CN105612821B - 多层配线基板的制造方法 - Google Patents
多层配线基板的制造方法 Download PDFInfo
- Publication number
- CN105612821B CN105612821B CN201480055474.4A CN201480055474A CN105612821B CN 105612821 B CN105612821 B CN 105612821B CN 201480055474 A CN201480055474 A CN 201480055474A CN 105612821 B CN105612821 B CN 105612821B
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- Prior art keywords
- hole
- filling
- layer
- electroplated
- upper strata
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 34
- 238000011049 filling Methods 0.000 claims abstract description 206
- 238000000034 method Methods 0.000 claims abstract description 92
- 239000011888 foil Substances 0.000 claims abstract description 75
- 229910052751 metal Inorganic materials 0.000 claims abstract description 73
- 239000002184 metal Substances 0.000 claims abstract description 73
- 230000008569 process Effects 0.000 claims abstract description 64
- 238000007747 plating Methods 0.000 claims abstract description 41
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 12
- 230000001965 increasing effect Effects 0.000 claims abstract description 10
- 239000011248 coating agent Substances 0.000 claims description 53
- 238000000576 coating method Methods 0.000 claims description 53
- 239000000463 material Substances 0.000 claims description 33
- 239000000758 substrate Substances 0.000 claims description 21
- 230000005611 electricity Effects 0.000 claims description 16
- 230000009467 reduction Effects 0.000 claims description 9
- 230000010354 integration Effects 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 230000008859 change Effects 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 291
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 165
- 239000010949 copper Substances 0.000 description 98
- 229910052802 copper Inorganic materials 0.000 description 98
- 239000011889 copper foil Substances 0.000 description 65
- 238000009713 electroplating Methods 0.000 description 62
- 229920005989 resin Polymers 0.000 description 52
- 239000011347 resin Substances 0.000 description 52
- 239000007788 liquid Substances 0.000 description 25
- 239000003795 chemical substances by application Substances 0.000 description 21
- 239000000243 solution Substances 0.000 description 16
- 230000002708 enhancing effect Effects 0.000 description 13
- 238000005530 etching Methods 0.000 description 12
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 10
- 238000007772 electroless plating Methods 0.000 description 10
- 239000003054 catalyst Substances 0.000 description 8
- 239000003112 inhibitor Substances 0.000 description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000000835 fiber Substances 0.000 description 6
- 239000011229 interlayer Substances 0.000 description 6
- 239000002966 varnish Substances 0.000 description 6
- 239000000654 additive Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000003365 glass fiber Substances 0.000 description 5
- 229910052763 palladium Inorganic materials 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000002344 surface layer Substances 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 239000002313 adhesive film Substances 0.000 description 3
- -1 curing accelerator Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 229920006259 thermoplastic polyimide Polymers 0.000 description 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000005030 aluminium foil Substances 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000010425 asbestos Substances 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000003623 enhancer Substances 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- XEMZLVDIUVCKGL-UHFFFAOYSA-N hydrogen peroxide;sulfuric acid Chemical compound OO.OS(O)(=O)=O XEMZLVDIUVCKGL-UHFFFAOYSA-N 0.000 description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000012783 reinforcing fiber Substances 0.000 description 2
- 229910052895 riebeckite Inorganic materials 0.000 description 2
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Chemical compound [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- 239000004416 thermosoftening plastic Substances 0.000 description 2
- 230000008719 thickening Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- 235000003301 Ceiba pentandra Nutrition 0.000 description 1
- 244000146553 Ceiba pentandra Species 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- XOGTZOOQQBDUSI-UHFFFAOYSA-M Mesna Chemical compound [Na+].[O-]S(=O)(=O)CCS XOGTZOOQQBDUSI-UHFFFAOYSA-M 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920001131 Pulp (paper) Polymers 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 229910021502 aluminium hydroxide Inorganic materials 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- LJCFOYOSGPHIOO-UHFFFAOYSA-N antimony pentoxide Chemical compound O=[Sb](=O)O[Sb](=O)=O LJCFOYOSGPHIOO-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000003196 chaotropic effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000004532 chromating Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- PEVJCYPAFCUXEZ-UHFFFAOYSA-J dicopper;phosphonato phosphate Chemical compound [Cu+2].[Cu+2].[O-]P([O-])(=O)OP([O-])([O-])=O PEVJCYPAFCUXEZ-UHFFFAOYSA-J 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002085 enols Chemical class 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- MUJIDPITZJWBSW-UHFFFAOYSA-N palladium(2+) Chemical compound [Pd+2] MUJIDPITZJWBSW-UHFFFAOYSA-N 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000011120 plywood Substances 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 150000003856 quaternary ammonium compounds Chemical class 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- FTCLAXOKVVLHEG-UHFFFAOYSA-N sodium;3-sulfanylpropane-1-sulfonic acid Chemical compound [Na].OS(=O)(=O)CCCS FTCLAXOKVVLHEG-UHFFFAOYSA-N 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 235000012222 talc Nutrition 0.000 description 1
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000004073 vulcanization Methods 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/423—Plated through-holes or plated via connections characterised by electroplating method
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
- H05K3/0035—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material of blind holes, i.e. having a metal layer at the bottom
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/421—Blind plated via connections
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
- H05K2201/09863—Concave hole or via
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/20—Details of printed circuits not provided for in H05K2201/01 - H05K2201/10
- H05K2201/2072—Anchoring, i.e. one structure gripping into another
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1184—Underetching, e.g. etching of substrate under conductors or etching of conductor under dielectrics; Means for allowing or controlling underetching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/14—Related to the order of processing steps
- H05K2203/1476—Same or similar kind of process performed in phases, e.g. coarse patterning followed by fine patterning
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/14—Related to the order of processing steps
- H05K2203/1492—Periodical treatments, e.g. pulse plating of through-holes
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013-211871 | 2013-10-09 | ||
| JP2013211871 | 2013-10-09 | ||
| JP2014147757A JP6350064B2 (ja) | 2013-10-09 | 2014-07-18 | 多層配線基板の製造方法 |
| JP2014-147757 | 2014-07-18 | ||
| PCT/JP2014/075257 WO2015053084A1 (ja) | 2013-10-09 | 2014-09-24 | 多層配線基板の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105612821A CN105612821A (zh) | 2016-05-25 |
| CN105612821B true CN105612821B (zh) | 2018-06-22 |
Family
ID=52812903
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201480055474.4A Active CN105612821B (zh) | 2013-10-09 | 2014-09-24 | 多层配线基板的制造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10076044B2 (ja) |
| JP (1) | JP6350064B2 (ja) |
| CN (1) | CN105612821B (ja) |
| WO (1) | WO2015053084A1 (ja) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6499925B2 (ja) * | 2015-06-02 | 2019-04-10 | タツタ電線株式会社 | フレキシブルプリント配線板、フレキシブルプリント配線板用補強部材、及びフレキシブルプリント基板 |
| CN105979709B (zh) * | 2016-07-15 | 2019-04-02 | 武汉华星光电技术有限公司 | 多层印刷电路板钻孔方法 |
| US20220032573A1 (en) * | 2018-11-19 | 2022-02-03 | Bright Lite Structures Llc | High-strength low-heat release composites |
| TWI704852B (zh) * | 2018-11-28 | 2020-09-11 | 先豐通訊股份有限公司 | 電路板的電鍍方法及其所製成的電路板 |
| CN111508924B (zh) * | 2019-01-31 | 2023-12-15 | 奥特斯奥地利科技与系统技术有限公司 | 部件承载件的通孔中的悬伸部补偿式环形镀层 |
| CN110996522B (zh) * | 2019-12-20 | 2021-08-24 | 珠海斗门超毅实业有限公司 | 一种线路板制作方法和线路板 |
| US20230164925A1 (en) * | 2021-11-24 | 2023-05-25 | Ibiden Co., Ltd. | Method for manufacturing printed wiring board |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100589682C (zh) * | 2005-12-28 | 2010-02-10 | 新光电气工业株式会社 | 用于填充通孔的方法 |
| CN103444275A (zh) * | 2007-06-15 | 2013-12-11 | 美录德有限公司 | 印刷电路板制造用的镀铜填充方法以及使用该镀铜填充方法得到的印刷电路板 |
Family Cites Families (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4316322A (en) * | 1979-10-25 | 1982-02-23 | Burroughs Corporation | Method of fabricating electrical contacts in a printed circuit board |
| US4425380A (en) * | 1982-11-19 | 1984-01-10 | Kollmorgen Technologies Corporation | Hole cleaning process for printed circuit boards using permanganate and caustic treating solutions |
| JPH04187793A (ja) * | 1990-11-20 | 1992-07-06 | Fujitsu Ltd | 半導体装置及びその製造方法 |
| US5284548A (en) * | 1993-03-03 | 1994-02-08 | Microelectronics And Computer Technology Corporation | Process for producing electrical circuits with precision surface features |
| JPH1143797A (ja) * | 1997-07-25 | 1999-02-16 | Hideo Honma | ビアフィリング方法 |
| US7244677B2 (en) * | 1998-02-04 | 2007-07-17 | Semitool. Inc. | Method for filling recessed micro-structures with metallization in the production of a microelectronic device |
| JP2000200975A (ja) * | 1998-04-10 | 2000-07-18 | Shinko Electric Ind Co Ltd | 多層配線基板の製造方法 |
| JP3836252B2 (ja) * | 1998-04-30 | 2006-10-25 | 株式会社荏原製作所 | 基板のめっき方法 |
| JP2000022337A (ja) * | 1998-06-30 | 2000-01-21 | Matsushita Electric Works Ltd | 多層配線板及びその製造方法 |
| US6793796B2 (en) * | 1998-10-26 | 2004-09-21 | Novellus Systems, Inc. | Electroplating process for avoiding defects in metal features of integrated circuit devices |
| US6708404B1 (en) | 1999-06-17 | 2004-03-23 | Mitsubishi Gas Chemical Company, Inc. | Method of producing high-density copper clad multi-layered printed wiring board having highly reliable through hole |
| JP3594894B2 (ja) * | 2000-02-01 | 2004-12-02 | 新光電気工業株式会社 | ビアフィリングめっき方法 |
| JP2002004083A (ja) * | 2000-04-18 | 2002-01-09 | Shinko Electric Ind Co Ltd | ヴィアフィリング方法 |
| US6448506B1 (en) | 2000-12-28 | 2002-09-10 | Amkor Technology, Inc. | Semiconductor package and circuit board for making the package |
| US6564454B1 (en) | 2000-12-28 | 2003-05-20 | Amkor Technology, Inc. | Method of making and stacking a semiconductor package |
| US6458696B1 (en) * | 2001-04-11 | 2002-10-01 | Agere Systems Guardian Corp | Plated through hole interconnections |
| JP4000796B2 (ja) * | 2001-08-08 | 2007-10-31 | 株式会社豊田自動織機 | ビアホールの銅メッキ方法 |
| JP2003318544A (ja) | 2002-04-22 | 2003-11-07 | Toppan Printing Co Ltd | 多層配線基板およびその製造方法 |
| JP2005019577A (ja) * | 2003-06-25 | 2005-01-20 | Hitachi Cable Ltd | 半導体装置用テープキャリアの製造方法 |
| JP2008258636A (ja) | 2003-11-14 | 2008-10-23 | Hitachi Chem Co Ltd | 内層導体回路処理方法 |
| JP4290621B2 (ja) | 2004-09-01 | 2009-07-08 | 日本メクトロン株式会社 | 多層フレキシブルプリント基板の無電解銅メッキ方法 |
| KR20060107053A (ko) * | 2005-04-07 | 2006-10-13 | 대덕전자 주식회사 | 인쇄 회로 기판의 비아필 빌드업 기판 제작 방법 |
| TWI394504B (zh) | 2005-05-31 | 2013-04-21 | Hitachi Via Mechanics Ltd | 印刷配線板之製造方法與使用該方法製出的銅箔層積板以及處理液 |
| US7521806B2 (en) | 2005-06-14 | 2009-04-21 | John Trezza | Chip spanning connection |
| JP2007129180A (ja) * | 2005-10-03 | 2007-05-24 | Cmk Corp | プリント配線板、多層プリント配線板及びその製造方法 |
| TWI278265B (en) * | 2006-01-09 | 2007-04-01 | Phoenix Prec Technology Corp | Method for fabricating circuit board with electrically conducting structure and the same |
| CN101416569B (zh) | 2006-03-30 | 2011-04-06 | 埃托特克德国有限公司 | 用金属填充孔和凹处的电解方法 |
| JP2008021770A (ja) * | 2006-07-12 | 2008-01-31 | Matsushita Electric Ind Co Ltd | 基板およびその製造方法 |
| JP4620713B2 (ja) | 2007-09-28 | 2011-01-26 | 日立ビアメカニクス株式会社 | プリント配線板の製造方法及びこの製造方法に用いられる電解エッチング処理液 |
| JP5066427B2 (ja) * | 2007-11-02 | 2012-11-07 | 日本シイエムケイ株式会社 | プリント配線板の製造方法 |
| JP2010232590A (ja) * | 2009-03-30 | 2010-10-14 | Sanyo Electric Co Ltd | 回路基板の製造方法 |
| US8541695B2 (en) | 2010-02-26 | 2013-09-24 | Ibiden Co., Ltd. | Wiring board and method for manufacturing the same |
| US20130062210A1 (en) | 2011-09-13 | 2013-03-14 | Hoya Corporation | Manufacturing method of substrate and manufacturing method of wiring substrate |
| JP2013077807A (ja) | 2011-09-13 | 2013-04-25 | Hoya Corp | 基板製造方法および配線基板の製造方法 |
| JP2013077809A (ja) | 2011-09-16 | 2013-04-25 | Hoya Corp | 基板製造方法および配線基板の製造方法 |
| JP6016004B2 (ja) | 2011-09-29 | 2016-10-26 | 日立化成株式会社 | 配線基板及びその製造方法 |
| JP2013118370A (ja) * | 2011-12-05 | 2013-06-13 | Samsung Electro-Mechanics Co Ltd | ビアホールめっき方法及びそれを用いて製造されたプリント回路基板 |
| JP2015028973A (ja) * | 2013-07-30 | 2015-02-12 | イビデン株式会社 | 配線板および配線板の製造方法 |
-
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- 2014-07-18 JP JP2014147757A patent/JP6350064B2/ja active Active
- 2014-09-24 US US15/027,756 patent/US10076044B2/en active Active
- 2014-09-24 CN CN201480055474.4A patent/CN105612821B/zh active Active
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100589682C (zh) * | 2005-12-28 | 2010-02-10 | 新光电气工业株式会社 | 用于填充通孔的方法 |
| CN103444275A (zh) * | 2007-06-15 | 2013-12-11 | 美录德有限公司 | 印刷电路板制造用的镀铜填充方法以及使用该镀铜填充方法得到的印刷电路板 |
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| JP2015097254A (ja) | 2015-05-21 |
| WO2015053084A1 (ja) | 2015-04-16 |
| US10076044B2 (en) | 2018-09-11 |
| CN105612821A (zh) | 2016-05-25 |
| US20160242299A1 (en) | 2016-08-18 |
| JP6350064B2 (ja) | 2018-07-04 |
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