CN1040524C - 基片传送装置 - Google Patents

基片传送装置 Download PDF

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CN1040524C
CN1040524C CN92114574A CN92114574A CN1040524C CN 1040524 C CN1040524 C CN 1040524C CN 92114574 A CN92114574 A CN 92114574A CN 92114574 A CN92114574 A CN 92114574A CN 1040524 C CN1040524 C CN 1040524C
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CN1073648A (zh
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P·马勒
H·沃尔夫
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Balzers und Leybold Deutschland Holding AG
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706—Mechanical details, e.g. roller, belt
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/02—Controlled or contamination-free environments or clean space conditions

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  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
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  • Microelectronics & Electronic Packaging (AREA)
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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
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Abstract

基片传送装置，该真空处理设置具有若干工作站、一个加热装置和若干基片支架，基片支架可以是板式的、扁平的和平行六面体的，且可在垂直状态下沿预定的传送路径通过工作站。在真空室内给实心的下端部(6)装上保持和导引装置，并给该下端部(6)装上用金银丝工艺制成的(filigran)平面框架结构的上端部(7)，待加工的基片(23、23′…)借助于一个基片支架(14、15)悬挂在该框架上，并且基片支架(14、15)可活动地保持在框架上，当加热产生长度改变时，基片支架(14、15)可相对框架运动。

Description

基片传送装置
本发明涉及一种基片传送装置，即，将基片送入并使其通过真空处理设备的一种传送装置，该真空处理设备具有若干工作站、一个加热装置和若干基片支架，基片支架可以是板式、扁平状和平行六面体的，这些基片支架可在垂直状态下沿预定的传送路径通过工作站。
目前使用的基片支架要么是带有与基片相适应的凹口的薄板，要么是带有撑条的框架(基片固定在撑条上)。通常，基片支架用来装载许多扁平的和板状的基片。
上述类型的传送设备已由美国专利US-PS4042128公开。在使用这种传送设备时，平板形基片支架的主平面在其上、下边棱处，在垂直状态下，在辊子之间被导引，这些辊子可绕垂直轴旋转。在其下边棱处，基片支架还置于具有水平旋转轴的托辊上。
具有多个工作站和辊子的、用于真空涂覆设备的传送设备也已公知(见EP-254145B1)，轮子用于导引和运送基本上两维的基片支架在垂直状态下沿一条预先给定的路径通过工作站，并且在基片支架的下边棱区域设有成对的导辊，这些导辊可绕垂直轴旋转，基片支架置于其间。
这些公知的传送装置的任务在于：尽可能地排除由于涂料落下而产生的涂覆故障。
此外，曾经有人提议，给传送设备(用于真空涂覆设备)的基片支架装上支腿，支腿在固定导轨上滑动(见欧洲专利EP-0346815)。
在一份较早的专利申请中(P4029905.8，一种具有多个工作站的、用于真空加工设备的基片传送装置)，曾建议过，给每个支腿(下端部)装上一对平行的、相互间隔一定距离的、在垂直面内设置的基片支架。一个加热器装进基片支架之间的井状张开区，该加热器从真空室的上壁面垂直向下延伸。
公知的这些装置的缺点是，由于基片所需温度约为450℃，这就不可避免地对基片支架产生温度影响，而且这种温度影响会使整个装置产生热膨胀和变形。由于基片和基片滚柱导轨的尺寸公差较小，热影响产生的所有构件的尺寸改变也大大影响了设备运行的安全性和可靠性，并导致了大多为全自动的设备产生故障。致使这些设备中断运行，造成较大浪费。
此外，当一基片支架从涂覆区送出及另一基片支架送进时，固定安装在基片支架之间空腔内的加热器也被涂上了涂料。这样，随着操作时间的增加就导致了加热器的功率损耗。
本发明的主要目的是：研制一种对温度影响不敏感且在高温情况下保障设备稳定的无故障运行的装置。此外，最好避免加热器的涂覆以便尽量延长维修的间隔时间。
本发明的目的是这样完成的：在真空室内给实心的下端部装上保持和导引装置，并给该下端部装上用金银丝工艺制成的(filigran)平面框架结构的上端部，待加工的基片借助于一个基片支架保持在该框架上，并且基片支架可活动地悬挂保持在框架上，这样，当加热造成长度改变时，可产生相对运动。
这种一致的、用金银丝工艺制成的(filigran)框架结构，不仅整个上端部而且基片支架的质量较小，并且部件之间可活动地固定，这样就使得装置对温度影响很不敏感及尺寸不易变形。
通过在基片支承框架的垂直支撑上安装侧面屏蔽板，对基片加热器的涂覆得以避免。
其它的实施  可能性和特征在从属权利要求中被进一步描述和说明。
本发明可以有各种不同的实施例，其中之一作为例子在附图中详细画出。
图1：在两个相对的喷雾源之间的、装有基片的基片支架的剖视
     图。
图2：图1所示基片支架的侧视图。
图3：沿图2X-X剖开的剖视图。
图4：具有轮——导轨装置的基片支架的剖视图。
在涂覆室(为了简便起见，未在图中画出)内装有两个喷雾源1、2(见图1)，该喷雾源的工作平面3、4间距相等且对称布置。在这两个喷雾源1、2之间有一个支承架5，该支承架由实心的下端部6及杆件式结构的上端部7构成。在下端部6内，设置有一个装置(图中未绘出)，该装置用于保持和导引涂覆室中支承架。上端部7由每边两个垂直的支撑8、9及两个水平的支撑10、11组成，垂直支承8、9固定在下端部6的两相对的端部，水平支撑10、11如图所示总是与垂直支撑8、9的上端相连接。
由每边两个垂直支撑8、9和每边一个水平支撑10、11构成的两个框架不是封闭的，而是在每两个部件之间至少有一个活动部位。因此，当热引起长度改变时，支承架5不会产生变形。
用两个U形挂勾12、13把基片支架14、15挂到两个水平支撑10、11上。基片支架14、15由若干水平的、与支撑10、11平行的支承杆16、16′---，17、17′以及若干垂直的、与支撑9、9′平行的支承杆19、19′、---组成(见图2)。基片支架14、15支承在其下端部，下端部靠着支承辊20、21，支承辊20、21在支承架5内水平放置。水平支承杆16、16′---17、17′上设有槽22、22′---，待涂覆的基片23、23′---装入槽内，基片的正面和反面与喷雾源1、2的工作平面3、4平行。
两个基片支架14、15构成了一个上面敞开的空腔24，在此空腔中挂有中央加热装置25，该加热装置借助一个支座26固定在图中未画出的涂覆腔的盖子上。
大致上矩形的基片23、23′---装入矩形框架5的格子内(见图2)。
在垂直支撑9、9′---侧面装有屏蔽板27、27′---，两个相邻的支承架5，5′---的屏蔽板相互重叠(见图3)。因此，当支承架5、5′沿方向A经过位置固定的喷雾源1、2时，就不会涂覆位于两个基片14、15之间的加热装置25。
用来装入基片23、23′---的支承架5主要由下端部6和上端部7组成(见图4)。为了保持和引导真空室中的支承架5，在下端部6内设有导轨28，该导轨置于一排轮子30、30′---之上。下端下端部6的垂直支脚29支承在第二排轮子31、31′--上。这些轮子30、30′---、31、31′---固定在沿水平方向延伸的L型机壳框架32中，该框架32安装在真空室的壁33和底34上。

Claims (6)

1.用于将基片(23、23’)送入并使其通过真空处理设备若干工作站的传送装置，该真空处理设备具有一个加热装置(25)和若干大致为板形的、扁平平行六面体的基片支架，基片支架可在垂直位置下沿预定的传送路径通过工作站，其特征在于一个具有保持和导引基片(23、23’)装置的可移动的下端部(6)，这些保持和导引装置具有两个与导轨(28)和立式正推轴承(29)共同作用的轮组(30、30，…，31、31’，…)，并具有一个由下端部(6)保持的、用金银丝工艺制成的平面框架结构的上端部(7)，所述上端部(7)由垂直支撑(8、8’及9、9’)和水平支撑(10、11)构成，待加工的基片(23、23’，…)借助于一个基片支架(14、15)保持在框架上；至少一个连接点可在垂直支撑(8、8’及9、9’)和水平支撑(10、11)之间形成相向移动，这样，就有可能通过加热而在基片支架(14、15)和框架(5、5’)之间形成相对运动—例如长度的变动；并且所述加热装置垂直地从上而下伸入互相对置的基片之间的空间内。
2.按照权利要求1的装置，其特征在于下端部(6)整体制成，并具有大致平行六面体的外形。
3.按照权利要求1或2的装置，其特征在于下端部(6)借助一个轮—导轨装置加以保持和导引。
4.按照权利要求1的装置，其特征在于基片支架(14、15)借助于设置在基片支架(14、15)上端的、下端开口的挂钩(12，12’，13，13’)保持在框架(5，5’)的支撑(10，11)上。
5.按照权利要求1的装置，其特征在于每两个结构相同的基片支架(14、15)相互镜面对称地配置。
6.按照权利要求1的装置，其特征在于在垂直支撑(8、8’，9、9’)的外侧，设有屏蔽板(27、27’，…)，屏蔽板沿基片(23、23’，…)的主延伸方向伸展。
CN92114574A 1991-11-30 1992-11-27 基片传送装置 Expired - Fee Related CN1040524C (zh)

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Application Number Priority Date Filing Date Title
DEP4139549.2 1991-11-30
DE4139549A DE4139549A1 (de) 1991-11-30 1991-11-30 Vorrichtung fuer den transport von substraten

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CN1073648A CN1073648A (zh) 1993-06-30
CN1040524C true CN1040524C (zh) 1998-11-04

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EP (1) EP0544995B1 (zh)
JP (1) JP2543300B2 (zh)
KR (1) KR100228809B1 (zh)
CN (1) CN1040524C (zh)
DE (2) DE4139549A1 (zh)
HK (1) HK54096A (zh)
TW (1) TW206198B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1923642B (zh) * 2005-08-31 2012-01-11 乐金显示有限公司 用于传送基板的搬运器

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH691680A5 (de) * 1996-10-15 2001-09-14 Unaxis Deutschland Gmbh Transportvorrichtung für Werkstücke in einer Vakuumanlage.
US6264804B1 (en) 2000-04-12 2001-07-24 Ske Technology Corp. System and method for handling and masking a substrate in a sputter deposition system
DE10261362B8 (de) * 2002-12-30 2008-08-28 Osram Opto Semiconductors Gmbh Substrat-Halter
KR100639004B1 (ko) * 2005-01-05 2006-10-26 삼성에스디아이 주식회사 트레이의 감지 및 이송장치
DE102005045718B4 (de) 2005-09-24 2009-06-25 Applied Materials Gmbh & Co. Kg Träger für ein Substrat
ATE514802T1 (de) * 2006-03-29 2011-07-15 Applied Materials Gmbh & Co Kg Vakuumtransportvorrichtung mit beweglicher führungsschiene
CN1970830B (zh) * 2006-11-30 2010-11-17 北京实力源科技开发有限责任公司 一种柔性输送装置及使用该装置的真空镀膜设备
DE102007052524B4 (de) 2007-11-01 2012-05-31 Von Ardenne Anlagentechnik Gmbh Transportmittel und Vakuumbeschichtungsanlage für Substrate unterschiedlicher Größe
DE102008015982B3 (de) * 2008-03-27 2009-07-30 Grenzebach Maschinenbau Gmbh Verfahren und Vorrichtung zur Fixierung und den Weitertransport stoßempfindlicher Platten in Sputter-Beschichtungsanlagen, Computerprogramm zur Durchführung des Verfahrens und maschinenlesbarer Träger hierzu
KR101011617B1 (ko) * 2008-09-26 2011-01-27 임태용 투수성 생태 호안 블럭 및 제조 방법
DE102009038369B4 (de) 2009-08-24 2012-05-24 Von Ardenne Anlagentechnik Gmbh Substrathalter für scheiben-oder plattenförmige Substrate und Vakuumbehandlungsanlage mit einer vertikalen Substrattransporteinrichtung
CN102803556B (zh) * 2010-01-14 2014-08-13 东电电子太阳能股份公司 用于在真空室内固定反应器的托架
DE102010054483A1 (de) * 2010-12-14 2012-06-14 Manz Automation Ag Mobile, transportable elektrostatische Substrathalteanordnung
DE102012010151A1 (de) * 2012-05-24 2013-11-28 Manz Ag Thermisch optimierter elektrostatischer Substrathalter
US11688589B2 (en) 2013-06-10 2023-06-27 View, Inc. Carrier with vertical grid for supporting substrates in coater
WO2014200927A1 (en) * 2013-06-10 2014-12-18 View, Inc. Glass pallet for sputtering systems

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0346815A2 (en) * 1988-06-13 1989-12-20 Asahi Glass Company Ltd. Vacuum processing apparatus and transportation system thereof

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH542772A (de) * 1971-09-21 1973-10-15 Balzers Patent Beteilig Ag Einrichtung zum Transportieren von zu beschichtenden Substraten durch eine Vakuumanlage
US4042128A (en) * 1975-11-26 1977-08-16 Airco, Inc. Substrate transfer apparatus for a vacuum coating system
DE3623970A1 (de) * 1986-07-16 1988-01-28 Leybold Heraeus Gmbh & Co Kg Transporteinrichtung mit rollensystemen fuer vakuum-beschichtungsanlagen
KR0133676B1 (ko) * 1987-12-07 1998-04-23 후세 노보루 웨이퍼 이동 교체 장치 및 방법
JP2559617B2 (ja) * 1988-03-24 1996-12-04 キヤノン株式会社 基板処理装置
DD285514A7 (de) * 1988-05-25 1990-12-19 Zi Fuer Festkoerperphysik Und Werkstofforschung Der Adw,Dd Vorrichtung zum beschichten von fadenfoermigen substraten im vakuum
DE4029905C2 (de) * 1990-09-21 1993-10-28 Leybold Ag Vorrichtung für den Transport von Substraten
DE4036339C2 (de) * 1990-11-15 1993-10-21 Leybold Ag Vorrichtung für den Transport von Substraten

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0346815A2 (en) * 1988-06-13 1989-12-20 Asahi Glass Company Ltd. Vacuum processing apparatus and transportation system thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1923642B (zh) * 2005-08-31 2012-01-11 乐金显示有限公司 用于传送基板的搬运器

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JPH05213444A (ja) 1993-08-24
KR930009889A (ko) 1993-06-21
HK54096A (en) 1996-04-03
TW206198B (zh) 1993-05-21
DE4139549A1 (de) 1993-06-03
CN1073648A (zh) 1993-06-30
EP0544995A1 (de) 1993-06-09
KR100228809B1 (ko) 1999-11-01
JP2543300B2 (ja) 1996-10-16
DE59203986D1 (de) 1995-11-16
EP0544995B1 (de) 1995-10-11

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