CN105698706B - 自动检测晶片基底二维形貌的装置 - Google Patents
自动检测晶片基底二维形貌的装置 Download PDFInfo
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CN109916338B (zh) * | 2019-02-28 | 2020-06-23 | 同济大学 | 晶片表面倾角变化精密测量系统 |
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CN101029849A (zh) * | 2007-04-03 | 2007-09-05 | 中国科学院上海光学精密机械研究所 | 薄膜应力测量装置及其测量方法 |
CN102023068A (zh) * | 2010-10-10 | 2011-04-20 | 徐建康 | 薄膜应力测量设备及其测量方法 |
CN103985653A (zh) * | 2013-02-07 | 2014-08-13 | 北京智朗芯光科技有限公司 | 一种晶片应力测量方法 |
CN103985652A (zh) * | 2013-02-07 | 2014-08-13 | 北京智朗芯光科技有限公司 | 一种晶片应力测量装置及测量方法 |
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JPS5879104A (ja) * | 1981-11-06 | 1983-05-12 | Hitachi Ltd | パタ−ン比較検査装置 |
JPH06347230A (ja) * | 1993-06-14 | 1994-12-20 | Hitachi Ltd | 形状測定方法および装置 |
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CN101029849A (zh) * | 2007-04-03 | 2007-09-05 | 中国科学院上海光学精密机械研究所 | 薄膜应力测量装置及其测量方法 |
CN102023068A (zh) * | 2010-10-10 | 2011-04-20 | 徐建康 | 薄膜应力测量设备及其测量方法 |
CN103985653A (zh) * | 2013-02-07 | 2014-08-13 | 北京智朗芯光科技有限公司 | 一种晶片应力测量方法 |
CN103985652A (zh) * | 2013-02-07 | 2014-08-13 | 北京智朗芯光科技有限公司 | 一种晶片应力测量装置及测量方法 |
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