13
Comparative example 4 15
Comparative example 5 10
Comparative example 6 10
If the difference between the design value of the line width/space pattern mask and the measured value of the obtained fine pattern is 20 μm or more, it is difficult to realize a fine pixel, and if it has a negative value, the side means a critical value causing a process failure. Referring to table 5, it can be confirmed that there is no problem in the fine pattern formed by using the quantum dots and the scattering particles at the same time by the present invention.
Experimental example 2: measurement of luminescence intensity
In the color filters manufactured using the self-luminous photosensitive resin compositions manufactured in the foregoing examples 1 to 16 and comparative examples 1 to 6, the light conversion regions were measured for the portions formed in the pattern of 20mm × 20mm squares by a Tube type 4W UV irradiator (VL-4LC, VILBER gourmat) of 365nm, and the emission intensities in the 520nm region of examples 1 to 12 and comparative examples 1 to 3 and in the 640nm region of examples 13 to 16 and comparative example 4 were measured using a spectrometer (Ocean Optics).
TABLE 6
Luminous intensity
Example 1 39500
Example 2 20800
Example 3 21800
Example 4 37800
Example 5 23200
Example 6 41300
Example 7 44500
Example 8 37900
Example 9 36500
Example 10 20700
Example 11 29600
Example 12 34100
Example 13 23400
Example 14 31600
Example 15 35900
Example 16 39100
Comparative example 1 20200
Comparative example 2 42200
Comparative example 3 19700
Comparative example 4 18200
Comparative example 5 33600
Comparative example 6 25200
Comparative example 7 16300
Higher measured luminescence intensity means higher light efficiency. Therefore, it can be seen from table 6 that the emission intensity was improved in examples 1 to 16 as compared with comparative examples 3 and 4 in which quantum dots and scattering particles were not used. In the case of comparative example 7 having a laminated structure, the light source was absorbed in the layer containing only the scattering particles, and the intensity of the light source reaching the self-light-emitting layer was reduced, whereby it was confirmed that the light efficiency was reduced.
Experimental example 3: evaluation of sedimentation stability
50ml of the self-luminous photosensitive resin composition produced in the above examples and comparative examples was put in a 100ml measuring cylinder, and the phenomenon of phase separation in the upper layer due to scattering body sedimentation was observed with the naked eye.
Evaluation was carried out for 6, 18, 36, 72 and 100 hours, and the time for which 5ml or more of phase separation was observed for each sample was measured.
TABLE 7
Stability of sedimentation (time)
Example 1 72
Example 2 100
Example 3 100
Example 4 72
Example 5 72
Example 6 72
Example 7 72
Example 8 72
Example 9 36
Example 10 100
Example 11 72
Example 12 18
Example 13 72
Example 14 72
Example 15 72
Example 16 72
Comparative example 1 72
Comparative example 2 72
Comparative example 3 100
Comparative example 4 100
Comparative example 5 6
Comparative example 6 100
In general, the sedimentation of the scatterers is a natural phenomenon, but if phase separation is caused in the process of manufacturing the color filter, a problem arises in the stability of the coating. Therefore, if the time for confirming the phase separation of the sample is 6 hours or more, it can be judged that there is no problem in the stability of the composition.
Referring to table 7, since each of examples 1 to 16 exhibited a sedimentation stability of 6 hours or more, it was confirmed that there was no problem in the stability of the composition.
Industrial applicability
The self-luminous photosensitive resin composition of the invention can maintain excellent color reproducibility and brightness when being introduced into a color filter of an image display device, and can realize high-grade vivid image quality.

Claims (8)

1. A self-luminous photosensitive resin composition for preventing a decrease in light emission characteristics due to aggregation of quantum dot particles, comprising 3 to 80 wt% of quantum dots, 0.1 to 50 wt% of scattering particles, 5 to 70 wt% of a photopolymerizable compound, 0.1 to 20 wt% of a photopolymerization initiator, 5 to 80 wt% of an alkali-soluble resin, and the balance of a solvent, wherein the amount of the solvent is set to 100 wt% of the total composition,
the scattering particles are metal oxides having an average particle diameter of 30 to 1000nm,
the photopolymerizable compound is a pentafunctional photopolymerizable compound containing a carboxylic acid group.
2. The self-luminous photosensitive resin composition according to claim 1, wherein the metal oxide is an oxide containing one or more metals selected from the group consisting of Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, Ta and In.
3. The self-luminous photosensitive resin composition according to claim 1, wherein the metal oxide contains a metal selected from the group consisting of Al2O3、SiO2、ZnO、ZrO2、BaTiO3、TiO2、Ta2O5、Ti3O5、ITO、IZO、ATO、ZnO-Al、Nb2O3SnO and MgO.
4. The self-luminous photosensitive resin composition according to claim 1, wherein the quantum dot comprises one or more selected from the group consisting of a group IIB-VIA semiconductor compound, a group IIIA-VA semiconductor compound, a group IVA-VIA semiconductor compound, and a group IVA element or a compound containing the group IVA element.
5. The self-luminous photosensitive resin composition according to claim 1, wherein the scattering particles are metal oxides having an average particle diameter of 100 to 500 nm.
6. The self-luminous photosensitive resin composition according to claim 1, wherein the scattering particles are contained in an amount of 0.5 to 30% by weight.
7. A color filter produced from the self-luminous photosensitive resin composition according to any one of claims 1 to 6.
8. An image display device characterized by comprising the color filter according to claim 7.
CN201510812347.0A 2014-11-21 2015-11-20 Self-luminous photosensitive resin composition, color filter and image display device Active CN105629661B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020140163085A KR101879016B1 (en) 2014-11-21 2014-11-21 Self emission type photosensitive resin composition, color filter manufactured using thereof and image display device having the same
KR10-2014-0163085 2014-11-21

Publications (2)

Publication Number Publication Date
CN105629661A CN105629661A (en) 2016-06-01
CN105629661B true CN105629661B (en) 2020-12-29

Family

ID=56044742

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510812347.0A Active CN105629661B (en) 2014-11-21 2015-11-20 Self-luminous photosensitive resin composition, color filter and image display device

Country Status (4)

Country Link
JP (2) JP6984993B2 (en)
KR (1) KR101879016B1 (en)
CN (1) CN105629661B (en)
TW (1) TWI684829B (en)

Families Citing this family (72)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6965500B2 (en) * 2016-05-31 2021-11-10 大日本印刷株式会社 Light wavelength conversion composition, light wavelength conversion particles, light wavelength conversion member, light wavelength conversion sheet, backlight device, and image display device.
KR102605471B1 (en) 2016-06-30 2023-11-23 엘지전자 주식회사 Display device using semiconductor light emitting device
KR102418601B1 (en) * 2016-08-30 2022-07-08 동우 화인켐 주식회사 Self emission type photosensitive resin composition, color filter using thereof and image display device having the same
KR102497282B1 (en) * 2016-09-13 2023-02-08 삼성디스플레이 주식회사 Photoresist composition and color filter using the same
KR20180040173A (en) 2016-10-11 2018-04-20 삼성디스플레이 주식회사 High luminance display device
KR102028968B1 (en) * 2016-10-20 2019-10-07 동우 화인켐 주식회사 Quantum dot dispersion, self emission type photosensitive resin composition comprising the same, color filter and image display device produced using the same
KR101840347B1 (en) * 2016-10-26 2018-03-20 동우 화인켐 주식회사 Self emission type photosensitive resin composition, color filter and image display device produced using the same
KR102028970B1 (en) * 2016-10-26 2019-10-07 동우 화인켐 주식회사 Metal oxide photosensitive resin composition, color filter and image display device produced using the same
WO2018080001A1 (en) * 2016-10-26 2018-05-03 동우화인켐 주식회사 Metal oxide photosensitive resin composition, and color filter and image display device manufactured using same
KR101965278B1 (en) * 2016-10-31 2019-04-03 삼성에스디아이 주식회사 Photosensitive resin composition, photosensitive resin layer using the same and color filter
KR102512672B1 (en) * 2016-11-16 2023-03-22 동우 화인켐 주식회사 Yellow curable resin composition, and color filter comprising thereof and display device comprising of the same
KR102554277B1 (en) * 2016-11-21 2023-07-11 동우 화인켐 주식회사 Self emission type photosensitive resin composition, color filter manufactured using thereof and image display device having the same
KR101941573B1 (en) * 2016-11-28 2019-01-23 동우 화인켐 주식회사 Self emission type photosensitive resin composition, color filter and image display device produced using the same
CN106653809B (en) * 2016-12-09 2019-10-29 安徽熙泰智能科技有限公司 A kind of semiconductor integrates OLED display and preparation method thereof
KR101976659B1 (en) 2016-12-12 2019-05-09 삼성에스디아이 주식회사 Photosensitive resin composition, photosensitive resin layer using same and color filter
EP3339946B1 (en) 2016-12-21 2020-05-06 Samsung Electronics Co., Ltd. Layered structures, production methods thereof, and liquid crystal display including the same
KR102317627B1 (en) * 2016-12-28 2021-10-26 디아이씨 가부시끼가이샤 Ink composition, light conversion layer, and color filter
WO2018123821A1 (en) * 2016-12-28 2018-07-05 Dic株式会社 Dispersion, and inkjet ink composition, light conversion layer, and liquid crystal display element using dispersion
JP7069543B2 (en) * 2017-01-31 2022-05-18 大日本印刷株式会社 Light wavelength conversion composition, light wavelength conversion member, light wavelength conversion sheet, backlight device, and image display device
KR102554285B1 (en) * 2017-02-03 2023-07-10 동우 화인켐 주식회사 Quantum Dot Dispersion, Self Emission Type Photosensitive Resin Composition, Color Filter and Display Device
JP6630754B2 (en) * 2017-02-16 2020-01-15 住友化学株式会社 Curable resin composition, cured film and display device
US10663860B2 (en) 2017-02-20 2020-05-26 Samsung Electronics Co., Ltd. Photosensitive compositions, quantum dot polymer composite produced therefrom, and layered structures and electronic device including the same
US10670962B2 (en) 2017-02-20 2020-06-02 Samsung Electronics Co., Ltd. Photosensitive compositions, preparation methods thereof, and quantum dot polymer composite pattern produced therefrom
KR102300328B1 (en) * 2017-03-29 2021-09-09 동우 화인켐 주식회사 A black colored photosensitive resin composition and display device produced using the same
CN110506235B (en) * 2017-03-30 2023-11-21 东友精细化工有限公司 Blue photosensitive resin composition, color filter manufactured using the same, and image display device
TWI766941B (en) * 2017-03-31 2022-06-11 南韓商東友精細化工有限公司 Blue photosensitive resin composition and color filter and image display device manufactured using the same
KR102395742B1 (en) * 2017-03-31 2022-05-09 동우 화인켐 주식회사 Blue photosensitive resin composition, color filter and image display device produced using the same
KR102300331B1 (en) * 2017-03-31 2021-09-09 동우 화인켐 주식회사 Blue photosensitive resin composition, color filter and image display device produced using the same
KR102403787B1 (en) * 2017-03-31 2022-05-30 동우 화인켐 주식회사 Blue photosensitive resin composition, color filter and image display device produced using the same
JP6921963B2 (en) * 2017-03-31 2021-08-18 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. Blue photosensitive resin composition, color filter and image display device manufactured using this
KR20180111067A (en) * 2017-03-31 2018-10-11 동우 화인켐 주식회사 Blue photosensitive resin composition, color filter and image display device produced using the same
JP6972656B2 (en) * 2017-05-22 2021-11-24 Dic株式会社 Ink composition and its manufacturing method, light conversion layer and color filter
CN109283767A (en) * 2017-07-19 2019-01-29 黄永兰 A kind of electrophoretic display apparatus
JP7013705B2 (en) * 2017-08-01 2022-02-01 Dic株式会社 Ink composition and its manufacturing method, light conversion layer and color filter
JP6981083B2 (en) * 2017-08-01 2021-12-15 Dic株式会社 Ink composition and its manufacturing method, light conversion layer and color filter
JP6981082B2 (en) * 2017-08-01 2021-12-15 Dic株式会社 Ink composition and its manufacturing method, light conversion layer and color filter
KR102648724B1 (en) 2017-08-17 2024-03-18 삼성전자주식회사 Compositions, quantum dot polymer composite and layered structure produced therefrom, and electronic device including the same
KR102466420B1 (en) 2017-08-22 2022-11-11 삼성디스플레이 주식회사 Color conversion panel and display device including the same
US11029559B2 (en) * 2017-08-25 2021-06-08 Nanosys, Inc. Nanostructure based display devices
KR102362443B1 (en) * 2017-08-31 2022-02-11 동우 화인켐 주식회사 A blue colored photosensitive resin composition, color filter and image display device produced using the same
JP7020014B2 (en) * 2017-09-14 2022-02-16 Dic株式会社 Ink composition, light conversion layer and color filter
JP7020015B2 (en) * 2017-09-14 2022-02-16 Dic株式会社 Ink composition, light conversion layer and color filter
JP7035400B2 (en) * 2017-09-14 2022-03-15 Dic株式会社 Ink composition, light conversion layer and color filter
WO2019083112A1 (en) * 2017-10-27 2019-05-02 삼성에스디아이 주식회사 Composition comprising quantum dots, method for preparing quantum dots, and color filter
JP7196392B2 (en) * 2017-11-10 2022-12-27 Dic株式会社 Inkjet ink for color filter, light conversion layer and color filter
JP7024336B2 (en) * 2017-11-10 2022-02-24 Dic株式会社 Ink composition, light conversion layer and color filter
JP6992424B2 (en) * 2017-11-10 2022-01-13 Dic株式会社 Ink composition, light conversion layer and color filter
KR102464914B1 (en) * 2017-11-22 2022-11-09 동우 화인켐 주식회사 A light converting resin composition, a light converting unit and a display device using the same
JP7024383B2 (en) * 2017-12-22 2022-02-24 Dic株式会社 Ink composition, light conversion layer and color filter
WO2019167751A1 (en) * 2018-02-28 2019-09-06 Jsr株式会社 Semiconductor-nanoparticle-containing composition, wavelength conversion film, light-emitting display element, and method for forming wavelength conversion film
JP6790158B2 (en) * 2018-03-21 2020-11-25 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. Light conversion resin composition, light conversion laminated base material, and image display device using the same
JP6901513B2 (en) * 2018-03-26 2021-07-14 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. Light conversion resin composition and light conversion laminated base material, image display device using this
WO2019186726A1 (en) * 2018-03-27 2019-10-03 日立化成株式会社 Wavelength conversion member, backlight unit and image display device
CN108864384B (en) * 2018-05-08 2020-09-15 纳晶科技股份有限公司 Quantum dot dispersion resin molded body, quantum dot dispersion colloid, and light-emitting device
JP7243073B2 (en) * 2018-08-03 2023-03-22 Dic株式会社 Ink composition and cured product thereof, light conversion layer, and color filter
KR20200016057A (en) 2018-08-06 2020-02-14 삼성전자주식회사 Composition, quantum dot-polymer composite, and dispaly device including same
KR102285669B1 (en) * 2018-08-27 2021-08-04 동우 화인켐 주식회사 A color filter, a method of making thereof, and an image display device comprising thereof
KR102634132B1 (en) * 2018-08-27 2024-02-06 동우 화인켐 주식회사 A color filter and an image display device comprising thereof
JP7318494B2 (en) 2018-12-26 2023-08-01 東洋インキScホールディングス株式会社 Quantum dots, ink compositions and printed matter
KR102419673B1 (en) * 2019-01-21 2022-07-08 삼성에스디아이 주식회사 Quantum dot, curable composition comprising the same, curing layer using the composition, color filter including the curing layer, display device and manufacturing method of the curing layer
KR102296792B1 (en) 2019-02-01 2021-08-31 삼성에스디아이 주식회사 Non-solvent type curable composition, curing layer using the same, color filter including the curing layer, display device and manufacturing method of the curing layer
JP6933311B2 (en) * 2019-02-07 2021-09-08 Dic株式会社 Inkjet ink for color filters, light conversion layer and color filter
JP7318225B2 (en) * 2019-02-07 2023-08-01 Dic株式会社 Inkjet ink for color filter, light conversion layer and color filter
KR102472457B1 (en) * 2019-03-14 2022-12-01 동우 화인켐 주식회사 Light scattering resin composition, scattering layer and image display device using the same
KR102436143B1 (en) * 2019-03-27 2022-08-26 동우 화인켐 주식회사 A colored photosensitive resin composition, a color filter and an image display device produced using the same
JP2020166131A (en) * 2019-03-29 2020-10-08 山陽色素株式会社 Quantum dot dispersion and composition for coating film formation including quantum dot dispersion
KR102360987B1 (en) 2019-04-24 2022-02-08 삼성에스디아이 주식회사 Curable composition including quantum dot, resin layer using the same and display device
JP7331452B2 (en) * 2019-05-16 2023-08-23 Dic株式会社 Curable ink composition, light conversion layer and color filter
KR102504790B1 (en) 2019-07-26 2023-02-27 삼성에스디아이 주식회사 Quantum dot, curable composition comprising the same, curing layer using the composition, color filter including the curing layer, display device
JP2021096323A (en) * 2019-12-16 2021-06-24 Dic株式会社 Color filter ink composition, light conversion layer, and color filter
CN110989296A (en) * 2019-12-19 2020-04-10 京东方科技集团股份有限公司 Quantum dot photoresist and preparation method thereof, display substrate and display device
JP2022041899A (en) * 2020-08-31 2022-03-11 住友化学株式会社 Resin composition, resin film, and display device

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1864991A1 (en) * 2005-03-28 2007-12-12 Idemitsu Kosan Co., Ltd. Organic ligands for semiconductor nanocrystals
WO2009002512A1 (en) * 2007-06-25 2008-12-31 Qd Vision, Inc. Compositions, optical component, system including an optical component, devices, and other products
WO2007108432A1 (en) * 2006-03-20 2007-09-27 Mitsui Chemicals, Inc. Optical film and method for producing same
JP4631808B2 (en) * 2006-06-08 2011-02-16 住友化学株式会社 Colored photosensitive resin composition
JP5773646B2 (en) * 2007-06-25 2015-09-02 キユーデイー・ビジヨン・インコーポレーテツド Compositions and methods comprising depositing nanomaterials
WO2009011922A1 (en) * 2007-07-18 2009-01-22 Qd Vision, Inc. Quantum dot-based light sheets useful for solid-state lighting
KR20100037283A (en) * 2008-10-01 2010-04-09 삼성전자주식회사 Liquid crystal display and manufacturing method of the same
WO2011047385A1 (en) * 2009-10-17 2011-04-21 Qd Vision, Inc. An optical, component, products including same, and methods for making same
KR101251738B1 (en) * 2011-03-22 2013-04-05 엘지이노텍 주식회사 Dispaly device
KR101805198B1 (en) * 2011-11-03 2018-01-10 동우 화인켐 주식회사 A colored photosensitive resin composition
JP5699096B2 (en) * 2012-01-26 2015-04-08 東京応化工業株式会社 Photosensitive composition, pattern and display device having pattern
KR101860935B1 (en) * 2012-03-15 2018-05-25 삼성디스플레이 주식회사 Liquid crystal display device and manufacturing method thereof
US20140027673A1 (en) * 2012-07-25 2014-01-30 Qd Vision, Inc. Method of making components including quantum dots, methods, and products
KR102165441B1 (en) * 2013-01-21 2020-10-14 쓰리엠 이노베이티브 프로퍼티즈 컴파니 Quantum dot film
KR20140100261A (en) * 2013-02-06 2014-08-14 동우 화인켐 주식회사 Colored photosensitive resin composition
US9142732B2 (en) * 2013-03-04 2015-09-22 Osram Sylvania Inc. LED lamp with quantum dots layer
CN103278876A (en) * 2013-05-28 2013-09-04 京东方科技集团股份有限公司 Quantum dot color filter and manufacturing method thereof and display device
CN103487857A (en) * 2013-10-11 2014-01-01 张家港康得新光电材料有限公司 Quantum dot film and backlight module
CN103728837B (en) * 2013-12-30 2016-08-31 京东方科技集团股份有限公司 Photosensitve resin composition and the method preparing quantum dot pattern with Photosensitve resin composition
CN105093830A (en) * 2015-08-28 2015-11-25 京东方科技集团股份有限公司 Quantum-dot photoresist, color film substrate and display device

Also Published As

Publication number Publication date
KR101879016B1 (en) 2018-07-16
CN105629661A (en) 2016-06-01
TW201626104A (en) 2016-07-16
JP6984993B2 (en) 2021-12-22
KR20160060904A (en) 2016-05-31
JP2016098375A (en) 2016-05-30
JP2021119226A (en) 2021-08-12
TWI684829B (en) 2020-02-11

Similar Documents

Publication Publication Date Title
CN105629661B (en) Self-luminous photosensitive resin composition, color filter and image display device
CN106444132B (en) Self-emission type photosensitive resin composition, color filter manufactured therefrom, and image display device having the color filter
CN105388702B (en) Photosensitive resin composition
JP6570937B2 (en) Photosensitive resin composition
KR102052101B1 (en) Self emission type photosensitive resin composition, color filter manufactured using thereof and image display device having the same
CN110023838B (en) Self-luminous photosensitive resin composition, color filter and image display device manufactured by using same
KR102431437B1 (en) Color filter, method for producing the same and image display device employing color filter
CN106569389B (en) Self-luminous photosensitive resin composition, color filter and display device including the same
CN110291431B (en) Color filter and image display device
KR102554277B1 (en) Self emission type photosensitive resin composition, color filter manufactured using thereof and image display device having the same
KR102028439B1 (en) Self emission type photosensitive resin composition, and color filter comprising thereof and display device comprising of the same
CN107880871B (en) Quantum dot dispersion, self-luminous photosensitive resin composition and use thereof
TWI748961B (en) Self-light-emitting photosensitive resin composition, and color filter and display device comprising the same
TW201728996A (en) Self-emission photosensitive resin composition and color filter and image display device produced using the same may not occur problem of low light emitting efficiency and defect photosensitivity during post-backing procedure
KR20170017544A (en) Self emission type photosensitive resin composition, color filter using thereof and image display device having the same

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant