CN105463377B - Vacuum deposition apparatus - Google Patents
Vacuum deposition apparatus Download PDFInfo
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- CN105463377B CN105463377B CN201510607517.1A CN201510607517A CN105463377B CN 105463377 B CN105463377 B CN 105463377B CN 201510607517 A CN201510607517 A CN 201510607517A CN 105463377 B CN105463377 B CN 105463377B
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Abstract
Vacuum deposition apparatus.The present invention provides a kind of excellent vacuum deposition apparatus with quartz oscillation formula film thickness gauge, by using the quartz vibrator for the organic material evaporated from remaining other evaporation source for being pre-formed certain film thickness in the quartz oscillation formula film thickness gauge of an evaporation source, from without basilar memebrane formation process is arranged, also multiple quartz vibrators of the organic material basilar memebrane with certain film thickness can be pre-formed, and, it is suppressed that the rising of the equivalent series resistance of quartz vibrator simultaneously realizes service life extension.In vacuum deposition apparatus, for evaporation source film thickness and multiple quartz vibrators (4) of quartz oscillation formula film thickness gauge for being controlled of evaporation rate be the quartz vibrator with organic material substrate film for foring the organic material basilar memebrane of the organic material on multiple quartz vibrator while control film thickness and evaporation rate in the vapor deposition process implemented using remaining other evaporation source in advance.
Description
Technical field
The present invention relates to form film on substrate in the vacuum tank for keeping reduced pressure atmosphere, have for film thickness or steaming
The vacuum deposition apparatus for the quartz oscillation formula film thickness gauge that plating speed (film thickness rate) is controlled.
Background technique
In the vacuum deposition apparatus for forming film on substrate by vacuum vapour deposition, using film thickness gauge so as to film thickness
It is controlled with evaporation rate (film thickness rate).The film thickness gauge is different according to mensuration mode and there are various species, but makes extensively
With quartz vibrator method.
It is utilized to work as using the quartz oscillation formula film thickness gauge of quartz vibrator method and is attached with vapor deposition object on the surface of quartz vibrator
When matter, the property that resonant vibration changes according to its mass change, for example, passing through the change for measuring the resonant vibration (frequency of oscillation)
Change to measure film thickness and film thickness rate, and be fed back to the heating control apparatus of evaporation source, thus by evaporated film on substrate
Film thickness rate control be it is constant to manage film thickness.
Also, in such film thickness measuring (film thickness monitoring) based on quartz oscillation formula film thickness gauge, when in quartz vibrator
Electrode film on thicker evaporated film when, can generate that resonant vibration is unstable, (the crystal resistance of equivalent series resistance of quartz vibrator
It is anti-) current reduction that rises and flow through quartz vibrator, thus phenomena such as resonant vibration can not be measured.Therefore, when so thicker
When being deposited and resonant vibration can not be measured, it is judged as that quartz vibrator reaches the service life, quartz vibrator is changed to new quartz vibrator.
Specifically, for example rotating the quartzy retainer for keeping multiple quartz vibrators and switching use, enable to
The replacement of the quartz vibrator is carried out continuously in vacuum tank.
In the past, in order to extend service life of the quartz vibrator, according to (the Japanese Unexamined Patent Publication 2000-101387 public affairs of patent document 1
Report) it is described, in order to enable the crackle or the removing that are also easy to produce the film are not allowed in the case where evaporated film thicker yet, by preparatory
Soft metal film is formed on the electrode film of the film forming face of quartz vibrator, to mitigate the internal stress of film to prevent the removing of film
Or crackle.
Also, according to described in patent document 2 (Japanese Unexamined Patent Publication 2014-70238 bulletin), have at least 2 in vacuum chamber
A above evaporation source and corresponding film thickness sensor, and be configured to be not easy to be attached to stone from an evaporation source evaporation
The material on English oscillator surface, and import the material evaporated from another evaporation source in advance to the film thickness sensor monitored to it
Material, as a result, before the material for being not easy attachment is deposited, using the excellent material of adaptation in advance in quartz vibrator table
Face forms basilar memebrane, to also be able to detect accurate evaporation rate using the material for being not easy attachment.
[patent document 1] Japanese Unexamined Patent Publication 2000-101387 bulletin
[patent document 2] Japanese Unexamined Patent Publication 2014-70238 bulletin
It but is to prevent from forming a film by the known method for being pre-formed metal film on quartz vibrator of patent document 1
The removing of material, the unstability for eliminating resonant vibration, extend quartz vibrator service life method, still, even if quartz vibrator
The film of upper formation is unstripped, since the equivalent series resistance of quartz vibrator rises and flow through the current reduction of quartz vibrator, sometimes
Also resonant vibration can not be measured, so, the service life of quartz vibrator can not be extended.
Also, known to the material for being not easy attachment being set in an evaporation source by patent document 2
Film thickness sensor is imported from the material that another evaporation source evaporates in the method to be pre-formed basilar memebrane, passes through precoating importing
Pipe imports the material of another evaporation source to the film thickness sensor for configuring place in place relative to one evaporation source,
So the basilar memebrane for being unable to ensure sufficient vapor deposition rate, also, being previously formed on the film thickness sensor (quartz vibrator surface)
It is easy to become uneven.In turn, its film thickness is not monitored when importing material easy to attach from another evaporation source, so, it can not
Form the basilar memebrane of accurate film thickness.
That is, allow to prevent removing or the crackle of evaporation film, however using the lesser organic material of specific gravity as vapor deposition
In the case that material is deposited, when which forms a film on the electrode, the film thickness of the evaporation film is bigger, then can not more follow
The thickness shear vibration of quartz vibrator, so, even if vibration is maintained in itself, but the film thickness of evaporation film is thicker, then equivalent string
Connection resistance more rises, therefore cannot sufficiently solve that frequency of oscillation such problems can not be measured.It is especially metal in basilar memebrane
When film, equivalent series resistance caused by the membrane interface between organic material can not be inhibited to rise, quartz oscillation formula film thickness gauge
Service life is still shorter and can not extend.
And in particular, being the lesser organic material of specific gravity for manufacturing the evaporation material of organic EL device, with quartz
Adaptation between the electrode film (such as Au or Ag) on oscillator surface is poor, can not follow the thickness shear vibration of quartz vibrator,
Even if Metal Substrate counterdie is arranged, also only becomes the organic material and be placed in the state on electrode film, so, when the film of evaporation film
When thickness increases, equivalent series impedance can rise, therefore the service life of quartz vibrator is shorter.
Also, the organic material for not carrying out film thickness monitoring is being imported in the method on quartz vibrator surface by ingress pipe,
The quartz vibrator that multiple tape base counterdies for being formed uniformly an adequate amount of film thickness can not be formed, can not cope with volume production equipment
Utilization.
Summary of the invention
Present invention discover that and solve above-described problem, its purpose is to provide a kind of epoch-making vacuum deposition apparatus,
It controls film thickness or evaporation rate by quartz oscillation formula film thickness gauge, also, is monitored by the film thickness, shakes in the quartz
The organic material evaporated from (remaining the is other) evaporation source is deposited in the multiple quartz vibrator surfaces for swinging formula film thickness gauge, is pre-formed
The organic material basilar memebrane for providing film thickness, using with multiple bases with regulation film thickness being formed uniformly as an adequate amount of film thickness
The quartz oscillation formula film thickness gauge of the quartz vibrator of counterdie is directed at from (one) evaporation source while controlling its film thickness or evaporation rate
The organic material of evaporation is deposited, thus, it is suppressed that the rising of the equivalent series resistance of quartz vibrator realizes the long-life
Change, also, as described above, the organic material basilar memebrane adequate relief can be made to become certain film thickness, moreover, can be efficiently
Organic material substrate film is pre-formed without the film formation process except vapor deposition process.
Purport of the invention is illustrated referring to attached drawing.
The present invention relates to a kind of vacuum deposition apparatus, evaporate the evaporation source 2 more than at least two in vacuum tank 1
The organic material as evaporation material be deposited on 3 surface of substrate and deposit and form film, which is characterized in that in the vacuum
With the film thickness for being used to control each evaporation source 2 and controlling 3 surface of substrate or vapor deposition speed more than at least two in slot 1
Quartz oscillation formula the film thickness gauge M, the quartz oscillation formula film thickness gauge M of degree have multiple quartz vibrators 4, one evaporation source 2
Possessed one quartz oscillation formula film thickness gauge M is configured to the quartz vibrator 4 with the organic material substrate film 6 of multiple bands,
The quartz vibrator 4 of multiple organic material substrate film 6 of band is being pre-formed steaming from remaining other evaporation source 2 for certain film thickness
After the organic material of hair, it is changed to next quartz vibrator 4, organic material is deposited in quartz oscillation formula film thickness gauge M as a result,
On possessed the multiple quartz vibrator 4, the film in the vapor deposition process that remaining other evaporation source 2 is implemented using this is being carried out
The organic material basilar memebrane 6 of certain film thickness has been pre-formed while thickness monitoring respectively, has utilized remaining other evaporation source 2
Vapor deposition process after, by the quartz oscillation formula film thickness gauge M of the quartz vibrator 4 with the organic material substrate film 6 of the band,
The film thickness carried out in the vapor deposition process implemented using one evaporation source 2 is monitored.
Also, it is related to vacuum deposition apparatus documented by the 1st aspect, which is characterized in that the vacuum tank 1 is by multiple organic
Deposited chamber 12 is constituted, and each evaporation source 2 and the quartz oscillation formula film thickness gauge M are equipped in each organic vapor deposition room 12, is matched
The multiple quartz vibrator 4 for the quartz oscillation formula film thickness gauge M being located in an organic vapor deposition room 12 is being pre-formed
Certain film thickness after the organic material that the evaporation source 2 of remaining other organic vapor deposition room 12 evaporates, be changed to next
A quartz vibrator 4 is respectively formed the organic material basilar memebrane 6 on multiple quartz vibrator 4 as a result, by having the band
The quartz oscillation formula film thickness gauge M of the quartz vibrator 4 of organic material basilar memebrane 6 carries out utilizing one organic vapor deposition room 12
Film thickness monitoring in the vapor deposition process that the evaporation source 2 is implemented.
Also, it is related to vacuum deposition apparatus documented by the 1st aspect, which is characterized in that the shape on each quartz vibrator 4
At the organic material basilar memebrane 6 be at least 2 μm or more film thickness.
Also, it is related to vacuum deposition apparatus documented by the 2nd aspect, which is characterized in that the shape on each quartz vibrator 4
At the organic material basilar memebrane 6 be at least 2 μm or more film thickness.
Also, it is related to vacuum deposition apparatus documented by any one aspect in the 1st~4 aspect, which is characterized in that
The electrode film 5 formed on the surface and the back side of the quartz vibrator 4 is formed by Al or by the various metals of principal component of Al.
Also, it is related to vacuum deposition apparatus documented by any one aspect in the 1st~4 aspect, which is characterized in that institute
The mobile mechanism 13 that vacuum deposition apparatus has the mobile quartz oscillation formula film thickness gauge M is stated, controls film thickness or vapor deposition on one side
Speed is deposited on one side from the organic material that remaining described other evaporation source 2 evaporate on each quartz vibrator 4 and forms institute
Organic material basilar memebrane 6 is stated, after the vapor deposition process that remaining other evaporation source 2 is implemented using this, passes through the movement
Mechanism 13 moves quartz oscillation formula film thickness gauge M, is formed on the quartz vibrator 4 of the organic material substrate film 6 of the band from described
The organic material of one evaporation source 2 evaporation controls an evaporation source 2 as a result, and controls film thickness or the steaming on 3 surface of substrate
Speed is plated, the film thickness carried out in the vapor deposition process implemented using an evaporation source 2 is monitored.
Also, it is related to vacuum deposition apparatus documented by the 5th aspect, which is characterized in that the vacuum deposition apparatus has
The mobile mechanism 13 of the mobile quartz oscillation formula film thickness gauge M, controls film thickness or evaporation rate, on one side in each stone on one side
It is deposited on English oscillator 4 from the organic material that remaining described other evaporation source 2 evaporate and forms the organic material basilar memebrane 6,
After the vapor deposition process that remaining other evaporation source 2 is implemented using this, pass through the mobile quartz vibration of the mobile mechanism 13
Formula film thickness gauge M is swung, being formed on the quartz vibrator 4 of the organic material substrate film 6 of the band has from what one evaporation source 2 evaporated
Machine material controls an evaporation source 2 as a result, and controls the film thickness or evaporation rate on 3 surface of substrate, carry out using this one
Film thickness monitoring in the vapor deposition process that a evaporation source 2 is implemented.
Also, it is related to vacuum deposition apparatus documented by any one aspect in the 1st~4 aspect, which is characterized in that institute
Stating organic material is the organic material for manufacturing organic EL device.
Also, it is related to vacuum deposition apparatus documented by the 5th aspect, which is characterized in that the organic material is for making
Make the organic material of organic EL device.
Also, it is related to vacuum deposition apparatus documented by the 6th aspect, which is characterized in that the organic material is for making
Make the organic material of organic EL device.
Also, it is related to vacuum deposition apparatus documented by the 7th aspect, which is characterized in that the organic material is for making
Make the organic material of organic EL device.
Due to constituting as described above, so, the present invention is configured to a kind of epoch-making vacuum deposition apparatus, passes through quartz
Oscillatory type film thickness gauge controls film thickness or evaporation rate, also, is monitored by the film thickness, in the quartz oscillation formula film thickness gauge
Multiple quartz vibrator surfaces the organic material that evaporates from (remaining the is other) evaporation source is deposited, be pre-formed regulation film thickness
Organic material basilar memebrane uses the stone for the basilar memebrane with regulation film thickness for becoming an adequate amount of film thickness with multiple adequate reliefs
The quartz oscillation formula film thickness gauge of English oscillator has while controlling its film thickness or evaporation rate to from (one) evaporation source evaporation
Machine material is deposited, thus, it is suppressed that the rising of the equivalent series resistance of quartz vibrator realizes long lifetime, also, such as
It is upper described, the organic material basilar memebrane can be made uniformly and be formed as certain film thickness, moreover, can efficiently be pre-formed with
Machine material substrate film is without the film formation process except vapor deposition process.
In other words, it is configured to the following excellent vacuum deposition apparatus with quartz oscillation formula film thickness gauge, utilizes quartz
Oscillatory type film thickness gauge is managed (film thickness monitoring) film thickness in the same manner as the film thickness of substrate, also, in the quartz oscillation formula film
The organic material for being formed and being evaporated from (remaining the is other) evaporation source is deposited in multiple quartz vibrator surfaces of thickness meter in advance, so,
The basilar memebrane formation process (the new vapor deposition process of basilar memebrane formation) except process is deposited without setting, is capable of forming always
The organic material basilar memebrane based on different organic materials of uniform regulation film thickness (certain film thickness), thus, it is suppressed that quartz vibration
The rising of the equivalent series resistance of son, realizes long lifetime.
That is, being configured to following vacuum deposition apparatus: on the electrode film of quartz vibrator, first passing through remaining other steaming in advance
Film thickness and evaporation rate control in plating process carry out the organic material management at certain film thickness, and by it together with the substrate
Be deposited and formed the organic material basilar memebrane of certain film thickness, so, on electrode film directly to evaporation material (organic material)
The case where being deposited is compared, and the adaptation of electrode film and the organic material basilar memebrane is good, also, the organic material substrate
The adaptation of film and evaporation material (organic material) is also good, also, with using metal film compared with the case where basilar memebrane, substrate
Compatibility between film and the evaporation material is also good, so, compared with the case where using metal film, membrane interface thickens,
Even if increasing the film thickness of evaporation film, it is also able to suppress the upper of the equivalent series resistance of quartz vibrator
It rises, thus it is possible to extend the service life, is able to carry out prolonged monitoring, also, also do not need another except necessary vapor deposition process
Outer setting organic material basilar memebrane formation process, so, productivity is also extremely excellent.
When further explanation, it is configured to the following vacuum deposition apparatus with quartz oscillation formula film thickness gauge: by preparatory
The organic material basilar memebrane is formed on the electrode film of quartz vibrator, even if to will lead to the close of electrode film and evaporation material
Conjunction property, which is deteriorated, evaporation film can not follow the resonant vibration of quartz vibrator, foreign matter is in from the perspective of quartz vibrator adheres to shape
The feelings that state is deposited to the evaporation material risen there are the equivalent series resistance of the energy loss of vibration and quartz vibrator
Under condition, it is also able to suppress the rising of the equivalent series resistance of quartz vibrator when it is deposited, thus it is possible to extend the longevity
Life, is able to carry out prolonged monitoring.
In turn, it is configured to following excellent vacuum deposition apparatus: for from multiple evaporation sources in vacuum tank
The evaporation of an evaporation source organic material film thickness or the quartz oscillation formula film thickness gauge that is controlled of evaporation rate quartz vibration
Son is switched to other quartz vibrator to carry out film thickness monitoring: other quartz vibrator has multiple, and has been pre-formed certain film
The thick different organic materials evaporated in the vapor deposition process implemented using remaining other evaporation source from the evaporation source, but not
It deposits to the reduction lower limit value of resonance frequency, that is, carry out film thickness monitoring on one side, successively switch the stone for carrying out the film thickness monitoring on one side
English oscillator and the organic material basilar memebrane that regulation film thickness is sequentially formed on each quartz vibrator carry out film thickness monitoring on one side as a result,
Multiple quartz vibrators with the organic material basilar memebrane that accurate vapor deposition is certain film thickness are formed on one side, it is described by being used as
The quartz oscillation formula film thickness gauge of one evaporation source (makes in the quartz vibrator of the quartz oscillation formula film thickness gauge of an evaporation source
With), to inhibit the rising of equivalent series resistance, also, do not need organic material basilar memebrane formation process yet.
In other words, as described above, carrying out and (can take into account) film thickness monitoring simultaneously and carrying out different (next)
Basilar memebrane when film thickness monitors is formed, thus it is possible to which multiple organic material substrates with certain film thickness are more efficiently arranged
The quartz vibrator of film, so, it is configured to the superfine vacuum deposition apparatus of practicability.
Also, in the invention documented by the 2nd aspect, by being thus configured to practicability with multiple organic vapor deposition rooms
Excellent vacuum deposition apparatus.
Also, in the invention documented by the 3rd, 4 aspects, by forming at least 2 μm or more of organic material basilar memebrane, from
And it is configured to further suppress the vacuum deposition apparatus of the rising of the equivalent series resistance of quartz vibrator.
Also, in the invention documented by the 5th aspect, realize vacuum deposition apparatus more excellent as follows: base
Adaptation between counterdie and evaporation material further increases, and evaporation film can not follow the resonant vibration of quartz vibrator and quartz shakes
Equivalent series resistance risings of son, the current reduction for flowing through quartz vibrator etc. lead to not the case where measurement resonant vibration and are able to
Inhibit.
Also, in the invention documented by the 6th, 7 aspects, by having the moving machine mobile for quartz oscillation formula film thickness gauge
Structure can be such that it automatically moves, also, for example by the way that vacuum deposition apparatus to be arranged in the same deposited chamber of vacuum tank, from
And the evaporation for stopping organic material not being had to, it will be able to use the quartz vibration with the quartz vibrator for foring organic material basilar memebrane
Swing film thickness monitoring monitor of the formula film thickness gauge as other evaporation sources of the same deposited chamber.
Also, in the invention documented by the 8th~11 aspect, suitable for the manufacture of organic EL device, become more useful
Quartz oscillation formula film thickness gauge.
Detailed description of the invention
Fig. 1 is the schematic structural diagram for having used the vacuum deposition apparatus of quartz oscillation formula film thickness gauge of the present embodiment.
Fig. 2 is the explanatory diagram of the quartzy retainer of a part of the quartz oscillation formula film thickness gauge as the present embodiment.
Fig. 3 is the explanatory diagram of the cover of a part of the quartz oscillation formula film thickness gauge as the present embodiment.
Fig. 4 is the outline structure explanatory diagram for showing an example of cluster mode of organic el device manufacture apparatus.
Fig. 5 is the outline structure explanatory diagram of the quartz vibrator of the present embodiment.
Fig. 6 be show carry out the present embodiment organic material vapor deposition when the film thickness corresponding to organic material basilar memebrane etc.
Imitate the curve graph that series impedance stablizes time ratio.
Fig. 7 is the outline knot for showing the mobile mechanism of the quartz oscillation formula film thickness gauge in the vacuum deposition apparatus of the present embodiment
Structure illustrated planar figure.
Fig. 8 is the outline knot for showing the mobile mechanism of the quartz oscillation formula film thickness gauge in the vacuum deposition apparatus of the present embodiment
Structure side view.
Label declaration
1: vacuum tank；2: evaporation source；3: substrate；4: quartz vibrator；5: electrode film；6: organic material basilar memebrane；12: organic
Deposited chamber；13: mobile mechanism；M: quartz oscillation formula film thickness gauge.
Specific embodiment
Effect of the invention is shown with reference to the accompanying drawings and preferred embodiments of the present invention are briefly described.
Vacuum deposition apparatus of the invention is configured in vacuum tank 1 evaporating with evaporation source 2 more than at least two
The quartz oscillation formula film thickness gauge M for controlling each film thickness and evaporation rate is equipped in source 2, in quartz oscillation formula film thickness gauge M
In there are multiple quartz vibrators 4, the multiple quartz vibrators 4 at least having in this quartz oscillation formula film thickness gauge M are configured to,
Be pre-formed certain film thickness after the organic material that remaining other evaporation source 2 evaporates, be changed to next quartz vibration
Son 4, to this, the film thickness of remaining other evaporation source 2 and evaporation rate are controlled on one side as a result, on one side in multiple quartz vibrators
The organic material is deposited on 4 and forms organic material substrate film 6, is used for the film thickness and vapor deposition to one evaporation source 2
The quartz oscillation formula film thickness gauge M or use the quartz with the quartz vibrator 4 with the organic material basilar memebrane 6 that speed is controlled
Oscillatory type film thickness gauge M, as a result, compared with the case where directly evaporation material is deposited on the electrode film 5 in quartz vibrator 4,
Electrode film 5 and the adaptation of organic material basilar memebrane 6 are good, also, the organic material basilar memebrane 6 and the evaporation material is close
Conjunction property is also good, also, with using metal film as the case where basilar memebrane compared with, the organic material basilar memebrane 6 and the evaporation material
Between compatibility it is also good, so, compared with the case where using metal film, membrane interface thickens, even if evaporation material
The film thickness of evaporation film increases, and is also able to suppress the rising of the equivalent series resistance of quartz vibrator 4, is able to extend service life, Neng Goujin
Row monitors for a long time and does not have to the organic material basilar memebrane formation process other than setting vapor deposition process.
For example, in the case where the lesser organic material of specific gravity for manufacturing organic EL device is deposited, with stone
Adaptation between the electrode film 5 (such as Au or Ag) on 4 surface of English oscillator is also good, shakes for the thickness shear of quartz vibrator 4
Dynamic tracing ability improves, it is suppressed that the rising of the equivalent series resistance of quartz vibrator 4 is able to extend the service life, when being able to carry out long
Between monitoring.
Therefore, as the organic material for forming organic material substrate film 6 on electrode film 5, for example, selection from answer
The organic material of the rising of the equivalent series resistance of the inhibition quartz vibrator 4 carries out total vapor deposition in same vacuum tank 1 together
It is other organic among possessed multiple organic vapor deposition rooms 12 in the organic material or vacuum deposition apparatus that evaporation source 2 evaporates
The organic material that the equivalent series resistance for being not easy to make quartz vibrator 4 when being individually deposited in deposited chamber 12 rises, and lead to
The vapor deposition process is crossed to be deposited and form the organic material basilar memebrane 6.For example, possessed more from vacuum deposition apparatus
The organic material of following effect is realized in selection in the organic material evaporated in a organic vapor deposition room 12, as by including at least one
The organic material that the organic matter of above carbon atom is constituted is easy to rise organic with the equivalent series resistance of quartz vibrator 4
Material is compared, and the adaptation between electrode is good, and the tracing ability of the thickness shear vibration of quartz vibrator 4 improves, also, with will
Metal film is compared as the case where basilar memebrane, and the compatibility between the organic material is good, and membrane interface also becomes mould as a result,
Paste, even if the thickness of evaporation film increases, is also able to suppress the rising of equivalent series resistance so that frequency of oscillation it is stable and being capable of standard
It is really measured, is able to extend the service life.
Also, if basilar memebrane is simply set as metal film rather than organic material based on metal material, even if
Adaptation between electrode film 5 is higher, can also generate the membrane interface between evaporation material, so, equivalent series resistance meeting
Rise, the service life is shorter.
In turn, it is using in advance the case where quartz vibrator 4 of organic material have been deposited on the electrode film 5 of quartz vibrator 4
Under, from formed organic material substrate film 6 play actually be deposited until in a period of, due to the shadow of moisture in atmosphere etc.
It rings and deteriorates organic material, the function as basilar memebrane may be lost.
For example, vacuum deposition apparatus is configured to, the film thickness prison for the organic material that will be evaporated from (remaining is other) evaporation source 2
The quartz vibrator 4 depending on used in is immediately available for as the quartz vibrator 4 with organic material substrate film 6 from (one) other steaming
Rise the organic materials of 2 evaporations, is minimum limit thereby, it is possible to be used as the degradation inhibiting of the organic material of basilar memebrane.
In turn, the vacuum deposition apparatus for manufacturing organic EL device has multiple organic vapor deposition rooms 12, even if without using same
The organic material of total vapor deposition is carried out in one organic vapor deposition room 12 as basilar memebrane, also can in view of vapor deposition rate and film characteristics, from
Selection is most suitable as the organic material of basilar memebrane in the organic material evaporated by possessed multiple evaporation sources 2.
Also, the film thickness of organic material basilar memebrane 6 is set as at least 2 μm or more, thereby, it is possible to further suppress quartzy vibration
The rising of the equivalent series resistance of son 4.
In turn, in the electrode film 5 of quartz vibrator 4 formed on the front and back using Al or using Al as a variety of of principal component
Metal, as a result, compared with the case where forming electrode film 5 using the lower metal of Au or Ag isoreactivity, between evaporation material
Adaptation it is better, evaporation film can not follow the resonant vibration of quartz vibrator 4 and make the equivalent series resistance of quartz vibrator 4
Rise, the current reduction for flowing through quartz vibrator 4 etc. leads to not be inhibited the case where measuring resonant vibration.
Also, if quartz oscillation formula film thickness gauge M is configured to the quantity for example than the evaporation source 2 in organic vapor deposition room 12
Mobile mechanism 13 that is more and having overall movement, then can be configured to monitor the organic material evaporated from an evaporation source 2 on one side
Film thickness form organic material basilar memebrane 6 on one side after moved, and the film to the organic material evaporated from other evaporation sources 2
Thickness is monitored, thereby, it is possible to carry out prolonged use without the evaporation of stopping organic material.
[embodiment]
Specific embodiments of the present invention are illustrated with reference to the accompanying drawings.
The present embodiment applies the present invention in the vacuum deposition apparatus with quartz oscillation formula film thickness gauge M, quartz vibration
Formula film thickness gauge M is swung for making the organic material deposition evaporated from evaporation source 2 form film on the surface of the substrate in vacuum tank 1
When film thickness monitoring.
The present embodiment is configured to, with evaporation source 2 more than at least two in vacuum tank 1, and in each evaporation source 2
Place is respectively provided with the quartz oscillation formula film thickness gauge M of the film thickness monitoring in each vapor deposition process carried out using each evaporation source 2,
There are multiple quartz vibrators 4 in each quartz oscillation formula film thickness gauge M.
Wherein, about the evaporation source 2 that the evaporation material (organic material) for increase equivalent series resistance is deposited
Quartz oscillation formula film thickness gauge M (a quartz oscillation formula film thickness gauge M of an evaporation source 2), using being pre-formed from other
Stone with organic material substrate film 6 of the evaporation material (organic material) that (remaining is other) evaporation source 2 evaporates as basilar memebrane
English oscillator 4.
The production of the quartz vibrator 4 with organic material substrate film 6 as the present embodiment, using described other
(remaining is other) evaporation source 2 implement vapor deposition process in quartz oscillation formula film thickness gauge M multiple quartz vibrators 4 on, into
Film thickness in the row vapor deposition process forms the uniform organic material basilar memebrane 6 of regulation film thickness while monitoring, in the present embodiment
In be configured to, removed from the quartz oscillation formula film thickness gauge M quartz oscillation formula film thickness gauge M with organic material substrate film 6
Quartz vibrator 4 is disposed in one quartz oscillation formula film thickness gauge M of one evaporation source 2.
That is, in the present embodiment, quartz oscillation formula film thickness gauge is all arranged in each vapor deposition process (according to each evaporation source 2)
M, quartz oscillation formula film thickness gauge M are configured to not move, and carry out film thickness monitoring monogon on one side in other vapor deposition process
After organic material basilar memebrane 6, replacement (mobile installation) quartz vibrator 4.
In contrast, the quartz vibrator 4 with organic material substrate film 6 will can be formed in while carrying out film thickness monitoring
On quartz oscillation formula film thickness gauge M be configured to as follows, move each quartz oscillation formula film thickness gauge M respectively
It is dynamic, or as be described hereinafter described in embodiment, do not have to reconnect wiring, and so that a quartz oscillation formula film thickness gauge M is kept out of the way
It is mobile, and become the quartz oscillation formula film thickness gauge M formed on another described quartz vibrator 4 with organic material substrate film 6
At the mode of one quartz oscillation formula film thickness gauge M, move together multiple quartz oscillation formula film thickness gauge M.
No matter which kind of situation, the present invention is configured to following vacuum deposition apparatus: utilizing remaining other evaporation source 2
In the vapor deposition process of implementation, in the organic material basilar memebrane 6 for carrying out forming certain film thickness while film thickness monitoring, it is not required to as a result,
Want special basilar memebrane formation process, it will be able to the stone of multiple organic material basilar memebranes 6 with certain film thickness be efficiently formed
English oscillator 4, in this way, by the stone of the organic material basilar memebrane 6 with certain film thickness formed in remaining other vapor deposition process
The steaming that English oscillator 4 is deposited as (in addition) vapor deposition process, i.e. to the evaporation material for increase equivalent series resistance
Plate process in quartz oscillation formula film thickness gauge M possessed by quartz vibrator 4, and by using have this with organic material substrate film
The quartz oscillation formula film thickness gauge M of 6 quartz vibrator 4, to play the excellent results.
Fig. 1 show using the specific the present embodiment quartz oscillation formula film thickness gauge M large substrate in can be long when
Between the outline structure of vacuum deposition apparatus that is used continuously still in this embodiment, be internally provided with 2 in vacuum tank 1
Linear evaporation source 2, and do not interfering to gasify from each evaporation source 2 and the evaporation material that projects reaches substrate surface and is formed thin
2 quartz oscillation formula film thickness gauge M are provided at the position of the process of dispersing of film, using as film thickness monitoring monitor.
The quartz oscillation formula film thickness gauge M of the present embodiment is configured to, in the quartz vibrated by transmitter 7 with certain frequency
The evaporation material projected from evaporation source 2 is deposited on 4 surface of oscillator (electrode film 5), resonance frequency becomes according to deposition as a result,
Change, evaporation rate and film thickness is calculated according to the resonance frequency variable quantity using film thickness display unit 11, and the value is fed back into heating
Control unit 8 as a result, controls the heating power of evaporation source 2, keeps evaporation rate constant.
In turn, the breaker (not shown) as curtain-shaped cover member with opening portion and non-opening portion is arranged to certain
Speed rotation, to inhibit to be attached to the amount on 4 surface of quartz vibrator from the evaporation material that evaporation source 2 projects, when making it possible to long
Between use a quartz vibrator 4.
The quartz oscillation formula film thickness gauge M as film thickness monitoring monitor in the embodiment has and can store Fig. 2 institute
The quartzy retainer 14 of the multiple quartz vibrators 4 shown, and in 2 side of evaporation source of quartzy retainer 14 with shown in Fig. 3
It is provided with the cover 15 of opening portion 10 at one position of quartz vibrator 4, by rotating quartzy retainer 14, allows hand over use
The quartz vibrator 4 being arranged at the position for the opening portion 10 being arranged on cover 15, can be carried out continuously the prison of evaporation rate for a long time
Depending on.
Also, Fig. 4 shows the structure of the vacuum deposition apparatus of multiple organic vapor deposition rooms 12 with manufacture organic EL device.
The vacuum deposition apparatus is by charging chamber, pretreatment chamber, organic vapor deposition room, mask storage room, conveying chamber, transfer chamber, metal evaporation
Room, discharge room are constituted, and make organic EL device by the way that multiple organic layers are laminated, so, vacuum deposition apparatus according to each layer and
With multiple organic vapor deposition rooms 12, if had in view of vapor deposition rate or film characteristics what is evaporated from evaporation source 2 currently in use
Selection is most suitable as the organic material of organic material basilar memebrane 6 in machine material, then quartz oscillation formula film thickness gauge M is with certain film thickness
Quartz vibrator 4 is used in switching, and thereby, it is possible to realize the use as film thickness monitor and the formation of basilar memebrane simultaneously.
About the organic material B selected as the organic material basilar memebrane 6, as described above, being in independent vapor deposition
It is not easy the material for increase the equivalent series resistance of quartz vibrator 4.Specifically, the organic material that selection has the property that:
Compared with the organic material A for being set as evaporation material, the adaptation between electrode film 5 is good, cuts for the thickness of quartz vibrator 4
Become vibration tracing ability improve, also, with using metal film compared with the case where basilar memebrane, between the organic material A
Compatibility is also good, and membrane interface also thickens as a result, even if the thickness of evaporation film increases, is also able to suppress equivalent series electricity
The rising of resistance, oscillatory vibration number is stable and can accurately be measured, and is able to extend the service life.Therefore, as described above, being formed with
The organic material B of machine material substrate film 6 be set as it is different from the evaporation material A (organic material A) by comprising at least one with
On carbon atom organic matter constitute organic material.
Also, if basilar memebrane is not organic material and the only metal film of metal material, though itself and electrode film 5 it
Between adaptation it is higher, can also generate the membrane interface between evaporation material A (organic material A), so, equivalent series resistance meeting
Rise, the service life is shorter.
That is, the organic material B for forming organic material substrate film 6 is and the evaporation material A (organic material A) that is deposited on it
Between the good organic material of compatibility, also, in the organic material monitored from vacuum deposition apparatus to film thickness
Adaptation between selection and electrode film 5 is higher than the organic material B of organic material A.
Also, it is used using Al as the alloy of principal component, as a result, in the electrode of quartz vibrator 4 formed on the front and back
Compared with the case where forming electrode film 5 using the lower metal of Au or Ag isoreactivity, the adaptation between evaporation material is more
Add well, is able to suppress the rising of the equivalent series resistance of quartz vibrator 4.
Fig. 5 is the outline structure of the quartz vibrator 4 of the present embodiment, wherein as described above, be configured to quartz front and
The back side is formed with by Al or the electrode film 5 constituted using Al as the alloy of principal component.
Al is easy to oxidize, and the front of electrode film 5 is formed with the oxidation film covered by oxygen, and the higher oxygen molecule of reactivity improves
Adaptation between the organic molecule and electrode film 5 of the organic material being deposited, enables evaporation film to follow quartz vibrator 4
Resonant vibration.
Fig. 6 is to show that organic material is deposited and forms organic material substrate film 6 to make on the electrode film 5 of quartz vibrator 4
For the preparation film being deposited in advance, and the organic material used in vapor deposition process is deposited on the organic material basilar memebrane 6
In the case where, the curve graph for the time that equivalent series resistance is stablized without rising.
The stabilization time of equivalent series impedance when film thickness equipped with machine material substrate film 6 is 0.16 μm is 1, shown with
The stabilization time ratio of equivalent series impedance when the film thickness of machine material substrate film 6 is 0.78 μm, 1.57 μm, 3.13 μm.
With the film thickness of organic material basilar memebrane 6 be 0.16 μm when compared with, it is known that film thickness be 0.78 μm, 1.57 μm, 3.13 μ
When m, the film thickness of organic material basilar memebrane 6 is thicker, then the stabilization time ratio of equivalent series resistance is got over as 1.3,2.2,6.8
It is long.
As a result, organic material basilar memebrane 6 is deposited thicker, is then more able to suppress the rising of equivalent series impedance, but
Be the evaporation material being formed on the organic material basilar memebrane 6 vapor deposition amount also can according to thicker be deposited basilar memebrane amount and
It is corresponding to reduce, it is preferred, therefore, that the film thickness of basilar memebrane is at least 2 μm or more, consider the quartz vibration stored in quartzy retainer 14
Son 4 quantity and evaporation time come determine basilar memebrane film thickness and formed quartz vibrator 4 number.
Fig. 7 is in the case where having the mobile mechanism 13 for moving together all quartz oscillation formula film thickness gauge M as a whole
Outline structure illustrated planar figure.There are 2 evaporation sources 2 in organic vapor deposition room 12, and have one more than the quantity than evaporation source 2
A i.e. 3 quartz oscillation formula film thickness gauge M.In the quartz oscillation formula film thickness gauge M that equivalent series resistance can rise in vapor deposition in advance
The quartz vibrator 4 with organic material substrate film 6 is arranged, and new quartz vibration is arranged in remaining 2 quartz oscillation formula film thickness gauge M
Son 4.In the case where long-time evaporating organic materials, the amount of quartz vibrator 4 used in film thickness monitoring becomes insufficient, need into
Row replacement.
At this point, 3 quartz oscillation formula film thickness gauge M are integrally moved on the short side direction of evaporation source 2, film thickness is carried out as a result,
The quartz oscillation formula film thickness gauge M of monitoring changes, and then can persistently carry out film thickness monitoring.
Specifically, making the quartz oscillation formula film for carrying out film thickness monitoring using the quartz vibrator 4 with organic material substrate film 6
Thickness meter M keeps out of the way mobile (not using after this keeps out of the way movement), also, moves and replace use and taken into account film thickness monitoring and substrate
The quartz oscillation formula film thickness gauge M (film thickness gauge as the evaporation material that increase equivalent series resistance) that film is formed, is using
After the film thickness gauge for having carried out the organic material of basilar memebrane formation, unused and standby film thickness gauge is used.
Stop the evaporation of the organic material projected from evaporation source 2 as a result, it is after the cooling period, straight to carrying out ventilating in vacuum tank 1
It, also can be long lasting for progress film from the quartz vibrator 4 without replacing quartz oscillation formula film thickness gauge M to atmospheric pressure is become
Thickness monitoring.
Fig. 8 shows the mobile mechanism 13 of the quartz oscillation formula film thickness gauge M in vacuum deposition apparatus.Quartz oscillation formula film
The flexible piping of thickness meter M is connect with the atmospheric pressure space (atmosphere BOX) in vacuum tank 1, and is configured to make atmosphere by having
The atmosphere arm for the joint portion that BOX is connected to the atmospheric pressure space outside vacuum tank 1 enables the atmosphere BOX to move.By adopting
With the structure, electric wiring, coaxial cable, water cooling piping etc. can be imported from the atmospheric pressure space outside vacuum tank 1 true
Quartz oscillation formula film thickness gauge M in empty slot 1 is simultaneously moved it.
In addition, capableing of the specific structure of appropriately designed each structure important document the present invention is not limited to the present embodiment.
Claims (11)
1. a kind of vacuum deposition apparatus makes from the evaporation of at least two evaporation source in vacuum tank as the organic of evaporation material
Material deposits on the surface of the substrate to form film, which is characterized in that
Film thickness or the steaming for being used to control each evaporation source at least two in the vacuum tank and controlling the substrate surface
The quartz oscillation formula film thickness gauge of speed is plated, the quartz oscillation formula film thickness gauge has multiple quartz vibrators, and an evaporation source is had
One had the quartz oscillation formula film thickness gauge is configured to the quartz vibrator with the organic material substrate film of multiple bands, multiple band
The quartz vibrator of organic material basilar memebrane is in the organic material evaporated from remaining other evaporation source for being pre-formed certain film thickness
After material, it is changed to next quartz vibrator, the institute possessed by the quartz oscillation formula film thickness gauge is deposited in the organic material as a result,
It states on multiple quartz vibrators, while carrying out the film thickness monitoring in the vapor deposition process that remaining other evaporation source is implemented using this
Organic material bases that be pre-formed certain film thickness respectively, that material is different from the evaporation material evaporated from one evaporation source
Counterdie, after the vapor deposition process that remaining other evaporation source is implemented using this, by with the organic material substrate of the band
The quartz oscillation formula film thickness gauge of the quartz vibrator of film, the film thickness carried out in the vapor deposition process implemented using one evaporation source are supervised
Depending on.
2. vacuum deposition apparatus according to claim 1, which is characterized in that
The vacuum tank is made of multiple organic vapor deposition rooms, and each evaporation source and the stone are equipped in each organic vapor deposition room
English oscillatory type film thickness gauge is disposed in the multiple quartz of the quartz oscillation formula film thickness gauge in one of organic vapor deposition room
Oscillator is configured to, and being pre-formed, evaporating from the evaporation source of remaining other organic vapor deposition room for certain film thickness is organic
After material, it is changed to next quartz vibrator, is respectively formed the organic material substrate on multiple quartz vibrator as a result,
Film have using one by the quartz oscillation formula film thickness gauge with the quartz vibrator with organic material substrate film
Film thickness monitoring in the vapor deposition process that the evaporation source of machine deposited chamber is implemented.
3. vacuum deposition apparatus according to claim 1, which is characterized in that
The film thickness that the organic material basilar memebrane formed on each quartz vibrator is at least 2 μm or more.
4. vacuum deposition apparatus according to claim 2, which is characterized in that
The film thickness that the organic material basilar memebrane formed on each quartz vibrator is at least 2 μm or more.
5. vacuum deposition apparatus described in any one according to claim 1~4, which is characterized in that
It is formed in the electrode film of the quartz vibrator formed on the front and back by Al or by the various metals of principal component of Al.
6. vacuum deposition apparatus described in any one according to claim 1~4, which is characterized in that
The vacuum deposition apparatus has the mobile mechanism of the mobile quartz oscillation formula film thickness gauge, controls film thickness or vapor deposition on one side
Speed is deposited on one side from the organic material that remaining described other evaporation source evaporate on each quartz vibrator and is formed described
Organic material basilar memebrane passes through the mobile mechanism after vapor deposition process that remaining other evaporation source is implemented using this
The mobile quartz oscillation formula film thickness gauge, forms on the quartz vibrator of the organic material substrate film of the band from one evaporation source
The organic material of evaporation controls an evaporation source as a result, and controls the film thickness or evaporation rate of the substrate surface, carries out benefit
The film thickness in vapor deposition process implemented with an evaporation source monitors.
7. vacuum deposition apparatus according to claim 5, which is characterized in that
The vacuum deposition apparatus has the mobile mechanism of the mobile quartz oscillation formula film thickness gauge, controls film thickness or vapor deposition on one side
Speed is deposited on one side from the organic material that remaining described other evaporation source evaporate on each quartz vibrator and is formed described
Organic material basilar memebrane passes through the mobile mechanism after vapor deposition process that remaining other evaporation source is implemented using this
The mobile quartz oscillation formula film thickness gauge, forms on the quartz vibrator of the organic material substrate film of the band from one evaporation source
The organic material of evaporation controls an evaporation source as a result, and controls the film thickness or evaporation rate of the substrate surface, carries out benefit
The film thickness in vapor deposition process implemented with an evaporation source monitors.
8. vacuum deposition apparatus described in any one according to claim 1~4, which is characterized in that
The organic material is the organic material for manufacturing organic EL device.
9. vacuum deposition apparatus according to claim 5, which is characterized in that
The organic material is the organic material for manufacturing organic EL device.
10. vacuum deposition apparatus according to claim 6, which is characterized in that
The organic material is the organic material for manufacturing organic EL device.
11. vacuum deposition apparatus according to claim 7, which is characterized in that
The organic material is the organic material for manufacturing organic EL device.
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| JP2014200860A JP6448279B2 (en) | 2014-09-30 | 2014-09-30 | Vacuum deposition equipment |
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| WO2018077388A1 (en) * | 2016-10-25 | 2018-05-03 | Applied Materials, Inc. | Measurement assembly for measuring a deposition rate, evaporation source, deposition apparatus, and method therefor |
| US10763143B2 (en) * | 2017-08-18 | 2020-09-01 | Applied Materials, Inc. | Processing tool having a monitoring device |
| KR101870581B1 (en) * | 2017-09-29 | 2018-06-22 | 캐논 톡키 가부시키가이샤 | Method of determining life of crystal quartz oscilator, apparatus of measuring film thickness, film forming method, film forming apparatus and manufacturing method of electronic device |
| JP7301578B2 (en) * | 2019-03-29 | 2023-07-03 | キヤノントッキ株式会社 | Film forming apparatus and film forming method |
| CN109930112A (en) * | 2019-04-15 | 2019-06-25 | 湖畔光电科技（江苏）有限公司 | A kind of vapor deposition cavity body structure |
| TWI701641B (en) * | 2019-10-01 | 2020-08-11 | 龍翩真空科技股份有限公司 | Wireless transmission film thickness monitoring device |
| WO2021079589A1 (en) * | 2019-10-21 | 2021-04-29 | 株式会社アルバック | Film forming device |
| CN111829428B (en) * | 2020-06-17 | 2022-02-15 | 华中科技大学 | Double-quartz-crystal diaphragm thickness control instrument and error correction method |
| KR20220011924A (en) * | 2020-07-22 | 2022-02-03 | 주식회사 엘지화학 | Silicon based coating composition and silicon based release film |
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| CN102465262A (en) * | 2010-11-04 | 2012-05-23 | 佳能株式会社 | Film formation apparatus |
| CN103305796A (en) * | 2012-03-12 | 2013-09-18 | 株式会社日立高新技术 | Evaporation source apparatus, vacuum deposition apparatus, and method of manufacturing organic EL display device |
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| JP4233644B2 (en) | 1998-09-22 | 2009-03-04 | 株式会社アルバック | Thickness monitor crystal unit |
| JP2005325400A (en) * | 2004-05-13 | 2005-11-24 | Seiko Epson Corp | Vacuum deposition system and thin film deposition method |
| KR20120023273A (en) * | 2010-09-01 | 2012-03-13 | (주)알파플러스 | Thickness monitoring method for vacuum metallizing film using shutter and vacuum metallizing apparatus using the method |
| JP2014065942A (en) * | 2012-09-26 | 2014-04-17 | Hitachi High-Technologies Corp | Vacuum evaporation device |
| JP2014070238A (en) * | 2012-09-28 | 2014-04-21 | Hitachi High-Technologies Corp | Vacuum evaporation device, and evaporation method for the same |
| CN103469172B (en) * | 2013-08-31 | 2015-08-05 | 上海膜林科技有限公司 | Quartz crystal coated method for controlling thickness and quartz crystal coated device |
| JP6223275B2 (en) * | 2014-05-15 | 2017-11-01 | キヤノントッキ株式会社 | Crystal oscillation film thickness meter |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102465262A (en) * | 2010-11-04 | 2012-05-23 | 佳能株式会社 | Film formation apparatus |
| CN103305796A (en) * | 2012-03-12 | 2013-09-18 | 株式会社日立高新技术 | Evaporation source apparatus, vacuum deposition apparatus, and method of manufacturing organic EL display device |
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| CN105463377A (en) | 2016-04-06 |
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| KR101968798B1 (en) | 2019-04-12 |
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