CN104425310B - Chemically-cleaning device - Google Patents
Chemically-cleaning device Download PDFInfo
- Publication number
- CN104425310B CN104425310B CN201310401334.5A CN201310401334A CN104425310B CN 104425310 B CN104425310 B CN 104425310B CN 201310401334 A CN201310401334 A CN 201310401334A CN 104425310 B CN104425310 B CN 104425310B
- Authority
- CN
- China
- Prior art keywords
- reserve tank
- liquid reserve
- drainage
- separating tube
- cleaning solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
A kind of chemically-cleaning device, including：Liquid reserve tank for holding chemical cleaning solution；Master at the top of the liquid reserve tank send pipeline, and the master send pipeline to be passed through from outside the liquid reserve tank inside the liquid reserve tank, and the master send the adjustable length that pipeline is stretched into liquid reserve tank；Some separating tube roads inside the liquid reserve tank, pipeline communication is sent with the master in the one end in the separating tube road, the other end in the separating tube road extends to the sidewall direction of liquid reserve tank and higher than the liquid level of chemical cleaning solution, the separating tube road and master have angle between sending pipeline, and the corner dimension is adjustable；Positioned at the drainage system of the liquid reserve tank interior side-wall surface, the separating tube road towards liquid reserve tank side wall one end scope of activities in the range of drainage system covering, and the separating tube road to the distance between drainage system within a preset range.The cleaning performance of the chemically-cleaning device is improved.
Description
Technical field
The present invention relates to technical field of manufacturing semiconductors, more particularly to a kind of chemically-cleaning device.
Background technology
In existing semiconductor fabrication process, after by etching technics, the wafer table of semiconductor structure is formed with
Face is also easy to produce impurity and polymer residue, and the impurity and polymer of these residuals easily cause shadow to follow-up handling process
Ring, such as depositing operation.Therefore, in order to exclude these impurity or polymer, it is necessary to carry out scavenger between each processing step
Skill.Wet chemical cleaning is one of current method on cleaning wafer surface more commonly used.
Fig. 1 is a kind of cross-sectional view of chemically-cleaning device of prior art, including：
Cleaning fluid 110 is contained with liquid reserve tank 100 for holding chemical cleaning solution, the liquid reserve tank 100；
For the processing chamber housing 101 of cleaning wafer, there is pending wafer, the wafer table in the processing chamber housing 101
Face is formed with semiconductor structure；
Liquid-transport pipe-line 102 positioned at the top of liquid reserve tank 100, the other end and processing chamber housing of the liquid-transport pipe-line 102
101 bottom connection, the cleaning fluid 110 for processing chamber housing 101 to be discharged is inputted in liquid reserve tank 100；
Output channel 103 positioned at the bottom of liquid reserve tank 100, the other end and processing chamber housing of the output channel 103
101 top connection, for the cleaning fluid 110 in liquid reserve tank 100 to be delivered into processing chamber housing 101, with processing chamber housing 101
Wafer carry out chemical cleaning technology；
The filter 104 being connected with the output channel 103, for removing the impurity in cleaning fluid 110, makes by mistake
The cleaning fluid 110 of filter device can continue on for cleaning wafer into processing chamber housing 101；
The heater 105 being connected with the output channel 103, for making the cleaning fluid 110 by filtering be heated to fitting
Share the temperature in wafer cleaning.
However, after being cleaned using existing chemically-cleaning device, easily making the semiconductor for being formed at crystal column surface
The pattern of structure is bad.
The content of the invention
The problem of present invention is solved is to provide a kind of chemically-cleaning device, improves the cleaning performance of chemically-cleaning device.
To solve the above problems, the present invention provides a kind of chemically-cleaning device, including：Liquid reserve tank, the liquid reserve tank is used for
Hold chemical cleaning solution；Master at the top of the liquid reserve tank send pipeline, for chemical cleaning solution to be conveyed from outside liquid reserve tank
To liquid reserve tank, the master send pipeline to be passed through from outside the liquid reserve tank inside the liquid reserve tank, and the master send pipeline to stretch
Enter the adjustable length in liquid reserve tank；Some separating tube roads inside the liquid reserve tank, the one end in the separating tube road and institute
State master and send pipeline communication, the other end in the separating tube road extends to the sidewall direction of liquid reserve tank and higher than the liquid of chemical cleaning solution
Face, for sending the chemical cleaning solution in pipeline to branch in some separating tube roads master, and by the separating tube road to liquid storage
Conveying chemical cleaning solution in case, the separating tube road and master have angle between sending pipeline, and the corner dimension is adjustable；It is located at
The drainage system of the liquid reserve tank interior side-wall surface, for disperseing the chemical cleaning solution that the separating tube road is sent out, and makes described
Chemical cleaning solution is flowed into liquid reserve tank by the guiding of the drainage system, and the separating tube road is towards liquid reserve tank side wall one end
Scope of activities in the range of drainage system covering, and the separating tube road to the distance between drainage system in default model
In enclosing；Output channel positioned at the liquid reserve tank bottom, for the chemical cleaning solution in liquid reserve tank to be transferred out into the liquid reserve tank.
Optionally, the drainage system includes：Some drainage layers for being vertically installed in liquid reserve tank sidewall surfaces, some drainages
It is parallel to each other between layer, the drainage layer is tilted relative to the liquid level of the chemical cleaning solution in liquid reserve tank, between adjacent drainage layer
Constitute drainage groove.
Optionally, the drainage system also includes：At least one drainage channel at least one drainage groove, institute
The two ends for stating drainage channel are mutually communicated with twice drainage groove respectively.
Optionally, when the drainage channel quantity in same drainage groove is more than 1, in same drainage groove
The distance between drainage channel is 5 centimetres~15 centimetres.
Optionally, the position of the drainage channel in adjacent twice drainage groove is interlaced.
Optionally, the side wall of the drainage channel and drainage layer are connected, and the drainage channel side wall perpendicular to liquid storage
The sidewall surfaces of case.
Optionally, the drainage layer surface has some convex portions.
Optionally, the one or more being shaped as in circle, rectangle, taper of the convex portion.
Optionally, the distance between adjacent two layers drainage layer is 8 centimetres~12 centimetres.
Optionally, the interior side-wall surface of the circular liquid reserve tank of the drainage system one week；The bottom of the drainage system
Equal to or higher than the liquid level of the chemical cleaning solution in liquid reserve tank.
Optionally, also include：Positioned at the stairs device of the interior side-wall surface of the liquid reserve tank, the bottom of the stairs device
The bottom of the liquid reserve tank is arranged at, the top of the stairs device is less than or equal to the bottom of the drainage system, described
Rank device successively decreases step by step from liquid reserve tank bottom to top, and the top of the stairs device is clear greater than or equal to the chemistry in liquid reserve tank
The liquid level of washing lotion.
Optionally, the liquid reserve tank is cylinder, and the quantity in the separating tube road is 1~2 π r/L, wherein, r is the storage
The radius of liquid case, L extends the folder between the distance between one end, and some separating tube roads for adjacent separating tube road to drainage system
Angle is equal.
Optionally, it is 31.7 centimetres~34.9 that the adjacent separating tube road extends the distance between one end L to drainage system
Centimetre.
Optionally, the pre-determined distance of the separating tube road to drainage system is 4.8 centimetres~7.3 centimetres.
Optionally, the speed for exporting chemical cleaning solution to drainage system when the separating tube road is faster, the separating tube road
It is smaller towards one end of drainage system to distance between the liquid level of chemical cleaning solution.
Optionally, the liquid reserve tank includes having closed cavity, the sky between inner and outer wall, the inner and outer wall
There is nitrogen in chamber.
Optionally, the output channel is connected with filter, and the filter, which is used to filter, removes chemical cleaning solution
In impurity.
Optionally, also include：Processing chamber housing, the output channel is connected with the processing chamber housing, makes the change in liquid reserve tank
Learn cleaning fluid and processing chamber housing is entered by output channel, to carry out chemical cleaning technology.
Compared with prior art, technical scheme has advantages below：
Some separating tube roads are connected with main one end for sending pipeline to stretch into liquid reserve tank, can will send pipeline from storage by main
Chemical cleaning solution of the conveying as internal is branched in some separating tube roads outside liquid case；And the other end in the separating tube road is to storage
The sidewall direction of liquid case extends, and the scope of activities of the separating tube road towards liquid reserve tank side wall one end is covered in the drainage system
In the range of lid, therefore the chemical cleaning solution sent out from separating tube road can be fallen into drainage system, make the chemical cleaning solution
Liquid reserve tank bottom is flowed into by the scattered and guiding of the drainage system, it is clear because flowing into the chemistry in liquid reserve tank so as to avoid
The flow velocity of washing lotion is excessive and the problem of forming a large amount of foams so that the impurity such as oxygen is difficult to be mixed into inside the chemical cleaning solution,
So that chemical cleaning solution is pure.Moreover, the separating tube road is to one end of the sidewall direction extension of liquid reserve tank and clear higher than chemical
The liquid level of washing lotion, can avoid because the separating tube road is immersed in chemical cleaning solution and caused by pollution.Therefore, it is placed in described
Chemical cleaning solution in chemically-cleaning device is pure, cleaning performance is good, and the semiconductor structure pattern through over cleaning can keep good
It is good.
Further, the drainage system includes：Some drainage layers for being vertically installed in liquid reserve tank sidewall surfaces, some drainages
It is parallel to each other between layer, the drainage layer is tilted relative to the liquid level of the chemical cleaning solution in liquid reserve tank, between adjacent drainage layer
Constitute drainage groove；At least one drainage channel at least one drainage groove, the two ends difference of the drainage channel
It is mutually communicated with twice drainage groove.The drainage groove and the drainage channel are used to pass through chemical cleaning solution, therefore,
Even if the speed during chemical cleaning solution output separating tube road is larger, after the scattered and guiding of drainage system,
The flow velocity of chemical cleaning solution in the inflow liquid reserve tank can be reduced, so that into the stream of the chemical cleaning solution in liquid reserve tank
Speed is stable, it is to avoid the chemical cleaning solution formation foam, then ensure that and does not have in the chemical cleaning solution in the liquid reserve tank
The impurity such as oxygen.
Further, the drainage layer surface has some convex portions, and the convex portion can be in guiding and disperse chemical cleaning fluid
While, filtering removes the solid impurity in the chemical cleaning solution so that flow into the chemical cleaning solution of the liquid reserve tank bottom
More pure, cleaning performance is more preferably.
Further, the separating tube road and master have angle between sending pipeline, and the corner dimension is adjustable, and the master
The length for sending pipeline to stretch into liquid reserve tank is also adjustable, so that the different in flow rate of chemical cleaning solution is exported for separating tube road, can
By adjusting the separating tube road and the main angle sent between pipeline and the main length for sending pipeline to stretch into liquid reserve tank, reduce
The foam that the chemical cleaning solution enters produced by liquid reserve tank；Specifically, making the separating tube road to drainage system outputization
Learn cleaning fluid speed it is faster when, the separating tube road is towards one end of drainage system to distance between the liquid level of chemical cleaning solution
It is smaller, the chemical cleaning solution into liquid reserve tank bottom can be suppressed and produce foam.Therefore, no matter the output of the chemical cleaning solution
How speed changes, and the chemical cleaning solution entered by drainage system in liquid reserve tank is produced foam or be mixed into impurity.
Further, positioned at the liquid reserve tank interior side-wall surface stairs device, the bottom of the stairs device is arranged at
The bottom of the liquid reserve tank, the top of the stairs device is less than or equal to the bottom of the drainage system, and the step is filled
Put and successively decrease step by step from liquid reserve tank bottom to top, then the chemical cleaning solution flowed out from drainage system bottom flows to the stairs device
Surface so that the chemical cleaning solution is further buffered, and can further avoid generation in the chemical cleaning solution
Foam is mixed into impurity.
Further, the liquid reserve tank includes having closed cavity, the sky between inner and outer wall, the inner and outer wall
There is the nitrogen in nitrogen, the cavity can improve the sealing property in liquid reserve tank, it is to avoid the air outside liquid reserve tank in chamber
Penetrate into inside the liquid reserve tank, further avoid in the chemical cleaning solution in liquid reserve tank and be mixed into oxygen, it is ensured that Chemical cleaning
Liquid it is pure so that the semiconductor structure pattern after over cleaning is good.
Brief description of the drawings
Fig. 1 is a kind of cross-sectional view of chemically-cleaning device of prior art；
Fig. 2 is schematic diagram when being cleaned using the cleaning fluid containing oxygen to the pending wafer in processing chamber housing；
Fig. 3 is a kind of cross-sectional view of the embodiment of chemically-cleaning device；
Fig. 4 is the cross-sectional view of the chemically-cleaning device of the embodiment of the present invention；
Fig. 5 is partial structural diagram of the drainage system along AA ' directional profiles in Fig. 4.
Embodiment
As stated in the Background Art, after being cleaned using existing chemically-cleaning device, easily make to be formed at wafer table
The pattern of the semiconductor structure in face is bad.
Found by research, because in existing chemically-cleaning device, the sealing of liquid reserve tank is poor, easily makes liquid reserve tank
In cleaning fluid in be mixed into impurity, such as oxygen causes the cleansing power of cleaning fluid to decline, and make the wafer after cleaning and partly lead
Body body structure surface pattern is bad.
Specifically, please continue to refer to Fig. 1, when the chemically-cleaning device described in Fig. 1 is used for etching metal（Such as copper）
Residue afterwards, then the chemical cleaning technology used is NANO（High speed nitrogen and water）Manufacturing process for cleaning, cleaning fluid at least by
The nitrogen and water being passed through at a high speed are mixed, and the nitrogen being passed through at a high speed can form NH in water4 +Ion, the NH4 +Ion
The impurity produced after etching metal can be removed.Due at least being formed in cleaning fluid by nitrogen and water, therefore, except woven hose
Outside road 102 is connected with the top of the liquid reserve tank 100, at least also need to from outside the liquid reserve tank by gas pipeline 106
In cleaning fluid 110 in supplying nitrogen to the liquid reserve tank 100, to supply in cleaning fluid 110 because of the NH being lost in through over cleaning4 +
Ion.
However, these connected with the liquid reserve tank 100 are used for the pipeline for inputting gas or liquid（The He of gas pipeline 106
Liquid-transport pipe-line 102）The sealing property of the liquid reserve tank 100 is easily reduced, so that the oxygen in air is mixed into the liquid reserve tank
Inside 100.Moreover, the cycle rate in order to improve the cleaning fluid 110 between liquid reserve tank 100 and processing chamber housing 101, from woven hose
The flow velocity that road 102 discharges cleaning fluid 110 into liquid reserve tank 100 is larger, is easily caused from liquid-transport pipe-line 102 and is discharged into liquid reserve tank
Cleaning fluid 110 in 100 produces substantial amounts of foam, and the oxygen that the foam can be carried in liquid reserve tank 100 enters in cleaning fluid 110
Portion, and make it that oxygen is dissolved in cleaning fluid 110.When the cleaning fluid 110 containing oxygen enters processing chamber housing 101 and treats
When processing wafer is cleaned, the pattern Quality Down of pending crystal column surface is easily caused.
Fig. 2 specifically is refer to, Fig. 2 is to the pending wafer in processing chamber housing 101 with the cleaning fluid 110 containing oxygen
120 schematic diagram when being cleaned.The surface of pending wafer 120 has the metal by photoetching process and etching technics mutual
Link structure 121, the material of the metal interconnection structure 121 is copper；Due in a lithographic process, easily causing same pending crystalline substance
The diverse location on 120 surfaces of circle has electrical potential difference, therefore, has first area I and second on the pending surface of wafer 120
Region II, the first area I potential are higher than second area II potential.When carrying oxygen in the cleaning fluid 110, oxygen
Gas can make the copper on the surface of metal interconnection structure 121 be oxidized to copper ion；Because first area I potential is higher than second area II's
Potential, the copper ion is easily migrated by the effect of electric field force to second area II, and is reduced to copper in second area II
And the surface of metal interconnection structure 121 is deposited on, so as to cause the second area II surface of metal interconnection structure 121 to be higher than the firstth area
The domain I surface of metal interconnection structure 121.Therefore, by the cleaning of the cleaning fluid 110 containing oxygen, it is formed at pending
The Quality Down of the surface topography of metal interconnection structure 121 on the surface of wafer 120, is unfavorable for formed chip or semiconductor devices
Performance it is stable.
In order to produce substantial amounts of bubble-related issues when solving and cleaning fluid is discharged into liquid reserve tank from liquid-transport pipe-line, as shown in Figure 3
A kind of chemically-cleaning device be suggested, i.e., liquid-transport pipe-line 102a is passed through inside liquid reserve tank 100, and the liquid-transport pipe-line 102a
Stretch into the bottom of cleaning fluid 110；Wherein, the liquid-transport pipe-line 102a sidewall surfaces stretched into inside liquid reserve tank 100 have some logical
Hole 130, the through hole 130 can export the cleaning fluid 110 in liquid-transport pipe-line 102.The liquid-transport pipe-line 102a can be reduced
A large amount of gas foams are formed in cleaning fluid 110；However, because the liquid-transport pipe-line 102a stretches into the bottom of cleaning fluid 110, easily making
It is inconsistent into the surface of cleaning fluid 110 in liquid reserve tank 100 and the chemical concentrations of bottom, it is unfavorable for the clear of output liquid reserve tank 100
The control of the concentration of washing lotion 110；Moreover, the concentration of the bottom of cleaning fluid 110 is higher, easily make the chemical substance in cleaning fluid in liquid storage
The bottom deposit of case 100；Further, since the liquid-transport pipe-line 102a is impregnated in cleaning fluid 110 for a long time, easily cause described defeated
The corrosion in liquid pipe 102a roads, so as to add the impurity of the cleaning fluid 110 in liquid reserve tank 100, is unfavorable for pending crystalline substance
Round cleaning.
In order to solve the above problems, the present invention proposes a kind of chemically-cleaning device, including：For holding chemical cleaning solution
Liquid reserve tank；Master at the top of the liquid reserve tank send pipeline, and the master send pipeline to be passed through the storage from outside the liquid reserve tank
Inside liquid case, and the master send the adjustable length that pipeline is stretched into liquid reserve tank；Some separating tubes inside the liquid reserve tank
Road, the one end in the separating tube road and the master send pipeline communication, and the other end in the separating tube road is to the side wall side of liquid reserve tank
To extension, for sending the chemical cleaning solution in pipeline to branch in some separating tube roads master, the separating tube road send pipe with master
There is angle between road, and the corner dimension is adjustable；Positioned at the drainage system of the liquid reserve tank interior side-wall surface, for disperseing
The chemical cleaning solution that the separating tube road is sent out, and the chemical cleaning solution is flowed into liquid storage by the guiding of the drainage system
In case.
Wherein, some separating tube roads are connected with main one end for sending pipeline to stretch into liquid reserve tank, can will send pipe by master
The road chemical cleaning solution of conveying as internal from outside liquid reserve tank is branched in some separating tube roads；And the separating tube road is another
Hold to liquid reserve tank sidewall direction extension, and the separating tube road towards liquid reserve tank side wall one end scope of activities in the drainage
In the range of device covering, therefore the chemical cleaning solution sent out from separating tube road can be fallen into drainage system, make the chemistry
Cleaning fluid flows into liquid reserve tank bottom by the scattered and guiding of the drainage system, so as to avoid because flowing into liquid reserve tank
The flow velocity of chemical cleaning solution is excessive and the problem of forming a large amount of foams so that the impurity such as oxygen is difficult to be mixed into the chemical cleaning solution
It is internal so that chemical cleaning solution is pure.Moreover, the separating tube road is to one end of the sidewall direction extension of liquid reserve tank and higher than change
Learn the liquid level of cleaning fluid, can avoid because the separating tube road is immersed in chemical cleaning solution and caused by pollution.Therefore, it is placed in
Chemical cleaning solution in the chemically-cleaning device is pure, cleaning performance is good, and the semiconductor structure pattern through over cleaning can be protected
Hold good.
It is understandable to enable the above objects, features and advantages of the present invention to become apparent, below in conjunction with the accompanying drawings to the present invention
Specific embodiment be described in detail.
Fig. 4 to Fig. 5 is the structural representation of the chemically-cleaning device of the embodiment of the present invention.
Fig. 4 is refer to, the chemically-cleaning device includes：
Liquid reserve tank 200, the liquid reserve tank 200 is used to hold chemical cleaning solution 201；
Master positioned at the top of liquid reserve tank 200 send pipeline 202, for chemical cleaning solution is defeated from the outside of liquid reserve tank 200
Deliver to inside liquid reserve tank 200, the master send pipeline 202 to be passed through from outside the liquid reserve tank 200 inside the liquid reserve tank 200, and
The master send the adjustable length that pipeline 202 is stretched into liquid reserve tank 200；
Some separating tube roads 203 inside the liquid reserve tank 200, one end and the master in the separating tube road 203
Pipeline 202 is sent to connect, the other end in the separating tube road 203 extends to the sidewall direction of liquid reserve tank 200 and higher than Chemical cleaning
The liquid level of liquid 201, for sending the chemical cleaning solution in pipeline 200 to branch in some separating tube roads 203 master, and by described
Separating tube road 203 conveys chemical cleaning solution 201 into liquid reserve tank 200, and the separating tube road 203 and master send tool between pipeline 202
There is angle, and the corner dimension is adjustable；
Positioned at the drainage system 204 of the interior side-wall surface of liquid reserve tank 200, sent out for disperseing the separating tube road 203
Chemical cleaning solution, and the chemical cleaning solution is flowed into by the guiding of the drainage system 204 in liquid reserve tank 200, it is described
Separating tube road 203 towards the side wall one end of liquid reserve tank 200 scope of activities in the range of the drainage system 204 covering, and institute
Stating between separating tube road 203 arrives drainage system 204 has pre-determined distance；
Output channel 205 positioned at the bottom of liquid reserve tank 200, for the chemical cleaning solution 201 in liquid reserve tank 200 is defeated
Send out the liquid reserve tank 200.
It should be noted that in the present embodiment, processing chamber housing is also included in the chemically-cleaning device（It is not shown）, institute
Stating processing chamber housing is used to place pending wafer, and the pending wafer needs to carry out chemical cleaning technology.In the present embodiment,
The pending crystal column surface is formed with metal interconnection structure, and the metal interconnection structure is formed by etching technics；Due to existing
There is the etching technics for metal easily to produce accessory substance or polymer in pending wafer and metal interconnection structure surface, therefore
Need after the etching process, chemical cleaning technology to be carried out to the metal interconnection structure.Metal in the present embodiment mutually links
Structure material is copper, and the chemical cleaning solution 201 for chemical cleaning technology includes water and the nitrogen being mixed into water, the nitrogen
Gas can form NH in water4 +Ion, the NH4 +Ion can remove the accessory substance or polymer remained after etching copper.
The master send pipeline 202 to be connected with the processing chamber housing, for by the chemistry of over cleaning is clear in processing chamber housing
Washing lotion 201 is delivered in the liquid reserve tank 200.Secondly, the output channel 205 is also connected with the processing chamber housing, makes liquid storage
Chemical cleaning solution 201 in case 200 enters processing chamber housing by output channel 205, the chemistry exported by the output channel 205
The pending wafer that cleaning fluid 201 is used to be opposite in processing chamber housing carries out chemical cleaning technology.
At least one filter 207 is connected with the output channel 205, the filter 207 is used to remove certainly
Impurity, pollutant in the chemical cleaning solution 201 exported in liquid reserve tank 200, oxygen, are filtered by the filter 207
Chemical cleaning solution 201, which is input into processing unit, carries out chemical cleaning technology.In addition, being also connected with the output channel 205
There is heater（It is not shown）, the temperature that the heater is used to make to be delivered to chemical cleaning solution 201 in processing unit reaches
To the temperature suitably cleaned.
The liquid reserve tank 200 is used to hold chemical cleaning solution 201.In the present embodiment, the liquid reserve tank 200 is cylinder.
Chemical cleaning solution 201 in liquid reserve tank 200 is transported in processing chamber housing to carry out cleaning after filtering, and described
The chemical cleaning solution 201 through over cleaning is transmitted back in the liquid reserve tank 200 in processing chamber housing so that liquid reserve tank 200 and processing
Chemical cleaning solution 201 between chamber constitutes circulation.
In the present embodiment, the chemically-cleaning device also includes gas pipeline（It is not shown）, the gas pipeline is described in
Entered outside liquid reserve tank 200 by the top of the liquid reserve tank 200 inside the liquid reserve tank 200, and be passed through the change in liquid reserve tank
Below the liquid level for learning cleaning fluid 201；The gas pipeline is used to be passed through nitrogen in the chemical cleaning solution 201 into liquid reserve tank 200,
The nitrogen can be with the aquatic production NH in chemical cleaning solution4 +Ion, so as to replenish the NH that processing chamber housing is consumed4 +Ion.
Although the liquid reserve tank 200 be enclosed construction, yet with the master send pipeline 202 and gas pipeline be required to from
Inside is passed through outside the liquid reserve tank 200, therefore the liquid reserve tank 200 is difficult to be fully sealed, and air is penetrated into the storage
Inside liquid case 200, make that there is oxygen in liquid reserve tank 200；And after the oxygen is mixed into the chemical cleaning solution 201, institute
Chemical cleaning solution 201 is stated easily to cause damage to the pattern of the metal interconnection structure of pending crystal column surface.Therefore, the present embodiment
In chemically-cleaning device can avoid in the chemical cleaning solution 201 that oxygen is mixed into liquid reserve tank 200, it is ensured that through over cleaning
Pending crystal column surface pattern is good, and the cleansing power of chemical cleaning solution 201 is good.
In the present embodiment, the liquid reserve tank 200 includes inwall 200a and outer wall 200b, the inwall 200a and outer wall 200b
Between have closed cavity 200c, the cavity 200c in have nitrogen；Make the nitrogen pressure in the cavity 200c higher than big
Air pressure, the then air that the nitrogen can suppress outside liquid reserve tank 200 enters in liquid reserve tank 200, so as to reduce liquid reserve tank 200
The oxygen content on the interior surface of chemical cleaning solution 201, it is ensured that chemical cleaning solution 201 it is pure.
The master send pipeline 202 to stretch into described inside one end of liquid reserve tank 200 and connected with some separating tube roads 203, makes to pass through
The main chemical cleaning solution 201 for sending pipeline 202 to enter inside liquid reserve tank 200 is respectively enterd in some separating tube roads 203, and described in
Separating tube road 203 exports to drainage system 204 to one end of the side wall extension of liquid reserve tank 200.In the present embodiment, the separating tube
The pre-determined distance that has of road 203 to drainage system 204 is 4.8 centimetres~7.3 centimetres.Because the separating tube road 203 arrives drainage
During the distance between device 204 is smaller, therefore the chemical cleaning solution 201 is delivered to drainage system from separating tube road,
It is difficult to evoke foam, therefore, it is possible to avoid foam to bring oxygen inside chemical cleaning solution 201 into, makes the chemical cleaning solution 201
It can keep pure.In addition, the port plane of one end that the separating tube road 203 extends to the direction of drainage system 204 with it is described
Drainage system surface is engaged, and the chemical cleaning solution 201 that separating tube road 203 is exported is entered in drainage system 204.
The quantity in the separating tube road 203 is 1~2 π r/L, wherein, r is the radius of the liquid reserve tank 200, and L is adjacent point
Liquid pipe road 203 extends the distance between one end to drainage system 204；Preferably, the adjacent separating tube road 203 is to drainage system
The distance between 204 extension one end L is 31.7 centimetres~34.9 centimetres, then the chemical cleaning solution that adjacent separating tube road 203 is exported
201 will not influence each other and generate foam, while can ensure that the speed for exporting chemical cleaning solution 201 is larger as far as possible again；Therefore,
When the radius of the liquid reserve tank 200 is bigger, the quantity in the separating tube road 203 is more.In addition, between some separating tube roads 203
Angle it is equal, some separating tube roads 203 are highly identical to one end that the side wall of liquid reserve tank 200 extends, i.e., some separating tube roads 203
It is uniformly distributed, chemical cleaning solution 201 is uniformly delivered in drainage system 204.It should be noted that the master send pipeline
202 stretch into liquid reserve tank 200 one end it is closed, only connected with some separating tube roads 203, make chemical cleaning solution 201 completely by point
Liquid pipe road 203 is exported.
The separating tube road 203 and master have angle between sending pipeline 202, and the separating tube road 203 send pipeline with master
Movably connected between 202, make the corner dimension adjustable.In addition, the master send the length that pipeline 201 is stretched into liquid reserve tank 200
Also it is adjustable.Therefore, one end height that the separating tube road 203 extends to drainage system 204 can be adjusted.It should be noted that
No matter the separating tube road 203 and master send how the angle between pipeline 202 adjusts, and are required to the separating tube road 203 to drawing
The scope of activities of one end that device 204 extends is flowed in the range of the drainage system 204, to ensure that chemical cleaning solution 201 fills
Divide and be delivered in drainage system 204.Moreover, no matter the separating tube road 203 with master send how pipeline 202 adjusts, it is described no matter
The liquid level that pipeline 202 is above chemical cleaning solution 201 is sent with master in the separating tube road 203.
Pipeline 202 is sent to stretch into liquid reserve tank by adjusting separating tube road 203 and the main angle sent between pipeline 202 and master
Length in 200, can adjust one end that separating tube road 203 extends to drainage system 204 and chemical cleaning solution 201 liquid level it
Between distance, moreover, the distance changes according to the flow velocity of chemical cleaning solution 201, enter storage to suppress chemical cleaning solution 201
Foam is produced after liquid case 200.Specifically, when the speed that the separating tube road 203 exports chemical cleaning solution to drainage system 204 is got over
It hurry up, then make separating tube road 203 smaller towards one end of drainage system 204 to distance between the liquid level of chemical cleaning solution 201, because
This, no matter how the output speed of the chemical cleaning solution 201 changes, and will not make the Chemical cleaning entered in liquid reserve tank 200
Liquid 201 produces foam.
In the present embodiment, stairs device 206 is additionally provided with the liquid reserve tank 200, the stairs device 206 is located at storage
The interior side-wall surface of liquid case 200, the bottom of the stairs device 206 is located at the bottom of the liquid reserve tank 200, the stairs device
206 top is less than or equal to the bottom of the drainage system 204, moreover, the stairs device 206 is from the bottom of liquid reserve tank 200
Successively decrease step by step to top, liquid of the top greater than or equal to the chemical cleaning solution 201 in liquid reserve tank 200 of the stairs device 206
Face.
Chemical cleaning solution 201 enters in the drainage system 204 from after the output of separating tube road 203, and from drainage system
204 bottom flows to the surface of the stairs device 206 so that entering the chemical cleaning solution 201 of the bottom of liquid reserve tank 200 can obtain
To further buffering, so as to further avoid producing foam in chemical cleaning solution 201, and then chemical cleaning solution ensure that
201 it is pure.
It should be noted that the material of the drainage system 204 and stairs device 206 is not sent out with chemical cleaning solution 201
The material of raw reaction, the material of the drainage system 204 and stairs device 206 can be consistent with the material of liquid reserve tank 200；Or
Person, the drainage system 204 or stairs device 206 use polymeric material, and the polymeric material includes polyvinyl chloride, poly- third
One or more combinations in alkene, acidproof phenolic aldehyde, poly- four ethene, the polymeric material is corrosion-resistant, can make drainage system 204
Or stairs device 206 keeps stable chemical nature in chemical cleaning solution 201.
The interior side-wall surface of the circular liquid reserve tank 200 of the drainage system 204 one week, the bottom of the drainage system 204
Portion is equal to or higher than the liquid level of the chemical cleaning solution 201 in liquid reserve tank 200.The drainage system 204 can disperse and buffer certainly
The chemical cleaning solution 201 that separating tube road 203 is exported, to prevent that the chemical cleaning solution 201 entered in liquid reserve tank 200 from producing foam,
And then avoid the foam bring the gas of ullage inside chemical cleaning solution 201 into, so as to ensure chemical cleaning solution 201
Cleansing power.Described in detail below with reference to accompanying drawing.
It refer to Fig. 5, Fig. 5 is partial structural diagram of the drainage system along AA ' directional profiles in Fig. 4.
The drainage system 204 includes：Some drainage for being vertically installed in the sidewall surfaces of liquid reserve tank 200 layer 204a, it is some
It is parallel to each other between drainage layer 204a, the drainage layer 204a inclines relative to the liquid level of the chemical cleaning solution 201 in liquid reserve tank 200
Tiltedly, drainage groove 204b is constituted between adjacent drainage layer 204a.Wherein, the distance between adjacent two layers drainage layer 204a is 8 lis
Rice~12 centimetres, i.e., described drainage groove 204b width is 8 centimetres~12 centimetres.In other embodiments, the drainage layer
204a can also have angle relative to the sidewall surfaces of liquid reserve tank 200.
Secondly, also include in the drainage system 204：At least one drainage at least one drainage groove 204b
Passage 204c, the drainage channel 204c two ends are mutually communicated with twice drainage groove 204b respectively.It is some in the present embodiment
Some drainage channel 204c are respectively provided with drainage groove 204b.It should be noted that drawing in adjacent twice drainage groove 204b
Circulation road 204c position interlocks, so as to make to enter the path that passes through of chemical cleaning solution 201 in drainage system 204 more
It is long, then it is more beneficial for scattered and buffers the chemical cleaning solution 201, it is to avoid foam is produced in the chemical cleaning solution 201.
Wherein, when the drainage channel 204c quantity in same drainage groove 204b is more than 1, positioned at same drainage trench
Distance is 5 centimetres~15 centimetres between adjacent drainage channel 204c in groove 204b.It should be noted that when the liquid reserve tank
200 perimeter side wall is longer or length of the drainage groove 204b is longer, then the quantity in drainage groove 204b is got over
It is many.
In the present embodiment, the side wall of the drainage channel 204c is connected with drainage layer 204a, and the drainage channel
204c side wall is perpendicular to the sidewall surfaces of liquid reserve tank 200, i.e., described drainage groove 204b and drainage channel 204c opening court
To separating tube road 203, the chemical cleaning solution 201 that separating tube road 203 is exported is set to enter drainage groove 204b and drainage channel
In 204c.In the present embodiment, the drainage channel 204c is vertical with the liquid level direction of chemical cleaning solution 201.In other embodiment
In, the drainage channel 204c can also be tilted relative to the liquid level of chemical cleaning solution 201.
The drainage groove 204b and the drainage channel 204c are used to pass through chemical cleaning solution 201, from separating tube
After the chemical cleaning solution 201 that road 203 is exported is disperseed and guided by the drainage groove 204b and drainage channel 204c,
Flow velocity can be reduced so that the flow speed stability of the bottom of liquid reserve tank 200 be flowed into, so as to efficiently avoid in chemical cleaning solution 201
Interior formation foam, then ensure that the chemical cleaning solution 201 in the liquid reserve tank 200 is pure, the chemical cleaning solution 201 it is clear
Wash ability good, cleaned with the chemical cleaning solution 201 after pending wafer, the pattern of the pending crystal column surface is good
It is good.
In the present embodiment, the drainage layer 204a surfaces also have some convex portions（It is not shown）, the convex portion is uniformly divided
It is distributed in each 204 surface of drainage layer, the one or more being shaped as in circle, rectangle, taper of the convex portion.The convex portion can
When the chemical cleaning solution 201 is flowed through drainage 204 surface of layer, the solid impurity in the chemical cleaning solution 201 is prevented to pass through, i.e. institute
State convex portion to play a role in filtering, so that the chemical cleaning solution 201 for flowing into the bottom of liquid reserve tank 200 is more pure, clearly
Wash better.
In the chemically-cleaning device of the present embodiment, some separating tube roads connect with main one end for sending pipeline to stretch into liquid reserve tank
It is logical, by main the pipeline chemical cleaning solution of conveying as internal from outside liquid reserve tank can will be sent to branch in some separating tube roads；
And the other end in the separating tube road extends to the sidewall direction of liquid reserve tank, and the separating tube road is towards liquid reserve tank side wall one end
Scope of activities in the range of drainage system covering, therefore the chemical cleaning solution sent out from separating tube road can fall into and draw
Flow in device, the chemical cleaning solution is flowed into liquid reserve tank bottom by the scattered and guiding of the drainage system, so as to
Avoid because the flow velocity for flowing into the chemical cleaning solution in liquid reserve tank is excessive form a large amount of foams the problem of so that the impurity such as oxygen is difficult
To be mixed into inside the chemical cleaning solution so that chemical cleaning solution is pure.Moreover, the separating tube road is to the side wall side of liquid reserve tank
To one end of extension and higher than the liquid level of chemical cleaning solution, it can avoid because the separating tube road is immersed in chemical cleaning solution
The pollution caused.Therefore, the chemical cleaning solution that is placed in the chemically-cleaning device is pure, cleaning performance is good, through over cleaning
Semiconductor structure pattern can keep good.
Although present disclosure is as above, the present invention is not limited to this.Any those skilled in the art, are not departing from this
In the spirit and scope of invention, it can make various changes or modifications, therefore protection scope of the present invention should be with claim institute
The scope of restriction is defined.
Claims (18)
1. a kind of chemically-cleaning device, it is characterised in that including：
Liquid reserve tank, the liquid reserve tank is used to hold chemical cleaning solution；
Master at the top of the liquid reserve tank send pipeline, for chemical cleaning solution to be delivered in liquid reserve tank from outside liquid reserve tank
Portion, the master send pipeline to be passed through from outside the liquid reserve tank inside the liquid reserve tank, and the master send pipeline to stretch into liquid reserve tank
Adjustable length；
Some separating tube roads inside the liquid reserve tank, one end and the master in the separating tube road send pipeline communication, institute
The other end for stating separating tube road extends to the sidewall direction of liquid reserve tank and higher than the liquid level of chemical cleaning solution, for sending pipeline by master
Interior chemical cleaning solution is branched in some separating tube roads, and Chemical cleaning is conveyed into liquid reserve tank by the separating tube road
Liquid, the separating tube road and master have angle between sending pipeline, and the corner dimension is adjustable；
Positioned at the drainage system of the liquid reserve tank interior side-wall surface, for disperseing the chemical cleaning solution that the separating tube road is sent out,
And the chemical cleaning solution is flowed into by the guiding of the drainage system in liquid reserve tank, the separating tube road is towards liquid reserve tank side
The scope of activities of wall one end the drainage system covering in the range of, and the separating tube road to drainage system have preset away from
From；
Output channel positioned at the liquid reserve tank bottom, for the chemical cleaning solution in liquid reserve tank to be transferred out into the liquid reserve tank.
2. chemically-cleaning device as claimed in claim 1, it is characterised in that the drainage system includes：It is some to be vertically installed in
It is parallel to each other between the drainage layer of liquid reserve tank sidewall surfaces, some drainage layers, the drainage layer is relative to the chemistry in liquid reserve tank
The liquid level of cleaning fluid is tilted, and drainage groove is constituted between adjacent drainage layer.
3. chemically-cleaning device as claimed in claim 2, it is characterised in that the drainage system also includes：Positioned at least together
At least one drainage channel in drainage groove, the two ends of the drainage channel are mutually communicated with twice drainage groove respectively.
4. chemically-cleaning device as claimed in claim 3, it is characterised in that when the drainage channel number in same drainage groove
When amount is more than 1, the distance between drainage channel in same drainage groove is 5 centimetres~15 centimetres.
5. chemically-cleaning device as claimed in claim 3, it is characterised in that the drainage channel in adjacent twice drainage groove
Position it is interlaced.
6. chemically-cleaning device as claimed in claim 3, it is characterised in that the side wall of the drainage channel is connected with drainage layer,
And the side wall of the drainage channel is perpendicular to the sidewall surfaces of liquid reserve tank.
7. chemically-cleaning device as claimed in claim 2, it is characterised in that the drainage layer surface has some convex portions.
8. chemically-cleaning device as claimed in claim 7, it is characterised in that the convex portion is shaped as in circle, rectangle, taper
One or more.
9. chemically-cleaning device as claimed in claim 2, it is characterised in that the distance between adjacent two layers drainage layer is 8 centimetres
~12 centimetres.
10. chemically-cleaning device as claimed in claim 1, it is characterised in that the drainage system is interior around the liquid reserve tank
Sidewall surfaces one week；The bottom of the drainage system is equal to or higher than the liquid level of the chemical cleaning solution in liquid reserve tank.
11. chemically-cleaning device as claimed in claim 1, it is characterised in that also include：Positioned at the madial wall table of the liquid reserve tank
The stairs device in face, the bottom of the stairs device is arranged at the bottom of the liquid reserve tank, and the top of the stairs device is less than
Or equal to the bottom of the drainage system, the stairs device successively decreases step by step from liquid reserve tank bottom to top, the stairs device
Liquid level of the top greater than or equal to the chemical cleaning solution in liquid reserve tank.
12. chemically-cleaning device as claimed in claim 1, it is characterised in that the liquid reserve tank is cylinder, the separating tube road
Quantity be 1~2 π r/L, wherein, r be the liquid reserve tank radius, L be adjacent separating tube road to drainage system extend one end it
Between distance, and the angle between some separating tube roads is equal.
13. chemically-cleaning device as claimed in claim 12, it is characterised in that the adjacent separating tube road extends to drainage system
The distance between one end L is 31.7 centimetres~34.9 centimetres.
14. chemically-cleaning device as claimed in claim 1, it is characterised in that the separating tube road to drainage system it is default away from
From for 4.8 centimetres~7.3 centimetres.
15. chemically-cleaning device as claimed in claim 1, it is characterised in that when the separating tube road is to drainage system outputization
The speed for learning cleaning fluid is faster, and the separating tube road is got over towards one end of drainage system to distance between the liquid level of chemical cleaning solution
It is small.
16. chemically-cleaning device as claimed in claim 1, it is characterised in that the liquid reserve tank includes inner and outer wall, described interior
Having between wall and outer wall has nitrogen in closed cavity, the cavity.
17. chemically-cleaning device as claimed in claim 1, it is characterised in that the output channel is connected with filter, described
Filter is used to filter the impurity removed in chemical cleaning solution.
18. chemically-cleaning device as claimed in claim 1, it is characterised in that also include：Processing chamber housing, the output channel with
The processing chamber housing connection, makes the chemical cleaning solution in liquid reserve tank enter processing chamber housing by output channel, chemical clear to carry out
Wash technique.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310401334.5A CN104425310B (en) | 2013-09-05 | 2013-09-05 | Chemically-cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310401334.5A CN104425310B (en) | 2013-09-05 | 2013-09-05 | Chemically-cleaning device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104425310A CN104425310A (en) | 2015-03-18 |
| CN104425310B true CN104425310B (en) | 2017-07-14 |
Family
ID=52973971
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310401334.5A Active CN104425310B (en) | 2013-09-05 | 2013-09-05 | Chemically-cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104425310B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1379447A (en) * | 2001-04-10 | 2002-11-13 | 华邦电子股份有限公司 | Chip washing equipment preventing blocking of pipe wall |
| CN201353576Y (en) * | 2009-02-20 | 2009-12-02 | 无锡威孚奥特凯姆精密机械有限公司 | Liquid collecting device for repeatedly using cleaning fluid |
| CN201782331U (en) * | 2010-08-06 | 2011-04-06 | 马如夫 | Cutter frame condiment basket and rice bin combined cabinet |
| CN202576251U (en) * | 2012-04-20 | 2012-12-05 | 成都中住光纤有限公司 | Optical fiber coating device for reducing bubbles of optical fiber coating |
-
2013
- 2013-09-05 CN CN201310401334.5A patent/CN104425310B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1379447A (en) * | 2001-04-10 | 2002-11-13 | 华邦电子股份有限公司 | Chip washing equipment preventing blocking of pipe wall |
| CN201353576Y (en) * | 2009-02-20 | 2009-12-02 | 无锡威孚奥特凯姆精密机械有限公司 | Liquid collecting device for repeatedly using cleaning fluid |
| CN201782331U (en) * | 2010-08-06 | 2011-04-06 | 马如夫 | Cutter frame condiment basket and rice bin combined cabinet |
| CN202576251U (en) * | 2012-04-20 | 2012-12-05 | 成都中住光纤有限公司 | Optical fiber coating device for reducing bubbles of optical fiber coating |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104425310A (en) | 2015-03-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105359259B (en) | The flushing of single use in linear kalimeris brother Buddhist nun's drier | |
| JP5549026B1 (en) | Inner wall surface processing method for micro vacancy | |
| CN109201608A (en) | A kind of wafer high-efficiency washing device and cleaning method | |
| CN218274527U (en) | Wet etching cleaning device capable of improving uniformity after etching | |
| CN104425310B (en) | Chemically-cleaning device | |
| CN205146761U (en) | Silicon chip cleaning system | |
| CN114405072A (en) | Spraying system suitable for chemical etching is used | |
| CN207430788U (en) | A kind of spray system | |
| CN210778501U (en) | Wet etching and cleaning device | |
| CN204685622U (en) | A kind of silicon wafer cleaner pure water recovery system | |
| CN102254793A (en) | Double-layer quartz groove for cleaning silicon wafer | |
| CN206716611U (en) | Electronic product protecting cover cleaning device | |
| CN202881395U (en) | Water seal device of acid tank | |
| CN203090717U (en) | Ultra-clean high-efficiency absorption tower | |
| CN106852293A (en) | The juvenile fish culturing pool of temperature-controllable | |
| KR102112654B1 (en) | A device for removing isopropyl alcohol from a semiconductor process comprising a U-turn type and water contact filler | |
| CN208861942U (en) | A kind of etching device | |
| CN209328856U (en) | A kind of flow-harmonization device | |
| CN108636917B (en) | Anti-coagulation liquid tank, anti-coagulation liquid tank system and anti-coagulation method | |
| CN105883954B (en) | Air-dissolving air-float contact chamber | |
| CN205556198U (en) | Cavity ceramic plate, empty bubble generating device of nanometer water film and exhaust treatment device | |
| TWI648804B (en) | Processes and apparatus for cleaning, rinsing, and drying substrates | |
| CN204769666U (en) | Silicon chip washing unit | |
| JP2021068873A (en) | Wafer surface cleaning device and wafer surface cleaning method | |
| CN220400612U (en) | Wet oxidation device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |