CN104684957A - 液态环氧树脂组合物 - Google Patents
液态环氧树脂组合物 Download PDFInfo
- Publication number
- CN104684957A CN104684957A CN201380051978.4A CN201380051978A CN104684957A CN 104684957 A CN104684957 A CN 104684957A CN 201380051978 A CN201380051978 A CN 201380051978A CN 104684957 A CN104684957 A CN 104684957A
- Authority
- CN
- China
- Prior art keywords
- epoxy resin
- composition
- mass parts
- resin composition
- liquid epoxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 89
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 title claims abstract description 24
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 26
- -1 amine compound Chemical class 0.000 claims abstract description 18
- 239000004593 Epoxy Substances 0.000 claims abstract description 11
- 239000005011 phenolic resin Substances 0.000 claims abstract description 7
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229920001568 phenolic resin Polymers 0.000 claims abstract description 6
- 239000003822 epoxy resin Substances 0.000 claims description 38
- 229920000647 polyepoxide Polymers 0.000 claims description 38
- 239000012764 mineral filler Substances 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 claims description 9
- 238000005538 encapsulation Methods 0.000 claims description 7
- 150000004693 imidazolium salts Chemical class 0.000 claims description 6
- NHDIQVFFNDKAQU-UHFFFAOYSA-N tripropan-2-yl borate Chemical compound CC(C)OB(OC(C)C)OC(C)C NHDIQVFFNDKAQU-UHFFFAOYSA-N 0.000 abstract description 2
- 239000011256 inorganic filler Substances 0.000 abstract 2
- 229910003475 inorganic filler Inorganic materials 0.000 abstract 2
- 229920005989 resin Polymers 0.000 description 48
- 239000011347 resin Substances 0.000 description 48
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 30
- 239000007788 liquid Substances 0.000 description 17
- 238000002347 injection Methods 0.000 description 15
- 239000007924 injection Substances 0.000 description 15
- 239000000377 silicon dioxide Substances 0.000 description 15
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 13
- 239000000945 filler Substances 0.000 description 11
- 238000007711 solidification Methods 0.000 description 11
- 230000008023 solidification Effects 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- 238000011156 evaluation Methods 0.000 description 10
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 9
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 8
- 238000012360 testing method Methods 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 230000008719 thickening Effects 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229920003986 novolac Polymers 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- 239000011324 bead Substances 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 230000001788 irregular Effects 0.000 description 4
- 229960001866 silicon dioxide Drugs 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 3
- QCBSYPYHCJMQGB-UHFFFAOYSA-N 2-ethyl-1,3,5-triazine Chemical compound CCC1=NC=NC=N1 QCBSYPYHCJMQGB-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 3
- 229940015043 glyoxal Drugs 0.000 description 3
- 150000002460 imidazoles Chemical class 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 238000004321 preservation Methods 0.000 description 3
- 238000004445 quantitative analysis Methods 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 230000035882 stress Effects 0.000 description 3
- LTQBNYCMVZQRSD-UHFFFAOYSA-N (4-ethenylphenyl)-trimethoxysilane Chemical compound CO[Si](OC)(OC)C1=CC=C(C=C)C=C1 LTQBNYCMVZQRSD-UHFFFAOYSA-N 0.000 description 2
- RBACIKXCRWGCBB-UHFFFAOYSA-N 1,2-Epoxybutane Chemical group CCC1CO1 RBACIKXCRWGCBB-UHFFFAOYSA-N 0.000 description 2
- YSUQLAYJZDEMOT-UHFFFAOYSA-N 2-(butoxymethyl)oxirane Chemical compound CCCCOCC1CO1 YSUQLAYJZDEMOT-UHFFFAOYSA-N 0.000 description 2
- JPEGUDKOYOIOOP-UHFFFAOYSA-N 2-(hexoxymethyl)oxirane Chemical compound CCCCCCOCC1CO1 JPEGUDKOYOIOOP-UHFFFAOYSA-N 0.000 description 2
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical compound OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- 241000675108 Citrus tangerina Species 0.000 description 2
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical compound C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 description 2
- AWMVMTVKBNGEAK-UHFFFAOYSA-N Styrene oxide Chemical compound C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 description 2
- 239000006230 acetylene black Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- RGIBXDHONMXTLI-UHFFFAOYSA-N chavicol Chemical compound OC1=CC=C(CC=C)C=C1 RGIBXDHONMXTLI-UHFFFAOYSA-N 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- 238000002296 dynamic light scattering Methods 0.000 description 2
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 230000008642 heat stress Effects 0.000 description 2
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 description 2
- MTNDZQHUAFNZQY-UHFFFAOYSA-N imidazoline Chemical compound C1CN=CN1 MTNDZQHUAFNZQY-UHFFFAOYSA-N 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000003014 phosphoric acid esters Chemical class 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 230000037303 wrinkles Effects 0.000 description 2
- HRJBMMYXSCKJDY-UHFFFAOYSA-N (5-methyl-2-phenyl-1H-imidazol-4-yl)methanol Chemical compound C1(=CC=CC=C1)C=1NC(=C(N1)C)CO.C1(=CC=CC=C1)C=1NC(=C(N1)C)CO HRJBMMYXSCKJDY-UHFFFAOYSA-N 0.000 description 1
- YQMXOIAIYXXXEE-UHFFFAOYSA-N 1-benzylpyrrolidin-3-ol Chemical compound C1C(O)CCN1CC1=CC=CC=C1 YQMXOIAIYXXXEE-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- RUFZNDNBXKOZQV-UHFFFAOYSA-N 2,3-dihydro-1h-pyrrolo[1,2-a]benzimidazole Chemical compound C1=CC=C2N(CCC3)C3=NC2=C1 RUFZNDNBXKOZQV-UHFFFAOYSA-N 0.000 description 1
- QIRNGVVZBINFMX-UHFFFAOYSA-N 2-allylphenol Chemical compound OC1=CC=CC=C1CC=C QIRNGVVZBINFMX-UHFFFAOYSA-N 0.000 description 1
- WHNBDXQTMPYBAT-UHFFFAOYSA-N 2-butyloxirane Chemical compound CCCCC1CO1 WHNBDXQTMPYBAT-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- LCXFHGRFFYYUSF-UHFFFAOYSA-N 2-ethyl-5-methyl-1H-imidazole Chemical compound C(C)C=1NC=C(N1)C.C(C)C=1NC=C(N1)C LCXFHGRFFYYUSF-UHFFFAOYSA-N 0.000 description 1
- KXRDLLZZOQGICO-UHFFFAOYSA-N 2-heptadecyl-1H-imidazole Chemical compound C(CCCCCCCCCCCCCCCC)C=1NC=CN1.C(CCCCCCCCCCCCCCCC)C=1NC=CN1 KXRDLLZZOQGICO-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- WHNQFLAEAOWDTD-UHFFFAOYSA-N 2-methylaniline Chemical compound CC1=CC=CC=C1N.CC1=CC=CC=C1N WHNQFLAEAOWDTD-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- FLBUMFXTSUZXHH-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1.C1=CNC(C=2C=CC=CC=2)=N1 FLBUMFXTSUZXHH-UHFFFAOYSA-N 0.000 description 1
- FUOZJYASZOSONT-UHFFFAOYSA-N 2-propan-2-yl-1h-imidazole Chemical compound CC(C)C1=NC=CN1 FUOZJYASZOSONT-UHFFFAOYSA-N 0.000 description 1
- KFJDQPJLANOOOB-UHFFFAOYSA-N 2h-benzotriazole-4-carboxylic acid Chemical compound OC(=O)C1=CC=CC2=NNN=C12 KFJDQPJLANOOOB-UHFFFAOYSA-N 0.000 description 1
- XGHCIDJACVCMQZ-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O.CCO[Si](OCC)(OCC)CCCNC(N)=O XGHCIDJACVCMQZ-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- KRUWQUUDUHZGRG-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound C(C=C)(=O)OCCC[Si](OC)(OC)OC.C(C=C)(=O)OCCC[Si](OC)(OC)OC KRUWQUUDUHZGRG-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- DLYLVPHSKJVGLG-UHFFFAOYSA-N 4-(cyclohexylmethyl)cyclohexane-1,1-diamine Chemical compound C1CC(N)(N)CCC1CC1CCCCC1 DLYLVPHSKJVGLG-UHFFFAOYSA-N 0.000 description 1
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 description 1
- SCRXNTYBUKOKOE-UHFFFAOYSA-N C(C)C=1NCCN1.N1=CC=CC2=CC=CC=C12 Chemical compound C(C)C=1NCCN1.N1=CC=CC2=CC=CC=C12 SCRXNTYBUKOKOE-UHFFFAOYSA-N 0.000 description 1
- HEMFDIYZZSJVLN-UHFFFAOYSA-N C(CCCCCCCCCC)C=1NC=CN1.C(CCCCCCCCCC)C=1NC=CN1 Chemical compound C(CCCCCCCCCC)C=1NC=CN1.C(CCCCCCCCCC)C=1NC=CN1 HEMFDIYZZSJVLN-UHFFFAOYSA-N 0.000 description 1
- NGNZNAVRMPRYKG-UHFFFAOYSA-N C1(=CC=CC=C1)C=1NC(=C(N1)CO)CO.C1(=CC=CC=C1)C=1NC(=C(N1)CO)CO Chemical compound C1(=CC=CC=C1)C=1NC(=C(N1)CO)CO.C1(=CC=CC=C1)C=1NC(=C(N1)CO)CO NGNZNAVRMPRYKG-UHFFFAOYSA-N 0.000 description 1
- NRANSBXJMSKTTC-UHFFFAOYSA-N C1(=CC=CC=C1)C=1NC=C(N1)C.C1(=CC=CC=C1)C=1NC=C(N1)C Chemical compound C1(=CC=CC=C1)C=1NC=C(N1)C.C1(=CC=CC=C1)C=1NC=C(N1)C NRANSBXJMSKTTC-UHFFFAOYSA-N 0.000 description 1
- XZYSFTAQNKBPKR-UHFFFAOYSA-N CO[SiH](OC)OC.CO[Si](CCCS)(OC)OC Chemical compound CO[SiH](OC)OC.CO[Si](CCCS)(OC)OC XZYSFTAQNKBPKR-UHFFFAOYSA-N 0.000 description 1
- IAZKGRRJAULWNS-UHFFFAOYSA-N Chavicol Natural products OC1=CC=C(CCC=C)C=C1 IAZKGRRJAULWNS-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 description 1
- NELQEHVHPJKZSS-UHFFFAOYSA-N O1CC1CCCCCC.O1CC1CCCCCC Chemical compound O1CC1CCCCCC.O1CC1CCCCCC NELQEHVHPJKZSS-UHFFFAOYSA-N 0.000 description 1
- UBINTMJXOAFSPD-UHFFFAOYSA-N OCCNCCCN.OCCNNCCC Chemical compound OCCNCCCN.OCCNNCCC UBINTMJXOAFSPD-UHFFFAOYSA-N 0.000 description 1
- YFQPJCUYATWTLO-UHFFFAOYSA-N [4-(oxiran-2-ylmethoxymethyl)cyclohexyl]methanol Chemical compound C1CC(CO)CCC1COCC1OC1 YFQPJCUYATWTLO-UHFFFAOYSA-N 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 239000011353 cycloaliphatic epoxy resin Substances 0.000 description 1
- 239000013530 defoamer Substances 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 150000002220 fluorenes Chemical class 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- VOOLKNUJNPZAHE-UHFFFAOYSA-N formaldehyde;2-methylphenol Chemical compound O=C.CC1=CC=CC=C1O VOOLKNUJNPZAHE-UHFFFAOYSA-N 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 239000003273 ketjen black Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000005543 nano-size silicon particle Substances 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- JKXONPYJVWEAEL-UHFFFAOYSA-N oxiran-2-ylmethyl acetate Chemical compound CC(=O)OCC1CO1 JKXONPYJVWEAEL-UHFFFAOYSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000003921 particle size analysis Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- BJQWBACJIAKDTJ-UHFFFAOYSA-N tetrabutylphosphanium Chemical compound CCCC[P+](CCCC)(CCCC)CCCC BJQWBACJIAKDTJ-UHFFFAOYSA-N 0.000 description 1
- 238000005382 thermal cycling Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- NELNNGOFUZQQGL-UHFFFAOYSA-N triethoxy-[1-(1-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)C(CC)SSSSC(CC)[Si](OCC)(OCC)OCC NELNNGOFUZQQGL-UHFFFAOYSA-N 0.000 description 1
- LIZNFGPUESNNEN-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane trimethoxysilane Chemical compound CO[SiH](OC)OC.CO[Si](CCCOCC1CO1)(OC)OC LIZNFGPUESNNEN-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
- H01L23/295—Organic, e.g. plastic containing a filler
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/182—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing using pre-adducts of epoxy compounds with curing agents
-
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Abstract
目的在于提供一种液态环氧树脂组合物,其即便含有无机填料,环氧树脂组合物的流动性也良好,而且通过保存中的增粘抑制而使得适用期长。液态环氧树脂组合物特征在于,含有(A)液态环氧树脂、(B)胺化合物的环氧加合物固化剂、(C)无机填料、(D)硼酸三异丙酯和(E)苯酚树脂;相对液态环氧树脂组合物100质量份,(C)成分为20~65质量份,(D)成分为0.02~0.15质量份,(E)成分为0.3~15.0。
Description
技术领域
本发明涉及液态环氧树脂组合物,尤其是涉及以流动性优异且低线膨胀系数为特征的可当作底部填充胶(under fill material)或电子元件用粘接剂使用的液态环氧树脂组合物。
背景技术
近年来,作为能够应对电子机器进一步的布线等的高密度化、高频化的半导体芯片封装方式,倒装芯片键合(flip chip bonding)得到利用。倒装芯片封装中,因为是将半导体芯片和基板直接连接,有可能因由硅芯片与基板的线膨胀系数之差异引起的应力,而造成在连接部产生裂纹(crack),成为联接可靠性不良的原因。作为解决措施,有采用将称作底部填充胶(underfill material)的液态封装材料充填于半导体芯片与布线基板之间的技术的。通过使用底部填充胶,能提高针对热循环(heat cycle)等热的应力的联接可靠性、和针对冲击或弯曲等物理应力的联接可靠性。
在此,硅芯片的线膨胀系数为4ppm/℃,基板、譬如玻璃环氧树脂基板的线膨胀系数为20ppm/℃。底部填充胶,一般,为吸收其线膨胀系数之差,混合无机填料,而作为无机填料,通常使用二氧化硅填料。
另外,底部填充胶,作为可低温固化的树脂,使用环氧树脂-咪唑固化系,但是出于降低上述底部填充胶线膨胀系数之目的而往该树脂系添加二氧化硅填料时,会出现底部填充胶流动性劣化的问题。作为该流动性劣化的原因,被认为是底部填充胶中的树脂成分和二氧化硅填料的分散状态不均。
出于对添加该二氧化硅填料时底部填充胶流动性劣化加以改善之目的,有人报告过含有磷酸酯的封装用环氧树脂组合物(专利文献1、专利文献2)。
已有技术文献
专利文献
专利文献1:特开2003-289123号公报
专利文献2:特开2011-246545号公报
发明内容
技术问题
然而,当让环氧树脂组合物含有磷酸酯时,却会出现环氧树脂组合物保存中的粘度上升变大、适用期(pot life)变短这一问题。关于该二氧化硅填料添加后环氧树脂组合物的适用期的问题,在作为底部填充胶用途以外的光半导体等电子元件用粘接剂使用时也构成问题。
本发明目的就在于提供一种液态环氧树脂组合物,其即便含有无机填料,环氧树脂组合物的流动性也良好,而且通过保存中的增粘抑制而使得适用期长。
技术方案
本发明涉及通过具有以下构成而解决了上述问题的液态环氧树脂组合物。
〔1〕一种液态环氧树脂组合物,其特征在于,含有(A)液态环氧树脂、(B)胺化合物的环氧加合物固化剂或微胶囊化咪唑(microcapsulation imidazole)化合物固化剂、(C)无机填料、(D)硼酸三异丙酯(boric acid triisopropyl)和(E)苯酚树脂(phenol resin);相对液态环氧树脂组合物100质量份,(C)成分为20~65质量份,(D)成分为0.02~0.30质量份,(E)成分为0.3~15.0。
〔2〕一种底部填充胶,其中,含有上述〔1〕所述的液态环氧树脂组合物。
〔3〕一种粘接剂,其中,含有上述〔1〕所述的液态环氧树脂组合物。
〔4〕一种半导体装置,其中,含有上述〔2〕所述的底部填充胶的固化物。
〔5〕一种半导体装置,其中,含有上述〔3〕所述的粘接剂的固化物。
发明的效果
根据本发明〔1〕,能够提供一种液态环氧树脂组合物,其即便含有无机填料,流动性也良好,而且通过保存中的增粘抑制而使得适用期长。
根据本发明〔4〕和〔5〕,藉含有无机填料的固化后的环氧树脂组合物的适度热膨胀系数,能获得高可靠性半导体装置。
附图说明
图1是说明液态环氧树脂组合物注入性评价方法的模式图。
具体实施方式
本发明液态环氧树脂组合物(以下称树脂组合物)特征在于,含有(A)液态环氧树脂、(B)胺化合物的环氧加合物固化剂或微胶囊化咪唑化合物固化剂、(C)无机填料、(D)硼酸三异丙酯和(E)苯酚树脂;相对液态环氧树脂组合物100质量份,(C)成分为20~65质量份,(D)成分为0.02~0.15质量份,(E)成分为0.3~15.0。
(A)成分给树脂组合物赋予粘接性、固化性,给固化后树脂组合物赋予耐久性、耐热性。作为(A)成分,可例举出:液态双酚A型环氧树脂(bisphenol A type epoxy resin)、液态双酚F型环氧树脂(bisphenol F type epoxy resin)、液态萘型环氧树脂(naphthalene typeepoxy resin)、液态氨基苯酚型环氧树脂(aminophenol type epoxy resin)、液态氢化双酚型环氧树脂(hydrogenated bisphenol type epoxy resin)、液态脂环族环氧树脂、液态醇醚型环氧树脂(alcohol ether type epoxy resin)、液态环状脂肪族型环氧树脂、液态芴型环氧树脂(fluorene type epoxy resin)、液态硅氧烷系环氧树脂(siloxane system epoxy resin)等,但从粘接性、固化性、耐久性、耐热性的观点,优选液态双酚A型环氧树脂、液态双酚F型环氧树脂、液态萘型环氧树脂。另外,从粘度调整的观点,环氧当量优选为80~250g/eq。作为市售品,可例举出:新日铁化学制双酚F型环氧树脂(产品名:YDF8170)、DIC公司制双酚A型环氧树脂(产品名:EXA-850CRP)、新日铁化学制双酚F型环氧树脂(产品名:YDF870GS)、DIC公司制萘型环氧树脂(产品名:HP4032D)、三菱化学制氨基苯酚型环氧树脂(等级:JER630、JER630LSD)、Momentive Performance公司制硅氧烷系环氧树脂(产品名:TSL9906)、新日铁化学株式会社制1,4-环己烷二甲醇缩水甘油醚(1,4-cyclohexanedimethanol diglycidyl ether)(产品名:ZX1658GS)等。(A)成分既可单独使用也可并用2种以上。
(B)成分使得80~100℃左右的低温下固化成为可能。(B)成分的胺化合物的环氧加合物是通过胺化合物与环氧树脂反应而合成的具有氨基的化合物。
作为胺化合物,并无特别限定,只要是分子内具有1个以上能与环氧基加成反应的活性氢即可。作为胺化合物,可例举出:二亚乙基三胺(diethylenetriamine)、三亚乙基四胺(triethylenetetramine)、正丙胺(n-propylamine)、2-羟乙基氨基丙胺(2-hydroxyethylamino propylamine)、环己胺(cyclohexylamine)、4,4’-二氨基二环己基甲烷(4,4’-diaminodicyclohexylmethane)等脂肪族胺化合物;4.4’-二氨基二苯甲烷(4,4’-diaminodiphenylmethane)、2-甲基苯胺(2-methyl aniline)等芳香族胺化合物;咪唑(imidazole)、2-甲基咪唑(2-methylimidazole)、2-乙基咪唑(2-ethylimidazole)、2-异丙基咪唑(2-isopropylimidazole)等咪唑化合物;咪唑啉(imidazoline)、2-甲基咪唑啉(2-methylimidazoline)、2-乙基咪唑啉(2-ethylimidazoline)等咪唑啉化合物等。
作为环氧化合物,可例举出:1,2-环氧丁烷(1,2-epoxybutane)、1,2-环氧己烷(1,2-epoxyhexan)、1,2-环氧辛烷(1,2-epoxyoctane)、环氧苯乙烷(styrene oxide)、正丁基缩水甘油醚(n-butyl glycidyl ether)、正己基缩水甘油醚(hexylglycidyl ether)、苯基缩水甘油醚(phenylglycidylether)、乙酸缩水甘油酯(glycidylacetate)等。
作为(B)成分的微胶囊化咪唑化合物固化剂,从保存稳定性的观点,优选被以聚氨酯树脂等微胶囊化的咪唑化合物固化促进剂;而从操作性、固化速度、保存稳定性的角度,则优选分散于液态双酚A型等液态环氧树脂中的、被母体胶料化的微胶囊化咪唑化合物固化促进剂。作为咪唑固化剂,能例举出:2-甲基咪唑、2-十一烷基咪唑(2-undecylimidazole)、2-十七烷基咪唑(2-heptadecylimidazole)、2-乙基-4-甲基咪唑(2-ethyl-4-methylimidazol)、2-苯基咪唑(2-phenylimidazole)、2-苯基-4-甲基咪唑(2-phenyl-4-methylimidazol)、2,4-二氨基-6-[2’-甲基咪唑基-(1’)]乙基-s-三嗪(2,4-diamino-6-[2’-methylimidazolyl-(1’)]-ethyl-s-triazine)、4,5-二羟甲基-2-苯基咪唑(2-phenyl-4,5-dihydroxymethylimidazole)、2-苯基-4-甲基-5-羟基甲基咪唑(2-phenyl-4-methyl-5-hydroxymethylimidazole)、2,3-二氢-1H-吡咯并[1,2-a]笨并咪唑(2,3-dihydro-1H-pyrrolo[1,2-a]benzimidazole)等,但从固化速度、操作性、耐湿性的观点,优选2,4-二氨基-6-[2’-甲基咪唑基-(1’)]乙基-s-三嗪、2,4-二氨基-6-[2’-十一烷基咪唑基-(1)乙基]-s-三嗪(2,4-diamino-6-(2’-undecylimidazolyl-(1’))ethyl-s-triazine)、2,4-二氨基-6-[2’-乙基-4’-甲基咪唑基-(1’)]乙基-s-三嗪(2,4-diamino-6-[2’-ethyl-4’-methylimidazolyl-(1’)]-ethyl-s-triazine])等。
作为(B)成分的市售品,可例举出:味之素精细科技(Ajinomoto Fine-Techno Co.,Inc.)制胺加成物系潜在性固化剂(产品名:AJICURE PN-23、AJICURE PN-40)、T&KTOKA制潜在性固化剂(产品名:FUJICURE FX-1000)、旭化成电子材料(Asahi KaseiE-materials Corporation.)制微胶囊化咪唑化合物潜在性固化剂(产品名:NOVACUREHX3941HP、NOVACURE HX3088、NOVACURE HX3722)。(B)成分既可单独使用也可并用2种以上。
通过(C)成分,能够控制树脂组合物的线膨胀系数。作为(C)成分,可例举出:硅溶胶(colloidal silica)、疏水性二氧化硅、微細二氧化硅、纳米二氧化硅(Nano-silica)等二氧化硅填料、丙烯酸珠(acrylic beads)、玻璃珠(glass beads)、聚氨酯珠(urethane beads)、膨润土(bentonite)、乙炔黑(acetylene black)、科琴碳黑(KETJENBLACK)等。另外,(C)成分的平均粒径(非粒状时指其平均最大径),并无特别限定,但在使得充填剂均匀地分散于树脂组合物中基础上,优选为0.01~50μm,还有,从将树脂组合物作底部填充胶使用时注入性优异等理由来讲也如此优选。若不满0.01μm,有可能会造成树脂组合物粘度上升、作底部填充胶使用时注入性恶化。而若超过50μm,则有可能会造成树脂组合物中充填剂均匀分散变得困难。另外,从保护铜制线不受固化后树脂组合物的热应激(heat stress)影响的观点,更优选(C)成分的平均粒径为0.6~10μm。作为市售品,可例举出:ADMATECHS公司制高纯度合成球状二氧化硅(产品名:SO-E5、平均粒径:2μm;产品名:SE-2300、平均粒径:0.6μm)、龙森制二氧化硅(产品名:FB7SDX、平均粒径:10μm)、MICRON公司制二氧化硅(产品名:TS-10-034P、平均粒径:20μm)等。这里,通过动态光散射纳米粒度分析仪(nano track particle sizeanalyzer of dynamic light scattering)来测定充填剂的平均粒径。(C)成分既可单独使用也可并用2种以上。
(D)成分是以化学式(1)表示的硼酸三异丙酯。
(D)成分能够提高树脂组合物中的树脂成分和二氧化硅填料的润湿性,改善树脂成分和二氧化硅填料的分散状态,而且能够抑制液态环氧树脂组合物保存中増粘,延长适用期。(D)成分譬如使用和光纯药工业市售的试剂即可。
(E)成分抑制环氧树脂组合物保存中増粘。当作(E)成分使用的苯酚树脂,通过在树脂组合物中含有特定量而起固化延迟剂的作用。作为苯酚树脂,可例举出:苯酚酚醛(phenol novolac)、邻甲酚醛(cresol novolac)、烯丙基苯酚(allylphenol)等。但优选苯酚酚醛,因为其20℃下为液态。作为市售品可例举出明和化成制苯酚酚醛(产品名:MEH8005)。
(B)成分,从良好的反应性、可靠性的观点,优选其相对树脂组合物100质量份为5~35质量份,更优选为7~30质量份。
(C)成分,相对于树脂组合物100质量份,含有20~65质量份,优选30~60质量份,更优选30~40质量份。当为30~40质量份时,能使得线膨胀系数降低且避免注入性恶化。
另外,(C)成分,相对于树脂组合物的固化物100质量份,含有20~65质量份,优选30~60质量份,更优选30~40质量份。这里,因为树脂组合物固化时质量减少不大,仅约1~2质量%,所以在固化物中的优选的(C)成分含量和在树脂组合物中的含量一样。这里,(C)成分的定量分析用质量分析法做。
(D)成分,相对于树脂组合物100质量份,为0.02~0.30质量份,优选0.02~0.15质量份,更优选0.02~0.06质量份。当为0.02质量份以上时注入性良好,而当为0.30质量份以下时则固化后树脂组合物的强度充分。
另外,(D)成分,相对于树脂组合物的固化物100质量份,为0.02~0.30质量份,优选0.02~0.15质量份,更优选0.02~0.06质量份。这里,(D)成分的定量分析用质量分析法做。
(E)成分,相对于相对于树脂组合物100质量份,优选为0.3~15.0质量份。(E)成分不满0.3质量份时,固化后树脂组合物出现颜色不均等外观不良;而若超过15质量份时,则固化性降低、在要求时间固化不充分,故固化后树脂组合物强度降低。
另外,(E)成分,相对于树脂组合物的固化物100质量份,优选为0.3~15.0质量份。这里,(E)成分的定量分析用质量分析法做。
从密接性的观点,优选树脂组合物还含有作为(F)成分的偶联剂。作为(F)成分,可例举出:3-缩水甘油醚氧基丙基三甲氧基硅烷(3-glycidoxypropyltrimethoxysilane)、3-氨基丙基三甲氧基硅烷(3-aminopropyltrimethoxysilane)、乙烯基三甲氧基硅烷(vinyltrimethoxysilane)、p-苯乙烯基三甲氧基硅烷(p-styryltrimethoxysilane)、3-甲基丙烯酰氧基丙基甲基三甲氧基硅烷(3-methacryloxypropylmethyltrimethoxysilane)、3-丙烯酰氧基丙基三甲氧基硅烷(3-acryloxypropyltrimethoxysilane)、3-脲基丙基三乙氧基硅烷(3-ureidopropyltriethoxysilane)、3-巯基丙基三甲氧基硅烷(3-mercaptopropyltrimethoxysilane)、双(三乙氧基硅基丙基)四硫化物(bis(triethoxysilylpropyl)tetrasulfide)、3-异氰酸酯基丙基三乙氧基硅烷(3-isocyanatepropyltriethoxysilane)等,但从密接性的观点,优选3-缩水甘油醚氧基丙基三甲氧基硅烷、3-氨基丙基三甲氧基硅烷。作为市售品可例举出信越化学工业制KBM403、KBE903、KBE9103等。(F)成分既可单独使用也可并用2种以上。
(F)成分,相对于树脂组合物100质量份,优选含有0.05~15质量份,更优选0.1~10质量份。当为0.05质量份以上时密接性提高,而当为15质量份以下时则树脂组合物的发泡被抑制。
本发明树脂组合物,还能根据需要,在不有损于本发明目的的范围,混配流平剂(leveling agent)、着色剂、离子捕捉剂(ion trapping agent)、消泡剂、耐燃剂以及其它添加剂等。
本发明树脂组合物譬如能这样得到:对(A)成分~(E)成分以及其它添加剂等,一边根据需要进行加热处理,一边同时或分别地进行搅拌、熔融、混合、分散。作为进行这些混合、搅拌、分散等的装置,并无特别限定,能使用具备搅拌和加热装置的捣碎机、三辊轧机、球磨机(ball mill)、行星式搅拌机(planetary mixer)、珠磨机(beadsmill)等。另外,也可将这些装置适当组合使用。
本发明树脂组合物,从注入性的观点,优选其温度25℃下的粘度为1000~80000mPa·s。这里,粘度用东机产业公司制E型粘度计(型号:TVE-22H)测定。
本发明树脂组合物,通过点胶机(dispenser)、印刷等形成和涂布于基板或光半导体等电子元件的所期望位置。这里,树脂组合物作底部填充胶使用时,形成于柔性线路板(Flexible Printed Circuits)等基板与半导体器件之间,并使至少一部分接在基板的布线上。
本发明树脂组合物的固化,优选80~300℃,另外,从提高生产性的观点,还优选在200秒以内使之固化。
本发明树脂组合物适于作底部填充胶或光半导体等电子元件用粘接剂。另外,含有底部填充胶固化物或粘接剂固化物的半导体装置,由于无机填料均匀分散,所以可靠性高。
实施例
根据实施例描述本发明,但本发明并非受此限制。另外,以下实施例中,只要没有特别说明,份、%均表示质量份、质量%。
〔实施例1~17、比较例1~20〕
按表1~表4所示配比制作了树脂组合物。制作出的树脂组合物均为液态。
〔粘度评价〕
对刚制作出的树脂组合物的粘度(以下称初始粘度。单位:mPa·s),用东机产业公司制E型粘度计(型号:TVE-22H)以每分10转的条件进行了测定。初始粘度优选为1000~80000mPa·s,更优选为1000~8000mPa·s。另外,也对树脂组合物25℃下保持48小时后的粘度作了同样测定,求出了粘度増加率(单位:%)。这里,粘度増加率用下式求出。测定结果在表1~表4给出。
粘度増加率=〔(48小时后粘度)-(初始粘度)〕/(初始粘度)×100
〔触变指数(thixotropy factor)评价〕
用东机产业公司制E型粘度计(型号:TVE-22H)测定了树脂组合物的触变指数。触变指数,是从以每分1转的条件求出的测定值除以以每分10转的条件求出的测定值所得到的比率、即(每分1转下的粘度)/(每分10转下的粘度)求出的。触变指数的合适范围是0.8~1.0。测定结果在表1~表4给出。
〔树脂组合物注入性评价〕
图1给出说明树脂组合物注入性评价方法的模式图。首先,如图1(A)所示,在基板20上设置50μm的沟(gap)40,将代替半导体器件的玻璃板30固定,这样制作出了试片。这里,作为基板20使用的是FR4基板。接着,将该试片置放于温度设定在50℃的加热板上,如图1(B)所示,在玻璃板30的一端侧涂布制作出的树脂组合物10,对直到如图1(C)所示沟40被树脂组合物11填满为止的时间进行了测定。注入时间的合适范围是1000秒以内。注入性评价结果在表1~表4给出。
〔固化物外观〕
将进行了树脂组合物注入性评价的试片放入温箱(oven),120℃下加热3分钟,使环氧树脂组合物固化。对加热后的固化物外观通过目视进行了观察。不认为固化物出现皱纹、桔皮等外观不良或颜色不均时记作○;而认为固化物出现皱纹、桔皮等外观不良或颜色不均时记作×。固化物外观评价结果在表1~表4给出。
〔固化后树脂组合物强度评价〕
在玻璃环氧树脂基板印刷评价用试样,在该试样上置放2mm×2mm的硅芯片。将此用80±2℃的热风干燥机加热固化90分钟,或用100±2℃的热风干燥机加热固化90分钟。将之作试片,用dage公司制多功能剪切力测试仪(Multipurpose Bondtester)(型号:DAGE4000)对硅芯片加荷重,测定了芯片剥离时的强度(剥离强度)。设n=10,将其平均值作强度。另外,不满100N时,记作未固化。强度评价结果在表1~表4给出。
[表1]
[表2]
[表3]
[表4]
从表1~表3可知,所有实施例1~17中,初始粘度都在使用可能范围内,48小时后粘度増加率也在4.3%以下,揺片指数也在所期望范围内,注入时间也在所期望范围内。另外,100℃下固化,固化后树脂组合物的强度也良好。尤其是,(D)成分为0.02~0.12质量份的实施例1~4、7~17中,竟在80℃低温下也固化了。对此,不含(D)成分的比较例1,触变指数高,注入试验中途结束。(D)成分过少的比较例2,触变指数高。还有,(D)成分过多的比较例3,100℃下90分钟也没有固化。(C)成分过多的比较例4,粘度过高而无法测定。不含(B)成分的比较例5,増粘试验中固化了。(E)成分过少的比较例6,出现了颜色不均引起的外观不良。(E)成分过多的比较例7,初始粘度偏高,粘度増加率高,80℃下90分钟没固化。使用了碳数与(D)成分不同的硼酸三正十六烷(boric acid tri-n-hexadecyl)的比较例8~12,均是触变指数高,注入试验中途结束。从表4可知,取代(D)成分而使用了四正丁基叠氮基膦(tetra-n-butylphosphonium benzotriazolate)的比较例13~17,均是粘度増加率过高。还有,比较例13,触变指数高,注入试验中途结束。取代(B)成分而使用了固化剂的比较例18、20,粘度増加率过高且100℃×90分钟也没固化。(E)成分过多的比较例19也是粘度増加率过高且100℃×90分钟也没固化。
实用性
本发明树脂组合物,即便含有无机填料,流动性也良好,而且,能抑制树脂组合物保存时増粘,延长适用期。本发明树脂组合物作为底部填充胶或电子元件用粘接剂尤其有用。
标号说明
10 树脂组合物
20 基板
30 玻璃板
40 沟
Claims (5)
1.一种液态环氧树脂组合物,其特征在于,含有(A)液态环氧树脂、(B)胺化合物的环氧加合物固化剂或微胶囊化咪唑化合物固化剂、(C)无机填料、(D)硼酸三异丙酯和(E)苯酚树脂;相对液态环氧树脂组合物100质量份,(C)成分为20~65质量份,(D)成分为0.02~0.30质量份,(E)成分为0.3~15.0。
2.一种底部填充胶,其中,含有权利要求1所述的液态环氧树脂组合物。
3.一种粘接剂,其中,含有权利要求1所述的液态环氧树脂组合物。
4.一种半导体装置,其中,含有权利要求2所述的底部填充胶的固化物。
5.一种半导体装置,其中,含有权利要求3所述的粘接剂的固化物。
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