CN104228182A - 壳体及其制备方法 - Google Patents

壳体及其制备方法 Download PDF

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CN104228182A
CN104228182A CN201310248644.8A CN201310248644A CN104228182A CN 104228182 A CN104228182 A CN 104228182A CN 201310248644 A CN201310248644 A CN 201310248644A CN 104228182 A CN104228182 A CN 104228182A
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CN104228182B (zh
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张春杰
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Taizhou Zhongtianhe Intelligent Equipment Co ltd
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Shenzhen Futaihong Precision Industry Co Ltd
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Priority to JP2014127057A priority patent/JP5889965B2/ja
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Abstract

本发明提供一种壳体，包括基体、形成于该基体表面的打底层、形成于打底层表面的过渡层及形成于该过渡层表面的色彩层，该过渡层为氧化铝层，该色彩层为碳氮化钛锆层，该色彩层呈现的色度区域于CIELAB表色系统的L*坐标介于70至80之间，a*坐标介于10至15之间，b*坐标介于22至30之间。本发明还提供一种上述壳体的制备方法。

Description

壳体及其制备方法
技术领域
本发明涉及一种壳体及其制备方法，尤其涉及一种具有黄色釉膜外观的壳体及其制备方法。
背景技术
为了使电子装置的壳体具有丰富色彩，目前主要通过阳极氧化、烤漆、烤瓷等工艺制备装饰性涂层。相比这些传统工艺，PVD镀膜技术更加绿色环保，且采用PVD镀膜技术可在产品壳体表面形成具有金属质感的装饰性色彩层。
然而现有技术中，利用PVD镀膜技术于壳体表面形成的膜层的色彩非常有限，目前能够广泛制备和使用的PVD膜层主要为金黄色、黑色、白色等色系，而且现有的黄色系PVD膜层硬度较低，容易被磨损。
发明内容
有鉴于此，本发明提供一种具有黄色釉膜外观且耐磨损的壳体。
另外，本发明还提供一种上述壳体的制备方法。
一种壳体，包括基体，该壳体还包括形成于该基体表面的打底层、形成于打底层表面的过渡层及形成于该过渡层表面的色彩层，该过渡层为氧化铝层，该色彩层为碳氮化钛锆层，该色彩层呈现的色度区域于CIE LAB表色系统的L*坐标介于70至80之间，a*坐标介于10至15之间，b*坐标介于22至30之间。
一种壳体的制备方法，包括如下步骤：
提供基体；
通过磁控溅射方法在基体表面沉积打底层，该打底层为钛锆合金层；
通过多弧离子镀在所述打底层上沉积过渡层，该过渡层为氧化铝层；
通过磁控溅射方法在所述过渡层上沉积色彩层，该色彩层为碳氮化钛锆层，该色彩层呈现的色度区域于CIE LAB表色系统的L*坐标介于70至80之间，a*坐标介于10至15之间，b*坐标介于22至30之间。
上述壳体的制备方法通过磁控溅射方法形成所述由碳氮化钛锆组成的色彩层，使该色彩层呈现稳定的黄色并且具有很好的耐磨性能。该过渡层通过多弧离子镀形成，沉积速度快，且使过渡层与打底层具有较高的结合力，而色彩层17采用磁控溅射方法形成，使色彩层17比较细腻、光滑，具有仿陶瓷釉膜的外观。
附图说明
图1是本发明较佳实施例壳体的剖面示意图。
图2是本发明较佳实施例镀膜件的制备方法中所用真空镀膜设备的结构示意图。
主要元件符号说明
壳体 10
基体 11
打底层 13
过渡层 15
色彩层 17
真空镀膜设备 100
真空室 20
转架 30
真空抽气系统 40
弧源装置 50
磁控钛靶 61
磁控锆靶 62
铝靶 63
如下具体实施方式将结合上述附图进一步说明本发明。
具体实施方式
请参阅图1，本发明较佳实施例的壳体10包括基体11、形成于基体11上的打底层13、形成于打底层13上的过渡层15及形成于过渡层15上的色彩层17。该色彩层17肉眼直观呈黄色。
基体11的材质可为不锈钢或模具钢。
该打底层13由钛金属与锆金属组成，其为一钛锆合金层。打底层13中，钛的质量百分含量为55%-70%，较佳为60%。打底层13的厚度大约为0.2μm-0.4μm。打底层13可提高过渡层15与基体11的结合力。
该过渡层15为氧化铝（Al2O3）层。过渡层15具有较高的硬度，有利于提高壳体10表面膜层的整体硬度。过渡层15的厚度大约为0.4μm-0.8μm。过渡层15呈灰色，其不会干扰色彩层17的颜色。
所述色彩层17为碳氮化钛锆（TiZrCN）层。该色彩层17肉眼直观呈现黄色，其呈现的色度区域于CIE LAB表色系统的L*坐标介于70至80之间，a*坐标介于10至15之间，b*坐标介于22至30之间。色彩层17包括碳氮化钛（TiCN）相和碳氮化锆（ZrCN）相，其中碳氮化锆相具有较高的硬度，可提高色彩层17的耐磨性能。色彩层17的厚度可为1.2μm至2.0μm。
所述打底层13及色彩层17通过磁控溅射方法形成，该过渡层15通过多弧离子镀方法形成。
本发明较佳实施例的上述壳体10的制作方法，包括以下步骤：
提供一基体11。基体11的材质可为金属，如不锈钢或模具钢。
通过磁控溅射在基体11的表面沉积该打底层13。
磁控溅射沉积该打底层13是在一真空镀膜设备100（参图2）中进行。该真空镀膜设备100为多功能镀膜设备，其可进行多弧离子镀及磁控溅射。该真空镀膜设备100包括真空室20、位于真空室20内的转架30、用以对真空室20抽真空的真空抽气系统40、以及若干个弧源装置50。真空室20中还设置有若干磁控钛靶61、若干磁控锆靶62及置于弧源装置50的阴极弧源位置上的若干铝靶63。沉积该打底层13时，将基体11固定于所述转架30上。真空室20被抽真空至3×10－3Pa-8×10－3Pa后，向真空室20内充入流量为100sccm（标准状态毫升/分钟）的氩气。调节真空室内20温度为160℃-200℃。对所述磁控钛靶61及磁控锆靶62施加250V的负偏压，设置偏压电源的占空比为50%。开启所述磁控钛靶61及磁控锆靶62的电源，并调节电源功率均为6kW-8kW，对基体11溅射8-15分钟，以于该基体11表面形成所述由钛锆合金组成的打底层13。
通过多弧离子镀在所述打底层13上沉积该过渡层15。多弧离子镀制备该过渡层15是在所述真空镀膜设备100中进行。形成有所述打底层13的基体11固定于所述转架30上。继续对真空室20抽真空并向真空室20充入流量为100sccm的氩气，同时，向真空室20通入流量为150sccm-200sccm的氧气，对所述铝靶63施加200V的负偏压，设置偏压电源的占空比为50%。开启铝靶63的电源，并调节电源的电压为15V-35V，电流为40A-70A，以在打底层13上沉积所述由氧化铝形成的过渡层15，沉积时间为50-60分钟。
然后，通过磁控溅射在所述过渡层15上沉积该色彩层17。磁控溅射沉积该色彩层17是在所述真空镀膜设备100中进行。形成有所述打底层13及过渡层15的基体11固定于所述转架30上。继续对真空室20抽真空并向真空室20充入流量为100sccm的氩气，同时，向真空室20通入流量为200sccm-230sccm的氮气，以及流量为200sccm-230sccm的乙炔（C2H2）气体，对所述磁控钛靶61及磁控锆靶62施加250V的负偏压，设置偏压电源的占空比为40%。开启磁控钛靶61及磁控锆靶62的电源，并调节电源功率均为5kW-10kW，以在过渡层15上沉积所述由TiCN陶瓷相及ZrCN陶瓷组成的色彩层17，沉积时间为35-40分钟。沉积该色彩层17时，占空比小于沉积打底层13及过渡层15的占空比，占空比变小，对应的沉积速率相对降低，有利于提高膜层的结合力。
下面结合具体实施例，对本发明进行进一步详细说明。
实施例
将不锈钢材质的基体11放入真空镀膜设备100中，磁控溅射打底层13。基体11固定于所述转架30上。真空室20被抽真空至5×10－3Pa后，向真空室20内充入流量为100sccm（标准状态毫升/分钟）的氩气。调节真空室内20温度为180℃。对所述磁控钛靶61及磁控锆靶62施加250V的负偏压，设置偏压电源的占空比为50%。开启所述磁控钛靶61及磁控锆靶62的电源，并调节电源功率均为8kW，对基体11溅射8分钟，于该基体11表面形成由钛锆合金组成的打底层13。打底层13中钛的质量含量为60%。
多弧离子镀沉积该过渡层15。继续对真空室20抽真空并向真空室20充入流量为100sccm的氩气，同时，向真空室20通入流量为160sccm的氧气，对所述铝靶63施加200V的负偏压，设置偏压电源的占空比为50%。开启铝靶63的电源，并调节电源的电压为20V，对应电流为60A-70A，在打底层13上沉积所述由氧化铝形成的过渡层15，沉积时间为50分钟。
磁控溅射沉积该色彩层17。磁继续对真空室20抽真空并向真空室20充入流量为100sccm的氩气，同时，向真空室20通入流量为220sccm的氮气，以及流量为220sccm的乙炔气体，对所述磁控钛靶61及磁控锆靶62施加250V的负偏压，设置偏压电源的占空比为40%。开启磁控钛靶61及磁控锆靶62的电源，并调节电源功率均为6kW，以在过渡层15上沉积所述由TiCN陶瓷相及ZrCN陶瓷组成的色彩层17，沉积时间为40分钟。
本发明壳体10可为笔记型计算机、移动通讯装置、个人数字助理等电子装置的壳体，或为其他装饰类产品的壳体。
所述壳体10的制备方法通过磁控溅射方法在形成所述色彩层17时，通过对靶材的选取，同时对反应气体氮气和乙炔流量的设计和溅射时间的控制，从而使色彩层17呈现稳定的黄色并且具有很好的耐磨性能。该过渡层15通过多弧离子镀形成，沉积速度快，且使过渡层15与打底层13具有较高的结合力。而色彩层17采用磁控溅射方法形成，使色彩层17比较细腻、光滑，具有仿陶瓷的外观。
可以理解，所述打底层13及过渡层15也可以省略，此时，该色彩层17可直接形成于基体11的表面上。

Claims (10)

1.一种壳体，包括基体，其特征在于：该壳体还包括形成于该基体表面的打底层、形成于打底层表面的过渡层及形成于该过渡层表面的色彩层，该过渡层为氧化铝层，该色彩层为碳氮化钛锆层，该色彩层呈现的色度区域于CIE LAB表色系统的L*坐标介于70至80之间，a*坐标介于10至15之间，b*坐标介于22至30之间。
2.如权利要求1所述的壳体，其特征在于：该打底层为钛锆合金层。
3.如权利要求1所述的壳体，其特征在于：该过渡层通过多弧离子镀形成。
4.如权利要求1所述的壳体，其特征在于：该色彩层通过磁控溅射方法形成。
5.如权利要求1所述的壳体，其特征在于：该基体为不锈钢或模具钢。
6.一种壳体，包括基体，其特征在于：该壳体还包括形成于该基体表面的色彩层，该色彩层为碳氮化钛锆层，该色彩层呈现的色度区域于CIE LAB表色系统的L*坐标介于70至80之间，a*坐标介于10至15之间，b*坐标介于22至30之间。
7.一种壳体的制备方法，包括如下步骤：
提供基体；
通过磁控溅射方法在基体表面沉积打底层，该打底层为钛锆合金层；
通过多弧离子镀在所述打底层上沉积过渡层，该过渡层为氧化铝层；
通过磁控溅射方法在所述过渡层上沉积色彩层，该色彩层为碳氮化钛锆层，该色彩层呈现的色度区域于CIE LAB表色系统的L*坐标介于70至80之间，a*坐标介于10至15之间，b*坐标介于22至30之间。
8.如权利要求7所述的壳体的制备方法，其特征在于：磁控溅射沉积该打底层采用钛靶和锆靶。
9.如权利要求7所述的壳体的制备方法，其特征在于：多弧离子镀沉积该过渡层采用铝靶及采用氧气为反应气体，氧气的流量为150sccm-200sccm。
10.如权利要求7所述的壳体的制备方法，其特征在于：磁控溅射沉积该色彩层采用钛靶和锆靶，采用氮气和乙炔为反应气体，氮气的流量为200sccm-230sccm，乙炔的流量为200sccm-230sccm。
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