CN105463377A - Vacuum evaporation device - Google Patents
Vacuum evaporation device Download PDFInfo
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- CN105463377A CN105463377A CN201510607517.1A CN201510607517A CN105463377A CN 105463377 A CN105463377 A CN 105463377A CN 201510607517 A CN201510607517 A CN 201510607517A CN 105463377 A CN105463377 A CN 105463377A
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Abstract
Provided is a vacuum evaporation device. The invention provides an excellent vacuum evaporation device with a quartz oscillatory film thickness gauge. Through using quartz vibrators in an organic material in the quartz oscillatory film thickness gauge of an evaporation source, the quartz vibrators forming certain film thickness in advance and are evaporated from other evaporation sources, a base film forming process is not needed, and a plurality of quartz vibrators of an organic material base film in certain film thickness are formed in advance. The device restrains rising of equivalent series resistance of the quartz vibrators and realizes prolonging of life. In the vacuum evaporation device, the plurality of quartz vibrators (4) of the quartz oscillatory film thickness gauge used to control film thickness and evaporation speed of the evaporation source are quartz vibrators with the organic material base films which are formed on the quartz vibrators while controlling the film thickness and evaporation speed of an evaporation process applied by other evaporation sources in advance.
Description
Technical field
The present invention relates to and on substrate, form film in the vacuum tank keeping reduced pressure atmosphere, there is vacuum deposition apparatus for the quartz oscillation formula film thickness gauge controlled thickness or evaporation rate (thickness rate).
Background technology
On substrate, in film forming vacuum deposition apparatus, using film thickness gauge to control to thickness and evaporation rate (thickness rate) by vacuum vapour deposition.There is various species according to mensuration mode difference in this film thickness gauge, but widely uses quartz resonator method.
The quartz oscillation formula film thickness gauge of quartz resonator method is used to make use of when having evaporation material in the surface attachment of quartz resonator, the character that resonant vibration changes according to its quality change, such as, thickness and thickness rate is measured by the change measuring this resonant vibration (oscillation frequency), and fed back to the heating control apparatus of evaporation source, thus the thickness rate of evaporated film on substrate is controlled as constant in manage thickness.
And, when the such determining film thickness based on quartz oscillation formula film thickness gauge (thickness supervision), when on the electrode film of quartz resonator during thicker ground evaporated film, resonant vibration instability can be produced, electric current that the equivalent series resistance (crystal impedance) of quartz resonator rises and flows through quartz resonator reduces, thus cannot the phenomenons such as resonant vibration be measured.Therefore, when cannot measure resonant vibration when so thicker ground evaporation, be judged as that quartz resonator reaches the life-span, quartz resonator is replaced by new quartz resonator.
Specifically, such as, the quartzy retainer of the multiple quartz resonator of maintenance is made to rotate and switch use, to make it possible to the replacing carrying out this quartz resonator in vacuum tank continuously.
In the past, in order to extend the life-span of this quartz resonator, according to patent documentation 1 (Japanese Unexamined Patent Publication 2000-101387 publication), in order to make the crackle or the stripping that are also not easy to produce this film when thicker ground evaporated film, by forming soft metal film in advance on the electrode film of the film forming face of quartz resonator, thus the internal stress relaxing film prevents stripping or the crackle of film.
And, according to patent documentation 2 (Japanese Unexamined Patent Publication 2014-70238 publication), there is the evaporation source of more than at least 2 and the film thickness sensor corresponding with it in vacuum chamber, and be configured to the material being not easy to be attached to quartz resonator surface from an evaporation source evaporation, and the material evaporated from another evaporation source is imported in advance to the film thickness sensor monitored it, thus, before evaporation is carried out to the material being not easy to adhere to, the material utilizing adaptation excellent forms basilar membrane on quartz resonator surface in advance, thus when using the material being not easy to adhere to, also rate of evaporation accurately can be detected.
[patent documentation 1] Japanese Unexamined Patent Publication 2000-101387 publication
[patent documentation 2] Japanese Unexamined Patent Publication 2014-70238 publication
But, by patent documentation 1, the known method being pre-formed metallic membrane on quartz resonator is the method preventing the stripping of film forming material, eliminate the unstable of resonant vibration, extend the life-span of quartz resonator, but, even if the film that quartz resonator is formed is unstripped, equivalent series resistance due to quartz resonator rises and flows through the electric current reduction of quartz resonator, sometimes also resonant vibration cannot be measured, so, the life-span of quartz resonator cannot be extended.
And, the material that evaporates from another evaporation source is imported to be pre-formed the method for basilar membrane at known by patent documentation 2 film thickness sensor being not easy the material adhered to being arranged in an evaporation source, by precoating ingress pipe, the film thickness sensor being configured in appropriate position relative to a described evaporation source is imported to the material of another evaporation source, so, sufficient evaporation rate cannot be guaranteed, further, the basilar membrane be previously formed on this film thickness sensor (quartz resonator surface) easily becomes uneven.And then, when this another evaporation source imports the material of easily attachment, do not monitor its thickness, so, the basilar membrane of thickness accurately cannot be formed.
Namely, namely the stripping or the crackle that prevent vapor-deposited film is allowed to, but when organic materials less for proportion is carried out evaporation as deposition material, this organic materials is on electrode during film forming, and the thickness of this vapor-deposited film is larger, then more cannot follow the thickness shear vibration of quartz resonator, so even if vibration itself is maintained, but the thickness of vapor-deposited film is thicker, then equivalent series resistance more rises, and therefore fully can not solve and cannot measure the such problem of oscillation frequency.Particularly when basilar membrane is metallic membrane, the equivalent series resistance that the membrane interface between organic materials cannot be suppressed to cause rises, and the life-span of quartz oscillation formula film thickness gauge is still shorter and cannot extend.
And particularly, deposition material for the manufacture of organic EL device is the organic materials that proportion is less, adaptation between itself and the electrode film (such as Au or Ag) on quartz resonator surface is poor, the thickness shear vibration of quartz resonator cannot be followed, even if arrange metal matrix counterdie, also just become this organic materials and be placed in state on electrode film, so, when the thickness of vapor-deposited film increases, equivalent series impedance can rise, and therefore the life-span of quartz resonator is shorter.
Further, the organic materials not carrying out thickness supervision being imported in the method on quartz resonator surface by ingress pipe, the quartz resonator of the tape base counterdie of multiple thickness being formed uniformly substantial amount cannot be formed, the utilization of volume production equipment cannot be tackled.
Summary of the invention
The present invention finds and solves the problems referred to above point, its object is to provide a kind of epoch-making vacuum deposition apparatus, it is controlled thickness or evaporation rate by quartz oscillation formula film thickness gauge, and, monitored by this thickness, at the multiple quartz resonators surface evaporation of this quartz oscillation formula film thickness gauge from the organic materials of this (remaining other) evaporation source evaporation, be pre-formed the organic materials basilar membrane of regulation thickness, use and there is the quartz oscillation formula film thickness gauge that multiple band being evenly formed as the thickness of this substantial amount specifies the quartz resonator of the basilar membrane of thickness, control its thickness or evaporation rate while carry out evaporation to the organic materials evaporated from (one) evaporation source, thus, inhibit the rising of the equivalent series resistance of quartz resonator, achieve long lifetime, and, as mentioned above, described organic materials basilar membrane adequate relief can be made to become certain thickness, and, organic material substrate film can be pre-formed efficiently and not need the film formation process outside evaporation operation.
With reference to accompanying drawing, purport of the present invention is described.
The present invention relates to a kind of vacuum deposition apparatus, it makes the organic materials as deposition material that the evaporation source 2 from more than at least 2 evaporates be deposited on substrate 3 deposited on silicon and form film in vacuum tank 1, it is characterized in that, have in described vacuum tank 1 more than at least 2 for controlling described each evaporation source 2 and controlling the thickness on described substrate 3 surface or the quartz oscillation formula film thickness gauge M of evaporation rate, described quartz oscillation formula film thickness gauge M has multiple quartz resonator 4, the described quartz oscillation formula film thickness gauge M that a described evaporation source 2 has is configured to have the quartz resonator 4 of the organic material substrate film 6 of multiple band, the quartz resonator 4 of the plurality of band organic material substrate film 6 is after being pre-formed the organic materials evaporated from remaining other evaporation source 2 of certain thickness, be replaced by next quartz resonator 4, thus, on described multiple quartz resonators 4 that organic materials evaporation is had in this quartz oscillation formula film thickness gauge M, carrying out being pre-formed the organic materials basilar membrane 6 of certain thickness respectively while the thickness in the evaporation operation utilizing this remaining other evaporation source 2 to implement monitors, after utilizing the evaporation operation of this remaining other evaporation source 2 to terminate, by having the quartz oscillation formula film thickness gauge M of the quartz resonator 4 of the organic material substrate film 6 of described band, the thickness carried out in the evaporation operation utilizing a described evaporation source 2 to implement monitors.
And, relate to the vacuum deposition apparatus described in the 1st aspect, it is characterized in that, described vacuum tank 1 is made up of multiple organic vapor deposition room 12, described each evaporation source 2 and described quartz oscillation formula film thickness gauge M is equipped in each organic vapor deposition room 12, after the organic materials that the described multiple quartz resonators 4 being disposed in the described quartz oscillation formula film thickness gauge M in this organic vapor deposition room 12 evaporate at the described evaporation source 2 from remaining other organic vapor deposition room 12 being pre-formed certain thickness, be replaced by next quartz resonator 4, thus, the plurality of quartz resonator 4 forms described organic materials basilar membrane 6 respectively, by having the quartz oscillation formula film thickness gauge M of the quartz resonator 4 of the organic material substrate film 6 of this band, thickness in the evaporation operation carrying out utilizing the described evaporation source 2 of a described organic vapor deposition room 12 to implement monitors.
Further, relate to the vacuum deposition apparatus described in the 1st aspect, it is characterized in that, the described organic materials basilar membrane 6 that described each quartz resonator 4 is formed is the thickness of more than at least 2 μm.
Further, relate to the vacuum deposition apparatus described in the 2nd aspect, it is characterized in that, the described organic materials basilar membrane 6 that described each quartz resonator 4 is formed is the thickness of more than at least 2 μm.
Further, relate to the vacuum deposition apparatus described in any one aspect in 1st ~ 4 aspects, it is characterized in that, the electrode film 5 that the surface and the back side of described quartz resonator 4 are formed is by Al or be that the various metals of principal constituent is formed with Al.
And, relate to the vacuum deposition apparatus described in any one aspect in 1st ~ 4 aspects, it is characterized in that, described vacuum deposition apparatus has the travel mechanism 13 of mobile described quartz oscillation formula film thickness gauge M, it is the thick or evaporation rate of controlling diaphragm on one side, while the organic materials that evaporation evaporates from remaining other evaporation source 2 described on described each quartz resonator 4 and form described organic materials basilar membrane 6, after the evaporation operation utilizing this remaining other evaporation source 2 to implement terminates, this quartz oscillation formula film thickness gauge M is moved by described travel mechanism 13, the quartz resonator 4 of described band organic material substrate film 6 is formed the organic materials evaporated from a described evaporation source 2, thus, control this evaporation source 2 and control thickness or the evaporation rate on described substrate 3 surface, the thickness carried out in the evaporation operation utilizing this evaporation source 2 to implement monitors.
And, relate to the vacuum deposition apparatus described in the 5th aspect, it is characterized in that, described vacuum deposition apparatus has the travel mechanism 13 of mobile described quartz oscillation formula film thickness gauge M, it is the thick or evaporation rate of controlling diaphragm on one side, while the organic materials that evaporation evaporates from remaining other evaporation source 2 described on described each quartz resonator 4 and form described organic materials basilar membrane 6, after the evaporation operation utilizing this remaining other evaporation source 2 to implement terminates, this quartz oscillation formula film thickness gauge M is moved by described travel mechanism 13, the quartz resonator 4 of described band organic material substrate film 6 is formed the organic materials evaporated from a described evaporation source 2, thus, control this evaporation source 2 and control thickness or the evaporation rate on described substrate 3 surface, the thickness carried out in the evaporation operation utilizing this evaporation source 2 to implement monitors.
Further, relate to the vacuum deposition apparatus described in any one aspect in 1st ~ 4 aspects, it is characterized in that, described organic materials is the organic materials for the manufacture of organic EL device.
Further, relate to the vacuum deposition apparatus described in the 5th aspect, it is characterized in that, described organic materials is the organic materials for the manufacture of organic EL device.
Further, relate to the vacuum deposition apparatus described in the 6th aspect, it is characterized in that, described organic materials is the organic materials for the manufacture of organic EL device.
Further, relate to the vacuum deposition apparatus described in the 7th aspect, it is characterized in that, described organic materials is the organic materials for the manufacture of organic EL device.
Due to formation described above, so, the present invention is configured to a kind of epoch-making vacuum deposition apparatus, it is controlled thickness or evaporation rate by quartz oscillation formula film thickness gauge, and, monitored by this thickness, at the multiple quartz resonators surface evaporation of this quartz oscillation formula film thickness gauge from the organic materials of this (remaining other) evaporation source evaporation, be pre-formed the organic materials basilar membrane of regulation thickness, the band having multiple adequate relief and become the thickness of this substantial amount is used to specify the quartz oscillation formula film thickness gauge of the quartz resonator of the basilar membrane of thickness, control its thickness or evaporation rate while carry out evaporation to the organic materials evaporated from (one) evaporation source, thus, inhibit the rising of the equivalent series resistance of quartz resonator, achieve long lifetime, and, as mentioned above, can make described organic materials basilar membrane evenly and be formed as certain thickness, and, organic material substrate film can be pre-formed efficiently and not need the film formation process outside evaporation operation.
In other words, be configured to the following excellent vacuum deposition apparatus with quartz oscillation formula film thickness gauge, utilize quartz oscillation formula film thickness gauge, in the same manner as the thickness of substrate, thickness is managed (thickness supervision), and, on multiple quartz resonator surfaces of this quartz oscillation formula film thickness gauge, evaporation forms the organic materials from this (remaining other) evaporation source evaporation in advance, so, basilar membrane formation process (the new evaporation operation that basilar membrane is formed) outside evaporation operation need not be set, all the time the organic materials basilar membrane based on different organic materials specifying thickness (certain thickness) uniformly can be formed, thus, inhibit the rising of the equivalent series resistance of quartz resonator, achieve long lifetime.
Namely, be configured to following vacuum deposition apparatus: on the electrode film of quartz resonator, control this organic materials to manage into certain thickness by the thickness in remaining other evaporation operation and evaporation rate in advance, and it is carried out evaporation together with this substrate and forms the organic materials basilar membrane of certain thickness, so, directly carry out compared with the situation of evaporation to deposition material (organic materials) with on electrode film, the adaptation of electrode film and described organic materials basilar membrane is good, and, the adaptation of this organic materials basilar membrane and deposition material (organic materials) is also good, and, with using metallic membrane compared with the situation of basilar membrane, consistency between basilar membrane and this deposition material is also good, so, compared with using the situation of metallic membrane, membrane interface thickens, even if make the thickness of vapor-deposited film increase due to deposition material, also the rising of the equivalent series resistance of quartz resonator can be suppressed, so, can prolongs life, can monitor for a long time, and, do not need outside the evaporation operation of necessity, arrange this organic materials basilar membrane formation process in addition yet, so, productivity is also very excellent.
When further illustrating, be configured to the following vacuum deposition apparatus with quartz oscillation formula film thickness gauge: by forming described organic materials basilar membrane in advance on the electrode film of quartz resonator, even if to the adaptation of electrode film and deposition material can be caused to be deteriorated, vapor-deposited film cannot follow the resonant vibration of quartz resonator, from the angle of quartz resonator be in foreign matter attachment state thus exist vibration power loss and the equivalent series resistance of quartz resonator rise deposition material carry out evaporation, also the rising of the equivalent series resistance of quartz resonator when evaporation carries out to it can be suppressed, so, can prolongs life, can monitor for a long time.
And then, be configured to following excellent vacuum deposition apparatus: switch to other quartz resonator to carry out thickness supervision the quartz resonator of the quartz oscillation formula film thickness gauge for controlling thickness or the evaporation rate of the organic materials from an evaporation source evaporation in the multiple evaporation sources in vacuum tank: this other quartz resonator has multiple, and be pre-formed certain thickness in the evaporation operation utilizing remaining other evaporation source to implement from the different organic materials that this evaporation source evaporates, but be not deposited into the reduction lower value of resonant frequency, namely, while carry out thickness supervision, switch the quartz resonator carrying out this thickness supervision successively on one side and the organic materials basilar membrane forming regulation thickness on each quartz resonator successively, thus, while carry out thickness supervision, while being formed multiple is the quartz resonator of the organic materials basilar membrane of certain thickness with accurate evaporation, by the quartz oscillation formula film thickness gauge (using in the quartz resonator of the quartz oscillation formula film thickness gauge of an evaporation source) used as a described evaporation source, thus inhibit the rising of equivalent series resistance, and, also without the need for machine material substrate film formation process.
In other words, as mentioned above, carry out the supervision of (can take into account) thickness and the basilar membrane formation when carrying out (next one) thickness different with it and monitoring simultaneously, so, the quartz resonator of multiple organic materials basilar membrane with certain thickness can be set more efficiently, so, be configured to the vacuum deposition apparatus that practicality is very excellent.
Further, in the invention described in the 2nd, by having multiple organic vapor deposition room, thus the excellent vacuum deposition apparatus of practicality is configured to.
Further, in the invention described in the 3rd, 4, by forming the organic materials basilar membrane of more than at least 2 μm, thus the vacuum deposition apparatus that can suppress the rising of the equivalent series resistance of quartz resonator is further configured to.
And, in invention described in the 5th, achieve vacuum deposition apparatus more excellent as follows: the adaptation between basilar membrane and deposition material improves further, the equivalent series resistance that vapor-deposited film cannot follow the resonant vibration of quartz resonator and quartz resonator rise, the flow through electric current reduction etc. of quartz resonator causes the situation that cannot measure resonant vibration all to be suppressed.
And, in invention described in the 6th, 7, by having the travel mechanism for the movement of quartz oscillation formula film thickness gauge, its movement automatically can be made, and, such as by being arranged in the same deposited chamber of vacuum tank by vacuum deposition apparatus, thus the evaporation of organic materials need not be stopped, the quartz oscillation formula film thickness gauge with the quartz resonator defining organic materials basilar membrane just can be used as the film thickness monitoring watch-dog of other evaporation source of this same deposited chamber.
Further, in the invention described in 8th ~ 11, be applicable to the manufacture of organic EL device, become more useful quartz oscillation formula film thickness gauge.
Accompanying drawing explanation
Fig. 1 is the use of the summary construction diagram of the vacuum deposition apparatus of the quartz oscillation formula film thickness gauge of the present embodiment.
Fig. 2 is the explanatory view of the quartzy retainer of a part for quartz oscillation formula film thickness gauge as the present embodiment.
Fig. 3 is the explanatory view of the cover of a part for quartz oscillation formula film thickness gauge as the present embodiment.
Fig. 4 is the schematic configuration explanatory view of an example of the mode of trooping that organic el device manufacture apparatus is shown.
Fig. 5 is the schematic configuration explanatory view of the quartz resonator of the present embodiment.
Fig. 6 is the graphic representation corresponding to equivalent series impedance ratio steady time of the thickness of organic materials basilar membrane when the organic materials evaporation carrying out the present embodiment is shown.
Fig. 7 is the schematic configuration illustrated planar figure of the travel mechanism of the quartz oscillation formula film thickness gauge illustrated in the vacuum deposition apparatus of the present embodiment.
Fig. 8 is the schematic configuration side elevational view of the travel mechanism of the quartz oscillation formula film thickness gauge illustrated in the vacuum deposition apparatus of the present embodiment.
Label declaration
1: vacuum tank; 2: evaporation source; 3: substrate; 4: quartz resonator; 5: electrode film; 6: organic materials basilar membrane; 12: organic vapor deposition room; 13: travel mechanism; M: quartz oscillation formula film thickness gauge.
Embodiment
Effect of the present invention is shown with reference to the accompanying drawings and preferred embodiments of the present invention are briefly described.
Vacuum deposition apparatus of the present invention is configured to the evaporation source 2 in vacuum tank 1 with more than at least 2, the quartz oscillation formula film thickness gauge M for controlling each thickness and evaporation rate is equipped in evaporation source 2, in this quartz oscillation formula film thickness gauge M, there is multiple quartz resonator 4, the multiple quartz resonators 4 at least had in this quartz oscillation formula film thickness gauge M are configured to, after being pre-formed the organic materials evaporated from remaining other evaporation source 2 of certain thickness, be replaced by next quartz resonator 4, thus, while the thickness of remaining other evaporation source 2 and evaporation rate control to this, while on multiple quartz resonator 4 this organic materials of evaporation and form organic material substrate film 6, use it for the quartz oscillation formula film thickness gauge M that the quartz oscillation formula film thickness gauge M that controls thickness and the evaporation rate of a described evaporation source 2 or use have the quartz resonator 4 with this organic materials basilar membrane 6, thus, directly carry out compared with the situation of evaporation to deposition material with on the electrode film 5 of quartz resonator 4, electrode film 5 is good with the adaptation of organic materials basilar membrane 6, and, this organic materials basilar membrane 6 is also good with the adaptation of described deposition material, and, with using metallic membrane compared with the situation of basilar membrane, consistency between this organic materials basilar membrane 6 and this deposition material is also good, so, compared with using the situation of metallic membrane, membrane interface thickens, even if the thickness of the vapor-deposited film of deposition material increases, also the rising of the equivalent series resistance of quartz resonator 4 can be suppressed, can prolongs life, can monitor for a long time and the organic materials basilar membrane formation process beyond evaporation operation need not be set.
Such as, when the organic materials less to the proportion for the manufacture of organic EL device carries out evaporation, and the adaptation between the electrode film 5 (such as Au or Ag) on quartz resonator 4 surface is also good, tracing ability for the thickness shear vibration of quartz resonator 4 improves, inhibit the rising of the equivalent series resistance of quartz resonator 4, can prolongs life, can monitor for a long time.
Therefore, as the organic materials for forming organic material substrate film 6 on electrode film 5, such as select the organic materials not easily making when carrying out separately evaporation the equivalent series resistance of quartz resonator 4 increase in other organic vapor deposition room 12 among multiple organic vapor deposition rooms 12 of having the organic materials that evaporates from the evaporation source 2 carrying out common evaporation together with should suppressing the organic materials of the rising of the equivalent series resistance of quartz resonator 4 in same vacuum tank 1 or vacuum deposition apparatus, and carry out evaporation by this evaporation operation and form this organic materials basilar membrane 6.Such as, the organic materials realizing following effect is selected in the organic materials of evaporation from the multiple organic vapor deposition rooms 12 had vacuum deposition apparatus, as the organic materials be made up of the organism of the carbon atom comprising at least more than one, namely compared with the organic materials easily risen with the equivalent series resistance of quartz resonator 4, and the adaptation between electrode is good, the tracing ability of the thickness shear vibration of quartz resonator 4 improves, and, with using metallic membrane compared with the situation of basilar membrane, and the consistency between described organic materials is good, thus, membrane interface also thickens, even if the thickness of vapor-deposited film increases, also the rising of equivalent series resistance can be suppressed, make oscillation frequency stable and can accurately measure, can prolongs life.
Further, if simply basilar membrane is set to metallic membrane based on metallic substance instead of organic materials, even if the adaptation then and between electrode film 5 is higher, the membrane interface between deposition material can also be produced, so equivalent series resistance can rise, and the life-span is shorter.
And then, using in advance on the electrode film 5 of quartz resonator 4 when evaporation quartz resonator 4 of organic materials, from formation organic material substrate film 6 play actual carry out evaporation till during in, make organic materials deterioration due to the impact of the moisture in air etc., the function as basilar membrane may be lost.
Such as, vacuum deposition apparatus is configured to, the quartz resonator 4 used the thickness of the organic materials that will evaporate from (remaining other) evaporation source 2 monitors is as the quartz resonator 4 of the organic material substrate film 6 of band, organic materials immediately for evaporating from other (one) evaporation source 2, thereby, it is possible to be inferior limit using the degradation inhibiting of the organic materials as basilar membrane.
And then, the vacuum deposition apparatus manufacturing organic EL device has multiple organic vapor deposition room 12, even if be not used in same organic vapor deposition room 12 and carry out the organic materials of common evaporation as basilar membrane, also in view of evaporation rate and film characteristics, the organic materials be most suitable for as basilar membrane can be selected from the organic materials evaporated by had multiple evaporation sources 2.
Further, the thickness of organic materials basilar membrane 6 is set to more than at least 2 μm, thereby, it is possible to suppress the rising of the equivalent series resistance of quartz resonator 4 further.
And then, use Al at the electrode film 5 formed on the front and back of quartz resonator 4 or take Al as the various metals of principal constituent, thus, the metal lower with utilizing Au or Ag isoreactivity is formed compared with the situation of electrode film 5, and the adaptation between deposition material is more good, vapor-deposited film cannot be followed the resonant vibration of quartz resonator 4 and make rise, the flow through electric current reduction etc. of quartz resonator 4 of the equivalent series resistance of quartz resonator 4 cause the situation that cannot measure resonant vibration all can suppress.
And, if quartz oscillation formula film thickness gauge M is configured to such as many than the quantity of the evaporation source 2 in organic vapor deposition room 12 and has the travel mechanism 13 moved integrally, then can be configured to monitoring that the thickness of the organic materials evaporated from an evaporation source 2 is while move after forming organic material substrate film 6, and the thickness of the organic materials evaporated from other evaporation source 2 is monitored, thereby, it is possible to use for a long time and the evaporation of organic materials need not be stopped.
[embodiment]
With reference to the accompanying drawings specific embodiments of the invention are described.
The present embodiment applies the present invention to have in the vacuum deposition apparatus of quartz oscillation formula film thickness gauge M, and the organic materials deposition that this quartz oscillation formula film thickness gauge M is used for making to evaporate from evaporation source 2 in vacuum tank 1 forms film thickness monitoring during film on the surface of the substrate.
The present embodiment is configured to, there is the evaporation source 2 of more than at least 2 in vacuum tank 1, and there is at this each evaporation source 2 place quartz oscillation formula film thickness gauge M that the thickness in each evaporation operation utilizing this each evaporation source 2 to carry out monitors respectively, in this each quartz oscillation formula film thickness gauge M, there is multiple quartz resonator 4.
Wherein, about the quartz oscillation formula film thickness gauge M (a quartz oscillation formula film thickness gauge M of an evaporation source 2) of evaporation source 2 deposition material making equivalent series resistance increase (organic materials) being carried out to evaporation, use and be pre-formed the deposition material (organic materials) that evaporates from other (remaining other) evaporation source 2 quartz resonator 4 as the organic material substrate film 6 of band of basilar membrane.
The making of the quartz resonator 4 of the organic material substrate film 6 of this band as the present embodiment, on multiple quartz resonators 4 of the quartz oscillation formula film thickness gauge M in the evaporation operation utilizing described (remaining other) evaporation source 2 in addition to implement, carrying out the uniform organic materials basilar membrane 6 forming regulation thickness while the thickness in this evaporation operation monitors, be configured in the present embodiment, the quartz resonator 4 of the organic material substrate film 6 of band of this quartz oscillation formula film thickness gauge M is taken off from this quartz oscillation formula film thickness gauge M, be arranged in a described quartz oscillation formula film thickness gauge M of a described evaporation source 2.
Namely, in the present embodiment, in each evaporation operation (according to each evaporation source 2), quartz oscillation formula film thickness gauge M is all set, this quartz oscillation formula film thickness gauge M is configured to not move, and in other evaporation operation, carry out thickness supervision while after forming organic material substrate film 6, change (mobile installation) this quartz resonator 4.
On the other hand, the quartz oscillation formula film thickness gauge M be formed at while carrying out thickness supervision on the quartz resonator 4 being with organic material substrate film 6 can be configured to as follows, after this evaporation operation, make each this quartz oscillation formula film thickness gauge M move respectively, or as described in aftermentioned embodiment, wiring need not be reconnected, and to make a quartz oscillation formula film thickness gauge M carry out keeping out of the way movement, and make the quartz oscillation formula film thickness gauge M that another quartz resonator 4 with organic material substrate film 6 described is formed become the mode of a described quartz oscillation formula film thickness gauge M, multiple quartz oscillation formula film thickness gauge M is moved together.
No matter which kind of situation, the present invention is configured to following vacuum deposition apparatus: in the evaporation operation utilizing remaining other evaporation source 2 to implement, the organic materials basilar membrane 6 of certain thickness is formed while carrying out thickness supervision, thus, do not need special basilar membrane formation process, just can form the quartz resonator 4 of multiple organic materials basilar membrane 6 with certain thickness efficiently, like this, using the quartz resonator 4 of the organic materials basilar membrane 6 with certain thickness that formed in remaining other evaporation operation as (other) evaporation operation, namely the quartz resonator 4 that the quartz oscillation formula film thickness gauge M carried out in the evaporation operation of evaporation the deposition material making equivalent series resistance increase has, and by using the quartz oscillation formula film thickness gauge M with the quartz resonator 4 of the organic material substrate film 6 of this band, thus play described excellent results.
Fig. 1 illustrates in the large substrate of the quartz oscillation formula film thickness gauge M using this concrete the present embodiment can the schematic configuration of vacuum deposition apparatus that uses of long-time continuous, but, in this embodiment, 2 linear evaporation sources 2 are provided with in the inside of vacuum tank 1, and to gasify and the position that the deposition material penetrated arrives substrate surface and film forming process of dispersing is provided with 2 quartz oscillation formula film thickness gauge M from each evaporation source 2 not hindering, using as film thickness monitoring watch-dog.
The quartz oscillation formula film thickness gauge M of the present embodiment is configured to, depositing so that quartz resonator 4 surface (electrode film 5) of certain frequency vibration is upper the deposition material penetrated from evaporation source 2 by projector 7, thus, resonant frequency changes according to deposition, utilize thickness display part 11 to calculate evaporation rate and thickness according to this resonant frequency variable quantity, and this value is fed back to heating control section 8, thus, the heating power of evaporation source 2 is controlled, makes evaporation rate constant.
And then, the isolating switch as shield component (not shown) with opening portion and non-opening portion is arranged to and rotates with certain speed, to suppress the amount be attached to from the deposition material of evaporation source 2 injection quartz resonator 4 surface, make it possible to use a quartz resonator 4 for a long time.
The quartz oscillation formula film thickness gauge M as film thickness monitoring watch-dog in this embodiment has the quartzy retainer 14 that can store the multiple quartz resonators 4 shown in Fig. 2, and a position of the quartz resonator 4 had shown in Fig. 3 in evaporation source 2 side of quartzy retainer 14 is provided with the cover 15 of opening portion 10, rotate by making quartzy retainer 14, the quartz resonator 4 that the position that is used in the opening portion 10 that cover 15 is arranged arranges can be switched, long-time continuous can carry out the supervision of evaporation rate.
Further, Fig. 4 illustrates the structure of the vacuum deposition apparatus with the multiple organic vapor deposition rooms 12 manufacturing organic EL device.This vacuum deposition apparatus is by loading space, pretreatment chamber, organic vapor deposition room, mask storing chamber, conveying chamber, transfer chamber, metal evaporation room, discharge chamber is formed, organic EL device is made by stacked multiple organic layer, so, vacuum deposition apparatus has multiple organic vapor deposition room 12 according to each floor, if select the organic materials be most suitable for as organic materials basilar membrane 6 in the organic materials evaporated from the evaporation source 2 used in view of evaporation rate or film characteristics, then quartz oscillation formula film thickness gauge M switches utilization quartz resonator 4 with certain thickness, thus, the formation of use as thickness watch-dog and basilar membrane can be realized simultaneously.
About by the organic materials B selected, as mentioned above, being the material not easily making the equivalent series resistance of quartz resonator 4 increase when independent evaporation as this organic materials basilar membrane 6.Specifically, select the organic materials with following characteristic: compared with the organic materials A being set to deposition material, and the adaptation between electrode film 5 is good, tracing ability for the thickness shear vibration of quartz resonator 4 improves, and, with using metallic membrane compared with the situation of basilar membrane, and the consistency between described organic materials A is also good, thus, membrane interface also thickens, even if the thickness of vapor-deposited film increases, also can suppress the rising of equivalent series resistance, oscillatory vibration number is stable and can accurately measure, can prolongs life.Therefore, as mentioned above, the organic materials B forming organic material substrate film 6 is set to the organic materials be made up of the organism of the carbon atom comprising at least more than one different from described deposition material A (organic materials A).
Further, if basilar membrane is not the metallic membrane of organic materials and just metallic substance, even if the adaptation then between itself and electrode film 5 is higher, also the membrane interface between deposition material A (organic materials A) can be produced, so equivalent series resistance can rise, and the life-span is shorter.
Namely, the organic materials B forming organic material substrate film 6 is the good organic materials of the consistency between the deposition material A (organic materials A) of evaporation thereon, further, from the organic materials monitored thickness vacuum deposition apparatus, select the adaptation between electrode film 5 higher than the organic materials B of this organic materials A.
And, using at the electrode formed on the front and back of quartz resonator 4 take Al as the alloy of principal constituent, thus, the metal lower with utilizing Au or Ag isoreactivity is formed compared with the situation of electrode film 5, and the adaptation between deposition material is more good, can suppress the rising of the equivalent series resistance of quartz resonator 4.
Fig. 5 is the schematic configuration of the quartz resonator 4 of the present embodiment, wherein, as mentioned above, is configured to be formed by Al at the front and back of quartz or take Al as the electrode film 5 that the alloy of principal constituent is formed.
Al is easily oxidized, and the front of electrode film 5 is formed with the oxide film covered by oxygen, and reactive higher oxygen molecule improves by the adaptation between the organic molecule of the organic materials of evaporation and electrode film 5, makes vapor-deposited film can follow the resonant vibration of quartz resonator 4.
Fig. 6 illustrates evaporation organic materials on the electrode film 5 of quartz resonator 4 and forms organic material substrate film 6 using the preparation film as evaporation in advance, and on this organic materials basilar membrane 6 when the organic materials that uses in evaporation operation of evaporation, the graphic representation of the time that equivalent series resistance is stablized and do not risen.
The steady time of the equivalent series impedance when thickness being provided with machine material substrate film 6 is 0.16 μm is 1, and ratio steady time of the equivalent series impedance when thickness of organic material substrate film 6 is 0.78 μm, 1.57 μm, 3.13 μm is shown.
Compared with when being 0.16 μm with the thickness of organic materials basilar membrane 6, known when thickness is 0.78 μm, 1.57 μm, 3.13 μm, the thickness of organic materials basilar membrane 6 is thicker, then ratio steady time of equivalent series resistance is longer as 1.3,2.2,6.8.
Thus, must be thicker by organic materials basilar membrane 6 evaporation, then more can suppress the rising of equivalent series impedance, but, the evaporation amount being formed at the deposition material on this organic materials basilar membrane 6 also can the corresponding minimizing according to the amount of thicker ground evaporation basilar membrane, so the thickness of preferred substrate film is more than at least 2 μm, consider that the quantity of the quartz resonator 4 stored in quartzy retainer 14 and evaporation time are decided the thickness of basilar membrane and forms the number of quartz resonator 4.
Fig. 7 be have make all quartz oscillation formula film thickness gauge M as a whole movement together travel mechanism 13 when schematic configuration illustrated planar figure.There are 2 evaporation sources 2 in organic vapor deposition room 12, and there are i.e. 3 quartz oscillation formula film thickness gauge Ms more than the quantity of evaporation source 2.Arrange the quartz resonator 4 of the organic material substrate film 6 of band in the quartz oscillation formula film thickness gauge M that equivalent series resistance can rise in evaporation in advance, and arrange new quartz resonator 4 in all the other 2 quartz oscillation formula film thickness gauge M.When long-time evaporating organic materials, the quantitative change of the quartz resonator 4 used during thickness monitors obtains not enough, needs to change.
Now, 3 quartz oscillation formula film thickness gauge M entirety move on the short side direction of evaporation source 2, and thus, the quartz oscillation formula film thickness gauge M carrying out thickness supervision changes, and can then continue to carry out thickness supervision.
Specifically, the quartz oscillation formula film thickness gauge M making the quartz resonator 4 of utilization with organic material substrate film 6 carry out thickness supervision keeps out of the way movement (not re-using after this keeps out of the way movement), and, move and change to use and taken into account the quartz oscillation formula film thickness gauge M (being used as the film thickness gauge of the deposition material that equivalent series resistance can be made to increase) that thickness monitors and basilar membrane is formed, after employing the film thickness gauge carrying out the organic materials that this basilar membrane is formed, do not use and standby film thickness gauge.
Thus, stop the evaporation of the organic materials penetrated from evaporation source 2, after the cooling period, ventilate until become normal atmosphere in vacuum tank 1, thus the quartz resonator 4 of quartz oscillation formula film thickness gauge M need not be changed, also can continue for a long time to carry out thickness supervision.
Fig. 8 illustrates the described travel mechanism 13 of the quartz oscillation formula film thickness gauge M in vacuum deposition apparatus.The flexible pipe arrangement of quartz oscillation formula film thickness gauge M is connected with the normal atmosphere space (air BOX) in vacuum tank 1, and the air arm be configured to by having the joint portion making air BOX be communicated with the normal atmosphere space outside vacuum tank 1, makes described air BOX to move.By adopting described structure, electrical wiring, coaxial cable, water-cooled pipe arrangement etc. can be imported the quartz oscillation formula film thickness gauge M in vacuum tank 1 from the normal atmosphere space outside vacuum tank 1 and move it.
In addition, the invention is not restricted to the present embodiment, suitably can design the concrete structure of each structure important document.
Claims (11)
1. a vacuum deposition apparatus, it makes the organic materials as deposition material of the evaporation source evaporation from more than at least 2 deposit on the surface of the substrate to form film in vacuum tank, it is characterized in that,
Have in described vacuum tank more than at least 2 control the thickness of described substrate surface or the quartz oscillation formula film thickness gauge of evaporation rate for controlling each described evaporation source, described quartz oscillation formula film thickness gauge has multiple quartz resonator, the described quartz oscillation formula film thickness gauge that a described evaporation source has is configured to have the quartz resonator of the organic material substrate film of multiple band, the quartz resonator of the plurality of band organic material substrate film is after being pre-formed the organic materials evaporated from remaining other evaporation source of certain thickness, be replaced by next quartz resonator, thus, on described multiple quartz resonator that this organic materials evaporation is had in this quartz oscillation formula film thickness gauge, carrying out being pre-formed the organic materials basilar membrane of certain thickness respectively while the thickness in the evaporation operation utilizing this remaining other evaporation source to implement monitors, after the evaporation operation utilizing this remaining other evaporation source to implement terminates, by having the quartz oscillation formula film thickness gauge of the quartz resonator of the organic material substrate film of described band, the thickness carried out in the evaporation operation utilizing a described evaporation source to implement monitors.
2. vacuum deposition apparatus according to claim 1, is characterized in that,
Described vacuum tank is made up of multiple organic vapor deposition room, each described evaporation source and described quartz oscillation formula film thickness gauge is equipped in each organic vapor deposition room, the described multiple quartz resonator being disposed in the described quartz oscillation formula film thickness gauge in one of them organic vapor deposition room is configured to, after the organic materials of the described evaporation source evaporation from remaining other organic vapor deposition room being pre-formed certain thickness, be replaced by next quartz resonator, thus, the plurality of quartz resonator is formed described organic materials basilar membrane respectively, by having the quartz oscillation formula film thickness gauge of the quartz resonator of the organic material substrate film of this band, thickness in the evaporation operation carrying out utilizing the described evaporation source of a described organic vapor deposition room to implement monitors.
3. vacuum deposition apparatus according to claim 1, is characterized in that,
The described organic materials basilar membrane that each described quartz resonator is formed is the thickness of more than at least 2 μm.
4. vacuum deposition apparatus according to claim 2, is characterized in that,
The described organic materials basilar membrane that each described quartz resonator is formed is the thickness of more than at least 2 μm.
5. the vacuum deposition apparatus according to any one in Claims 1 to 4, is characterized in that,
At the electrode film formed on the front and back of described quartz resonator by Al or be that the various metals of principal constituent is formed with Al.
6. the vacuum deposition apparatus according to any one in Claims 1 to 4, is characterized in that,
Described vacuum deposition apparatus has the travel mechanism of mobile described quartz oscillation formula film thickness gauge, while control thickness or evaporation rate, while the organic materials that evaporation evaporates from remaining other evaporation source described on each described quartz resonator and form described organic materials basilar membrane, after the evaporation operation utilizing this remaining other evaporation source to implement terminates, this quartz oscillation formula film thickness gauge is moved by described travel mechanism, the quartz resonator of described band organic material substrate film is formed the organic materials from described evaporation source evaporation, thus, control this evaporation source and control thickness or the evaporation rate of described substrate surface, the thickness carried out in the evaporation operation utilizing this evaporation source to implement monitors.
7. vacuum deposition apparatus according to claim 5, is characterized in that,
Described vacuum deposition apparatus has the travel mechanism of mobile described quartz oscillation formula film thickness gauge, while control thickness or evaporation rate, while the organic materials that evaporation evaporates from remaining other evaporation source described on each described quartz resonator and form described organic materials basilar membrane, after the evaporation operation utilizing this remaining other evaporation source to implement terminates, this quartz oscillation formula film thickness gauge is moved by described travel mechanism, the quartz resonator of described band organic material substrate film is formed the organic materials from described evaporation source evaporation, thus, control this evaporation source and control thickness or the evaporation rate of described substrate surface, the thickness carried out in the evaporation operation utilizing this evaporation source to implement monitors.
8. the vacuum deposition apparatus according to any one in Claims 1 to 4, is characterized in that,
Described organic materials is the organic materials for the manufacture of organic EL device.
9. vacuum deposition apparatus according to claim 5, is characterized in that,
Described organic materials is the organic materials for the manufacture of organic EL device.
10. vacuum deposition apparatus according to claim 6, is characterized in that,
Described organic materials is the organic materials for the manufacture of organic EL device.
11. vacuum deposition apparatus according to claim 7, is characterized in that,
Described organic materials is the organic materials for the manufacture of organic EL device.
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| CN109596959A (en) * | 2017-09-29 | 2019-04-09 | 佳能特机株式会社 | Life determining method, film thickness measuring device, film build method, film formation device and the electronic device manufacturing method of crystal oscillator |
| CN111748772A (en) * | 2019-03-29 | 2020-10-09 | 佳能特机株式会社 | Film forming apparatus and film forming method |
| CN111829428A (en) * | 2020-06-17 | 2020-10-27 | 华中科技大学 | Double-quartz-crystal diaphragm thickness control instrument and error correction method |
| CN113302332A (en) * | 2019-10-21 | 2021-08-24 | 株式会社爱发科 | Film forming apparatus |
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| JP2018538429A (en) * | 2016-10-25 | 2018-12-27 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | Measuring assembly, evaporation source, deposition apparatus and method therefor for measuring deposition rate |
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| KR20160038746A (en) | 2016-04-07 |
| JP2016069694A (en) | 2016-05-09 |
| CN105463377B (en) | 2019-08-23 |
| JP6448279B2 (en) | 2019-01-09 |
| TWI681066B (en) | 2020-01-01 |
| TW201627514A (en) | 2016-08-01 |
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