CN103608902B - 粘合片 - Google Patents
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- Publication number
- CN103608902B CN103608902B CN201280030235.4A CN201280030235A CN103608902B CN 103608902 B CN103608902 B CN 103608902B CN 201280030235 A CN201280030235 A CN 201280030235A CN 103608902 B CN103608902 B CN 103608902B
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- China
- Prior art keywords
- composition
- methyl
- bonding sheet
- mass parts
- acrylate
- Prior art date
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- 239000000203 mixture Substances 0.000 claims abstract description 73
- 239000000853 adhesive Substances 0.000 claims abstract description 32
- 230000001070 adhesive effect Effects 0.000 claims abstract description 32
- 238000005520 cutting process Methods 0.000 claims abstract description 27
- 239000000178 monomer Substances 0.000 claims abstract description 25
- 239000004014 plasticizer Substances 0.000 claims abstract description 25
- 229920000728 polyester Polymers 0.000 claims abstract description 24
- 229920001577 copolymer Polymers 0.000 claims abstract description 15
- 229920000915 polyvinyl chloride Polymers 0.000 claims abstract description 12
- 239000004800 polyvinyl chloride Substances 0.000 claims abstract description 12
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000003431 cross linking reagent Substances 0.000 claims abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract description 7
- 125000000524 functional group Chemical group 0.000 claims abstract description 5
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 claims abstract description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid group Chemical group C(CCCCC(=O)O)(=O)O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 claims description 16
- 239000001361 adipic acid Substances 0.000 claims description 8
- 235000011037 adipic acid Nutrition 0.000 claims description 8
- 230000007704 transition Effects 0.000 claims 1
- 230000009471 action Effects 0.000 abstract description 9
- -1 aliphatic dicarboxylic acids Chemical class 0.000 description 27
- 239000000463 material Substances 0.000 description 26
- CERQOIWHTDAKMF-UHFFFAOYSA-N alpha-methacrylic acid Natural products CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 17
- 229910052757 nitrogen Inorganic materials 0.000 description 16
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- 229920005989 resin Polymers 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- 239000012948 isocyanate Substances 0.000 description 11
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 9
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- 239000000049 pigment Substances 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 6
- 230000009194 climbing Effects 0.000 description 6
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 6
- 125000001931 aliphatic group Chemical group 0.000 description 5
- 239000003963 antioxidant agent Substances 0.000 description 5
- 230000003078 antioxidant effect Effects 0.000 description 5
- 125000003118 aryl group Chemical group 0.000 description 5
- 238000004040 coloring Methods 0.000 description 5
- 239000000470 constituent Substances 0.000 description 5
- 150000002513 isocyanates Chemical class 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 5
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical compound C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000003063 flame retardant Substances 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- 239000004611 light stabiliser Substances 0.000 description 4
- 150000002989 phenols Chemical class 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000006229 carbon black Substances 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- 150000003961 organosilicon compounds Chemical class 0.000 description 3
- 150000002924 oxiranes Chemical class 0.000 description 3
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 2
- 241001050985 Disco Species 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- 229920000305 Nylon 6,10 Polymers 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 238000003490 calendering Methods 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004049 embossing Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 229960004194 lidocaine Drugs 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 229940018564 m-phenylenediamine Drugs 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- 239000012860 organic pigment Substances 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 150000003505 terpenes Chemical class 0.000 description 2
- 235000007586 terpenes Nutrition 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical class N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- DPBJAVGHACCNRL-UHFFFAOYSA-N 2-(dimethylamino)ethyl prop-2-enoate Chemical compound CN(C)CCOC(=O)C=C DPBJAVGHACCNRL-UHFFFAOYSA-N 0.000 description 1
- ZCLIABJNNBEIBM-UHFFFAOYSA-N 2-(oxiran-2-ylmethoxy)-n-(oxiran-2-ylmethyl)aniline Chemical compound C1OC1CNC1=CC=CC=C1OCC1CO1 ZCLIABJNNBEIBM-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical class [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229920001651 Cyanoacrylate Polymers 0.000 description 1
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Natural products OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 1
- HSRJKNPTNIJEKV-UHFFFAOYSA-N Guaifenesin Chemical compound COC1=CC=CC=C1OCC(O)CO HSRJKNPTNIJEKV-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- 239000013032 Hydrocarbon resin Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- NNJVILVZKWQKPM-UHFFFAOYSA-N Lidocaine Chemical compound CCN(CC)CC(=O)NC1=C(C)C=CC=C1C NNJVILVZKWQKPM-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- MWCLLHOVUTZFKS-UHFFFAOYSA-N Methyl cyanoacrylate Chemical compound COC(=O)C(=C)C#N MWCLLHOVUTZFKS-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229920000388 Polyphosphate Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- 239000004902 Softening Agent Substances 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical class [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 238000003854 Surface Print Methods 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- AUNAPVYQLLNFOI-UHFFFAOYSA-L [Pb++].[Pb++].[Pb++].[O-]S([O-])(=O)=O.[O-][Cr]([O-])(=O)=O.[O-][Mo]([O-])(=O)=O Chemical class [Pb++].[Pb++].[Pb++].[O-]S([O-])(=O)=O.[O-][Cr]([O-])(=O)=O.[O-][Mo]([O-])(=O)=O AUNAPVYQLLNFOI-UHFFFAOYSA-L 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 229910021502 aluminium hydroxide Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- SMWDFEZZVXVKRB-UHFFFAOYSA-N anhydrous quinoline Natural products N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- BBEAQIROQSPTKN-UHFFFAOYSA-N antipyrene Natural products C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 1
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- VXTQKJXIZHSXBY-UHFFFAOYSA-N butan-2-yl 2-methylprop-2-enoate Chemical compound CCC(C)OC(=O)C(C)=C VXTQKJXIZHSXBY-UHFFFAOYSA-N 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Chemical class O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- UOUJSJZBMCDAEU-UHFFFAOYSA-N chromium(3+);oxygen(2-) Chemical class [O-2].[O-2].[O-2].[Cr+3].[Cr+3] UOUJSJZBMCDAEU-UHFFFAOYSA-N 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000002153 concerted effect Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- KQWGXHWJMSMDJJ-UHFFFAOYSA-N cyclohexyl isocyanate Chemical compound O=C=NC1CCCCC1 KQWGXHWJMSMDJJ-UHFFFAOYSA-N 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- PPSZHCXTGRHULJ-UHFFFAOYSA-N dioxazine Chemical compound O1ON=CC=C1 PPSZHCXTGRHULJ-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 229940051250 hexylene glycol Drugs 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229920006270 hydrocarbon resin Polymers 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000002466 imines Chemical group 0.000 description 1
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 1
- 235000013980 iron oxide Nutrition 0.000 description 1
- DCYOBGZUOMKFPA-UHFFFAOYSA-N iron(2+);iron(3+);octadecacyanide Chemical compound [Fe+2].[Fe+2].[Fe+2].[Fe+3].[Fe+3].[Fe+3].[Fe+3].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-] DCYOBGZUOMKFPA-UHFFFAOYSA-N 0.000 description 1
- VBMVTYDPPZVILR-UHFFFAOYSA-N iron(2+);oxygen(2-) Chemical class [O-2].[Fe+2] VBMVTYDPPZVILR-UHFFFAOYSA-N 0.000 description 1
- NCNCGGDMXMBVIA-UHFFFAOYSA-L iron(ii) hydroxide Chemical class [OH-].[OH-].[Fe+2] NCNCGGDMXMBVIA-UHFFFAOYSA-L 0.000 description 1
- 125000001261 isocyanato group Chemical group *N=C=O 0.000 description 1
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- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 1
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
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- C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
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- C08L33/08—Homopolymers or copolymers of acrylic acid esters
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
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- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
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- C—CHEMISTRY; METALLURGY
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- C—CHEMISTRY; METALLURGY
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- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2427/00—Presence of halogenated polymer
- C09J2427/006—Presence of halogenated polymer in the substrate
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
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- H—ELECTRICITY
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- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
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- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Dicing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
Abstract
本发明提供切割工序中的芯片保持性和拾取工序中的芯片的剥离性不会发生经时劣化的粘合片。根据本发明,提供一种切割用和/或输送用粘合片,在含有聚氯乙烯和聚酯类增塑剂而成的基材上层叠有粘合剂组合物,其特征在于,所述粘合剂组合物以质量比10:90~90:10的比例含有重均分子量小于35万且具有含官能团单体单元的(甲基)丙烯酸酯共聚物成分(A)、和重均分子量为35~200万且具有含官能团单体单元的(甲基)丙烯酸酯共聚物成分(B),并且,与所述成分(A)和所述成分(B)的官能团发生反应的交联剂的配合量相对于成分(A)和成分(B)的总计100质量份为0.5~20质量份,构成所述成分(A)的单体单元中10~95质量%为丙烯酸-2-乙基己酯,构成所述成分(B)的单体单元中10~95质量%为丙烯酸丁酯。
Description
技术领域
本发明涉及粘合片。更详细而言,涉及电子部件的制造工序中使用的切割用和/或输送用粘合片。
背景技术
通常,半导体晶片在形成电路后贴合粘合片,然后配置于切断(切割)为元件小片、清洗、干燥、粘合片的延伸(扩展)、从粘合片将元件小片剥离(拾取)以及贴装等各工序。作为这些工序中所使用的切割用和/或输送用粘合片,专利文献1记载了在基材中使用聚氯乙烯的示例。
此外,作为与本发明相关联的技术,在专利文献2中,作为粘合剂组合物,公开了一种使用重均分子量不同的两种(甲基)丙烯酸酯共聚物的组合物。
此外,在专利文献3中,记载了在皮肤粘贴用粘合片中,为了防止粘合力随时间推移而丧失,使用聚酯类增塑剂的技术。
【现有技术文献】
【专利文献】
【专利文献1】日本特开平6-61346号公报
【专利文献2】日本特开2001-89731号公报
【专利文献3】日本特开2001-106990号公报
发明内容
发明所要解决的问题
现有的聚氯乙烯作为基材的粘合片存在如下问题:即,会发生增塑剂经时地从基材向粘合剂层移动的问题,并且,会发生切割工序中的芯片保持性和拾取工序中的芯片的剥离性(拾取性)的问题。
本发明鉴于这种情况而完成,其主要目的在于,提供一种切割工序中的芯片保持性和拾取工序中的芯片的剥离性不发生经时劣化的粘合片。
用于解决问题的方法
根据本发明,提供一种切割用和/或输送用粘合片,在含有聚氯乙烯和聚酯类增塑剂而成的基材上层叠有粘合剂组合物,
所述粘合剂组合物以质量比10:90~90:10的比例含有重均分子量小于35万且具有含官能团单体单元的(甲基)丙烯酸酯共聚物成分(A)、和重均分子量为35~200万且具有含官能团单体单元的(甲基)丙烯酸酯共聚物成分(B),并且,与所述成分(A)和所述成分(B)的官能团发生反应的交联剂的配合量相对于成分(A)和成分(B)的总计100质量份为0.5~20质量份,
构成所述成分(A)的单体单元中10~95质量%为丙烯酸-2-乙基己酯(2-ethylhexylacrylate),构成所述成分(B)的单体单元中10~95质量%为丙烯酸丁酯(butylacrylate)。
本发明人最初考虑利用如专利文献3中记载的聚酯类增塑剂来代替一直以来所使用的邻苯二甲酸二辛酯,并进行了随时间推移所导致的粘合力上升的评价。但是,即使在使用聚酯类增塑剂的情况下,仍会发生粘合力随时间推移而上升,在芯片保持性和拾取性的至少一个方面无法得到令人满意的结果。
因此,本发明人进一步研究后发现,聚酯类增塑剂在以特定比例配合了具有上述特定的组成和分子量的两种(甲基)丙烯酸酯共聚物的粘合剂组合物中,特别难以发生移动,并且发现通过聚酯类增塑剂与这种粘合剂组合物间的组合,能够得到切割工序中的芯片保持性和拾取工序中的芯片的剥离性的经时劣化不会发生的粘合片,从而完成了本发明。
所述基材中的所述聚酯类增塑剂的配合量相对于聚氯乙烯100质量份为20~50质量份为佳。
聚酯类增塑剂为己二酸类聚酯为佳。
所述成分(A)和所述成分(B)的玻璃化转变温度为0℃以下为佳。
发明效果
通过本发明,提供一种切割工序中的芯片保持性和拾取工序中的芯片的剥离性的经时劣化不会发生的粘合片。
具体实施方式
以下,对于用于实施本发明的优选方式进行说明。需要说明的是,以下进行说明的实施方式表示本技术的代表性实施方式的一例,并不能由此对本发明的范围进行缩小解释。
需要说明的是,本说明书中,单体单元是指来源于单体的结构单元。“份”和“%”,只要没有特殊说明,以质量为标准。“(甲基)丙烯酸酯”为丙烯酸酯以及甲基丙烯酸酯的总称。同样,“(甲基)丙烯酸”等含有(甲基)的化合物是指具有“甲基”的化合物和不具有“甲基”的化合物的总称。
1.粘合片
(1)基材
本发明的切割用和/或输送用粘合片(以下,仅记载为“粘合片”)在含有聚氯乙烯和聚酯类增塑剂而成的基材上层叠有粘合剂组合物。
作为基材的材料,可以采用以往作为粘合片的基材材料通用的聚氯乙烯。对于基材的成型方法,可以采用例如压延成形法、T模挤出法、吹胀法(inflationmethod)或铸造法等。
基材膜的厚度没有特别限制,例如为40~250μm,优选为50~200μm,进一步优选为60~150μm。
聚氯乙烯中配合有作为增塑剂的聚酯。作为聚酯类增塑剂,可以列举例如:己二酸、壬二酸、癸二酸、邻苯二甲酸、间苯二甲酸、对苯二甲酸等碳原子数2~10的脂肪族二羧酸和/或芳香族二羧酸等二羧酸、与乙二醇、丙二醇、丁二醇、新戊二醇、己二醇等碳原子数2~10的二醇发生缩聚而生成的聚酯。
作为二羧酸,优选己二酸、癸二酸(Sebacicacid)等脂肪族二羧酸,特别是在通用性、价格、经时稳定性的方面,优选己二酸。作为二醇,可以使用直链状或支链状中的任意一种,可以根据需要适当选择。二醇优选碳原子数为2~6。
聚酯类增塑剂的数均分子量没有特别限制,通常使用约500~约4000的聚酯类增塑剂。
基材中的聚酯类增塑剂的配合量,相对于聚氯乙烯100质量份优选为20~50质量份,更加优选为25~45质量份,进一步优选为30~40质量份。
作为聚氯乙烯的增塑剂配合上述聚酯,并且与后述特定组成的粘合剂组合物一同使用,由此,基材中的增塑剂向粘合剂层的移动得以抑制,从而能够赋予粘合片切割工序中的充分的芯片保持性和拾取工序中的良好的芯片的剥离性。
基材膜中,根据需要还可以配合抗氧化剂、紫外线吸收剂、光稳定剂、抗静电剂、阻燃剂、染料或颜料等着色剂等各种添加剂。这些添加材料的添加量没有特别限制,可以适当设定。
对于抗氧化剂而言,只要是以往树脂或树脂组合物中作为抗氧化剂而公知的抗氧化剂则可以任意使用,没有特别限制。作为抗氧化剂,可以列举例如:酚类(单酚类、双酚类、高分子型酚类)、硫类、磷类等抗氧化剂。
作为紫外线吸收剂,可以列举例如:水杨酸酯类、二苯甲酮类、苯并三唑类、氰基丙烯酸酯类等紫外线吸收剂。从紫外线吸收効果的观点出发,优选二苯甲酮类紫外线吸收剂和苯并三唑类紫外线吸收剂,特别优选苯并三唑类紫外线吸收剂。
作为光稳定剂,可以使用例如:受阻胺类、受阻酚类等光稳定剂。
作为抗静电剂,可以列举四级铵盐(Quaternaryaminesalt)单体等。作为四级铵盐单体,可以列举例如:(甲基)丙烯酸二甲氨基乙酯四级氯化物,(甲基)丙烯酸二乙氨基乙酯四级氯化物,(甲基)丙烯酸甲基乙氨基乙酯四级氯化物,对二甲氨基苯乙烯四级氯化物和对二乙氨基苯乙烯四级氯化物等,优选使用甲基丙烯酸二甲氨基乙酯四级氯化物。需要说明的是,基材的抗静电处理也可以通过在基材表面涂布抗静电剂来进行。
作为阻燃剂,可以列举例如:溴类阻燃剂、氢氧化铝、氢氧化镁、三氧化锑等无机类阻燃剂;包括氰尿酸三聚氰胺、尿素、三聚氰胺衍生物等含三嗪环化合物;芳香族聚磷酸酯等磷酸酯等有机类阻燃剂。
作为着色剂,可以使用有机类颜料、无机类颜料、染料、炭黑等公知或周知的着色剂。颜色任意,例如,可以为白色、象牙色、黑色、红色、绿色、黄色和绿色等。在使膜基材为多层结构的情况下,可以在所有层中加入着色剂,也可以仅在一部分层中加入着色剂。作为颜料,可以列举例如:酞菁类、偶氮类、缩合偶氮类、偶氮色淀类、蒽醌类、二萘嵌苯和芘酮类、靛族和硫靛类、异吲哚酮类、偶氮甲碱偶氮类、二恶嗪类、喹吖酮类、苯胺黑类、三苯甲烷类、炭黑类等有机颜料;氧化钛类、氧化铁类、氢氧化铁类、氧化铬类、尖晶石型烧成类、铬酸类、铬朱红类、普鲁士蓝类、铝粉末类、青铜粉末类等颜料。对于这些颜料而言,可以是通过公知的方法实施各种分散处理后的颜料。
对于基材而言,为了提高扩展工序(Expandingstep)中的延伸性,可以在表面涂布润滑剂,或者将增滑剂揉入树脂中。润滑剂只要是能够降低粘合片与扩展装置的摩擦的物质则没有特别限定,可以使用例如:有机硅树脂和(改性)有机硅油等有机硅化合物,含氟树脂、六方晶氮化硼、炭黑、二硫化钼等。由于电子部件的制造在无尘室内进行,因此优选使用有机硅化合物或含氟树脂。有机硅化合物中,由于具有有机硅大分子单体单元的共聚物与抗静电剂的相容性良好,能够兼顾抗静电性和扩展性,因此特别优选。
在基材的一个表面层叠有如下说明的粘合剂层,也可以在另一个表面实施压花加工(embossprocessing)。压花加工优选以使基材表面的平均表面粗糙度(Ra)为0.3~1.5μm的方式实施。通过将粘合片的压花加工面设置于扩展装置的机械台侧,由此,扩张工序中的基材的延伸变容易。
(2)粘合剂层
将粘合剂层层叠在基材的一个表面。粘合剂层由粘合剂组合物形成,所述粘合剂组合物含有分别以预定比率而具有含官能团单体单元且重均分子量相互不同的两种(甲基)丙烯酸酯共聚物,并且所述粘合剂组合物含有与所述官能团发生反应的交联剂。
具体而言,粘合剂组合物以质量比10:90~90:10的比例含有重均分子量小于35万且具有含官能团单体单元的(甲基)丙烯酸酯共聚物成分(A),和重均分子量为35~200万且具有含官能团单体单元的(甲基)丙烯酸酯共聚物成分(B)。需要说明的是,“重均分子量”是通过凝胶渗透色谱法(GPC)作为聚苯乙烯换算的平均分子量而测定的值。
在成分(A)的重均分子量超过35万的情况下,对于被粘物的润湿性变得不充分,切割工序中的芯片保持性变得不充分。如果成分(B)的重均分子量小于35万,则粘贴到被粘物上后,粘合力随时间推移过度增大,拾取工序中的芯片剥离性变差。此外,如果成分(B)的重均分子量超过200万则对于被粘物的润湿性变得不充分,切割工序中的芯片保持性变得不充分。
成分(A)的重均分子量为例如5万、10万、15万、20万、25万、30万、34万,也可以为在此处例示的任意两个数値之间的范围内。此外,成分(B)的重均分子量为35万、40万、50万、60万、70万、80万、90万、100万、110万、120万、130万、140万、150万、160万、170万、180万、190万、200万,也可以为在此处例示的任意两个数值之间的范围内。成分(A)和成分(B)的质量比为例如10:90、20:80、30:70、40:60、50:50、60:40、70:30、80:20、90:10,也可以为在此处例示的任意两个数值之间的范围内。
对于成分(A)和成分(B)的含有比例而言,无论成分(A)过少或是过多都无法抑制随时间推移所导致的向被粘物的润湿扩大。
作为构成成分(A)和成分(B)的含官能团单体,可以使用乙烯化合物单体,所述乙烯化合物单体具有选自由羟基、羧基、环氧基、酰胺基、氨基、羟甲基、磺酸基、氨基磺酸基和(亚)磷酸酯基组成的官能团组的一种以上的官能团。
作为具有羟基的含官能团单体,可以列举:例如,(甲基)丙烯酸-2-羟基乙酯、(甲基)丙烯酸-2-羟基丙酯、(甲基)丙烯酸-2-羟基丁酯及2-羟基乙烯基醚等。
作为具有羧基的含官能团单体,可以列举:例如,(甲基)丙烯酸、巴豆酸、马来酸、马来酸酐、衣康酸、富马酸、丙烯酰胺-N-乙醇酸及肉桂酸。
作为具有环氧基的含官能团单体,可以列举:例如,(甲基)丙烯酸缩水甘油酯。
作为具有酰胺基的含官能团单体,可以列举:例如,(甲基)丙烯酰胺。
作为具有氨基的含官能团单体,可以列举:例如,(甲基)丙烯酸-N,N-二甲基氨基乙酯、(甲基)丙烯酸-N-叔丁基氨基乙酯。作为含有羟甲基的含官能团单体,可以列举:例如,N-羟甲基(甲基)丙烯酰胺。
作为构成成分(A)和成分(B),且能够与上述含官能团单体共聚的(甲基)丙烯酸酯单体,可以采用:例如,(甲基)丙烯酸丁酯、(甲基)丙烯酸-2-丁酯、(甲基)丙烯酸叔丁酯(t-butyl(meth)acrylate)、(甲基)丙烯酸戊酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸-2-乙基己酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸月桂酯、(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸异丙酯、(甲基)丙烯酸十三烷基酯、(甲基)丙烯酸十四烷基酯、(甲基)丙烯酸十六烷基酯、(甲基)丙烯酸十八烷基酯、(甲基)丙烯酸环己酯、(甲基)丙烯酸异冰片酯、(甲基)丙烯酸二环戊酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸甲氧基乙酯、(甲基)丙烯酸乙氧基乙酯、(甲基)丙烯酸丁氧基甲酯及(甲基)丙烯酸乙氧基正丙酯(Ethoxy-n-propyl(meth)acrylate)等。
为了抑制随时间推移所导致的向被粘物的润湿扩大,优选使构成成分(A)的单体单元中的10~95质量%为丙烯酸-2-乙基己酯,使构成成分(B)的单体单元中的10~95质量%为丙烯酸丁酯。丙烯酸-2-乙基己酯和丙烯酸丁酯的比例分别为10、20、30、40、50、60、70、80、90、95质量%,也可以在此处例示的任意两个数值之间的范围内。
优选成分(A)和成分(B)的玻璃化转变温度为0℃以下。另外,“玻璃化转变温度”是通过下述的“GORDON-TAILOR公式”导出的值。
W/Tg=W1/Tg1+W2/Tg2+WN/TgN
Tg:(甲基)丙烯酸酯共聚物的玻璃化转变温度(℃)
TgN:单体N的均聚物的玻璃化转变温度(℃)
WN:单体N的质量比率(%)
交联剂只要是与构成成分(A)和成分(B)的含官能团单体的官能团发生反应的物质则不受特别限定,例如,可以是异氰酸酯化合物,环氧化合物,亚胺化合物等。这些化合物可以单独使用,也可以将两种以上组合来使用。
作为异氰酸酯化合物,可以使用:例如,芳香族类异氰酸酯、脂环族类异氰酸酯及脂肪族类异氰酸酯等具有多个异氰酸酯基的化合物。
作为芳香族类异氰酸酯,可以列举:例如,甲苯二异氰酸酯、4,4-二苯基甲烷二异氰酸酯、苯二亚甲基二异氰酸酯。
作为脂肪族类异氰酸酯,可以列举:例如,异佛尔酮二异氰酸酯、亚甲基双(4-环己基异氰酸酯)。
作为脂肪族异氰酸酯,可以列举:例如,六亚甲基二异氰酸酯、三甲基六亚甲基二异氰酸酯。
这些异氰酸酯化合物,可以是二聚物或三聚物,此外也可以是与多元醇化合物反应而得到的加合物。
作为环氧化合物,使用例如:双酚A型环氧化合物、双酚F型环氧化合物、N,N-缩水甘油基苯胺、N,N-缩水甘油基甲苯胺、间N,N-缩水甘油基氨基苯基缩水甘油醚、对N,N-缩水甘油基氨基苯基缩水甘油醚、三缩水甘油基异氰酸酯、N,N,N’,N’-四缩水甘油基二氨基二苯甲烷、N,N,N’,N’-四缩水甘油基间苯二胺及N,N,N’,N’,N’’-五缩水甘油基二乙烯三胺等。
作为亚胺化合物,可以使用例如,N,N’-二苯基甲烷-4,4’-双(1-氮丙啶甲酰胺)、三羟甲基丙烷-三-β-氮丙啶基丙酸酯、四羟甲基甲烷-三-β-氮丙啶基丙酸酯及N,N’-甲苯-2,4-双-(1-氮丙啶甲酰胺)三亚乙基密胺等。
交联剂的配合量相对于成分(A)和成分(B)的总计100质量份在0.5~20质量份的范围内。在交联剂的配合量小于0.5质量份的情况下,粘合力变得过大,拾取工序中的芯片剥离性变差,如果超过20质量份则粘合力变得过小,切割工序中的芯片保持性降低。相对于成分(A)和成分(B)的总计100质量份,交联剂的配合量为例如0.5、1、2、4、6、8、10、12、14、16、18、20质量份,也可以在此处例示的任意两个数值之间的范围内。
还可以在粘合剂层中添加增粘剂、聚合引发剂、固化剂、软化剂、抗老剂、填充剂、紫外线吸收剂、光稳定剂、光聚合性化合物及光引发剂等各种添加剂。对于增粘剂,可以使用例如:松香树脂、松香酯树脂、萜烯树脂、萜烯酚树脂、苯酚树脂、二甲苯树脂、香豆酮树脂、香豆酮茚树脂、苯乙烯树脂、脂肪族石油树脂、芳香族石油树脂、脂肪族芳香族共重合石油树脂、脂环族烃树脂及它们的改性物、衍生物或氢加成物等。
增粘剂的配合量不受特别限定,相对于(甲基)丙烯酸酯重合体100质量份为200质量份以下,优选为30质量份以下。
2.粘合片的制造方法
本发明的粘合片可以通过使用公知的方法将粘合剂组合物层叠在基材上来进行制造。
作为在基材上形成粘合剂层的方法,可以为例如使用凹版涂布机、逗号涂布机(commacoater)、棒式涂布机、刮刀涂布机或辊式涂布机在基材上直接涂布粘合剂组合物的方法,或者在将粘合剂组合物涂布到剥离膜上并使其干燥后,再贴合在基材上的方法。此外,还可以通过凸板印刷、凹板印刷、平板印刷、柔性版印刷、胶版印刷或丝网印刷等将粘合剂层印刷到基材上。
粘合剂层的厚度不受特别限定,优选以干燥后的厚度计为约1~100μm,更优选为5~40μm。如果粘合剂层过薄则粘合力降低,切割时的芯片保持性降低,或者易于发生从环形框架的剥离。另一方面,如果粘合剂层过厚则粘合力较高,拾取工序中的芯片剥离性恶化。
实施例
通过密闭式混炼机将聚氯乙烯树脂、增塑剂、稳定剂、颜料、填充剂混炼后,通过压延加工形成70μm的厚度,得到基材。增塑剂的种类和配合量如表1~表2所示。己二酸类聚酯使用POLYCIZERW2310(大日本油墨化学工业株式会社,数均分子量2300)。
接下来,准备具有表3所示组成和分子量的(甲基)丙烯酸酯共聚物,按照表1~表2将成分(A),成分(B)及交联剂混合制备出粘合剂组合物。将涂布了粘合剂组合物的PET制剥离膜层叠在基材上以使干燥后的粘合剂层的厚度达到10μm,得到粘合片。
交联剂:2,4-甲苯二异氰酸酯的三羟甲基丙烷加合物(日本聚氨酯工业公司制,CORONATEL-45E)。
[表1]
[表2]
[表3]
对所得粘合片进行以下的评价。将其结果示于表1~表2。
(1)粘合力
将粘合片贴合到硅晶片镜面上,使用2kg的辊往复压合一次并放置20分钟后,在180°剥离、拉伸速度300mm/分钟的条件下测定粘合力。硅晶片使用725μm厚度的晶片(6英寸)。
(2)随时间推移所导致的粘合力上升
制成在上述的条件下压合后并放置了20分钟的试验体和放置了7天的试验体,测定各试验体的粘合力。根据下式由放置了20分钟的试验体的粘合力(X)和放置了7天的试验体的粘合力(Y)求出上升率。
上升率=(100×(Y-X))/X
根据算出的上升率,按照以下的基准,对随时间推移所导致的粘合力上升进行评价。
A:上升率小于5%。
B:上升率为5%以上且小于10%。
C:上升率为10%以上。
(3)芯片保持性
在对粘贴有粘合片的硅晶片进行切割时,计算粘合片上保持的芯片的数量。切割使用以下的装置。向粘合片的切削深度设为30μm,芯片尺寸设为3mm见方。
装置:DISCO公司DAD341
切割刀片:DISCO公司G1A851SD400R13B01
切割刀片旋转数:40,000rpm
切割刀片进给速度:40mm/秒
切削水温度:25℃
切削水量:1.0L/分。
根据芯片数量,按照以下的基准对芯片保持性进行评价。
A:保持在粘合片上的芯片为95%以上。
B:保持在粘合片上的芯片为80%以上。
C:保持在粘合片上的芯片小于80%。
(4)拾取性
在上述条件下将硅晶片切割后,在以下的条件下进行拾取,计算能够拾取的芯片的数量。
拾取装置:佳能机械公司制CAP-300II
扩展量:5mm
顶针形状:150μmR
顶针数量:4根
顶针顶推(Pushup)高度:0.3mm
根据能够拾取的芯片数量,按照以下的基准对拾取性进行评价。
A:90%以上的芯片能够拾取。
B:80%以上的芯片能够拾取。
C:小于80%的芯片能够拾取。
<讨论>
在使用己二酸类聚酯作为增塑剂的全部实施例中,随时间推移所导致的粘合力上升较小,芯片保持性和拾取性优良。在使用对苯二甲酸类聚酯作为增塑剂的实施例6中,虽然发生了随时间推移所导致的粘合力上升,但与使用邻苯二甲酸二辛酯的情况(比较例1)相比,仍能够获得良好的结果。
在比较例2~10中,无论是否使用己二酸类聚酯作为增塑剂,由于构成粘合剂层的共聚物成分或交联剂的物性和配合量不合适,因此无法获得良好的结果。
产业上的可利用性
本发明所涉及的粘合片,由于切割工序中的芯片保持性和拾取工序中的芯片的剥离性优良,因此作为切割用和/或输送用的粘合片而适用于电子部件的制造。
Claims (4)
1.一种切割用和/或输送用粘合片,在含有聚氯乙烯和聚酯类增塑剂而成的基材上层叠有粘合剂组合物,其中,
所述粘合剂组合物以质量比10:90~90:10的比例含有重均分子量小于35万且具有含官能团单体单元的(甲基)丙烯酸酯共聚物成分A、和重均分子量为35~200万且具有含官能团单体单元的(甲基)丙烯酸酯共聚物成分B,并且,与所述成分A和所述成分B的官能团发生反应的交联剂的配合量相对于成分A和成分B的总计100质量份为0.5~20质量份,
构成所述成分A的单体单元中10~95质量%为丙烯酸-2-乙基己酯,构成所述成分B的单体单元中10~95质量%为丙烯酸丁酯。
2.如权利要求1所述的粘合片,其中,所述基材中的所述聚酯类增塑剂的配合量相对于聚氯乙烯100质量份为20~50质量份。
3.如权利要求1或2所述的粘合片,其中,聚酯类增塑剂为己二酸类聚酯。
4.如权利要求1或2所述的粘合片,其中,所述成分A和所述成分B的玻璃化转变温度为0℃以下。
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