CN104335079B - 可显影底部抗反射涂层组合物以及使用其的图案形成方法 - Google Patents
可显影底部抗反射涂层组合物以及使用其的图案形成方法 Download PDFInfo
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- CN104335079B CN104335079B CN201380027001.9A CN201380027001A CN104335079B CN 104335079 B CN104335079 B CN 104335079B CN 201380027001 A CN201380027001 A CN 201380027001A CN 104335079 B CN104335079 B CN 104335079B
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Classifications
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
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- G—PHYSICS
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- G02B1/11—Anti-reflection coatings
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- G—PHYSICS
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
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- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
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Abstract
Description
Claims (25)
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US13/537,177 US8999624B2 (en) | 2012-06-29 | 2012-06-29 | Developable bottom antireflective coating composition and pattern forming method using thereof |
PCT/US2013/048180 WO2014004828A1 (en) | 2012-06-29 | 2013-06-27 | Developable bottom antireflective coating composition and pattern forming method using thereof |
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JP (1) | JP2015524573A (zh) |
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US8999624B2 (en) | 2012-06-29 | 2015-04-07 | International Business Machines Corporation | Developable bottom antireflective coating composition and pattern forming method using thereof |
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US10036953B2 (en) | 2013-11-08 | 2018-07-31 | Taiwan Semiconductor Manufacturing Company | Photoresist system and method |
KR101788091B1 (ko) * | 2014-09-30 | 2017-11-15 | 삼성에스디아이 주식회사 | 중합체, 유기막 조성물, 유기막, 및 패턴형성방법 |
KR102374049B1 (ko) | 2015-06-02 | 2022-03-14 | 삼성전자주식회사 | 포토레지스트를 이용한 패턴 형성 방법 |
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WO2018033995A1 (ja) * | 2016-08-19 | 2018-02-22 | 大阪有機化学工業株式会社 | 易剥離膜形成用硬化性樹脂組成物及びその製造方法 |
JP7008627B2 (ja) * | 2016-08-19 | 2022-02-10 | 大阪有機化学工業株式会社 | 易剥離膜形成用硬化性樹脂組成物及びその製造方法 |
TWI805617B (zh) | 2017-09-15 | 2023-06-21 | 南韓商Lg化學股份有限公司 | 層壓板 |
TWI777426B (zh) * | 2020-02-27 | 2022-09-11 | 台灣積體電路製造股份有限公司 | 光阻底層組成物與製造半導體裝置的方法 |
US20210389670A1 (en) * | 2020-06-12 | 2021-12-16 | Taiwan Semiconductor Manufacturing Co., Ltd. | Photoresist composition and method of manufacturing a semiconductor device |
US11940730B2 (en) | 2020-12-31 | 2024-03-26 | Rohm And Haas Electronic Materials Llc | Photoresist compositions and pattern formation methods |
US20220406593A1 (en) * | 2021-05-27 | 2022-12-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Coating composition for photolithography |
CN116102680B (zh) * | 2021-11-09 | 2024-02-13 | 上海新阳半导体材料股份有限公司 | 一种底部抗反射涂层及其制备方法和应用 |
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-
2012
- 2012-06-29 US US13/537,177 patent/US8999624B2/en not_active Expired - Fee Related
-
2013
- 2013-06-27 WO PCT/US2013/048180 patent/WO2014004828A1/en active Application Filing
- 2013-06-27 SG SG11201404867YA patent/SG11201404867YA/en unknown
- 2013-06-27 JP JP2015520503A patent/JP2015524573A/ja active Pending
- 2013-06-27 CN CN201380027001.9A patent/CN104335079B/zh not_active Expired - Fee Related
- 2013-06-27 GB GB1419648.9A patent/GB2517324B/en not_active Expired - Fee Related
- 2013-06-27 DE DE112013003188.4T patent/DE112013003188B4/de not_active Expired - Fee Related
- 2013-06-27 KR KR1020147022752A patent/KR20140126324A/ko not_active Application Discontinuation
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2014
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JP2015524573A (ja) | 2015-08-24 |
GB2517324A (en) | 2015-02-18 |
GB2517324B (en) | 2015-06-03 |
US20140004712A1 (en) | 2014-01-02 |
GB201419648D0 (en) | 2014-12-17 |
US20150050601A1 (en) | 2015-02-19 |
US8999624B2 (en) | 2015-04-07 |
US9040225B2 (en) | 2015-05-26 |
SG11201404867YA (en) | 2014-09-26 |
CN104335079A (zh) | 2015-02-04 |
WO2014004828A1 (en) | 2014-01-03 |
DE112013003188B4 (de) | 2023-01-12 |
DE112013003188T5 (de) | 2015-03-12 |
KR20140126324A (ko) | 2014-10-30 |
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