KR102634132B1 - A color filter and an image display device comprising thereof - Google Patents

Abstract

The present invention, a quantum dot layer; And a protective layer formed on the quantum dot layer,
The protective layer relates to a color filter made of a composition containing 0.5 to 1.5% by weight of a compound having a thiol group or made of a white photosensitive resin composition, based on the total weight of the composition, and to an image display device including the same, the present invention The color filter can exhibit excellent light resistance, and by including such a color filter, luminance characteristics are improved, making it possible to provide an image display device capable of realizing high-definition image quality.

Description

Color filter and image display device including same {A COLOR FILTER AND AN IMAGE DISPLAY DEVICE COMPRISING THEREOF}

The present invention relates to a color filter and an image display device including the same.

Display devices that have emerged recently include liquid crystal displays and organic electroluminescence devices.

The liquid crystal display device uses a color filter to form color, and the color filter includes a black matrix layer formed in a predetermined pattern on a transparent substrate to block light at the boundary between each pixel and a plurality of layers to form each pixel. It has a structure in which pixel units in which three primary colors (typically red (R), green (G), and blue (B)) are arranged in a certain order are stacked one after the other.

Color filters are manufactured by coating three or more colors on a transparent substrate using pigment dispersion, electrodeposition, printing, dyeing, transfer, and inkjet methods. Recently, pigment dispersion methods using pigment-dispersed photosensitive resins, which are excellent in terms of quality and performance, have become mainstream.

The pigment dispersion method involves coating a photosensitive resin composition containing a colorant, alkali-soluble resin, photopolymerization monomer, photopolymerization initiator, epoxy resin, solvent, and other additives on a transparent substrate with a black matrix, and forming a pattern of the desired shape. This is a method of forming a colored thin film by repeating a series of processes of removing non-exposed areas with a solvent and heat curing after exposure, and is actively used in manufacturing LCDs for mobile phones, laptops, monitors, TVs, etc.

Generally, when using the pigment dispersion method, dye or pigment is used as a colorant, but in this case, it causes the problem of lowering the transmission efficiency of the light source. A decrease in transmission efficiency ultimately lowers the color reproducibility of the image display device, ultimately making it difficult to implement a high-quality screen. Accordingly, as further improved performance such as excellent pattern characteristics, more diverse color expression, high color reproduction rate, high brightness and high contrast ratio are required, the use of self-emitting quantum dots instead of dyes or pigments has been proposed.

When quantum dots are used as a light-emitting material in a color filter, the light emission waveform can be narrowed, and it has the ability to realize high colors that cannot be achieved with pigments, and has excellent luminance characteristics. However, it has been reported that due to the low stability of quantum dots used in color filter manufacturing, crystals, etc. are generated on the surface, greatly reducing the luminous efficiency of quantum dots.

In this regard, for example, Republic of Korea Patent Publication No. 2018-0030353 discloses a quantum dot color filter to increase light efficiency and a display device equipped with the same, and it is possible to minimize the decrease in light efficiency during the manufacturing process of a self-luminous color filter. The development of existing technologies is continuously required.

Republic of Korea Patent Publication No. 2018-0030353

The purpose of the present invention is to provide a color filter that includes quantum dots, exhibits excellent light resistance, and can improve the light efficiency of a self-emissive pixel layer.

Additionally, the present invention aims to provide an image display device including the color filter.

The present invention,

Quantum dot layer; and

It includes a protective layer formed on the quantum dot layer,

The protective layer provides a color filter, which is manufactured from a composition containing 0.3 to 1.5% by weight of a compound having a thiol group, based on the total weight of the composition.

In addition, the present invention,

Quantum dot layer; and

It includes a protective layer formed on the quantum dot layer,

The protective layer provides a color filter made of a white photosensitive resin composition.

Additionally, the present invention provides an image display device including the above color filter.

The color filter according to the present invention can exhibit excellent light resistance by forming a protective layer on the layer containing quantum dots.

In addition, by including the color filter, an image display device capable of improving luminance characteristics and realizing high-definition image quality can be provided.

1, 3, and 5 are diagrams schematically showing the structure of a color filter that deviates from an embodiment of the present invention.
2, 4, and 6 are diagrams schematically showing the structure of a color filter according to an exemplary embodiment of the present invention.

The present invention, a quantum dot layer; And a protective layer formed on the quantum dot layer,

The protective layer relates to a color filter made from a composition containing 0.3 to 1.5% by weight of a compound having a thiol group or made from a white photosensitive resin composition, based on the total weight of the composition, and to an image display device including the same, the present invention The color filter can exhibit excellent light resistance, and by including such a color filter, luminance characteristics are improved, making it possible to provide an image display device capable of realizing high-definition image quality.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the attached drawings. Before explaining the present invention, if a detailed description of related known functions and configurations is judged to unnecessarily obscure the gist of the present invention, the description thereof will be omitted.

The description and drawings below illustrate specific embodiments to enable those skilled in the art to easily practice the devices and methods described. Other embodiments may include other structural and logical variations. Individual components and functions may be selected generically, unless explicitly required, and the order of processes may vary. Portions and features of some embodiments may be included in or replaced with other embodiments.

<Color Filter>

FIG. 2 is a diagram schematically showing a color filter according to a first embodiment of the present invention, FIG. 4 is a diagram schematically showing a color filter according to a second embodiment of the present invention, and FIG. 6 is a diagram schematically showing a color filter according to a third embodiment of the present invention. This is a diagram schematically showing a color filter according to an embodiment.

Referring to FIGS. 2, 4, and 6, the color filter of the present invention includes a quantum dot layer and a protective layer.

The quantum dot layer of the present invention can be formed using a self-luminous photosensitive resin composition containing photoluminescence quantum dots, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent.

Quantum dots (QDs) are nano-sized semiconductor materials. Atoms form molecules, and molecules form a collection of small molecules called clusters. When nanoparticles have semiconductor properties, they are called quantum dots. When a quantum dot receives energy from the outside and reaches an excited state, it emits energy according to the corresponding energy band gap.

The quantum dot is not particularly limited as long as it can emit light when stimulated by light, and examples include group II-VI semiconductor compounds; Group III-V semiconductor compounds; Group IV-VI semiconductor compounds; Group IV elements or compounds containing them; and combinations thereof. These can be used alone or in combination of two or more types.

The group II-VI semiconductor compound is a binary compound selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, and mixtures thereof; A ternary compound selected from the group consisting of CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe and mixtures thereof; and a quaternary element compound selected from the group consisting of CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe, and mixtures thereof, and the group III-V semiconductor compound is GaN. , GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof; A ternary compound selected from the group consisting of GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, and mixtures thereof; and a tetraelement compound selected from the group consisting of GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb, and mixtures thereof. , the group IV-VI semiconductor compound is a binary compound selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe, and mixtures thereof; A ternary compound selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, and mixtures thereof; and a quaternary element compound selected from the group consisting of SnPbSSe, SnPbSeTe, SnPbSTe, and mixtures thereof, and the group IV element or compound containing it is a group consisting of Si, Ge, and mixtures thereof. Elemental compounds selected from; and a binary compound selected from the group consisting of SiC, SiGe, and mixtures thereof.

In addition, the quantum dots have a homogeneous single structure; Dual structures such as core-shell, gradient structures, etc.; Or it may be a mixed structure thereof.

In the core-shell dual structure, the materials constituting each core and shell may be made of different semiconductor compounds mentioned above. For example, the core may include one or more materials selected from the group consisting of CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, and ZnO, but is not limited thereto. The shell may include one or more materials selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, and HgSe, but is not limited thereto.

The quantum dots of the present invention can be classified into red quantum dots, green quantum dots, and blue quantum dots, and the quantum dot layer according to the present invention has red, green, blue, and combinations thereof to correspond to the color represented by the color layer. It may include one type of quantum dot selected from.

The quantum dot layer may include scattering particles that scatter incident light. Scattering particles are particles that scatter and reflect incident light. It is effective to use particles with a particle size of 200 to 700 nanometers. am.

As the scattering particles, all common inorganic materials can be used, and metal oxides are preferably used.

The metal oxides include Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, A metal oxide containing one type selected from the group consisting of Ce, Ta, In, and combinations thereof is possible.

Specifically, Al ₂ O ₃ , SiO ₂ , ZnO, ZrO ₂ , BaTiO ₃ , TiO ₂ , Ta ₂ O ₅ , Ti ₃ O ₅ , ITO, IZO, ATO, ZnO-Al, Nb ₂ O ₃ , SnO, MgO and One type selected from the group consisting of a combination of these is possible. If necessary, materials surface treated with a compound having an unsaturated bond such as acrylate can also be used.

If necessary, the color filter of the present invention may further include a partition located between the quantum dot layer. In this case, since the partition wall provides a clear division, the pixels are clearly distinguished, allowing the user to receive a clear image.

The quantum dots may be synthesized by a wet chemical process, an organic metal chemical vapor deposition process, or a molecular beam epitaxy process.

The wet chemical process is a method of growing particles by adding a precursor material to an organic solvent. When the crystal grows, the organic solvent is naturally coordinated to the surface of the quantum dot crystal and acts as a dispersant to control the growth of the crystal, so the metal organic chemical vapor deposition (MOCVD) or molecular beam epitaxy (MBE) is used. The growth of nanoparticles can be controlled through an easier and cheaper process than vapor deposition methods such as beam epitaxy.

The quantum dots can replace conventionally used colorants such as pigments and dyes to provide color filters with improved performance such as various color expressions, high color gamut, high brightness, and high contrast ratio. Since it radiates, a problem occurs in which the utilization rate of light is not high.

Accordingly, the color filter according to the present invention can improve light efficiency by including a protective layer formed on the quantum dot layer.

In order to improve light efficiency, the protective layer of the present invention includes a composition containing 0.3 to 1.5% by weight of a compound having a thiol group, based on the total weight of the composition; Alternatively, it may be manufactured from a white photosensitive resin composition.

When the protective layer of the present invention is manufactured using a composition containing 0.3 to 1.5% by weight of a compound having a thiol group, light efficiency can be improved and light resistance can be improved.

Additionally, the white photosensitive resin composition may include an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent.

If necessary, the color filter of the present invention may further include a color layer.

The color layer is a layer containing one or more colors such as red, green, and blue, and is a photosensitive resin composition containing a colorant, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent. It can be formed using .

When further including a color layer, the color filter of the present invention may be formed with a color layer thickness ranging from 5 to 30 based on 100 the thickness of the quantum dot layer. Since the color layer formed with a thickness lower than the quantum dot layer thickness inhibits the amount of light generated from the quantum dot layer as it passes through the color filter, it is better to form the color layer at a thickness lower than the thickness of the quantum dot layer in terms of optical characteristics. It is advantageous. The main reason for forming the quantum dot layer and the color layer together in the color filter is that when light is incident from the outside of the display, the color layer acts as a filter, so it can suppress reflection of the light incident from the outside. The color layer is suitable for preventing reflection of external light sources while not interfering with the light source displayed on the display. Considering these characteristics, if the thickness of the color layer ranges from 5 to 30 based on the thickness of the quantum dot layer as 100, it has excellent properties in suppressing reflection of light incident from the outside and interferes with the light source displayed on the display. This is less. Additionally, it is important that the transmission characteristics of the manufactured color layer be 75% or more for a specific wavelength (for example, 530 nm, represented by green, to 630 nm, represented by red).

The color filter according to the present invention as described above can be applied to a display and used to display colors.

For example, the color filter according to the embodiment may form colors by arranging each color filter area to correspond to a plurality of pixel areas of the display unit controlled according to the image signal. The display unit may be, for example, a transmissive or reflective liquid crystal panel, or an organic light emitting panel.

<Composition for forming a protective layer>

Below, a composition for forming a protective layer formed on the quantum layer, that is, a composition for forming a protective layer, will be described in detail.

The protective layer of the present invention includes a composition containing 0.3 to 1.5% by weight of a compound having a thiol group, based on the total weight of the composition; Alternatively, it may be manufactured from a white photosensitive resin composition.

Composition containing a compound having a thiol group

If the composition contains a compound with a thiol group in an amount below the above content range, a problem may occur in which the light retention properties are not improved, and if it is included in an amount exceeding the above content range, a problem may occur in which the strength of the paint film is lowered. .

The compound having a thiol group may be one selected from the group consisting of compounds having a polyfunctional thiol group, and may preferably be a tri- to tetra-functional thiol compound in terms of improving curability.

For example, the compound having a thiol group may be one or more selected from the group consisting of trimethylolpropanetris-3-mercaptopropionate or pentaerythritoltetrakis-3-mercaptopropionate, but is limited thereto. That is not the case.

The composition containing the compound having a thiol group of the present invention may further include an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent included in the white photosensitive resin composition to be described later, and, if necessary, the scattering particles described above. More may be included.

In one embodiment of the present invention, the alkali-soluble resin may be included in an amount of 5 to 20% by weight, preferably 7 to 15% by weight, based on the total weight of the composition containing a compound having a thiol group. When the alkali-soluble resin is contained within the above range, it is preferable because pattern formation is easy.

The content of the photopolymerizable compound may be 5 to 20% by weight, preferably 7 to 15% by weight, based on the total weight of the composition containing the compound having a thiol group. When the photopolymerizable compound is included in the above range, it is preferable in terms of coating film formation.

The content of the photopolymerization initiator may be 0.1 to 5% by weight, preferably 0.2 to 4% by weight, based on the total weight of the composition containing the compound having a thiol group. When the photopolymerization initiator is included within the above range, it is preferable in terms of improving the strength of the coating film.

The solvent may be included in an amount of 60 to 85% by weight, preferably 70 to 85% by weight, based on the total weight of the composition containing the compound having a thiol group of the present invention. When the solvent is contained within the above content range, the applicability is improved when applied with a coating device such as a roll coater, spin coater, slit and spin coater, slit coater (sometimes called a die coater), and inkjet. It is desirable because it provides

White photosensitive resin composition

The white photosensitive resin composition includes an alkali-soluble resin; Photopolymerizable compounds; photopolymerization initiator; and a solvent.

The white photosensitive resin composition includes 5 to 20% by weight of an alkali-soluble resin, based on the total weight of the composition; 5 to 20% by weight of a photopolymerizable compound; 0.1 to 5.0% by weight of photopolymerization initiator; and 65 to 85% by weight of solvent.

The alkali-soluble resin can be used without particular limitation as long as it is a polymer that is soluble in the alkaline developer used in the development process when forming the pattern. However, in the present invention, the alkali-soluble resin is manufactured using a monomer having a non-reactive functional group. It is desirable to use .

Specific examples of the alkali-soluble resin include styrene, α-methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p- Methoxystyrene, o-vinylbenzyl methyl ether, m-vinylbenzyl methyl ether, p-vinylbenzyl methyl ether, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl aromatic vinyl compounds such as ether and indene; Methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-propyl acrylate, n-propyl methacrylate, i-propyl acrylate, i-propyl methacrylate, n-butylacrylate, n-butyl methacrylate, i-butyl acrylate, i-butyl methacrylate, sec-butyl acrylate, sec-butyl methacrylate, t-butyl acrylate, t-butyl methacrylate, 2-hydroxy Ethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl acrylate, 3-hydroxypropyl methacrylate, 2-hydroxypropyl acrylate Roxybutyl acrylate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl acrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, allyl acrylate Latex, allyl methacrylate, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate, phenyl methacrylate, 2-methoxyethyl acrylate, 2-methoxyethyl methacrylate Crylate, 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, methoxydiethylene glycol acrylate, methoxydiethylene glycol methacrylate, methoxytriethylene glycol acrylate, methoxytriethylene glycol methacrylate Latex, methoxypropylene glycol acrylate, methoxypropylene glycol methacrylate, methoxydipropylene glycol acrylate, methoxydipropylene glycol methacrylate, isobornyl acrylate, isobornyl methacrylate, dicyclopentadiene Nyl acrylate, dicyclopentadiethyl methacrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-hydroxy-3-phenoxypropyl methacrylate, glycerol monoacrylate, glycerol monomethacrylate unsaturated carboxylic acid esters such as; 2-Aminoethyl acrylate, 2-aminoethyl methacrylate, 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2-aminopropyl acrylate, 2-aminopropyl methacrylate, 2-dimethyl Aminopropyl acrylate, 2-dimethylaminopropyl methacrylate, 3-aminopropyl acrylate, 3-aminopropyl methacrylate, 3-dimethylaminopropyl acrylate, 3-dimethylaminopropyl methacrylate, etc. .

The content of the alkali-soluble resin may be 5 to 20% by weight, preferably 7 to 15% by weight, based on the total weight of the white photosensitive resin composition. When the alkali-soluble resin is included within the above range, it is preferable because pattern formation is easy.

The acid value of the alkali-soluble resin is preferably 30 mg·KOH/g to 150 mg·KOH/g, and thus, the aging stability of the photosensitive resin composition can be improved. If the acid value of the binder resin is less than 30 mg·KOH/g, it is difficult for the photosensitive resin composition to secure a sufficient development speed, and if it exceeds 150 mg·KOH/g, adhesion to the substrate is reduced, causing short circuiting of the pattern. It is easy to do this, and the aging stability of the white photosensitive resin composition may decrease and the viscosity may increase.

To ensure additional developability of the alkali-soluble resin, a hydroxyl group may be added. When hydroxyl groups are added to the binder resin, a pattern can be formed through a development process.

The hydroxyl value of the alkali-soluble resin is preferably 50 mg·KOH/g to 250 mg·KOH/g. If the hydroxyl value of the binder resin is less than 50 mg·KOH/g, sufficient development speed cannot be secured, and if it exceeds 250 mg·KOH/g, the dimensional stability of the formed pattern is reduced, resulting in poor straightness of the pattern. It is easy to fray, and problems with the aging stability of the white photosensitive resin composition may occur.

The photopolymerizable compound can be used without particular limitation as long as it is a compound that can be polymerized by the action of a photopolymerization initiator, but in the present invention, it is preferable to use a trifunctional or more multifunctional photopolymerizable compound.

Specific examples of the trifunctional or more multifunctional photopolymerizable compound include trimethylolpropane tri(meth)acrylate, ethoxylated trimethylolpropane tri(meth)acrylate, and propoxylated trimethylolpropane tri(meth)acrylate. Late, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol diacrylate, dipentaerythritol triacrylate, dipentaerythritol penta(meth)acrylate, Examples include toxylated dipentaerythritol hexa(meth)acrylate, propoxylated dipentaerythritol hexa(meth)acrylate, and dipentaerythritol hexa(meth)acrylate. Commercially available products include Aronix. Examples include M-309, TO-1382 (Toagosei), KAYARAD TMPTA, KAYARAD DPHA or KAYARAD DPHA-40H (Nippon Kayaku). However, it is not limited to this.

Among the photopolymerizable compounds exemplified above, (meth)acrylates and urethane (meth)acrylates are more preferable because they have excellent polymerizability and can improve strength.

The content of the photopolymerizable compound may be 5 to 20% by weight, preferably 7 to 15% by weight, based on the total weight of the white photosensitive resin composition. When the photopolymerizable compound is included within the above range, it is preferable in terms of coating film formation.

The photopolymerization initiator can be used without particular limitation as long as it can polymerize the photopolymerizable compound, but in the present invention, it is preferable to use oxime-based compounds or triazine-based compounds.

Specific examples of the oxime-based compounds include o-ethoxycarbonyl-α-oxymino-1-phenylpropan-1-one, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole -3-yl]-ethanone-1-(O-acetyloxime), (Z)-2-((benzoyloxy)imino)-1-(4-(phenylthio)phenyl)octan-1-one, (E)-1-(((1-(9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl)ethylidin)amino)oxy)ethanone and (E)-1- (((1-(6-(4-((2,2-dimethyl-1,3-dioxolan-4-yl)methoxy)-2-methylbenzoyl)-9-ethyl-9H-carbazole-3 Examples include -yl)ethylidine)amino)oxy)ethanone, and commercial products include OXE-01 and OXE-02 from BASF, but are not limited thereto.

Examples of the triazine-based compounds include 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)- 6-(4-methoxynaphthyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-piperonyl-1,3,5-triazine, 2,4- Bis(trichloromethyl)-6-(4-methoxystyryl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(5-methylfuran-2 -yl)ethenyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(furan-2-yl)ethenyl]-1,3,5-tri Azine, 2,4-bis(trichloromethyl)-6-[2-(4-diethylamino-2-methylphenyl)ethenyl]-1,3,5-triazine, 2,4-bis(trichloro and methyl)-6-[2-(3,4-dimethoxyphenyl)ethenyl]-1,3,5-triazine.

The content of the photopolymerization initiator may be 0.1 to 5.0% by weight, preferably 0.2 to 4.0% by weight, based on the total weight of the white photosensitive resin composition. When the photopolymerization initiator is included within the above range, it is preferable in terms of improving the strength of the coating film.

The photopolymerization initiator can be used alone or in combination of two or more types.

The white photosensitive resin composition according to the present invention may further include a photopolymerization initiation auxiliary agent in addition to the photopolymerization initiator.

The photopolymerization initiation aid is a compound used to promote polymerization of the photopolymerizable compound whose polymerization is initiated by the photopolymerization initiator, and may include, but is not limited to, an amine-based compound.

Specific examples of the amine compounds include aliphatic amine compounds such as triethanolamine, methyldiethanolamine, and triisopropanolamine; Methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, N,N-dimethylparatoluidine, 4,4 Aromatic amine compounds such as '-bis(dimethylamino)benzophenone and 4,4'-bis(diethylamino)benzophenone; etc. can be mentioned.

The photopolymerization initiation aid may be typically included in an amount of more than 0 mol to 10 mol or less, preferably 0.01 mol to 5 mol, based on 1 mol of the photopolymerization initiator. When the photopolymerization initiation aid is included within the above range, it is preferable because the sensitivity of the photosensitive resin composition is improved.

The solvent can be used without particular restrictions on solvents used in conventional photosensitive resin compositions, as long as they are effective in dissolving other components included in the white photosensitive resin composition, and in particular, ethers, aromatic hydrocarbons, ketones, alcohols, and esters. Or amides, etc. are preferable.

The solvent specifically includes ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, Diethylene glycol dialkyl ethers such as diethylene glycol dipropyl ether and diethylene glycol dibutyl ether, ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate, propylene glycol monomethyl ether acetate, Alkylene glycol alkyl ether acetates such as propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate, and methoxypentyl acetate, aromatic hydrocarbons such as benzene, toluene, xylene, and mesitylene, and methyl ethyl ketone. , Ketones such as acetone, methyl amyl ketone, methyl isobutyl ketone, and cyclohexanone, alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, and glycerin, ethyl 3-ethoxypropionate, 3- Ester, such as methyl methoxypropionate, and cyclic ester, such as γ-butyrolactone, are mentioned.

The solvent is preferably an organic solvent with a boiling point of 100°C to 200°C in terms of coating and drying properties, and more preferably propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, ethyl lactate, and butalac. Tate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, etc. can be used.

The solvents exemplified above may be used alone or in a mixture of two or more types, and may be included in an amount of 65 to 85% by weight, preferably 70 to 85% by weight, based on the total weight of the white photosensitive resin composition of the present invention. When the solvent is contained within the above content range, the applicability is improved when applied with a coating device such as a roll coater, spin coater, slit and spin coater, slit coater (sometimes called a die coater), and inkjet. It is desirable because it provides

If necessary, the white photosensitive resin composition of the present invention may further include the above-described scattering particles. The scattering particles are nano-sized particles used for the purpose of scattering light, and SiO ₂ , ZnO, TiO ₂ , etc. may be used, but are not limited thereto.

<Image display device>

The present invention provides an image display device including the color filter.

The color filter of the present invention can be applied to various image display devices such as electroluminescence display devices, plasma display devices, and field emission display devices, as well as ordinary liquid crystal display devices.

The image display device of the present invention may be provided with a color filter including a color layer formed of one or more colors, a quantum dot layer, and a partition wall that is integrated with the color layer and the quantum dot layer. In this case, when applied to an image display device, the emission light of the light source is not particularly limited, but in terms of better color reproduction, a light source that emits blue light can be preferably used.

The image display device of the present invention has excellent light efficiency, exhibits high luminance, has excellent color reproduction, and has a wide viewing angle.

Hereinafter, the present invention will be described in more detail using examples and comparative examples. However, the following examples are for illustrating the present invention, and the present invention is not limited by the following examples, and may be modified and changed in various ways. The scope of the present invention will be determined by the technical spirit of the patent claims described later.

<Manufacturing example>

Preparation of composition for forming protective layer

A composition for forming a protective layer was prepared by mixing the ingredients listed in Table 1 below in the corresponding ingredient ratio (unit: weight %).

division protective layer 1 Protective layer 2 Protective layer 3 Protective layer 4 scattering particles - 1.4 1.4 1.8 Alkali soluble resin 8.3 6.0 6.0 7.0 photopolymerizable compound 7.8 11.9 11.2 9.8 photopolymerization initiator 0.6 0.7 0.7 0.7 Multifunctional thiol compound 1 - - 0.7 0.4 Multifunctional thiol compound 2 - - - 0.3 solvent 83.3 80.0 80.0 80.0 Scattering particles: TiO ₂ (Ti-Pure R960 from Chemours)
Alkali soluble resin: SPCY-1L; Manufactured by Showa Polymer Co., Ltd.
Photopolymerizable compound: Dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.)
Photopolymerization initiator: Irgacure OXE-03 (manufactured by Ciba Specialty Chemical)
Solvent: Propylene glycol monomethyl ether acetate (PGMEA)
Multifunctional thiol compound 1: Trimethylolpropane tris-3-mercaptopropionate
Multifunctional thiol compound 2: Pentaerythritol tetrakis-3-mercaptopropionate

Examples and Comparative Examples: Preparation of color filters

Color filters of Examples 1 to 7 and Comparative Examples 1 to 3 were manufactured using the structures and protective layers shown in Table 2 below.

structure protective layer Example 1 Figure 2 protective layer 1 Example 2 Figure 4 protective layer 1 Example 3 Figure 4 Protective layer 3 Example 4 Figure 6 protective layer 1 Example 5 Figure 6 Protective layer 2 Example 6 Figure 6 Protective layer 3 Example 7 Figure 6 Protective layer 4 Comparative Example 1 Figure 1 No protective layer Comparative example 2 Figure 3 No protective layer Comparative Example 3 Figure 5 No protective layer

Specifically, the upper substrate was manufactured by sequentially stacking glass as a standard. In the case of Figure 1, a white-blue pattern layer is formed through a photolithography process using a self-luminous photosensitive resin composition containing white and blue quantum dots on a glass substrate, and a self-luminous photosensitive resin composition containing green quantum dots or red quantum dots is used. A quantum dot layer was formed by forming a green pattern layer and a red pattern layer through a photolithography process.

In the case of the substrate on which the protective layer of FIG. 2 is formed, the protective layer composition (protective layer 1) is additionally coated on the substrate of FIG. 1, the solvent is removed from the resin composition on which the protective layer was coated for 3 minutes at 100 degrees, and the protective layer is heated for 30 minutes at 180 degrees. After curing for a minute, a coating film was formed.

In the case of Figures 3 and 4, the substrate is manufactured through the same process as in Figures 1 and 2 mentioned above, but there is a difference in the process of first coating the glass substrate with a yellow photosensitive resin composition and forming a pattern.

In the case of Figures 5 and 6, the substrate is manufactured through the same process as in Figures 1 and 2 mentioned above, but the glass substrate is first coated with a red photosensitive resin composition, a green photosensitive resin composition, and a blue photosensitive resin composition to create a color layer. There is a difference in the process of forming the quantum dot layer.

Test example: Measurement of illuminance of color filter

The illuminance of the color filters manufactured in Examples 1 to 7 and Comparative Examples 1 to 3 was determined by Ocean Optics inc. It was measured using the company's Spectrum meter product, and the results are shown in Table 3 below. At this time, the lower the measured illuminance value, the better the effect of suppressing external light.

Light fastness measurement conditions: Light fastness is measured using a weather resistance tester (HB-801, Hanbaek Science, Korea) with a indicated. 100% means that it is maintained without change, and 50% indicates a value that is 50% lower than before the light fastness evaluation.

Initial illuminance (lux) Illuminance after measuring lightfastness compared to initial (%) Example 1 103 89% Example 2 105 85% Example 3 104 93% Example 4 102 88% Example 5 105 91% Example 6 106 93% Example 7 105 95% Comparative Example 1 95 72% Comparative example 2 88 66% Comparative Example 3 85 67%

As shown in Table 2, Examples 1 to 7 in which a protective layer made of a composition containing a thiol group or a white photosensitive resin composition was formed showed excellent light resistance because the change in illumination intensity after measuring light resistance compared to the initial illumination intensity was low, It was confirmed that the light efficiency of the pixel layer could be improved. On the other hand, in Comparative Examples 1 to 3 in which no protective layer was formed, it can be seen that the change in illuminance after measuring light fastness is large compared to the initial illuminance, and accordingly, it can be seen that light fastness is significantly reduced.

Claims (9)

Quantum dot layer; and
It includes a protective layer for improving light resistance formed on the quantum dot layer,
The protective layer for improving light resistance is manufactured from a composition containing a compound having a thiol group and scattering particles,
A color filter prepared in a composition containing 0.3 to 1.5% by weight of the compound having the thiol group based on the total weight of the composition. Quantum dot layer; and
It includes a protective layer for improving light resistance formed on the quantum dot layer,
The protective layer for improving light resistance is manufactured from a white photosensitive resin composition containing scattering particles,
The scattering particles are Al ₂ O ₃ , SiO ₂ , ZnO, ZrO ₂ , BaTiO ₃ , TiO ₂ , Ta ₂ O ₅ , Ti ₃ O ₅ , ITO, IZO, ATO, ZnO-Al, Nb ₂ O ₃ , SnO and A color filter comprising at least one selected from the group consisting of MgO, and comprising 1.4 to 1.8% by weight based on the total weight of the white photosensitive resin composition. In claim 1 or 2,
A color filter further comprising a color layer containing one or more colors of red, green, and blue. In claim 1,
The color filter wherein the compound having the thiol group is at least one selected from the group consisting of trimethylolpropanetris-3-mercaptopropionate and pentaerythritoltetrakis-3-mercaptopropionate. In claim 2,
The white photosensitive resin composition,
Alkali soluble resin; Photopolymerizable compounds; photopolymerization initiator; and a color filter, comprising a solvent. In claim 5,
The white photosensitive resin composition, based on the total weight of the composition,
5 to 20% by weight of alkali-soluble resin;
5 to 20% by weight of a photopolymerizable compound;
0.1 to 5.0% by weight of photopolymerization initiator; and
A color filter comprising 65 to 85% by weight of solvent. In claim 1 or 2,
The color filter wherein the quantum dot layer further includes scattering particles. In claim 7,
The scattering particles are Al ₂ O ₃ , SiO ₂ , ZnO, ZrO ₂ , BaTiO ₃ , TiO ₂ , Ta ₂ O ₅ , Ti ₃ O ₅ , ITO, IZO, ATO, ZnO-Al, Nb ₂ O ₃ , SnO and A color filter containing at least one selected from the group consisting of MgO. An image display device including the color filter of claim 1 or claim 2.