CN104134603A - 描绘装置和物品的制造方法 - Google Patents

描绘装置和物品的制造方法 Download PDF

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Publication number
CN104134603A
CN104134603A CN201410169271.XA CN201410169271A CN104134603A CN 104134603 A CN104134603 A CN 104134603A CN 201410169271 A CN201410169271 A CN 201410169271A CN 104134603 A CN104134603 A CN 104134603A
Authority
CN
China
Prior art keywords
charged particle
substrate
region
area
particle optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201410169271.XA
Other languages
English (en)
Chinese (zh)
Inventor
村木真人
平田吉洋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN104134603A publication Critical patent/CN104134603A/zh
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/045—Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31761—Patterning strategy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN201410169271.XA 2013-04-30 2014-04-25 描绘装置和物品的制造方法 Pending CN104134603A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013-095961 2013-04-30
JP2013095961A JP2014216631A (ja) 2013-04-30 2013-04-30 描画装置、及び物品の製造方法

Publications (1)

Publication Number Publication Date
CN104134603A true CN104134603A (zh) 2014-11-05

Family

ID=51788475

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410169271.XA Pending CN104134603A (zh) 2013-04-30 2014-04-25 描绘装置和物品的制造方法

Country Status (5)

Country Link
US (1) US9293292B2 (https=)
JP (1) JP2014216631A (https=)
KR (1) KR20140130029A (https=)
CN (1) CN104134603A (https=)
TW (1) TWI556063B (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6195349B2 (ja) * 2013-04-26 2017-09-13 キヤノン株式会社 描画装置、描画方法、および物品の製造方法
JP2016092136A (ja) * 2014-10-31 2016-05-23 キヤノン株式会社 描画装置、および、物品の製造方法
JP6616986B2 (ja) * 2015-09-14 2019-12-04 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画方法及びマルチ荷電粒子ビーム描画装置
JP2019102661A (ja) * 2017-12-04 2019-06-24 株式会社ニューフレアテクノロジー ビーム偏向形状取得方法及びブランキングアパーチャアレイの配置角度取得方法
EP4384472A1 (en) * 2021-08-13 2024-06-19 Qdevil ApS Circuit for transporting charged particles

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09245708A (ja) * 1996-03-04 1997-09-19 Canon Inc 電子ビーム露光装置とその露光方法
JPH1092356A (ja) * 1996-09-19 1998-04-10 Seiko Instr Inc 集束イオンビームの光軸調整方法および集束イオンビーム装置
WO2009084244A1 (ja) * 2007-12-28 2009-07-09 Nikon Corporation 露光装置、移動体駆動システム、パターン形成装置、及び露光方法、並びにデバイス製造方法
US20130032729A1 (en) * 2010-04-09 2013-02-07 Rainer Knippelmeyer Charged Particle Detection System and Multi-Beamlet Inspection System
US20130052590A1 (en) * 2011-08-23 2013-02-28 Canon Kabushiki Kaisha Drawing apparatus and method of manufacturing article

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4308504B2 (ja) 2002-11-21 2009-08-05 株式会社荏原製作所 電子線装置及びその装置を用いたデバイス製造方法
WO2012055936A1 (en) * 2010-10-26 2012-05-03 Mapper Lithography Ip B.V. Lithography system, modulation device and method of manufacturing a fiber fixation substrate
JP2013178961A (ja) * 2012-02-28 2013-09-09 Canon Inc 荷電粒子線装置及び物品製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09245708A (ja) * 1996-03-04 1997-09-19 Canon Inc 電子ビーム露光装置とその露光方法
JPH1092356A (ja) * 1996-09-19 1998-04-10 Seiko Instr Inc 集束イオンビームの光軸調整方法および集束イオンビーム装置
WO2009084244A1 (ja) * 2007-12-28 2009-07-09 Nikon Corporation 露光装置、移動体駆動システム、パターン形成装置、及び露光方法、並びにデバイス製造方法
US20130032729A1 (en) * 2010-04-09 2013-02-07 Rainer Knippelmeyer Charged Particle Detection System and Multi-Beamlet Inspection System
US20130052590A1 (en) * 2011-08-23 2013-02-28 Canon Kabushiki Kaisha Drawing apparatus and method of manufacturing article

Also Published As

Publication number Publication date
JP2014216631A (ja) 2014-11-17
TWI556063B (zh) 2016-11-01
KR20140130029A (ko) 2014-11-07
TW201441771A (zh) 2014-11-01
US9293292B2 (en) 2016-03-22
US20140319367A1 (en) 2014-10-30

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PB01 Publication
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SE01 Entry into force of request for substantive examination
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WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20141105