CN220400612U - Wet oxidation device - Google Patents

Abstract

The utility model discloses a wet oxidation device, which comprises an oxidation tank and a plurality of rinsing tanks, wherein each rinsing tank at least comprises a first rinsing tank and a second rinsing tank, a liquid inlet is formed in the first rinsing tank, a liquid outlet is formed in the second rinsing tank, the plurality of rinsing tanks are sequentially communicated in a preset water flow direction, the communicating ports among the rinsing tanks are sequentially lowered in the preset water flow direction, the water level in the rinsing tanks is sequentially lowered, and rinsing liquid can enter from the liquid inlet of the first rinsing tank and sequentially flow through all the rinsing tanks and then is discharged from the liquid outlet of the second rinsing tank. The device is provided with a plurality of rinsing tanks, and the material parts sequentially enter the rinsing tanks for rinsing, so that the residual oxidizing solution on the surface of the material parts can be removed more cleanly; and a plurality of rinsing tanks communicate in proper order, and the rinsing liquid can flow through all rinsing tanks in proper order from first rinsing tank, and the rinsing liquid is used repeatedly in each rinsing tank, compares in continuously injecting the rinsing liquid to a plurality of solitary rinsing tanks, and this scheme can save the quantity of rinsing liquid.

Description

Wet oxidation device

Technical Field

The utility model relates to the technical field of semiconductors, in particular to a wet oxidation device.

Background

In the semiconductor production process, in order to improve the photoelectric conversion efficiency, it is generally required to grow an oxide layer on the surface of the material. Compared with dry oxidation, the wet oxidation process can greatly reduce the production cost, and in the process with low requirement on the compactness of the oxide layer, the wet oxidation is an ideal method for growing the oxide layer.

The wet oxidation process of compound semiconductor device in the prior art is based on the principle that the material piece is soaked in strong oxide at a certain temperature to generate oxidation reaction, and oxide substances are generated on the surface of the material piece, so as to achieve the aim of optimizing the performance of the device.

The existing semiconductor wet oxidation device directly uses the oxidized material as a finished product, ignores that an oxidized oxidizing solution remains on the surface of the oxidized semiconductor wafer, and greatly influences the electric performance due to the cleanliness of the surface of the material. Once the purity of the material itself is reduced by an order of magnitude, parameters such as the conductivity, electron mobility, etc. of the material may be affected.

Disclosure of Invention

In order to overcome the defects in the prior art, the utility model provides a wet oxidation device which divides a rinsing tank into a plurality of rinsing tanks, and the plurality of rinsing tanks can rinse a material piece for a plurality of times so as to remove residual oxidation solution on the surface of the material piece.

In order to achieve the above purpose, the utility model adopts the following technical scheme: a wet oxidation device comprises an oxidation tank for forming an oxidation layer on a material, and a plurality of rinsing tanks for removing residual oxidation solution from oxidized material,

the utility model discloses a washing machine, including first washing tank, second washing tank, the washing tank includes at least first washing tank and second washing tank be equipped with the inlet on the first washing tank be equipped with the liquid outlet on the second washing tank, a plurality of the washing tank is in proper order linked together according to predetermineeing the rivers direction, the height of the intercommunication mouth between the washing tank reduces in proper order, the water level in the washing tank reduces in proper order, and the washing liquid can follow the inlet of first washing tank gets into and flows through all washing tanks in proper order after follow the liquid outlet of second washing tank discharges.

Further, the wet oxidation device comprises a tank body, a plurality of partition boards are arranged in the tank body, the partition boards divide the tank body into a plurality of rinsing tanks, overflow holes for communicating rinsing tanks on two sides of the partition boards are formed in the partition boards, and the rinsing tanks provided with the communication ports are communicated with adjacent rinsing tanks according to a preset water flow direction.

Further, a plurality of the partitions may be arranged at intervals along a straight line or may be arranged to intersect.

Further, each partition plate is provided with a plurality of overflow holes, the overflow holes are arranged in a straight line in the horizontal direction, and the bottom of each overflow hole is in a zigzag shape.

Further, the oxidation tank comprises a main tank and an auxiliary tank, the main tank is communicated with the auxiliary tank through a liquid discharge pipe and a liquid injection pipe, and an oxidation solution can circularly flow between the main tank and the auxiliary tank through the liquid discharge pipe and the liquid injection pipe.

Further, the auxiliary tank is connected with a PH meter, a specific gravity meter and an ORP meter, and the PH meter, the specific gravity meter and the ORP meter are respectively used for detecting the PH value, the specific gravity and the oxidation-reduction potential of the oxidation solution;

the auxiliary tank is also connected with an automatic fluid infusion device which comprises a plurality of fluid infusion tanks, and the automatic fluid infusion device automatically infuses fluid according to the data measured by the PH meter, the specific gravity meter and the ORP meter so as to keep the stability of the oxidation solution.

Further, the oxidation tank comprises a tank body made of PVDF material and a cover plate plated with a Teflon film, and a plurality of liquid level meters and a plurality of temperature sensors are arranged in the tank body.

Further, the wet oxidation device further comprises a mechanical arm for moving the material pieces between the oxidation tank and the plurality of rinsing tanks;

a servo motor and a precise speed reducing motor are arranged on the mechanical arm, and position sensors are arranged on the oxidation tank and the rinsing tank; the grabbing area of the mechanical arm is covered by a baffle plate.

Further, the wet oxidation device comprises two oxidation tanks.

Further, the wet oxidation device further comprises a drying device, and the drying device is used for drying the rinsed material pieces.

By the technical scheme, the utility model has the following beneficial effects:

1. in the method, a plurality of sequentially communicated rinsing tanks are arranged, oxidized material pieces sequentially enter each rinsing tank to be rinsed against the preset water flow direction, and the oxidized solution remained on the surface of the material pieces can be removed more cleanly through multiple rinsing;

2. in the application, the plurality of rinsing tanks are sequentially communicated, and the rinsing liquid can enter from the liquid inlet of the first rinsing tank and sequentially flow through all the rinsing tanks and then is discharged from the liquid outlet of the second rinsing tank, so that continuous water flow is formed, the rinsing liquid is repeatedly used in each rinsing tank, and compared with the continuous injection of the rinsing liquid into a plurality of independent rinsing tanks, the use level of the rinsing liquid can be saved;

3. the oxidation tank and the auxiliary tank in this application are through fluid-discharge tube and notes liquid pipe intercommunication, and during operation, oxidation solution circulate between oxidation tank and auxiliary tank, and the auxiliary tank is connected with automatic fluid infusion device, PH meter, hydrometer and ORP meter, can add required liquid in to oxidation solution according to the data of real-time detection, keeps oxidation solution's stability to guarantee oxidation tank interior material piece oxidation abundant.

The foregoing and other objects, features and advantages of the utility model will be apparent from the following more particular description of preferred embodiments, as illustrated in the accompanying drawings.

Drawings

In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings that are required in the embodiments or the description of the prior art will be briefly described, it being obvious that the drawings in the following description are only some embodiments of the utility model, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.

FIG. 1 is a schematic view of the overall apparatus structure of a wet oxidation apparatus according to an embodiment of the present utility model;

FIG. 2 is a schematic view of the structure of an oxidation section according to an embodiment of the present utility model;

FIG. 3 is a schematic view of an oxidation tank in an embodiment of the present utility model;

FIG. 4 is a schematic view of a rinse tank in accordance with an embodiment of the present utility model;

FIG. 5 is a schematic view of the structure of an overflow aperture in an embodiment of the utility model.

Reference numerals of the above drawings: 1. an oxidation tank; 11. a main groove; 111. a tank body; 112. a cover plate; 113. a liquid level gauge; 114. a temperature sensor; 115. v-shaped guide plates; 12. a secondary groove; 13. a liquid discharge pipe; 14. a liquid injection pipe; 2. a receiving groove; 21. a third rinse tank; 22. a fourth rinse tank; 23. a fifth rinse tank; 24. a sixth rinse tank; 25. a partition plate; 251. an overflow aperture; 252. a liquid discharge hole; 3. an air drying part; 4. a drying part; 5. a PH meter; 6. a specific gravity meter; 7. ORP meter.

Detailed Description

The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.

It should be noted that, in the description of the present utility model, the terms "first," "second," and the like are used for descriptive purposes only and to distinguish between similar objects, and there is no order of preference between them, nor should they be construed as indicating or implying relative importance. Furthermore, in the description of the present utility model, unless otherwise indicated, the meaning of "a plurality" is two or more.

Examples: as shown in fig. 1 to 5, this embodiment discloses a wet oxidation apparatus, which comprises an oxidation tank 1 for forming an oxidation layer on a material, and a rinsing tank for removing residual oxidation solution from the oxidized material, wherein the rinsing tank at least comprises a first rinsing tank and a second rinsing tank, the first rinsing tank is provided with a liquid inlet, the second rinsing tank is provided with a liquid outlet, a plurality of rinsing tanks are sequentially communicated in a preset water flow direction, the heights of the communication ports between the rinsing tanks are sequentially reduced in the preset water flow direction, the water level in the rinsing tank is sequentially reduced, and the rinsing liquid can enter from the liquid inlet of the first rinsing tank and sequentially flow through all the rinsing tanks and then be discharged from the liquid outlet of the second rinsing tank,

and sequentially rinsing the oxidized material pieces in each rinsing tank, wherein the moving path of the material pieces is opposite to the preset water flow direction.

Through the technical scheme, the plurality of rinsing tanks which are sequentially communicated are arranged, oxidized material pieces sequentially enter each rinsing tank for rinsing, after the preset time, the material pieces enter the next rinsing tank for rinsing, and the oxidized solution remained on the surface of the material pieces can be removed more cleanly through multiple times of rinsing;

and a plurality of rinsing tanks are communicated in turn, only need to add the rinsing liquid in the first rinsing tank, the rinsing liquid can follow the inlet of first rinsing tank gets into and flows through after all rinsing tanks in proper order and discharges from the liquid outlet of second rinsing tank, forms continuous rivers, and the rinsing liquid is used repeatedly in each rinsing tank, compares to continuously injecting the rinsing liquid to a plurality of solitary rinsing tanks in, and this scheme can save the quantity of rinsing liquid.

In this embodiment, the wet oxidation apparatus includes an oxidation tank 1, a containing tank 2, an air dryer 3, and a dryer 4, which are sequentially disposed. The wet oxidation device comprises two oxidation tanks 1, wherein each oxidation tank 1 comprises a main tank 11 and an auxiliary tank 12, the main tank 11 and the auxiliary tank 12 are communicated through a liquid discharge pipe 13 and a liquid injection pipe 14, and when the wet oxidation device works, an oxidation solution circularly flows between the main tank 11 and the auxiliary tank 12.

The two oxidation units 1 are in parallel relation and can work simultaneously. By providing two of the oxidation tanks 1, the productivity is increased.

The auxiliary tank 12 is located below the main tank 11, the liquid discharge pipe 13 is connected to the bottom of the main tank 11 and the top of the auxiliary tank 12, and the liquid injection pipe 14 is connected to the bottom of the auxiliary tank 12 and the side wall of the main tank 11.

A V-shaped deflector 115 is arranged above the connection between the main tank 11 and the drain pipe 13 to ensure that the drain is completely discharged.

The auxiliary tank 12 is connected with a PH meter 5, a hydrometer 6 and an ORP meter 7 and is used for detecting the PH value, specific gravity and oxidation-reduction potential of the solution in the auxiliary tank respectively;

the auxiliary tank 12 is also connected with an automatic fluid supplementing device (not shown) which comprises a plurality of fluid supplementing tanks, and HNO is respectively arranged in the fluid supplementing tanks ₃ 、H ₂ O ₂ The automatic fluid replacement device automatically supplements fluid according to the data measured by the PH meter 5, the specific gravity meter 6 and the ORP meter 7 so as to maintain the stability of the oxidation solution.

Through the technical scheme, the device can detect various values of the oxidation solution in real time, and add the lacking solution into the oxidation solution in real time, and meanwhile, the oxidation solution can be ensured to sufficiently react in the main tank 11 because the oxidation solution circularly flows between the main tank 11 and the auxiliary tank 12. Deionized water with a rinse solution of 18M ohm resistivity was added to the rinse tank.

Compared with the prior art that the oxidation solution is directly discharged for waste after being used, the proposal can save the consumption of the oxidation solution.

As shown in fig. 3, the oxidation tank 1 comprises a tank body 111 made of PVDF and a cover plate 112 coated with a teflon film, and two liquid level meters 113 and two temperature sensors 114 are arranged in the tank body 111. If one of the liquid level meter 113 or the temperature sensor 114 is abnormal, the other one can work normally, so that the stability and the safety of the equipment are improved to a great extent.

In this embodiment, as shown in fig. 1 and 4, the accommodating tank 2 has a first end and a second end opposite to each other, three parallel partitions 25 are disposed in the accommodating tank 2, the three partitions 25 divide the accommodating tank 2 into four rinse tanks, namely, a third rinse tank 21, a fourth rinse tank 22, a fifth rinse tank 23 and a sixth rinse tank 24, the third rinse tank 21, the fourth rinse tank 22, the fifth rinse tank 23 and the sixth rinse tank 24 are arranged from the first end toward the second end, overflow holes 251 are disposed on the partitions 25 between two adjacent rinse tanks, and the heights of the overflow holes 251 decrease from the first end toward the second end in sequence; a drain hole 252 is formed in the sixth rinse tank 24, and the height of the drain hole 252 is lower than the overflow hole 251 with the lowest height; the rinse liquid is injected from the third rinse tank 21, flows into and fills each of the rinse tanks in sequence through the overflow holes 251, and is discharged from the drain holes 252 in the sixth rinse tank 24.

As shown in fig. 5, two overflow holes 251 are provided on the partition plate 25 between two adjacent rinsing tanks, the two overflow holes 251 are arranged in a straight line at the same level, and the bottom of each overflow hole 251 is in a zigzag shape, so as to avoid the vortex phenomenon caused by overflow.

When the rinse tank is used, deionized water with the resistivity of 18M is injected from the third rinse tank 21, an overflow hole 251 is formed in a partition plate 25 between the third rinse tank 21 and the fourth rinse tank 22, and after the deionized water in the third rinse tank 21 reaches a certain water level, the deionized water flows into the fourth rinse tank 22 from the overflow hole 251. An overflow hole 251 is provided in the partition plate 25 between the fourth rinse tank 22 and the fifth rinse tank 23, and deionized water in the fourth rinse tank 22 flows into the fifth rinse tank 23 from the overflow hole 251 after reaching a certain water level. An overflow hole 251 is formed in the partition plate 25 between the fifth rinsing tank 23 and the sixth rinsing tank 24, and deionized water in the fifth rinsing tank 23 reaches a certain level and flows into the sixth rinsing tank 24 from the overflow hole 251. The sixth rinsing tank 24 has a drain hole 252, and deionized water in the sixth rinsing tank 24 reaches a certain level and is drained from the drain hole 252.

Wherein the height of the overflow hole 251 decreases from the third rinse tank 21 toward the sixth rinse tank 24, and the height of the drain hole 252 is lower than the overflow hole 251 between the fifth rinse tank 23 and the sixth rinse tank 24.

Through the above technical scheme, only the rinse liquid needs to be added into the third rinse tank 21, and the rinse liquid can sequentially flow into and fill each rinse tank through the overflow holes 251 and generate continuous water flow, so that the rinse liquid is repeatedly used in each rinse tank, and compared with the continuous injection of the rinse liquid into a plurality of independent rinse tanks, the use amount of the rinse liquid can be saved.

The oxidized material piece firstly enters the sixth rinsing tank 24 for rinsing, the material piece is taken out of the sixth rinsing tank 24 and put into the fifth rinsing tank 23 for rinsing after a preset time, the material piece is taken out of the fifth rinsing tank 23 and put into the fourth rinsing tank 22 for rinsing after the preset time, the material piece is taken out of the fourth rinsing tank 22 and put into the third rinsing tank 21 for rinsing until rinsing after the preset time, and the material piece is taken out after the preset time, namely the rinsing process of the material piece is completed.

The rinsed material pieces are dried by the air dryer 3 and the dryer 4, so that the material pieces are convenient for subsequent storage.

In another possible embodiment, the wet oxidation apparatus further includes a mechanical arm (not shown in the figure), through which the material-gripping member passes sequentially through the oxidation tank 1, the rinse tank 2, the air dryer 3, and the dryer 4;

a servo motor and a precise speed reducing motor are arranged on the mechanical arm, and position sensors are arranged on the oxidation tank 1 and the rinsing tank to ensure grabbing precision;

the grabbing area of the mechanical arm is covered by a blending material of polypropylene and polyvinyl chloride, so that corrosion injury to the mechanical arm is reduced.

The principles and embodiments of the present utility model have been described in detail with reference to specific examples, which are provided to facilitate understanding of the method and core ideas of the present utility model; meanwhile, as those skilled in the art will have variations in the specific embodiments and application scope in accordance with the ideas of the present utility model, the present description should not be construed as limiting the present utility model in view of the above.

Claims (10)

1. A wet oxidation apparatus is characterized by comprising an oxidation tank for forming an oxide layer on a material, and a plurality of rinsing tanks for removing residual oxidation solution from the oxidized material,

the utility model discloses a washing machine, including first washing tank, second washing tank, the washing tank includes at least first washing tank and second washing tank be equipped with the inlet on the first washing tank be equipped with the liquid outlet on the second washing tank, a plurality of the washing tank is in proper order linked together according to predetermineeing the rivers direction, the height of the intercommunication mouth between the washing tank reduces in proper order, the water level in the washing tank reduces in proper order, and the washing liquid can follow the inlet of first washing tank gets into and flows through all washing tanks in proper order after follow the liquid outlet of second washing tank discharges.

2. The wet oxidation apparatus according to claim 1, wherein the wet oxidation apparatus comprises a tank body, a plurality of partition plates are provided in the tank body, the plurality of partition plates divide the tank body into a plurality of rinsing tanks, overflow holes for communicating rinsing tanks on both sides of the partition plates are provided in the partition plates, and the rinsing tank provided with the communication port is communicated with the adjacent rinsing tank according to a preset water flow direction.

3. The wet oxidation apparatus according to claim 2, wherein a plurality of said separators are disposed at intervals along a straight line or are disposed in a cross-connection.

4. The wet oxidation apparatus according to claim 2, wherein each of the separators is provided with a plurality of overflow holes, the plurality of overflow holes are arranged in a straight line in a horizontal direction, and a bottom of each of the overflow holes is zigzag.

5. The wet oxidation apparatus according to claim 1, wherein said oxidation tank comprises a main tank and a sub tank, said main tank and said sub tank being in communication with each other via a drain pipe and a liquid injection pipe, and an oxidizing solution being capable of circulating between said main tank and said sub tank via said drain pipe and said liquid injection pipe.

6. The wet oxidation apparatus of claim 5, wherein said sub-tank is connected to a PH meter, a specific gravity meter and an ORP meter, said PH meter, said specific gravity meter and said ORP meter being respectively configured to detect PH, specific gravity and oxidation-reduction potential of the oxidizing solution;

the auxiliary tank is also connected with an automatic fluid infusion device which comprises a plurality of fluid infusion tanks, and the automatic fluid infusion device automatically infuses fluid according to the data measured by the PH meter, the specific gravity meter and the ORP meter so as to keep the stability of the oxidation solution.

7. The wet oxidation apparatus according to claim 5, wherein the oxidation tank comprises a tank body made of PVDF material and a cover plate plated with a Teflon film, and a plurality of liquid level meters and a plurality of temperature sensors are arranged in the tank body.

8. The wet oxidation apparatus of claim 1, further comprising a robotic arm for moving the material between the oxidation tank and the plurality of rinse tanks;

a servo motor and a precise speed reducing motor are arranged on the mechanical arm, and position sensors are arranged on the oxidation tank and the rinsing tank; the grabbing area of the mechanical arm is covered by a baffle plate.

9. The wet oxidation apparatus of claim 1, wherein said wet oxidation apparatus comprises two of said oxidation tanks.

10. The wet oxidation apparatus of claim 1, further comprising a drying apparatus for drying the rinsed material.