CN104350425B - 液浸构件及曝光装置 - Google Patents

液浸构件及曝光装置 Download PDF

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Publication number
CN104350425B
CN104350425B CN201380029835.3A CN201380029835A CN104350425B CN 104350425 B CN104350425 B CN 104350425B CN 201380029835 A CN201380029835 A CN 201380029835A CN 104350425 B CN104350425 B CN 104350425B
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China
Prior art keywords
liquid immersion
liquid
substrate
optical
path
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Application number
CN201380029835.3A
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English (en)
Chinese (zh)
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CN104350425A (zh
Inventor
柴崎祐
柴崎祐一
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Nikon Corp
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Nikon Corp
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Priority to CN201711011972.0A priority Critical patent/CN107728434B/zh
Publication of CN104350425A publication Critical patent/CN104350425A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
CN201380029835.3A 2012-04-10 2013-03-15 液浸构件及曝光装置 Active CN104350425B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201711011972.0A CN107728434B (zh) 2012-04-10 2013-03-15 液浸构件及曝光装置

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261622235P 2012-04-10 2012-04-10
US61/622,235 2012-04-10
US13/793,667 US9323160B2 (en) 2012-04-10 2013-03-11 Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US13/793,667 2013-03-11
PCT/JP2013/058454 WO2013153939A1 (en) 2012-04-10 2013-03-15 Liquid immersion member and exposure apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201711011972.0A Division CN107728434B (zh) 2012-04-10 2013-03-15 液浸构件及曝光装置

Publications (2)

Publication Number Publication Date
CN104350425A CN104350425A (zh) 2015-02-11
CN104350425B true CN104350425B (zh) 2017-11-28

Family

ID=49292050

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201380029835.3A Active CN104350425B (zh) 2012-04-10 2013-03-15 液浸构件及曝光装置
CN201711011972.0A Active CN107728434B (zh) 2012-04-10 2013-03-15 液浸构件及曝光装置

Family Applications After (1)

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CN201711011972.0A Active CN107728434B (zh) 2012-04-10 2013-03-15 液浸构件及曝光装置

Country Status (8)

Country Link
US (4) US9323160B2 (https=)
EP (1) EP2836875B1 (https=)
JP (3) JP6245179B2 (https=)
KR (1) KR102158968B1 (https=)
CN (2) CN104350425B (https=)
HK (2) HK1204682A1 (https=)
TW (3) TWI698720B (https=)
WO (1) WO2013153939A1 (https=)

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CN109856922B (zh) * 2017-11-30 2020-11-13 上海微电子装备（集团）股份有限公司 浸没流体控制装置、浸没式光刻系统与回收控制方法
KR102649164B1 (ko) 2017-12-15 2024-03-20 에이에스엠엘 네델란즈 비.브이. 유체 핸들링 구조체, 리소그래피 장치, 유체 핸들링 구조체를 사용하는 방법 및 리소그래피 장치를 사용하는 방법
JP6575629B2 (ja) * 2018-04-04 2019-09-18 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
CN112650028B (zh) * 2020-12-25 2024-02-09 浙江启尔机电技术有限公司 一种改善浸没流场压力特性的浸液供给回收装置

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US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
US8068209B2 (en) 2007-03-23 2011-11-29 Nikon Corporation Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
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US8451425B2 (en) * 2007-12-28 2013-05-28 Nikon Corporation Exposure apparatus, exposure method, cleaning apparatus, and device manufacturing method
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JP5232901B2 (ja) * 2011-07-22 2013-07-10 株式会社ニコン 露光装置及びデバイス製造方法
NL2009271A (en) 2011-09-15 2013-03-18 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9323160B2 (en) * 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

Also Published As

Publication number Publication date
JP6245179B2 (ja) 2017-12-13
KR20150005603A (ko) 2015-01-14
US9810999B2 (en) 2017-11-07
KR102158968B1 (ko) 2020-09-23
TW201928530A (zh) 2019-07-16
JP2015515738A (ja) 2015-05-28
EP2836875A1 (en) 2015-02-18
CN104350425A (zh) 2015-02-11
EP2836875B1 (en) 2020-11-18
US9323160B2 (en) 2016-04-26
TWI698720B (zh) 2020-07-11
US10139736B2 (en) 2018-11-27
CN107728434B (zh) 2020-04-03
US10520828B2 (en) 2019-12-31
HK1204090A1 (en) 2015-11-06
TWI658335B (zh) 2019-05-01
JP6569717B2 (ja) 2019-09-04
US20130265555A1 (en) 2013-10-10
TW201804261A (zh) 2018-02-01
US20160223915A1 (en) 2016-08-04
JP2018022198A (ja) 2018-02-08
HK1204682A1 (en) 2015-11-27
US20190056672A1 (en) 2019-02-21
TWI611270B (zh) 2018-01-11
US20180039186A1 (en) 2018-02-08
CN107728434A (zh) 2018-02-23
JP2019191613A (ja) 2019-10-31
HK1245901A1 (zh) 2018-08-31
WO2013153939A1 (en) 2013-10-17
TW201344376A (zh) 2013-11-01

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