CN104749885A - 感光性树脂组合物、感光性元件、喷砂用掩模材料及被处理物的表面加工方法 - Google Patents

感光性树脂组合物、感光性元件、喷砂用掩模材料及被处理物的表面加工方法 Download PDF

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Publication number
CN104749885A
CN104749885A CN201410814596.9A CN201410814596A CN104749885A CN 104749885 A CN104749885 A CN 104749885A CN 201410814596 A CN201410814596 A CN 201410814596A CN 104749885 A CN104749885 A CN 104749885A
Authority
CN
China
Prior art keywords
polymer combination
photosensitive polymer
methyl
combination according
photographic layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201410814596.9A
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English (en)
Chinese (zh)
Inventor
小泽恭子
吉田哲也
板垣秀一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Publication of CN104749885A publication Critical patent/CN104749885A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/04—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for treating only selected parts of a surface, e.g. for carving stone or glass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
CN201410814596.9A 2013-12-25 2014-12-24 感光性树脂组合物、感光性元件、喷砂用掩模材料及被处理物的表面加工方法 Pending CN104749885A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013266899 2013-12-25
JP2013-266899 2013-12-25

Publications (1)

Publication Number Publication Date
CN104749885A true CN104749885A (zh) 2015-07-01

Family

ID=53589791

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410814596.9A Pending CN104749885A (zh) 2013-12-25 2014-12-24 感光性树脂组合物、感光性元件、喷砂用掩模材料及被处理物的表面加工方法

Country Status (4)

Country Link
JP (1) JP2015143834A (ko)
KR (1) KR20150075375A (ko)
CN (1) CN104749885A (ko)
TW (1) TW201527885A (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113199404A (zh) * 2020-01-30 2021-08-03 新东工业株式会社 喷砂加工装置以及喷砂加工方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016104639A1 (ja) * 2014-12-26 2016-06-30 日立化成株式会社 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP2018084591A (ja) * 2015-03-23 2018-05-31 日立化成株式会社 感光性樹脂組成物、感光性エレメント、サンドブラスト用マスク材、及び被処理体の表面加工方法
JP6690367B2 (ja) * 2016-03-31 2020-04-28 日立化成株式会社 感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品
JP6926398B2 (ja) * 2016-03-31 2021-08-25 昭和電工マテリアルズ株式会社 感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品
JP7113779B2 (ja) * 2019-03-28 2022-08-05 株式会社ノリタケカンパニーリミテド 感光性組成物とその利用

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113199404A (zh) * 2020-01-30 2021-08-03 新东工业株式会社 喷砂加工装置以及喷砂加工方法

Also Published As

Publication number Publication date
KR20150075375A (ko) 2015-07-03
TW201527885A (zh) 2015-07-16
JP2015143834A (ja) 2015-08-06

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