CN104185663A - 具有对污染的防护性的有机硅组合物 - Google Patents
具有对污染的防护性的有机硅组合物 Download PDFInfo
- Publication number
- CN104185663A CN104185663A CN201380016337.5A CN201380016337A CN104185663A CN 104185663 A CN104185663 A CN 104185663A CN 201380016337 A CN201380016337 A CN 201380016337A CN 104185663 A CN104185663 A CN 104185663A
- Authority
- CN
- China
- Prior art keywords
- group
- weight
- silver
- composition
- bonding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 58
- 229920001296 polysiloxane Polymers 0.000 title claims abstract description 27
- 239000003344 environmental pollutant Substances 0.000 title description 5
- 231100000719 pollutant Toxicity 0.000 title description 5
- 150000001875 compounds Chemical class 0.000 claims abstract description 26
- 239000002245 particle Substances 0.000 claims abstract description 23
- 229910052709 silver Inorganic materials 0.000 claims abstract description 20
- 239000004332 silver Substances 0.000 claims abstract description 20
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 19
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 17
- 239000000945 filler Substances 0.000 claims abstract description 15
- 238000004132 cross linking Methods 0.000 claims abstract description 10
- 238000006459 hydrosilylation reaction Methods 0.000 claims abstract description 6
- 239000003054 catalyst Substances 0.000 claims abstract description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 24
- 239000010703 silicon Substances 0.000 claims description 24
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 23
- 229910052799 carbon Inorganic materials 0.000 claims description 14
- 239000011521 glass Substances 0.000 claims description 13
- 238000005538 encapsulation Methods 0.000 claims description 5
- 238000002156 mixing Methods 0.000 claims description 5
- 238000006116 polymerization reaction Methods 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 3
- 238000002360 preparation method Methods 0.000 claims 1
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 abstract 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 abstract 2
- 239000005373 porous glass Substances 0.000 abstract 1
- -1 siloxanes Chemical class 0.000 description 42
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 18
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 11
- 150000003254 radicals Chemical class 0.000 description 10
- 125000000217 alkyl group Chemical group 0.000 description 9
- 239000007789 gas Substances 0.000 description 8
- 229910052697 platinum Inorganic materials 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 6
- 229920002554 vinyl polymer Polymers 0.000 description 6
- 239000005368 silicate glass Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 4
- 150000001721 carbon Chemical group 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 4
- 229910000077 silane Inorganic materials 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- 239000004205 dimethyl polysiloxane Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 239000000413 hydrolysate Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 239000002923 metal particle Substances 0.000 description 2
- RZJRJXONCZWCBN-UHFFFAOYSA-N octadecane Chemical compound CCCCCCCCCCCCCCCCCC RZJRJXONCZWCBN-UHFFFAOYSA-N 0.000 description 2
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- NHOWDZOIZKMVAI-UHFFFAOYSA-N (2-chlorophenyl)(4-chlorophenyl)pyrimidin-5-ylmethanol Chemical group C=1N=CN=CC=1C(C=1C(=CC=CC=1)Cl)(O)C1=CC=C(Cl)C=C1 NHOWDZOIZKMVAI-UHFFFAOYSA-N 0.000 description 1
- KWEKXPWNFQBJAY-UHFFFAOYSA-N (dimethyl-$l^{3}-silanyl)oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)C KWEKXPWNFQBJAY-UHFFFAOYSA-N 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 125000006043 5-hexenyl group Chemical group 0.000 description 1
- HOPKHJSQWOIIQO-UHFFFAOYSA-N C[SiH2]C.[O] Chemical compound C[SiH2]C.[O] HOPKHJSQWOIIQO-UHFFFAOYSA-N 0.000 description 1
- QGJOPFRUJISHPQ-UHFFFAOYSA-N Carbon disulfide Chemical compound S=C=S QGJOPFRUJISHPQ-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical group CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 1
- 206010020852 Hypertonia Diseases 0.000 description 1
- 239000004594 Masterbatch (MB) Substances 0.000 description 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910004283 SiO 4 Inorganic materials 0.000 description 1
- 239000004902 Softening Agent Substances 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- ROQRYYMOYXKROR-UHFFFAOYSA-N [Pt].C(C)C(=O)C(=O)C Chemical compound [Pt].C(C)C(=O)C(=O)C ROQRYYMOYXKROR-UHFFFAOYSA-N 0.000 description 1
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910014307 bSiO Inorganic materials 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 description 1
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N ferric oxide Chemical compound O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 125000001905 inorganic group Chemical group 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- 229940038384 octadecane Drugs 0.000 description 1
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- PKELYQZIUROQSI-UHFFFAOYSA-N phosphane;platinum Chemical compound P.[Pt] PKELYQZIUROQSI-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- RSNQKPMXXVDJFG-UHFFFAOYSA-N tetrasiloxane Chemical compound [SiH3]O[SiH2]O[SiH2]O[SiH3] RSNQKPMXXVDJFG-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- UHUUYVZLXJHWDV-UHFFFAOYSA-N trimethyl(methylsilyloxy)silane Chemical compound C[SiH2]O[Si](C)(C)C UHUUYVZLXJHWDV-UHFFFAOYSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
- C09D7/62—Additives non-macromolecular inorganic modified by treatment with other compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/08—Metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/40—Glass
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/01—Hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/56—Organo-metallic compounds, i.e. organic compounds containing a metal-to-carbon bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/02—Ingredients treated with inorganic substances
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
- H01L23/296—Organo-silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/08—Metals
- C08K2003/0806—Silver
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
本发明涉及加成-交联有机硅组合物,包含:(A)30-95wt%的具有带有脂肪族碳-碳重键的基团的直链化合物、(B)0.1-20wt%的具有Si-键合氢原子的直链有机聚硅氧烷,或者代替(A)和(B),(C)30-95wt%的具有带有脂肪族碳-碳重键的SiC-键合基团和Si-键合氢原子的直链有机聚硅氧烷、(D)至少一种氢化硅烷化催化剂和(E)5-70wt%的由掺杂银的多孔玻璃颗粒制成的填料,其中,以离子形式掺杂5-50wt%的银。
Description
技术领域
本发明涉及能够对暴露于高腐蚀性环境的电气和电子组件提供保护性封装的加成-交联(addition-crosslinking)有机硅(硅氧烷,硅酮,silicone)组合物。
背景技术
大量的有机硅封装组合物被用于保护电子电路不被腐蚀。已经变得越来越普遍的另一种情况是电子组件暴露于特别地腐蚀性(aggressive)、含硫污染物气体。迄今可获得的有机硅封装组合物具有对硫、硫化氢、二氧化硫、二硫化碳和其他有机硫化合物的高渗透性,和金属导体轨道的腐蚀性,因此导致这些部件故障和寿命缩短。
EP1295905A1描述了包含粉状金属填料的有机硅封装组合物,此处描述的铜粉是特别优选的。然而,此处提出的使用纯金属表面的方案仍然不够有效,因为仅相对少的金属有效表面积可用于清除含硫气体的反应。而且这个方案与许多另外的缺陷相关,如高价格、高密度,和不利的衰减特性。
发明内容
因此,一个目的是提供不表现出上述缺点并且为电子组件提供良好的保护远离含硫污染气体的有机硅组合物。
出人意料地,通过加成-交联包含以下的有机硅组合物实现了这个目的:
(A)按重量计30%-95%的直链化合物(linear compound),该直链化合物具有带有脂肪族碳-碳重键(多重键,multiple bond)的基团(moiety,部分),
(B)按重量计0.1%-20%的具有Si-键合的氢原子的直链有机聚硅氧烷,
或者代替(A)和(B),
(C)按重量计30%-95%的直链有机聚硅氧烷,该直链有机聚硅氧烷具有带有脂肪族碳-碳重键的SiC-键合的基团以及Si-键合的氢原子,
(D)至少一种氢化硅烷化(硅氢加成,hydrosilylation)催化剂,以及
(E)按重量计5%-70%的由银掺杂的多孔玻璃颗粒制成的填料,其中,以离子形式掺杂按重量计5%-50%的银。
具体实施方式
本发明的组合物可以是单组分有机硅组合物或双组分有机硅组合物。在后面的情况中,本发明的组合物的双组分可以以任何期望的组合包含所有成分,通常其条件是,组分不同时包含具有脂肪族重键的硅氧烷、具有Si-键合的氢原子的硅氧烷、和催化剂,即,本质上分别地不同时包含成分(A)、(B)、和(D),或(C)和(D)。然而,优选的是本发明的组合物是单组分组合物。通过混合成分,通过混合如在现有技术中的组分(A)、(B)、(D)、和(E),或(C)、(D)和(E),制备本发明的单组分有机硅弹性体组合物。
以已知的方式选择本发明的加成交联组合物中分别使用的化合物(A)和(B),或(C),以允许交联:通过示例的方式,化合物(A)具有至少两个脂肪族不饱和基团并且(B)具有至少三个Si-键合的氢原子,或者化合物(A)具有至少三个脂肪族不饱和基团并且硅氧烷(B)具有至少两个Si-键合的氢原子,否则使用硅氧烷(C)代替化合物(A)和(B)并且硅氧烷(C)具有以上述比例的脂肪族不饱和基团和Si-键合的氢原子。另一个可能性是使用上述脂肪族不饱和基团与Si-键合的氢原子比例的(A)和(B)和(C)的混合物。
优选的是本发明的有机硅组合物包含作为成分(A)的至少一种脂肪族不饱和直链有机硅化合物,并且此处可以使用任何迄今在加成交联组合物中使用的脂肪族不饱和直链有机硅化合物。
使用的具有带有脂肪族碳-碳重键的SiC-键合的基团的有机硅化合物(A)优选地是由通式(II)的单元制成的直链有机聚硅氧烷
RaR1 bSiO(4-a-b)/2 (II),
其中,
R是相互独立的、相同或不同的不含脂肪族碳-碳重键的有机或无机基团,
R1是相互独立、相同或不同的具有至少一个脂肪族碳-碳重键的、单价的取代或未取代的SiC-键合的烃基,
a是1、2或3,以及
b是1或2,
其条件是a+b的和小于或等于3,并且在每个分子中存在至少2个基团。
基团R可以是单价或多价基团,并且此处例如二价、三价、和四价基团的多价基团,之后彼此键合多个式(II)的甲硅烷氧基单元,例如2、3、或4个甲硅烷氧基单元。
R的另一个实例是单价基团-F、-Cl、-Br、OR2、-CN、-SCN、-NCO、和SiC-键合的取代或未取代的烃基,该烃基可以通过氧原子或通过基团-C(O)-中断;R的其他实例是Si-键合在式(II)的两侧的二价基团。如果基团R是SiC-键合的、取代的烃基,则优选的取代基是卤素原子、含磷基团、氰基基团、-OR2、-NR2-、-NR2 2、-NR2-C(O)-NR2 2、C(O)-NR2 2、-C(O)R2、-C(O)OR2、-SO2-Ph、和-C6F5。此处的R2是相互独立的、相同或不同的氢原子或具有1-20个碳原子的单价的烃基,并且Ph是苯基基团。
基团R的实例是烷基基团,例如甲基、乙基、正丙基、异丙基、正丁基、异丁基、叔丁基、正戊基、异戊基、新戊基、叔戊基基团、己基基团如正己基基团、庚基基团如正庚基基团、辛基基团如正辛基基团和异辛基基团、例如2,2,4-三甲基戊基基团、壬基基团如正壬基基团、癸基基团如正癸基基团、十二烷基基团如正十二烷基基团、和十八烷基基团如正十八烷基基团、环烷基基团如环戊基、环己基、环庚基和甲基环己基基团、芳基基团如苯基、萘基、蒽基、和菲基基团、烷芳基基团如邻、间、对甲苯基团基团、二甲苯基基团、和乙苯基基团、和芳基基团如苄基基团、α-和β-苯乙基基团。
取代的基团R的实例是卤代烷基基团如3,3,3-三氟正丙基基团、2,2,2,2',2',2'-六氟异丙基基团、七氟异丙基基团、卤代芳基基团如邻、间、和对氯苯基基团、-(CH2)-N(R2)C(O)NR2 2、-(CH2)n-C(O)NR2 2、-(CH2)n-C(O)R2、-(CH2)n-C(O)OR2、-(CH2)n-C(O)NR2 2、-(CH2)-C(O)-(CH2)mC(O)CH3、-(CH2)-O-CO-R2、-(CH2)-NR2-(CH2)m-NR2 2、-(CH2)n-O-(CH2)mCH(OH)CH2OH、-(CH2)n(OCH2CH2)mOR2、-(CH2)n-SO2-Ph、和-(CH2)n-O-C6F5,其中,R2和Ph如以上定义,并且n和m是相同或不同的0-10的整数。
在式(II)两侧Si-键合的二价基团R的实例是衍生自以上基团R的单价实例的基团,其中另外的键代替氢原子,这种类型的基团的实例是-(CH2)-、-CH(CH3)-、-C(CH3)2-、-CH(CH3)-CH2-、-C6H4-、-CH(Ph)-CH2-、-C(CF3)2-、-(CH2)n-C6H4-(CH2)n-、-(CH2)n-C6H4-C6H4-(CH2)n-、-(CH2O)m、(CH2CH2O)m、-(CH2)n-Ox-C6H4-SO2-C6H4-Ox-(CH2)n-,其中,x是0或1,并且Ph、m、和n如以上定义。
优选的是基团R是单价的、SiC-键合的、具有1-18个碳原子并且不含脂肪族碳-碳重键的可选取代的烃基,特别地是单价的、SiC-键合的、具有1-6个碳原子并且不含有脂肪族碳-碳重键的烃基,具体地是甲基或苯基基团。
基团R1可以是任何期望的适于与SiH功能化合物加成反应(氢化硅烷化)的基团。
如果基团R1是SiC-键合的、取代的烃基,则优选的取代基是卤素原子、氰基基团和-OR2,其中,在以上定义了R2。
优选的是基团R1是具有2-16个碳原子的烯基或炔基基团,例如乙烯基、烯丙基、甲基烯丙基、1-丙烯基、5-己烯基、乙炔基、丁二烯基、己二烯基、环戊烯基、环戊二烯基、环己烯基、乙烯基环己基乙基、二乙烯基环己基乙基、降冰片烯基,乙烯基苯基和苯乙烯基基团,并且此处特别优选的是使用乙烯基、烯丙基和己烯基基团。
成分(A)的摩尔质量可以很大地不同,例如从102-106g/mol:通过示例的方式,成分(A)可以是相对低分子量的稀基官能化低聚硅氧烷,例如1,2-二乙烯基四甲基二硅氧烷,但也可以是高度聚合的聚二甲基硅氧烷,其在链内或链端具有Si-键合的乙烯基并且具有例如105g/mol(数均,通过NMR测得)的摩尔质量。
本发明的加成-交联有机硅组合物优选地包含按重量计30%至80%的(A),特别地按重量计40%-70%的(A)。
有机硅化合物(B)可以是任何迄今用于加成交联组合物的氢官能化的有机硅化合物。
使用的具有Si-键合的氢原子的有机聚硅氧烷(B)优选地是由通式(III)的单元组成的直链有机聚硅氧烷
RcHdSiO(4-c-d)/2 (III),
其中,
R如上定义,
c是0、1、2或3,以及
d是0、1、或2,
其条件是c+d的和小于或等于3,并且在每个分子中存在至少2个Si-键合的氢原子。
优选的是基于有机聚硅氧烷(B)的总重量,本发明中使用的有机聚硅氧烷(B)包含按重量计0.02%-1.7%范围内的量的Si-键合的氢。
成分(B)的摩尔质量同样可以很大地不同,例如从102-106g/mol:通过示例的方式,成分(B)能够是相对低分子量的SiH官能化的低聚硅氧烷,例如四甲基二硅氧烷,但也能够是在链中或链端具有SiH基团的高度聚合的聚二甲基聚硅氧烷,或具有SiH基团的有机硅树脂。
没有另外定义形成成分(B)的分子结构,具体地,相对高分子量的结构,即,低聚的或聚合的含SiH的硅氧烷可以是直链的。直链聚硅氧烷(B)优选地由式R3SiO1/2、HR2SiO1/2、HRSiO2/2、和R2SiO2/2组成,其中,R如上定义。
当然,也可以使用符合成分(B)的标准的不同硅氧烷的混合物。具体地,除了必要的SiH基团,形成成分(B)的分子也可以可选地或同时包含脂肪族不饱和基团。特别优选的是使用低分子量的SiH官能化的化合物,如四(二甲基甲硅烷氧基)硅烷和四甲基环四硅氧烷,以及也使用相对高分子量的含SiH的硅氧烷,如在25℃下具有10-10000mPa·s的粘度的聚(氢甲基)硅氧烷(poly(hydrogenmethyl)siloxane)和聚(二甲基氢甲基)硅氧烷(poly(dimethylhydrogenmethyl)siloxane),或其中一些甲基已经被3,3,3-三氟丙基或苯基取代的类似的含SiH的化合物。
本发明的加成-交联有机硅组合物优选地包含按重量计0.5%-20%的(B),特别地按重量计1%-15%的(B)。
优选这样量的本发明的可交联有机硅组合物中的成分(B),使得(A)中的SiH基团与脂肪族不饱和基团的摩尔比是0.1-20,特别地0.2-2.0。
本发明中使用的组分(A)和(B)是商业可获得的产品或可通过化学中通常使用的方法制备。
本发明的有机硅组合物可以包含代替组分(A)和(B)的直链有机聚硅氧烷(C),其同时具有脂肪族碳-碳重键和Si-键合的氢原子。本发明的有机硅组合物还可以包含所有的三种组分(A)、(B)、和(C)。
如果使用硅氧烷(C),则优选地这些由通式(IV)、(V)、和(VI)的单元组成,
RfSiO4/2 (IV)、
RgR1SiO3-g/2 (V)、
RhHSiO3-h/2 (VI),
其中,
R和R1如上定义,
f是1、2、或3,
g是1或2,以及
h是1或2,
其条件是在每个分子中存在至少2个基团R1和至少2个Si-键合的氢原子。
本发明的加成-交联有机硅组合物优选地包含按重量计30%-80%的(C),特别地按重量计40%-70%的(C)。
优选的是在每种情况25℃下,有机聚硅氧烷(C)的平均粘度是0.01-500000Pa·s,特别地0.1-100000Pa·s。可以通过化学中通常使用的方法制备有机聚硅氧烷(C)。
使用的氢化硅烷化催化剂(D)可以是现有技术中已知的任何催化剂。组分(D)可以是铂族金属,例如铂、铑、钌、钯、锇或铱,有机金属化合物,或它们的组合。组分(D)的实例是在基体内和核壳类结构内封装的化合物,如六氯铂酸、二氯化铂、乙酰丙酮铂、和所述化合物的络合物。铂与低分子量的有机聚硅氧烷的络合物是铂-1,3-二乙烯基-l,1,3,3-四甲基二硅氧烷络合物。其他的实例是铂亚磷酸酯络合物、铂膦络合物、和烷基铂络合物。这些化合物可以已经被封装在树脂基体内。
根据组分的总重量,组分(D)的量可以是每百万份0.1-1000份(ppm),0.5-100ppm,或1-25ppm的铂族金属。当铂族金属成分低于1ppm时,固化率较低。使用大于100ppm的铂族金属不经济,或可降低组合物的稳定性。
在由多孔玻璃颗粒(E)组成的填料中,用于本发明的目的的这些玻璃的玻璃基体的晶格密度是1.0-3.0g/cm3。相关的孔径是1.0x 10-10m-20x10-10m,即,1-20埃。
通过粉碎泡沫玻璃直到平均粒径是1-50μm,优选地2-15μm,并且随后将其与溶解的银盐,优选地硝酸银溶液混合来制备掺杂的玻璃颗粒(E)。基于玻璃颗粒,合并至混合物的银盐溶液的量是按重量计1%-15%,优选地按重量计4%-7%。玻璃颗粒的多孔性导致其吸收银溶液。此处没有发生玻璃颗粒的聚集。为了在玻璃颗粒的孔壁上通过离子的结合固定一些银离子并降低含银多孔玻璃颗粒的含水量,之后进行预处理/干燥过程。基于(E),多孔玻璃颗粒的银含量是按重量计0.5%-30%,优选地按重量计1%-10%。
以离子形式引入的银-银离子存在的量优选地是按重量计5%-50%,特别优选地按重量计15%-35%。
如果期望,本发明的有机硅弹性体组合物可以包含按重量计从0%上达至70%,优选地按重量计1%-40%的比例的作为成分的其他添加剂(F)。这些添加剂可以是不同于(E)的增强和惰性填料、流变改性添加剂、阻燃剂、用于影响电气性能的试剂、分散剂、溶剂、增粘剂、颜料、染料、增塑剂、有机聚合物、热稳定剂等。可以被用作另外的物质(F)的增粘剂的实例是具有可水解基团和SiC-键合的乙烯基、丙烯酰氧基、甲基丙烯酰氧基、环氧基、酸酐、酸、酯或醚基的硅烷;这些增粘剂的其他实例是部分水解产物和共水解产物,此处优选的是具有乙烯基的硅烷和具有包含乙氧基或乙酰氧基作为可水解基团的乙氧基的硅烷,并且此处特别优选的是乙烯基三乙氧基硅烷、乙烯基三乙酰氧基硅烷、环氧丙基三甲氧基硅烷,和它们的部分水解产物和共水解产物。本发明的有机硅组合物中包含的增粘剂(F)的量优选地是按重量计0%-5%,优选地按重量计0.3%-3%。
已经证明多孔表面结构与银掺杂(其为了结合含硫污染物气体主要以离子形式提供银)的结合对于保护封装的电子组件远离含硫污染物气体特别有效。由于组分(E)的多孔表面结构,本发明的加成-交联有机硅组合物提供了用于吸附污染物气体的显著较大的有效表面积。除了所述填料增加的表面积,而且已经证明主要以离子形式存在的银对于保护金属表面远离含硫污染物气体是特别有利的。
本发明的组合物被用于电气或电子组件的封装。
因此,本发明进一步提供了封装的电气或电子组件,其特征在于封装材料是本发明的聚合的有机硅组合物。
实施例
除非在以下描述的实施例中另有说明,所有说明的份数和百分比都基于重量。除非另外说明,在环境大气压力(即在约1000hPa)和室温(即在约20℃)下,或在当没有额外加热或冷却下反应物在室温下结合时逐渐建立的温度下进行下面的实施例。以下所有的粘度涉及在20℃下和1s-1的剪切速率下的动态粘度。以下的实施例说明本发明,但是不具有任何结果性的限制作用。所有的实施例给出了交联产品的整体组合物,无论这些是被配制为单组分还是双组分组合物。
原材料的说明:
乙烯基聚合物1和2:这些是具有不同的粘度、通过常规方法制备的乙烯基二甲基甲硅烷氧基封端的二甲基聚硅氧烷。
SiH交联剂H018:这是具有180mPa·s的粘度和按重量计0.17%的H含量的三甲基甲硅烷基封端的二甲基/甲基氢共聚硅氧烷。
H聚合物:这是具有65mPa·s的粘度的H-二甲基甲硅烷氧基封端的二甲基聚硅氧烷。
催化剂母料EP:在PDMS中具有按重量计1%的铂的Karstedt催化剂。
填料1:无定形的、多孔硅酸盐玻璃颗粒,典型的粒径约10μm,按重量计3.1%的银含量,0.26mg/L的银离子含量。
填料2:无定形的、多孔硅酸盐玻璃颗粒,典型的粒径约10μm,按重量计3.1%的银含量,0.37mg/L的银离子含量。
填料3:无定形的、多孔硅酸盐玻璃颗粒,典型的粒径约10μm,按重量计7.6%的银含量,2.4mg/L的银离子含量。
填料4:用金属银涂覆的球形硅酸盐玻璃颗粒,粒径15-50μm,密度2.6g/cm3,按重量计8.0%的银含量。
填料5:用金属银涂覆的球形铜金属颗粒,粒径10-30μm,按重量计17.0%的银含量。
有机硅组合物的说明和测试:
在合适的混合器中混合组合物。混合之后,使有机硅组合物在10mbar下脱气5min。基于全部配料,填料含量(填料1-5)始终是按重量计50%。
腐蚀测试:测试基片由厚度1mm的在其上印刷起伏的(undulating)银导体轨道的铝氧化物陶瓷组成。导体轨道的轨道宽度是0.5mm。以2mm的层厚度将可流动混合物1-6施加至测试基片,脱气,并且在150℃下硬化60min。得到柔软的有机硅凝胶。
将测试基片与1g的元素硫粉一起放入1L的干燥器中。将干燥器密封并加热至80℃共14天。
在规定的时间间隔内,取出测试基片,除去有机硅凝胶,并且用肉眼检查银导体轨道的腐蚀。
如果银轨道没有变色并且具有金属光泽,评估测试样品为优(g)。
如果银轨道变色至变暗或变黑,显示腐蚀,评估测试样品为差(p)。
表1示出了实施例1-6的组合物,还有腐蚀测试结果。
本发明的实施例1-4:具有由无定形、多孔硅酸盐颗粒和主要的银离子涂层组成的填料的有机硅组合物。
实施例5,非本发明的,具有球形硅酸盐玻璃颗粒和金属银涂层。
实施例6,非本发明的,具有与EP1295905A1类似的球形铜金属颗粒和金属银涂层。
本发明的实施例1-4示出了仅具有无定形的多孔硅酸盐颗粒和具有主要银离子掺杂的本发明的有机硅组合物可以提供耐久性以及对待保护的基板,并且因此对电子组件提供持久保护。
表一:
*非本发明的
Claims (4)
1.一种加成-交联有机硅组合物,包含:
(A)按重量计30%-95%的直链化合物,所述直链化合物具有带有脂肪族碳-碳重键的基团,
(B)按重量计0.1%-20%的具有Si-键合的氢原子的直链有机聚硅氧烷,
或者代替(A)和(B)
(C)按重量计30%-95%的直链有机聚硅氧烷,所述直链有机聚硅氧烷具有带有脂肪族碳-碳重键的SiC-键合的基团以及Si-键合的氢原子,
(D)至少一种氢化硅烷化催化剂,以及
(E)按重量计5%-70%的由银掺杂的多孔玻璃颗粒制成的填料,其中,以离子形式掺杂按重量计5%-50%的所述银。
2.一种用于制备根据权利要求1所述的加成-交联有机硅组合物的方法,通过组分(A)、(B)、(D)和(E),或者(C)、(D)和(E)的混合进行。
3.根据权利要求1所述的组合物用于电气或电子组件的封装的用途。
4.一种封装的电气或电子组件,其特征在于,封装材料是聚合的根据权利要求1所述的有机硅组合物。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102012206968.2 | 2012-04-26 | ||
DE102012206968A DE102012206968A1 (de) | 2012-04-26 | 2012-04-26 | Siliconzusammensetzung mit Schadstoffschutz |
PCT/EP2013/057146 WO2013160081A1 (de) | 2012-04-26 | 2013-04-04 | Siliconzusammensetzung mit schadstoffschutz |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104185663A true CN104185663A (zh) | 2014-12-03 |
CN104185663B CN104185663B (zh) | 2016-02-17 |
Family
ID=48095824
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201380016337.5A Active CN104185663B (zh) | 2012-04-26 | 2013-04-04 | 具有对污染的防护性的有机硅组合物 |
Country Status (7)
Country | Link |
---|---|
US (1) | US9818663B2 (zh) |
EP (1) | EP2841514B1 (zh) |
JP (1) | JP5932138B2 (zh) |
KR (1) | KR101708542B1 (zh) |
CN (1) | CN104185663B (zh) |
DE (1) | DE102012206968A1 (zh) |
WO (1) | WO2013160081A1 (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012220700A1 (de) * | 2012-11-13 | 2014-05-15 | Wacker Chemie Ag | Füllstoffhaltige Siliconzusammensetzungen |
DE102016201363A1 (de) * | 2016-01-29 | 2017-08-03 | Wacker Chemie Ag | Zu Silikongel vernetzbare Siliconzusammensetzung |
US10283233B2 (en) | 2016-06-28 | 2019-05-07 | International Business Machines Corporation | Bio-based conformal coating for sulfur sequestration using polyhydroxyalkanoates |
US10072120B2 (en) | 2016-12-02 | 2018-09-11 | International Business Machines Corporation | Functionalized polyhydroxyalkanoate materials formed from an unsaturated polyhydroxyalkanoate material |
US10081706B2 (en) | 2017-01-03 | 2018-09-25 | International Business Machines Corporation | Side-chain-functionalized polyhydroxyalkanoate materials |
CN111094477B (zh) * | 2017-09-07 | 2022-06-03 | 陶氏环球技术有限责任公司 | 导热憎冰涂层 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0367562A2 (en) * | 1988-11-04 | 1990-05-09 | Dow Corning Corporation | Electrically conductive silicone compositions |
EP1039480A1 (en) * | 1999-03-25 | 2000-09-27 | Shin-Etsu Chemical Co., Ltd. | Conductive silicone rubber composition and low-resistance connector |
EP1295905A1 (en) * | 2001-09-25 | 2003-03-26 | Shin-Etsu Chemical Co., Ltd. | Silicone rubber compositions for the sealing and encapsulation of electric and electronic parts |
CN101125688A (zh) * | 2007-07-13 | 2008-02-20 | 常州市天歌高分子科技有限公司 | 无公害藻类处理剂及其使用方法 |
CN102020421A (zh) * | 2009-09-14 | 2011-04-20 | 海洋王照明科技股份有限公司 | 一种在多孔玻璃中制备银纳米粒子的方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59152935A (ja) * | 1983-02-21 | 1984-08-31 | Kuraray Co Ltd | 導電性組成物 |
JPH03103472A (ja) * | 1989-09-16 | 1991-04-30 | Iwahashi Shiro | 防菌性を有する発泡若しくは未発泡プラスチック成形体 |
JPH07126533A (ja) * | 1993-11-04 | 1995-05-16 | Toshiba Silicone Co Ltd | 硬化性ポリオルガノシロキサン組成物 |
JP2980511B2 (ja) * | 1994-02-24 | 1999-11-22 | 信越化学工業株式会社 | 抗菌性シリコーンゴム層を設けたガラスルーバー用型ガラス及びその製造方法 |
JP2003031028A (ja) * | 2001-07-17 | 2003-01-31 | Shin Etsu Chem Co Ltd | 導電性組成物 |
BRPI0409713A (pt) * | 2003-04-25 | 2006-05-02 | Milliken & Co | composições de borracha pré-vulcanizada antimicrobiana e artigos de borracha vulcanizada antimicrobiana |
DE102006016753A1 (de) * | 2006-04-10 | 2007-10-11 | Wacker Chemie Ag | Vernetzbare Massen auf der Basis von Organosiliciumverbindungen |
US20100072416A1 (en) * | 2006-10-31 | 2010-03-25 | Techno Polymer Co. Ltd | Heat-dissipating resin composition, substrate for led mounting, reflector, and substrate for led mounting having reflector portion |
GB0622060D0 (en) * | 2006-11-06 | 2006-12-13 | Hexcel Composites Ltd | Improved composite materials |
DE102007043311B4 (de) * | 2007-09-12 | 2010-02-25 | Trovotech Gmbh | Zusammensetzung mit antimikrobieller Wirkung, Verfahren zu deren Herstellung und deren Verwendung |
-
2012
- 2012-04-26 DE DE102012206968A patent/DE102012206968A1/de not_active Withdrawn
-
2013
- 2013-04-04 WO PCT/EP2013/057146 patent/WO2013160081A1/de active Application Filing
- 2013-04-04 CN CN201380016337.5A patent/CN104185663B/zh active Active
- 2013-04-04 US US14/395,365 patent/US9818663B2/en active Active
- 2013-04-04 JP JP2015507448A patent/JP5932138B2/ja active Active
- 2013-04-04 KR KR1020147030569A patent/KR101708542B1/ko active IP Right Grant
- 2013-04-04 EP EP13716251.7A patent/EP2841514B1/de active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0367562A2 (en) * | 1988-11-04 | 1990-05-09 | Dow Corning Corporation | Electrically conductive silicone compositions |
EP1039480A1 (en) * | 1999-03-25 | 2000-09-27 | Shin-Etsu Chemical Co., Ltd. | Conductive silicone rubber composition and low-resistance connector |
EP1295905A1 (en) * | 2001-09-25 | 2003-03-26 | Shin-Etsu Chemical Co., Ltd. | Silicone rubber compositions for the sealing and encapsulation of electric and electronic parts |
CN101125688A (zh) * | 2007-07-13 | 2008-02-20 | 常州市天歌高分子科技有限公司 | 无公害藻类处理剂及其使用方法 |
CN102020421A (zh) * | 2009-09-14 | 2011-04-20 | 海洋王照明科技股份有限公司 | 一种在多孔玻璃中制备银纳米粒子的方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2013160081A1 (de) | 2013-10-31 |
EP2841514A1 (de) | 2015-03-04 |
JP2015514852A (ja) | 2015-05-21 |
EP2841514B1 (de) | 2015-08-19 |
KR101708542B1 (ko) | 2017-02-20 |
KR20140140633A (ko) | 2014-12-09 |
US20150132586A1 (en) | 2015-05-14 |
JP5932138B2 (ja) | 2016-06-08 |
US9818663B2 (en) | 2017-11-14 |
DE102012206968A1 (de) | 2013-10-31 |
CN104185663B (zh) | 2016-02-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN104185663A (zh) | 具有对污染的防护性的有机硅组合物 | |
EP3508533B1 (en) | Curable organopolysiloxane composition, and protection agent or adhesive composition for electrical/electronic components | |
TWI640576B (zh) | 室溫硬化性聚有機矽氧烷組成物及電氣、電子機器 | |
KR20160143782A (ko) | 경화성 오르가노폴리실록산 조성물 및 전기·전자 부품의 보호제 또는 접착제 조성물 | |
EP1295905A1 (en) | Silicone rubber compositions for the sealing and encapsulation of electric and electronic parts | |
CN101885851B (zh) | 含有异三聚氰酸环的末端氢聚硅氧烷 | |
CN101616961B (zh) | 含硅化合物、固化性组合物以及固化物 | |
CN101993539B (zh) | 有机聚亚甲基硅硅氧烷以及有机聚亚甲基硅硅氧烷组成物 | |
JP6722581B2 (ja) | 接着促進剤、それを含有してなる硬化性オルガノポリシロキサン組成物 | |
EP3318593B1 (en) | Heat dissipation material | |
CN114144477B (zh) | 可固化有机聚硅氧烷组合物、固化产物和电气/电子设备 | |
CN102807756A (zh) | 有机硅树脂组合物、薄片及其制造方法、光半导体元件装置 | |
JPH0588867B2 (zh) | ||
CN104781355A (zh) | 含有填料的硅酮组合物 | |
CN117801545A (zh) | 加成固化型有机硅组合物及光学元件 | |
WO2023028819A1 (en) | Anti-static silicone release coatings and methods for their preparation and use | |
JP6809432B2 (ja) | 硬化性オルガノポリシロキサン組成物 | |
WO2024084490A1 (en) | Emergency rescue & aid support system - erass | |
WO2024098435A1 (en) | A polysiloxane composition | |
JP2022137416A (ja) | 導電性シリコーン組成物、接着剤及び導電性シリコーン硬化物 | |
CN116875270A (zh) | 一种超低粘度可快固化的低温柔性有机硅灌封材料、制备方法及应用 | |
JP2024087720A (ja) | 導電性シリコーン組成物及びその製造方法、並びに、接着剤及び導電性シリコーン硬化物 | |
JP2012025903A (ja) | 熱可塑性シリコーン樹脂用組成物 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant |