CN105492655A - 透明导电性膜的制造方法 - Google Patents

透明导电性膜的制造方法 Download PDF

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Publication number
CN105492655A
CN105492655A CN201480047600.1A CN201480047600A CN105492655A CN 105492655 A CN105492655 A CN 105492655A CN 201480047600 A CN201480047600 A CN 201480047600A CN 105492655 A CN105492655 A CN 105492655A
Authority
CN
China
Prior art keywords
film
conducting layer
transparency conducting
sputtering
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201480047600.1A
Other languages
English (en)
Chinese (zh)
Inventor
梨木智刚
加藤久登
别府浩史
梶原大辅
高见佳史
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=52743344&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=CN105492655(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Publication of CN105492655A publication Critical patent/CN105492655A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
CN201480047600.1A 2013-09-26 2014-09-24 透明导电性膜的制造方法 Pending CN105492655A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013-199499 2013-09-26
JP2013199499A JP6239330B2 (ja) 2013-09-26 2013-09-26 透明導電性フィルムの製造方法
PCT/JP2014/075206 WO2015046208A1 (ja) 2013-09-26 2014-09-24 透明導電性フィルムの製造方法

Publications (1)

Publication Number Publication Date
CN105492655A true CN105492655A (zh) 2016-04-13

Family

ID=52743344

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201480047600.1A Pending CN105492655A (zh) 2013-09-26 2014-09-24 透明导电性膜的制造方法

Country Status (5)

Country Link
JP (1) JP6239330B2 (ko)
KR (1) KR20160061961A (ko)
CN (1) CN105492655A (ko)
TW (1) TWI555869B (ko)
WO (1) WO2015046208A1 (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI629693B (zh) * 2017-03-08 2018-07-11 南臺科技大學 軟性透明導電膜及其製造方法
CN111326291A (zh) * 2018-12-17 2020-06-23 日东电工株式会社 导电性薄膜的制造方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6412539B2 (ja) * 2015-11-09 2018-10-24 日東電工株式会社 光透過性導電フィルムおよび調光フィルム
WO2021240962A1 (ja) * 2020-05-25 2021-12-02 日東電工株式会社 光透過性導電性シートの製造方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101221935A (zh) * 2007-01-10 2008-07-16 日东电工株式会社 透明导电膜及其制造方法
CN101877372A (zh) * 2010-05-20 2010-11-03 深圳市创益科技发展有限公司 薄膜太阳能电池的背电极膜层
WO2011046050A1 (ja) * 2009-10-16 2011-04-21 東洋紡績株式会社 透明導電性フィルムの製造装置及び製造方法
JP2012246552A (ja) * 2011-05-30 2012-12-13 Dainippon Printing Co Ltd ガスバリアフィルムの製造方法及び製造装置並びにガスバリアフィルム
JP2013084542A (ja) * 2011-09-29 2013-05-09 Toyobo Co Ltd 透明導電性フィルム及びその製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4473852B2 (ja) * 2006-11-07 2010-06-02 株式会社大阪真空機器製作所 スパッタ装置及びスパッタ方法
JP4667471B2 (ja) 2007-01-18 2011-04-13 日東電工株式会社 透明導電性フィルム、その製造方法及びそれを備えたタッチパネル

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101221935A (zh) * 2007-01-10 2008-07-16 日东电工株式会社 透明导电膜及其制造方法
WO2011046050A1 (ja) * 2009-10-16 2011-04-21 東洋紡績株式会社 透明導電性フィルムの製造装置及び製造方法
CN101877372A (zh) * 2010-05-20 2010-11-03 深圳市创益科技发展有限公司 薄膜太阳能电池的背电极膜层
JP2012246552A (ja) * 2011-05-30 2012-12-13 Dainippon Printing Co Ltd ガスバリアフィルムの製造方法及び製造装置並びにガスバリアフィルム
JP2013084542A (ja) * 2011-09-29 2013-05-09 Toyobo Co Ltd 透明導電性フィルム及びその製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI629693B (zh) * 2017-03-08 2018-07-11 南臺科技大學 軟性透明導電膜及其製造方法
CN111326291A (zh) * 2018-12-17 2020-06-23 日东电工株式会社 导电性薄膜的制造方法

Also Published As

Publication number Publication date
KR20160061961A (ko) 2016-06-01
JP2015063743A (ja) 2015-04-09
TWI555869B (zh) 2016-11-01
TW201516171A (zh) 2015-05-01
WO2015046208A1 (ja) 2015-04-02
JP6239330B2 (ja) 2017-11-29

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Application publication date: 20160413