CN104614937B - 压印设备 - Google Patents

压印设备 Download PDF

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Publication number
CN104614937B
CN104614937B CN201510101359.2A CN201510101359A CN104614937B CN 104614937 B CN104614937 B CN 104614937B CN 201510101359 A CN201510101359 A CN 201510101359A CN 104614937 B CN104614937 B CN 104614937B
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CN
China
Prior art keywords
light
optical system
substrate
mould
label
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201510101359.2A
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English (en)
Chinese (zh)
Other versions
CN104614937A (zh
Inventor
前田普教
三浦圣也
三岛和彦
箕田贤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN104614937A publication Critical patent/CN104614937A/zh
Application granted granted Critical
Publication of CN104614937B publication Critical patent/CN104614937B/zh
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Mechanical Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Optics & Photonics (AREA)
CN201510101359.2A 2011-05-17 2012-05-17 压印设备 Active CN104614937B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011110587A JP5637931B2 (ja) 2011-05-17 2011-05-17 インプリント装置、インプリント方法およびデバイス製造方法
JP2011-110587 2011-05-17
CN201210153656.8A CN102789127B (zh) 2011-05-17 2012-05-17 压印设备、压印方法和装置制造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201210153656.8A Division CN102789127B (zh) 2011-05-17 2012-05-17 压印设备、压印方法和装置制造方法

Publications (2)

Publication Number Publication Date
CN104614937A CN104614937A (zh) 2015-05-13
CN104614937B true CN104614937B (zh) 2019-07-23

Family

ID=47154561

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201510101359.2A Active CN104614937B (zh) 2011-05-17 2012-05-17 压印设备
CN201210153656.8A Active CN102789127B (zh) 2011-05-17 2012-05-17 压印设备、压印方法和装置制造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201210153656.8A Active CN102789127B (zh) 2011-05-17 2012-05-17 压印设备、压印方法和装置制造方法

Country Status (5)

Country Link
US (2) US9188855B2 (enExample)
JP (1) JP5637931B2 (enExample)
KR (3) KR101524338B1 (enExample)
CN (2) CN104614937B (enExample)
TW (2) TWI496190B (enExample)

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JP5938218B2 (ja) * 2012-01-16 2016-06-22 キヤノン株式会社 インプリント装置、物品の製造方法およびインプリント方法
JP6188382B2 (ja) 2013-04-03 2017-08-30 キヤノン株式会社 インプリント装置および物品の製造方法
DE102013207243B4 (de) * 2013-04-22 2019-10-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und verfahren zur herstellung einer struktur aus aushärtbarem material durch abformung
JP5909210B2 (ja) * 2013-07-11 2016-04-26 キヤノン株式会社 インプリント装置及び物品の製造方法
JP6541328B2 (ja) * 2013-11-26 2019-07-10 キヤノン株式会社 検出装置、インプリント装置、および物品の製造方法
EP2916172A1 (en) * 2014-02-13 2015-09-09 Chemence, Inc. Improvements in the manufacture of craft stamps
SG10201603103UA (en) 2015-04-30 2016-11-29 Canon Kk Imprint device, substrate conveying device, imprinting method, and method for manufacturing article
US10386737B2 (en) * 2015-06-10 2019-08-20 Canon Kabushiki Kaisha Imprint apparatus and method for producing article
JP6748461B2 (ja) * 2016-03-22 2020-09-02 キヤノン株式会社 インプリント装置、インプリント装置の動作方法および物品製造方法
CN112639623B (zh) * 2018-08-20 2024-05-14 Asml荷兰有限公司 用于测量对准标记的位置的设备和方法
CN113815304B (zh) * 2020-06-19 2023-08-29 陈竹 基于丝网印刷技术的同步对花板材、板材同步对花系统及方法
CN115799146B (zh) * 2023-01-30 2023-05-09 北京青禾晶元半导体科技有限责任公司 一种光学对位系统

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Also Published As

Publication number Publication date
TW201537669A (zh) 2015-10-01
US20160033884A1 (en) 2016-02-04
CN102789127B (zh) 2016-04-06
TW201250779A (en) 2012-12-16
KR20150018866A (ko) 2015-02-24
KR101540884B1 (ko) 2015-07-30
JP2012243863A (ja) 2012-12-10
US9645514B2 (en) 2017-05-09
CN102789127A (zh) 2012-11-21
JP5637931B2 (ja) 2014-12-10
US9188855B2 (en) 2015-11-17
KR20140107156A (ko) 2014-09-04
CN104614937A (zh) 2015-05-13
KR101524338B1 (ko) 2015-05-29
US20120292801A1 (en) 2012-11-22
TWI496190B (zh) 2015-08-11
KR20120128571A (ko) 2012-11-27
KR101603037B1 (ko) 2016-03-11
TWI654706B (zh) 2019-03-21

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