CN103987876B - 等离子体处理系统中的惰性主导脉冲 - Google Patents

等离子体处理系统中的惰性主导脉冲 Download PDF

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Publication number
CN103987876B
CN103987876B CN201280056139.7A CN201280056139A CN103987876B CN 103987876 B CN103987876 B CN 103987876B CN 201280056139 A CN201280056139 A CN 201280056139A CN 103987876 B CN103987876 B CN 103987876B
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gas
pulse
pulses
ratio
source
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CN103987876A (zh
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克伦·雅克布卡纳里克
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Lam Research Corp
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Lam Research Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32128—Radio frequency generated discharge using particular waveforms, e.g. polarised waves
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146—Amplitude modulation, includes pulsing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00—Auxiliary systems
    • H05H2242/20—Power circuits
    • H05H2242/24—Radiofrequency or microwave generators

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
CN201280056139.7A 2011-11-15 2012-11-12 等离子体处理系统中的惰性主导脉冲 Active CN103987876B (zh)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201510894145.5A CN105513933A (zh) 2011-11-15 2012-11-12 等离子体处理系统中的惰性主导脉冲
CN201510894141.7A CN105489464B (zh) 2011-11-15 2012-11-12 等离子体处理系统中的惰性主导脉冲

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201161560005P 2011-11-15 2011-11-15
US61/560,005 2011-11-15
US13/550,547 US8808561B2 (en) 2011-11-15 2012-07-16 Inert-dominant pulsing in plasma processing systems
US13/550,547 2012-07-16
PCT/IB2012/056348 WO2013072834A1 (en) 2011-11-15 2012-11-12 Inert-dominant pulsing in plasma processing

Related Child Applications (2)

Application Number Title Priority Date Filing Date
CN201510894145.5A Division CN105513933A (zh) 2011-11-15 2012-11-12 等离子体处理系统中的惰性主导脉冲
CN201510894141.7A Division CN105489464B (zh) 2011-11-15 2012-11-12 等离子体处理系统中的惰性主导脉冲

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Publication Number Publication Date
CN103987876A CN103987876A (zh) 2014-08-13
CN103987876B true CN103987876B (zh) 2016-01-06

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CN201280056139.7A Active CN103987876B (zh) 2011-11-15 2012-11-12 等离子体处理系统中的惰性主导脉冲
CN201510894141.7A Active CN105489464B (zh) 2011-11-15 2012-11-12 等离子体处理系统中的惰性主导脉冲
CN201510894145.5A Pending CN105513933A (zh) 2011-11-15 2012-11-12 等离子体处理系统中的惰性主导脉冲

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CN201510894145.5A Pending CN105513933A (zh) 2011-11-15 2012-11-12 等离子体处理系统中的惰性主导脉冲

Country Status (7)

Country Link
US (3) US8808561B2 (enExample)
JP (2) JP6325448B2 (enExample)
KR (1) KR102188927B1 (enExample)
CN (3) CN103987876B (enExample)
SG (2) SG11201401749SA (enExample)
TW (2) TWI575552B (enExample)
WO (1) WO2013072834A1 (enExample)

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Also Published As

Publication number Publication date
US20160099133A1 (en) 2016-04-07
KR102188927B1 (ko) 2020-12-10
US8808561B2 (en) 2014-08-19
US20130119019A1 (en) 2013-05-16
KR20140096370A (ko) 2014-08-05
US9583316B2 (en) 2017-02-28
JP6676094B2 (ja) 2020-04-08
US9214320B2 (en) 2015-12-15
TWI623017B (zh) 2018-05-01
CN105513933A (zh) 2016-04-20
SG11201401749SA (en) 2014-09-26
TWI575552B (zh) 2017-03-21
JP6325448B2 (ja) 2018-05-16
CN103987876A (zh) 2014-08-13
TW201709258A (zh) 2017-03-01
CN105489464B (zh) 2018-02-02
JP2018142711A (ja) 2018-09-13
US20140319098A1 (en) 2014-10-30
JP2015503224A (ja) 2015-01-29
TW201331978A (zh) 2013-08-01
CN105489464A (zh) 2016-04-13
SG10201608391VA (en) 2016-11-29
WO2013072834A1 (en) 2013-05-23

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