CN105161436B - 倒装芯片的封装方法 - Google Patents
倒装芯片的封装方法 Download PDFInfo
- Publication number
- CN105161436B CN105161436B CN201510579955.1A CN201510579955A CN105161436B CN 105161436 B CN105161436 B CN 105161436B CN 201510579955 A CN201510579955 A CN 201510579955A CN 105161436 B CN105161436 B CN 105161436B
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- photoresist
- flip chip
- metal
- packaging
- conductive layer
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/857—Interconnections, e.g. lead-frames, bond wires or solder balls
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/568—Temporary substrate used as encapsulation process aid
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/93—Batch processes
- H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L24/96—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being encapsulated in a common layer, e.g. neo-wafer or pseudo-wafer, said common layer being separable into individual assemblies after connecting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/852—Encapsulations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/04105—Bonding areas formed on an encapsulation of the semiconductor or solid-state body, e.g. bonding areas on chip-scale packages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
- H01L2224/19—Manufacturing methods of high density interconnect preforms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L2224/96—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being encapsulated in a common layer, e.g. neo-wafer or pseudo-wafer, said common layer being separable into individual assemblies after connecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
- H01L2924/1815—Shape
- H01L2924/1816—Exposing the passive side of the semiconductor or solid-state body
- H01L2924/18162—Exposing the passive side of the semiconductor or solid-state body of a chip with build-up interconnect
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/036—Manufacture or treatment of packages
- H10H20/0364—Manufacture or treatment of packages of interconnections
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Wire Bonding (AREA)
- Led Device Packages (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510579955.1A CN105161436B (zh) | 2015-09-11 | 2015-09-11 | 倒装芯片的封装方法 |
| US15/757,902 US10985300B2 (en) | 2015-09-11 | 2016-04-26 | Encapsulation method for flip chip |
| JP2018532495A JP6777742B2 (ja) | 2015-09-11 | 2016-04-26 | フリップチップのパッケージ方法 |
| PCT/CN2016/080209 WO2017041491A1 (zh) | 2015-09-11 | 2016-04-26 | 倒装芯片的封装方法 |
| US17/095,727 US20210090907A1 (en) | 2015-09-11 | 2020-11-11 | Encapsulation Method for Flip Chip |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510579955.1A CN105161436B (zh) | 2015-09-11 | 2015-09-11 | 倒装芯片的封装方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105161436A CN105161436A (zh) | 2015-12-16 |
| CN105161436B true CN105161436B (zh) | 2018-05-22 |
Family
ID=54802253
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510579955.1A Active CN105161436B (zh) | 2015-09-11 | 2015-09-11 | 倒装芯片的封装方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10985300B2 (enExample) |
| JP (1) | JP6777742B2 (enExample) |
| CN (1) | CN105161436B (enExample) |
| WO (1) | WO2017041491A1 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105161436B (zh) * | 2015-09-11 | 2018-05-22 | 柯全 | 倒装芯片的封装方法 |
| US10861895B2 (en) | 2018-11-20 | 2020-12-08 | Ningbo Semiconductor International Corporation | Image capturing assembly and packaging method thereof, lens module and electronic device |
| CN109817769B (zh) * | 2019-01-15 | 2020-10-30 | 申广 | 一种新型led芯片封装制作方法 |
| CN110112129B (zh) * | 2019-06-05 | 2024-04-02 | 福建天电光电有限公司 | 一种玻璃荧光片的发光半导体制作工艺 |
| CN111170271A (zh) * | 2019-12-30 | 2020-05-19 | 杭州臻镭微波技术有限公司 | 一种嵌入式微系统模组中的芯片切割误差的协调方法 |
| CN119365062B (zh) * | 2024-10-21 | 2025-09-19 | 中国科学院上海微系统与信息技术研究所 | 超导量子芯片封装结构及超导量子芯片的倒装封装方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101452862A (zh) * | 2007-11-28 | 2009-06-10 | 南茂科技股份有限公司 | 晶粒重新配置的堆栈封装方法及其堆栈结构 |
| CN101728466A (zh) * | 2008-10-29 | 2010-06-09 | 先进开发光电股份有限公司 | 高功率发光二极管陶瓷封装结构及其制造方法 |
| US7939935B2 (en) * | 2006-05-22 | 2011-05-10 | Hitachi Cable Ltd. | Electronic device substrate, electronic device and methods for fabricating the same |
| CN103794587A (zh) * | 2014-01-28 | 2014-05-14 | 江苏长电科技股份有限公司 | 一种高散热芯片嵌入式重布线封装结构及其制作方法 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5405813A (en) * | 1994-03-17 | 1995-04-11 | Vlsi Technology, Inc. | Optimized photoresist dispense method |
| US20040007779A1 (en) | 2002-07-15 | 2004-01-15 | Diane Arbuthnot | Wafer-level method for fine-pitch, high aspect ratio chip interconnect |
| SE0302437D0 (sv) * | 2003-09-09 | 2003-09-09 | Joachim Oberhammer | Film actuator based RF MEMS switching circuits |
| JP4687066B2 (ja) * | 2004-10-25 | 2011-05-25 | 株式会社デンソー | パワーic |
| CN101436553B (zh) * | 2007-11-16 | 2010-06-02 | 南茂科技股份有限公司 | 芯片重新配置的封装结构中使用金属凸块的制造方法 |
| JP5201983B2 (ja) | 2007-12-28 | 2013-06-05 | 富士通株式会社 | 電子部品 |
| JP5107187B2 (ja) * | 2008-09-05 | 2012-12-26 | 新光電気工業株式会社 | 電子部品パッケージの製造方法 |
| DE112011100376B4 (de) | 2010-01-29 | 2024-06-27 | Citizen Electronics Co., Ltd. | Verfahren zur herstellung einer licht aussendenden vorrichtung |
| KR101181224B1 (ko) * | 2011-03-29 | 2012-09-10 | 성균관대학교산학협력단 | Led 패키지 및 그 제조방법 |
| JP5748336B2 (ja) * | 2011-06-10 | 2015-07-15 | 富士機械製造株式会社 | 半導体装置の製造方法 |
| CN103094135A (zh) | 2011-11-01 | 2013-05-08 | 柯全 | 倒装芯片的封装方法 |
| JP5829501B2 (ja) * | 2011-12-01 | 2015-12-09 | 富士機械製造株式会社 | 半導体素子画像認識装置及び半導体素子画像認識方法 |
| JP6029188B2 (ja) * | 2012-03-26 | 2016-11-24 | 富士機械製造株式会社 | Ledパッケージ及びその製造方法 |
| CN104272446B (zh) * | 2012-08-30 | 2016-11-09 | 松下知识产权经营株式会社 | 电子部件封装体及其制造方法 |
| CN103084135B (zh) | 2013-02-06 | 2015-05-20 | 武汉工程大学 | 一种卧式撞击流反应器 |
| CN103488051B (zh) * | 2013-08-28 | 2015-11-11 | 中国科学院高能物理研究所 | 一种用于liga技术的光刻胶膜与基片的复合结构的制备方法 |
| CN104658929A (zh) | 2014-04-22 | 2015-05-27 | 柯全 | 倒装芯片的封装方法及装置 |
| US20150325748A1 (en) * | 2014-05-07 | 2015-11-12 | Genesis Photonics Inc. | Light emitting device |
| CN105161436B (zh) * | 2015-09-11 | 2018-05-22 | 柯全 | 倒装芯片的封装方法 |
-
2015
- 2015-09-11 CN CN201510579955.1A patent/CN105161436B/zh active Active
-
2016
- 2016-04-26 JP JP2018532495A patent/JP6777742B2/ja active Active
- 2016-04-26 WO PCT/CN2016/080209 patent/WO2017041491A1/zh not_active Ceased
- 2016-04-26 US US15/757,902 patent/US10985300B2/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7939935B2 (en) * | 2006-05-22 | 2011-05-10 | Hitachi Cable Ltd. | Electronic device substrate, electronic device and methods for fabricating the same |
| CN101452862A (zh) * | 2007-11-28 | 2009-06-10 | 南茂科技股份有限公司 | 晶粒重新配置的堆栈封装方法及其堆栈结构 |
| CN101728466A (zh) * | 2008-10-29 | 2010-06-09 | 先进开发光电股份有限公司 | 高功率发光二极管陶瓷封装结构及其制造方法 |
| CN103794587A (zh) * | 2014-01-28 | 2014-05-14 | 江苏长电科技股份有限公司 | 一种高散热芯片嵌入式重布线封装结构及其制作方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105161436A (zh) | 2015-12-16 |
| US10985300B2 (en) | 2021-04-20 |
| US20180261743A1 (en) | 2018-09-13 |
| WO2017041491A1 (zh) | 2017-03-16 |
| JP6777742B2 (ja) | 2020-10-28 |
| JP2018529238A (ja) | 2018-10-04 |
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| C10 | Entry into substantive examination | ||
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| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20190109 Address after: 518023 No. 3039 Baoan North Road, Luohu District, Shenzhen City, Guangdong Province Patentee after: Ke Quan Address before: 518023 No. 3039 Baoan North Road, Luohu District, Shenzhen City, Guangdong Province Co-patentee before: Yi Futing Patentee before: Ke Quan Co-patentee before: Pan Ming |
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| TR01 | Transfer of patent right |