CN105517758B - 复合陶瓷研磨抛光液 - Google Patents

复合陶瓷研磨抛光液 Download PDF

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Publication number
CN105517758B
CN105517758B CN201480049117.7A CN201480049117A CN105517758B CN 105517758 B CN105517758 B CN 105517758B CN 201480049117 A CN201480049117 A CN 201480049117A CN 105517758 B CN105517758 B CN 105517758B
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CN
China
Prior art keywords
polishing
abrasive
ceramic
cac
abrasive composites
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CN201480049117.7A
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English (en)
Chinese (zh)
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CN105517758A (zh
Inventor
P·S·拉格
D·K·勒胡
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of CN105517758A publication Critical patent/CN105517758A/zh
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/04—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
    • B24D3/06—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic metallic or mixture of metals with ceramic materials, e.g. hard metals, "cermets", cements
    • B24D3/10—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic metallic or mixture of metals with ceramic materials, e.g. hard metals, "cermets", cements for porous or cellular structure, e.g. for use with diamonds as abrasives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/04—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
    • B24D3/14—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic ceramic, i.e. vitrified bondings
    • B24D3/18—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic ceramic, i.e. vitrified bondings for porous or cellular structure
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
CN201480049117.7A 2013-09-25 2014-09-22 复合陶瓷研磨抛光液 Active CN105517758B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361882369P 2013-09-25 2013-09-25
US61/882,369 2013-09-25
PCT/US2014/056750 WO2015047939A1 (en) 2013-09-25 2014-09-22 Composite ceramic abrasive polishing solution

Publications (2)

Publication Number Publication Date
CN105517758A CN105517758A (zh) 2016-04-20
CN105517758B true CN105517758B (zh) 2020-03-31

Family

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Application Number Title Priority Date Filing Date
CN201480049117.7A Active CN105517758B (zh) 2013-09-25 2014-09-22 复合陶瓷研磨抛光液

Country Status (8)

Country Link
US (1) US10293458B2 (enExample)
EP (1) EP3049215B1 (enExample)
JP (1) JP2016537439A (enExample)
KR (1) KR102289629B1 (enExample)
CN (1) CN105517758B (enExample)
SG (1) SG11201602206PA (enExample)
TW (1) TWI669382B (enExample)
WO (1) WO2015047939A1 (enExample)

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KR102252673B1 (ko) 2013-09-25 2021-05-18 쓰리엠 이노베이티브 프로퍼티즈 컴파니 다층화된 폴리싱 패드
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WO2017142805A1 (en) * 2016-02-16 2017-08-24 3M Innovative Properties Company Polishing systems and methods of making and using same
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WO2019043819A1 (ja) * 2017-08-30 2019-03-07 日立化成株式会社 スラリ及び研磨方法
JP7187770B2 (ja) * 2017-11-08 2022-12-13 Ａｇｃ株式会社 研磨剤と研磨方法、および研磨用添加液
CN109868447B (zh) 2017-12-01 2022-03-25 通用电气公司 用于降低表面粗糙度的方法
WO2019180656A1 (en) 2018-03-21 2019-09-26 3M Innovative Properties Company Structured abrasives containing polishing materials for use in the home
CN110499102A (zh) * 2018-05-20 2019-11-26 深圳市得益达电子科技有限公司 一种用于玻璃抛光的氧化铈液态悬浮抛光液
EP3578998B1 (en) 2018-06-08 2024-09-04 3M Innovative Properties Company Impedance assembly
CN110772911B (zh) * 2018-07-30 2021-11-09 天津大学 一种去除生物气溶胶的微波反应装置、反应系统及其应用
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US12434351B2 (en) 2019-12-12 2025-10-07 3M Innovative Properties Company Polymer bond abrasive articles including continuous polymer matrix, and methods of making same
CN111558855A (zh) * 2020-06-01 2020-08-21 宏明金属科技(无锡)有限公司 一种高精密机械配套零件抛光的工艺方法
CN111607330A (zh) * 2020-06-03 2020-09-01 大连理工大学 一种剪切增稠抛光液
US20220301892A1 (en) * 2021-03-19 2022-09-22 Changxin Memory Technologies, Inc. Wafer cleaning method and wafer cleaning apparatus
CN115247026A (zh) * 2021-04-26 2022-10-28 福建晶安光电有限公司 一种蓝宝石抛光液及其制备方法
EP4305118A4 (en) * 2021-05-13 2025-05-28 Araca, Inc. SILICON CARBIDE (SIC) WAFER POLISHING USING SLURRY FORMULATION AND PROCESS
CN113999653B (zh) * 2021-10-28 2022-05-24 华南理工大学 一种硅单晶研磨剂及其制备方法与应用
JP7621303B2 (ja) * 2022-03-24 2025-01-24 ノリタケ株式会社 研磨スラリー及び研磨方法
CN116000782B (zh) * 2022-12-27 2023-09-19 昂士特科技(深圳)有限公司 用于金属合金cmp的化学机械抛光组合物

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US20160221146A1 (en) 2016-08-04
TW201525119A (zh) 2015-07-01
KR102289629B1 (ko) 2021-08-17
KR20160060690A (ko) 2016-05-30
JP2016537439A (ja) 2016-12-01
EP3049215A1 (en) 2016-08-03
CN105517758A (zh) 2016-04-20
SG11201602206PA (en) 2016-04-28
WO2015047939A1 (en) 2015-04-02
US10293458B2 (en) 2019-05-21
TWI669382B (zh) 2019-08-21
EP3049215A4 (en) 2017-05-17
EP3049215B1 (en) 2021-04-14

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