CN104066758B - 光活性树脂、辐射可固化组合物以及辐射可固化油墨 - Google Patents

光活性树脂、辐射可固化组合物以及辐射可固化油墨 Download PDF

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CN104066758B
CN104066758B CN201280057694.1A CN201280057694A CN104066758B CN 104066758 B CN104066758 B CN 104066758B CN 201280057694 A CN201280057694 A CN 201280057694A CN 104066758 B CN104066758 B CN 104066758B
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carbon atoms
composition
ink
radiation curable
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CN104066758A (zh
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凯-乌伟·高德尔
于尔根·迪克特
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Sun Chemical Corp
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Sun Chemical Corp
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/103—Esters of polyhydric alcohols or polyhydric phenols of trialcohols, e.g. trimethylolpropane tri(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F16/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
    • C08F16/36—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by a ketonic radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G6/00—Condensation polymers of aldehydes or ketones only
    • C08G6/02—Condensation polymers of aldehydes or ketones only of aldehydes with ketones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/02—Condensation polymers of aldehydes or ketones only
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/102—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions other than those only involving unsaturated carbon-to-carbon bonds
    • C09D11/103—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions other than those only involving unsaturated carbon-to-carbon bonds of aldehydes, e.g. phenol-formaldehyde resins
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/106—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • C09D11/107—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds from unsaturated acids or derivatives thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/106—Esters of polycondensation macromers
    • C08F222/1061—Esters of polycondensation macromers of alcohol terminated polyesters or polycarbonates, e.g. polyester (meth)acrylates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/106—Esters of polycondensation macromers
    • C08F222/1067—Esters of polycondensation macromers of alcohol terminated epoxy functional polymers, e.g. epoxy(meth)acrylates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Paints Or Removers (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
  • Graft Or Block Polymers (AREA)
CN201280057694.1A 2011-11-29 2012-11-29 光活性树脂、辐射可固化组合物以及辐射可固化油墨 Active CN104066758B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161564421P 2011-11-29 2011-11-29
US61/564,421 2011-11-29
PCT/US2012/067024 WO2013082262A1 (en) 2011-11-29 2012-11-29 Photoactive resins, radiation curable compositions and radiation curable inks

Publications (2)

Publication Number Publication Date
CN104066758A CN104066758A (zh) 2014-09-24
CN104066758B true CN104066758B (zh) 2016-08-31

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US (1) US9884936B2 (cg-RX-API-DMAC10.html)
EP (1) EP2785754B1 (cg-RX-API-DMAC10.html)
JP (2) JP6166271B2 (cg-RX-API-DMAC10.html)
CN (1) CN104066758B (cg-RX-API-DMAC10.html)
WO (1) WO2013082262A1 (cg-RX-API-DMAC10.html)

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US9114282B2 (en) * 2012-05-30 2015-08-25 Nike, Inc. Game ball or other article of sports equipment printed with visible light-curable ink and method
EP3000853B1 (en) * 2014-09-29 2020-04-08 Agfa-Gevaert Etch-resistant inkjet inks for manufacturing conductive patterns
EP3075788A1 (de) * 2015-04-02 2016-10-05 Evonik Degussa GmbH Funktionalisierte keton-aldehyd-kondensationsharze
BR112018071478A2 (pt) 2016-04-21 2019-02-19 Flint Group Germany Gmbh formulação de tinta curável por radiação, processo para impressão, e, embalagem de alimento impressa ou rótulo para embalagem de alimento
JP2019119844A (ja) * 2018-01-10 2019-07-22 株式会社リコー 硬化型液体組成物、組成物収容容器、液体組成物吐出装置、硬化物、及び硬化物の製造方法
WO2019138837A1 (en) 2018-01-10 2019-07-18 Ricoh Company, Ltd. Curable liquid composition, composition-accommodating container, liquid composition discharging device, cured material, and method of manufacturing cured material
CN109188862A (zh) * 2018-10-11 2019-01-11 京东方科技集团股份有限公司 压印结构及其制造方法、压印模板
WO2020212488A1 (en) * 2019-04-18 2020-10-22 Sun Chemical Corporation Low migration electronic beam curable primer
GB201915023D0 (en) 2019-10-17 2019-12-04 Lambson Ltd Amine co-initiator mixture
US12187907B2 (en) 2020-07-31 2025-01-07 Sun Chemical Corporation Self-initiated energy curable ink compositions
WO2022187316A1 (en) * 2021-03-03 2022-09-09 Sun Chemical Corporation Energy curable inks and coatings with peroxides
AU2023231419A1 (en) * 2022-03-10 2024-09-19 Basf Se Casting lacquer for screen printing
JP7547663B1 (ja) 2024-01-30 2024-09-09 サカタインクス株式会社 電子線硬化型オフセット印刷インキ組成物

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EP0063874A1 (en) * 1981-04-29 1982-11-03 Imperial Chemical Industries Plc Production of aromatic polyketones
EP0389902A1 (de) * 1989-03-30 1990-10-03 Bayer Ag Verfahren zur Herstellung von aromatischen Polyätherketonen
JP2005272728A (ja) * 2004-03-25 2005-10-06 Tdk Corp 芳香族ポリケトン及びその中間体、芳香族ポリケトンの製造方法、電気化学素子用ガスケット、電気化学素子用セパレータ、並びに、電気化学素子
CN101959926A (zh) * 2008-03-07 2011-01-26 日产化学工业株式会社 具有芳酰基联苯骨架的高分子化合物和热固化膜形成用高分子组合物

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JP2006016510A (ja) * 2004-07-02 2006-01-19 Toyo Ink Mfg Co Ltd アクリルオリゴマーまたはそれを含む活性エネルギー線硬化性組成物およびその印刷物。
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EP1935659B1 (en) * 2006-12-21 2009-11-11 Agfa Graphics N.V. Inkjet printing methods and inkjet ink sets
WO2008083275A2 (en) * 2006-12-28 2008-07-10 3M Innovative Properties Company Dental filler and methods
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Patent Citations (4)

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Publication number Priority date Publication date Assignee Title
EP0063874A1 (en) * 1981-04-29 1982-11-03 Imperial Chemical Industries Plc Production of aromatic polyketones
EP0389902A1 (de) * 1989-03-30 1990-10-03 Bayer Ag Verfahren zur Herstellung von aromatischen Polyätherketonen
JP2005272728A (ja) * 2004-03-25 2005-10-06 Tdk Corp 芳香族ポリケトン及びその中間体、芳香族ポリケトンの製造方法、電気化学素子用ガスケット、電気化学素子用セパレータ、並びに、電気化学素子
CN101959926A (zh) * 2008-03-07 2011-01-26 日产化学工业株式会社 具有芳酰基联苯骨架的高分子化合物和热固化膜形成用高分子组合物

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JP6420403B2 (ja) 2018-11-07
US20140315002A1 (en) 2014-10-23
JP2017149970A (ja) 2017-08-31
JP2015505870A (ja) 2015-02-26
US9884936B2 (en) 2018-02-06
JP6166271B2 (ja) 2017-07-19
CN104066758A (zh) 2014-09-24
EP2785754B1 (en) 2016-07-06
EP2785754A1 (en) 2014-10-08
WO2013082262A1 (en) 2013-06-06

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