CN105091787A - 实时快速检测晶片基底二维形貌的装置 - Google Patents
实时快速检测晶片基底二维形貌的装置 Download PDFInfo
- Publication number
- CN105091787A CN105091787A CN201410189094.1A CN201410189094A CN105091787A CN 105091787 A CN105091787 A CN 105091787A CN 201410189094 A CN201410189094 A CN 201410189094A CN 105091787 A CN105091787 A CN 105091787A
- Authority
- CN
- China
- Prior art keywords
- wafer substrates
- laser
- light
- beam splitter
- dimensional appearance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 139
- 230000005540 biological transmission Effects 0.000 claims abstract description 22
- 239000004065 semiconductor Substances 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 14
- 239000013307 optical fiber Substances 0.000 claims description 12
- 238000002310 reflectometry Methods 0.000 claims description 9
- 239000000835 fiber Substances 0.000 claims description 8
- 238000009826 distribution Methods 0.000 claims description 4
- 238000005259 measurement Methods 0.000 claims description 2
- 230000003252 repetitive effect Effects 0.000 claims description 2
- 229910052594 sapphire Inorganic materials 0.000 abstract description 20
- 239000010980 sapphire Substances 0.000 abstract description 20
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 10
- 229910002804 graphite Inorganic materials 0.000 abstract description 10
- 239000010439 graphite Substances 0.000 abstract description 10
- 239000000463 material Substances 0.000 abstract description 2
- 238000009659 non-destructive testing Methods 0.000 abstract description 2
- 230000003044 adaptive effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 13
- 101001080825 Homo sapiens PH and SEC7 domain-containing protein 1 Proteins 0.000 description 10
- 102100027472 PH and SEC7 domain-containing protein 1 Human genes 0.000 description 10
- 238000001514 detection method Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 2
- 230000005693 optoelectronics Effects 0.000 description 2
- 230000011514 reflex Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000005477 standard model Effects 0.000 description 2
- 230000009897 systematic effect Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 241000931526 Acer campestre Species 0.000 description 1
- 230000005457 Black-body radiation Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000007323 disproportionation reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
Description
Claims (13)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410189094.1A CN105091787B (zh) | 2014-05-06 | 2014-05-06 | 实时快速检测晶片基底二维形貌的装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410189094.1A CN105091787B (zh) | 2014-05-06 | 2014-05-06 | 实时快速检测晶片基底二维形貌的装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN105091787A true CN105091787A (zh) | 2015-11-25 |
CN105091787B CN105091787B (zh) | 2018-01-16 |
Family
ID=54572749
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201410189094.1A Active CN105091787B (zh) | 2014-05-06 | 2014-05-06 | 实时快速检测晶片基底二维形貌的装置 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN105091787B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107063127A (zh) * | 2015-12-03 | 2017-08-18 | 欧姆龙株式会社 | 光学测量装置 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07234115A (ja) * | 1994-02-23 | 1995-09-05 | Nippon Steel Corp | 板材の反り量測定方法 |
US5523582A (en) * | 1992-04-30 | 1996-06-04 | Ann F. Koo | Method and apparatus for measuring the curvature of wafers with a laser source selecting device |
US5912738A (en) * | 1996-11-25 | 1999-06-15 | Sandia Corporation | Measurement of the curvature of a surface using parallel light beams |
US20080186512A1 (en) * | 2005-08-01 | 2008-08-07 | Bong Kee | Apparatus and Method for Measuring Curvature Using Multiple Beams |
CN101275825A (zh) * | 2008-01-11 | 2008-10-01 | 浙江工业大学 | Cmp过程中晶圆下液体薄膜中间变量的测量装置 |
CN101515558A (zh) * | 2006-03-30 | 2009-08-26 | 西安电子科技大学 | 在线检测薄膜生长率和应力的方法 |
CN101636696A (zh) * | 2007-02-06 | 2010-01-27 | 卡尔蔡司Smt股份公司 | 微光刻投射曝光设备的照明系统中多镜阵列的监测方法和设备 |
CN102077051A (zh) * | 2008-06-30 | 2011-05-25 | 株式会社Snu精密 | 厚度或表面形貌检测方法 |
-
2014
- 2014-05-06 CN CN201410189094.1A patent/CN105091787B/zh active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5523582A (en) * | 1992-04-30 | 1996-06-04 | Ann F. Koo | Method and apparatus for measuring the curvature of wafers with a laser source selecting device |
JPH07234115A (ja) * | 1994-02-23 | 1995-09-05 | Nippon Steel Corp | 板材の反り量測定方法 |
US5912738A (en) * | 1996-11-25 | 1999-06-15 | Sandia Corporation | Measurement of the curvature of a surface using parallel light beams |
US20080186512A1 (en) * | 2005-08-01 | 2008-08-07 | Bong Kee | Apparatus and Method for Measuring Curvature Using Multiple Beams |
CN101515558A (zh) * | 2006-03-30 | 2009-08-26 | 西安电子科技大学 | 在线检测薄膜生长率和应力的方法 |
CN101636696A (zh) * | 2007-02-06 | 2010-01-27 | 卡尔蔡司Smt股份公司 | 微光刻投射曝光设备的照明系统中多镜阵列的监测方法和设备 |
CN101275825A (zh) * | 2008-01-11 | 2008-10-01 | 浙江工业大学 | Cmp过程中晶圆下液体薄膜中间变量的测量装置 |
CN102077051A (zh) * | 2008-06-30 | 2011-05-25 | 株式会社Snu精密 | 厚度或表面形貌检测方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107063127A (zh) * | 2015-12-03 | 2017-08-18 | 欧姆龙株式会社 | 光学测量装置 |
CN107063127B (zh) * | 2015-12-03 | 2020-06-30 | 欧姆龙株式会社 | 光学测量装置 |
Also Published As
Publication number | Publication date |
---|---|
CN105091787B (zh) | 2018-01-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10145785B2 (en) | Optical element rotation type Mueller-matrix ellipsometer and method for measuring Mueller-matrix of sample using the same | |
CN208520336U (zh) | 激光基准桥梁多点挠度视觉检测装置 | |
CN111458696B (zh) | 手持式激光测距仪示值误差的校准方法 | |
US9360434B2 (en) | Optical inspection apparatus and method thereof | |
CN103512864A (zh) | 利用平行光测量衬底反射率和透射率的光学量测系统 | |
CN105091788B (zh) | 自动实时快速检测晶片基底二维形貌的装置 | |
CN105091777B (zh) | 实时快速检测晶片基底二维形貌的方法 | |
CN103985653B (zh) | 一种晶片应力测量方法 | |
CN102589455A (zh) | 基于激光和视觉技术的立木直径检测装置 | |
CN104807754B (zh) | 一种监测晶片生长薄膜特性的装置 | |
CN105091787B (zh) | 实时快速检测晶片基底二维形貌的装置 | |
CN105698845B (zh) | 一种单透镜型自动检测晶片基底二维形貌和温度的装置 | |
CN105627951B (zh) | 一种自动检测晶片基底二维形貌的装置 | |
CN105698698A (zh) | 一种单透镜型检测晶片基底二维形貌和温度的装置 | |
CN101975562A (zh) | 一种测量光波阵列面或光学反射面表面平坦度的方法 | |
CN109343075A (zh) | 用于分辨水下目标的激光偏振探测系统 | |
CN105698697B (zh) | 一种检测晶片基底二维形貌的装置 | |
CN108344712A (zh) | 一种材料折射率的测量装置及其测量方法 | |
CN103499814B (zh) | 一种高精度多普勒激光雷达频率锁定系统 | |
CN105698705B (zh) | 检测晶片基底二维形貌的装置 | |
CN205679527U (zh) | 一种随温度变化的材料反射率动态测量系统 | |
CN105698706B (zh) | 自动检测晶片基底二维形貌的装置 | |
CN105891157A (zh) | 固体材料逆向反射特性测量装置 | |
CN206515231U (zh) | 一种基于差分吸收技术的湿度测量装置 | |
CN207037107U (zh) | 一种原子干涉仪中基于微波回泵原子的探测系统 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
CB02 | Change of applicant information |
Address after: 102206 Beijing City, Changping District Changping Road No. 97 Xinyuan Science Park B building room 503 Applicant after: BEI OPTICS TECHNOLOGY Co.,Ltd. Address before: 100191, Beijing, Zhichun Road, Haidian District No. 27 quantum core 402 room Applicant before: BEI OPTICS TECHNOLOGY Co.,Ltd. |
|
CB03 | Change of inventor or designer information |
Inventor after: Liu Jianpeng Inventor after: Ma Tiezhong Inventor after: Wang Linzi Inventor after: Yan Dong Inventor before: Liu Jianpeng Inventor before: Zhang Tang Inventor before: Li Chengmin Inventor before: Wang Linzi Inventor before: Yan Dong |
|
COR | Change of bibliographic data | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20200414 Address after: 330096 floor 1, workshop 8, Zhongxing science and Technology Park, No. 688, aixihu North Road, Nanchang high tech Industrial Development Zone, Nanchang City, Jiangxi Province Patentee after: Nanchang angkun Semiconductor Equipment Co.,Ltd. Address before: 503, room 102206, B, Xinyuan Science Park, 97 Changping Road, Beijing, Changping District Patentee before: BEI OPTICS TECHNOLOGY Co.,Ltd. |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20230621 Address after: B701, Building 8, No. 97, Changping Road, Shahe Town, Changping District, Beijing 102200 (Changping Demonstration Park) Patentee after: Beijing Airui Haotai Information Technology Co.,Ltd. Address before: 330096 1st floor, No.8 workshop, Zhongxing Science Park, no.688 aixihu North Road, Nanchang hi tech Industrial Development Zone, Nanchang City, Jiangxi Province Patentee before: Nanchang angkun Semiconductor Equipment Co.,Ltd. |
|
TR01 | Transfer of patent right |