CN105353433B - 用于极紫外光刻的反射镜的基底 - Google Patents

用于极紫外光刻的反射镜的基底 Download PDF

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Publication number
CN105353433B
CN105353433B CN201510870929.4A CN201510870929A CN105353433B CN 105353433 B CN105353433 B CN 105353433B CN 201510870929 A CN201510870929 A CN 201510870929A CN 105353433 B CN105353433 B CN 105353433B
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China
Prior art keywords
base body
substrate
alloy
mirror
phase
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English (en)
Chinese (zh)
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CN105353433A (zh
Inventor
C.埃克斯坦
H.马尔特
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C14/00—Alloys based on titanium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C21/00—Alloys based on aluminium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C21/00—Alloys based on aluminium
    • C22C21/12—Alloys based on aluminium with copper as the next major constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C9/00—Alloys based on copper
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Sampling And Sample Adjustment (AREA)
CN201510870929.4A 2011-01-21 2012-01-14 用于极紫外光刻的反射镜的基底 Active CN105353433B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201161434869P 2011-01-21 2011-01-21
DE102011002953.2 2011-01-21
US61/434,869 2011-01-21
DE201110002953 DE102011002953A1 (de) 2011-01-21 2011-01-21 Substrat für Spiegel für die EUV-Lithographie
CN201280006089.1A CN103328664B (zh) 2011-01-21 2012-01-14 用于euv光刻的反射镜的基底

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201280006089.1A Division CN103328664B (zh) 2011-01-21 2012-01-14 用于euv光刻的反射镜的基底

Publications (2)

Publication Number Publication Date
CN105353433A CN105353433A (zh) 2016-02-24
CN105353433B true CN105353433B (zh) 2019-08-23

Family

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Family Applications (3)

Application Number Title Priority Date Filing Date
CN201510870929.4A Active CN105353433B (zh) 2011-01-21 2012-01-14 用于极紫外光刻的反射镜的基底
CN201280006089.1A Active CN103328664B (zh) 2011-01-21 2012-01-14 用于euv光刻的反射镜的基底
CN201910693451.0A Active CN110376670B (zh) 2011-01-21 2012-01-14 用于极紫外光刻的反射镜的基底

Family Applications After (2)

Application Number Title Priority Date Filing Date
CN201280006089.1A Active CN103328664B (zh) 2011-01-21 2012-01-14 用于euv光刻的反射镜的基底
CN201910693451.0A Active CN110376670B (zh) 2011-01-21 2012-01-14 用于极紫外光刻的反射镜的基底

Country Status (9)

Country Link
US (3) US20130301151A1 (enExample)
EP (2) EP3489374B1 (enExample)
JP (1) JP6023083B2 (enExample)
KR (1) KR102080180B1 (enExample)
CN (3) CN105353433B (enExample)
DE (1) DE102011002953A1 (enExample)
ES (1) ES2933686T3 (enExample)
PL (1) PL3489374T3 (enExample)
WO (1) WO2012098062A2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009040785A1 (de) * 2009-09-09 2011-03-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Substrat aus einer Aluminium-Silizium-Legierung oder kristallinem Silizium, Metallspiegel, Verfahren zu dessen Herstellung sowie dessen Verwendung
DE102011002953A1 (de) * 2011-01-21 2012-07-26 Carl Zeiss Smt Gmbh Substrat für Spiegel für die EUV-Lithographie
DE102013107192A1 (de) * 2013-07-08 2015-01-08 Carl Zeiss Laser Optics Gmbh Reflektives optisches Element für streifenden Einfall im EUV-Wellenlängenbereich
DE102013215541A1 (de) 2013-08-07 2015-02-12 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
WO2017158989A1 (ja) * 2016-03-16 2017-09-21 東洋アルミニウム株式会社 紫外線反射材用アルミニウム箔およびその製造方法
DE102016209359A1 (de) * 2016-05-31 2017-11-30 Carl Zeiss Smt Gmbh EUV-Kollektor
CA3099808C (en) 2018-05-09 2024-01-02 Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. Mirror support for a composite optical mirror and method for its production
IL281070B2 (en) * 2018-08-27 2025-08-01 Materion Corp UV reflective mirrors for display manufacturing
CN114868083A (zh) * 2019-12-19 2022-08-05 Asml荷兰有限公司 真空中增强的热导率
CN112662918A (zh) * 2020-12-02 2021-04-16 国网电力科学研究院武汉南瑞有限责任公司 Al2O3-TiC颗粒增强铝基复合材料及其制备方法
WO2025201772A1 (en) 2024-03-28 2025-10-02 Asml Netherlands B.V. Substrate and method for a high power laser system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0939467A2 (en) * 1998-02-26 1999-09-01 Nikon Corporation Mirror for an ultraviolet laser and method
JP2005259949A (ja) * 2004-03-11 2005-09-22 Nikon Corp ミラー及び照明光学装置
CN1719287A (zh) * 2005-06-29 2006-01-11 中国人民解放军国防科学技术大学 三明治式结构SiC基复合材料轻质反射镜及其制备方法
CN101088031A (zh) * 2004-12-23 2007-12-12 弗劳恩霍弗实用研究促进协会 用于euv光谱区域的热稳定的多层的反射镜

Family Cites Families (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1877141A (en) * 1930-04-07 1932-09-13 Alfred J Lyon Aluminum casting alloy
US3826688A (en) * 1971-01-08 1974-07-30 Reynolds Metals Co Aluminum alloy system
US4093349A (en) * 1976-10-27 1978-06-06 Northrop Corporation High reflectivity laser mirrors
US4412870A (en) * 1980-12-23 1983-11-01 Aluminum Company Of America Wrought aluminum base alloy products having refined intermetallic phases and method
DE3107612A1 (de) * 1981-02-27 1982-09-16 Siemens AG, 1000 Berlin und 8000 München Laserspiegel, insbesondere laser-polygonspiegel
DE3376076D1 (en) * 1982-09-03 1988-04-28 Alcan Int Ltd Aluminium alloys
JPS61266535A (ja) * 1985-05-21 1986-11-26 Nissan Motor Co Ltd 銅基複合材料
US4643543A (en) * 1986-01-27 1987-02-17 Atlantic Richfield Company Mirror optic article
JPS62180301A (ja) * 1986-02-04 1987-08-07 Toshiba Corp 反射鏡
US4659548A (en) * 1986-02-13 1987-04-21 The United States Of America As Represented By The Secretary Of The Navy Fabrication of metal matrix composite mirror
US4755221A (en) * 1986-03-24 1988-07-05 Gte Products Corporation Aluminum based composite powders and process for producing same
US4803334A (en) * 1987-11-16 1989-02-07 Westinghouse Electric Corp. Method for laser beam welding metal matrix composite components
JPH0715523B2 (ja) * 1988-05-31 1995-02-22 住友電気工業株式会社 レーザ用非球面鏡
US5045280A (en) * 1989-10-04 1991-09-03 Mintek Intermetallic compounds
ES2028537A6 (es) * 1990-09-17 1992-07-01 Martin Gutierrez Antonio Procedimiento para la decoracion de espejos circulares.
JPH06279897A (ja) * 1992-02-06 1994-10-04 Chuetsu Gokin Chuko Kk 高軟化特性析出硬化型銅合金
JP2684927B2 (ja) * 1992-06-16 1997-12-03 日本鋼管株式会社 光学素子基板
JP3304021B2 (ja) * 1994-07-20 2002-07-22 日産自動車株式会社 高温耐摩耗性に優れた銅合金
DE69520268T2 (de) * 1995-02-01 2001-08-09 Brush Wellman Inc., Cleveland Behandlung von Legierungen und danach hergestellte Gegenstände
US5699188A (en) * 1995-06-26 1997-12-16 Minnesota Mining And Manufacturing Co. Metal-coated multilayer mirror
ATE217366T1 (de) * 1996-08-15 2002-05-15 Alcan Tech & Man Ag Reflektor mit resistenter oberfläche
US6183877B1 (en) * 1997-03-21 2001-02-06 Inco Limited Cast-alumina metal matrix composites
US6377655B1 (en) * 1998-05-08 2002-04-23 Nikon Corporation Reflective mirror for soft x-ray exposure apparatus
JPH11326598A (ja) * 1998-05-08 1999-11-26 Nikon Corp 反射鏡およびその製造方法
JP3316191B2 (ja) * 1998-12-24 2002-08-19 日本碍子株式会社 鏡面性に優れたベリリウム−銅−亜鉛合金
JP4410367B2 (ja) * 1999-12-24 2010-02-03 キヤノン電子株式会社 金属鏡および金属回転多面鏡およびその製造方法
US6587263B1 (en) * 2000-03-31 2003-07-01 Lockheed Martin Corporation Optical solar reflectors
EP1154289A1 (de) * 2000-05-09 2001-11-14 Alcan Technology & Management AG Reflektor
DE10127086A1 (de) * 2001-06-02 2002-12-05 Zeiss Carl Vorrichtung zur Reflexion von elektromagnetischen Wellen
DE10134267B4 (de) 2001-07-18 2007-03-01 Gkss-Forschungszentrum Geesthacht Gmbh Einrichtung zur Reflexion von Röntgenstrahlen
US6634760B2 (en) * 2001-08-27 2003-10-21 The Regents Of The University Of California Low-cost method for producing extreme ultraviolet lithography optics
US6921177B2 (en) * 2003-02-24 2005-07-26 Raytheon Company High precision mirror, and a method of making it
JP2005268359A (ja) * 2004-03-17 2005-09-29 Nikon Corp ミラー及び照明光学装置
CN1253731C (zh) * 2004-05-20 2006-04-26 中国科学院上海技术物理研究所 大口径轻质复合材料反射镜及制备方法
JP4210239B2 (ja) * 2004-06-01 2009-01-14 日鉱金属株式会社 強度、導電性及び曲げ加工性に優れるチタン銅及びその製造方法
JP2006190862A (ja) * 2005-01-07 2006-07-20 Taiheiyo Cement Corp 露光用反射鏡
US8926898B2 (en) * 2005-03-29 2015-01-06 Kobe Steel, Ltd. Al base alloy excellent in heat resistance, workability and rigidity
DE102005026418B4 (de) 2005-06-08 2008-05-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Spiegelträger für einen optischen Spiegel
WO2007030701A2 (en) * 2005-09-07 2007-03-15 M Cubed Technologies, Inc. Metal matrix composite bodies, and methods for making same
US7612285B2 (en) * 2007-01-08 2009-11-03 Edtek, Inc. Conversion of solar energy to electrical and/or heat energy
US9279178B2 (en) * 2007-04-27 2016-03-08 Honeywell International Inc. Manufacturing design and processing methods and apparatus for sputtering targets
US20090148334A1 (en) * 2007-12-05 2009-06-11 United States of America as represented by the Administrator of the National Aeronautics and Nanophase dispersion strengthened low cte alloy
DE102009000099A1 (de) * 2009-01-09 2010-07-22 Carl Zeiss Smt Ag Mikrospiegelarray mit Doppelbiegebalken Anordnung und elektronischer Aktorik
US8057203B2 (en) * 2008-10-02 2011-11-15 Gap Engineering LLC Pyrospherelator
WO2010085678A1 (en) * 2009-01-22 2010-07-29 Alcoa Inc. Improved aluminum-copper alloys containing vanadium
DE102009039400A1 (de) * 2009-08-31 2011-03-03 Carl Zeiss Laser Optics Gmbh Reflektives optisches Element zur Verwendung in einem EUV-System
DE102009040785A1 (de) * 2009-09-09 2011-03-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Substrat aus einer Aluminium-Silizium-Legierung oder kristallinem Silizium, Metallspiegel, Verfahren zu dessen Herstellung sowie dessen Verwendung
US8810775B2 (en) * 2010-04-16 2014-08-19 Media Lario S.R.L. EUV mirror module with a nickel electroformed curved mirror
DE102011079933A1 (de) * 2010-08-19 2012-02-23 Carl Zeiss Smt Gmbh Optisches Element für die UV- oder EUV-Lithographie
DE102010039927A1 (de) * 2010-08-30 2012-03-01 Carl Zeiss Smt Gmbh Substrat für Spiegel für die EUV-Lithographie
DE102011002953A1 (de) * 2011-01-21 2012-07-26 Carl Zeiss Smt Gmbh Substrat für Spiegel für die EUV-Lithographie
DE102016217735A1 (de) * 2016-09-16 2018-03-22 Carl Zeiss Smt Gmbh Komponente für eine Spiegelanordnung für die EUV-Lithographie

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0939467A2 (en) * 1998-02-26 1999-09-01 Nikon Corporation Mirror for an ultraviolet laser and method
JP2005259949A (ja) * 2004-03-11 2005-09-22 Nikon Corp ミラー及び照明光学装置
CN101088031A (zh) * 2004-12-23 2007-12-12 弗劳恩霍弗实用研究促进协会 用于euv光谱区域的热稳定的多层的反射镜
CN1719287A (zh) * 2005-06-29 2006-01-11 中国人民解放军国防科学技术大学 三明治式结构SiC基复合材料轻质反射镜及其制备方法

Also Published As

Publication number Publication date
CN105353433A (zh) 2016-02-24
EP3489374B1 (en) 2022-09-21
WO2012098062A2 (en) 2012-07-26
US20130301151A1 (en) 2013-11-14
US20210149093A1 (en) 2021-05-20
CN103328664A (zh) 2013-09-25
CN110376670A (zh) 2019-10-25
CN103328664B (zh) 2016-01-20
KR20140018245A (ko) 2014-02-12
EP3489374A1 (en) 2019-05-29
EP2665839A2 (en) 2013-11-27
ES2933686T3 (es) 2023-02-13
JP6023083B2 (ja) 2016-11-09
US20170160447A1 (en) 2017-06-08
KR102080180B1 (ko) 2020-02-24
US10935704B2 (en) 2021-03-02
CN110376670B (zh) 2022-03-22
WO2012098062A3 (en) 2012-10-18
EP2665839B1 (en) 2018-12-26
PL3489374T3 (pl) 2023-01-30
JP2014506724A (ja) 2014-03-17
DE102011002953A1 (de) 2012-07-26

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