CN103403895B - 半导体发光器件 - Google Patents
半导体发光器件 Download PDFInfo
- Publication number
- CN103403895B CN103403895B CN201180066819.2A CN201180066819A CN103403895B CN 103403895 B CN103403895 B CN 103403895B CN 201180066819 A CN201180066819 A CN 201180066819A CN 103403895 B CN103403895 B CN 103403895B
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- external terminal
- metal pillar
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 108
- 229910052751 metal Inorganic materials 0.000 claims abstract description 89
- 239000002184 metal Substances 0.000 claims abstract description 87
- 239000012212 insulator Substances 0.000 claims abstract description 10
- 229920005989 resin Polymers 0.000 claims description 28
- 239000011347 resin Substances 0.000 claims description 28
- 230000004888 barrier function Effects 0.000 claims description 26
- 239000000463 material Substances 0.000 claims description 20
- 238000009434 installation Methods 0.000 claims description 16
- 238000010276 construction Methods 0.000 claims description 14
- 230000005611 electricity Effects 0.000 claims description 3
- 239000000758 substrate Substances 0.000 description 30
- 239000011248 coating agent Substances 0.000 description 20
- 238000000576 coating method Methods 0.000 description 20
- 239000010949 copper Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 229910003564 SiAlON Inorganic materials 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 238000005520 cutting process Methods 0.000 description 6
- 238000013461 design Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 150000004767 nitrides Chemical class 0.000 description 5
- 238000002372 labelling Methods 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 229920002050 silicone resin Polymers 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910052788 barium Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
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- 229910052733 gallium Inorganic materials 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910052712 strontium Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910003978 SiClx Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 244000154870 Viola adunca Species 0.000 description 1
- 235000005811 Viola adunca Nutrition 0.000 description 1
- 235000013487 Viola odorata Nutrition 0.000 description 1
- 235000002254 Viola papilionacea Nutrition 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 229910052909 inorganic silicate Inorganic materials 0.000 description 1
- 238000011900 installation process Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
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- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
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- 230000000717 retained effect Effects 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0093—Wafer bonding; Removal of the growth substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/483—Containers
- H01L33/486—Containers adapted for surface mounting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Led Device Packages (AREA)
- Led Devices (AREA)
Abstract
Description
Claims (15)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011-025812 | 2011-02-09 | ||
JP2011025812A JP5603793B2 (ja) | 2011-02-09 | 2011-02-09 | 半導体発光装置 |
PCT/JP2011/003245 WO2012107967A1 (en) | 2011-02-09 | 2011-06-08 | Semiconductor light emitting device |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103403895A CN103403895A (zh) | 2013-11-20 |
CN103403895B true CN103403895B (zh) | 2017-03-29 |
Family
ID=44629848
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201180066819.2A Active CN103403895B (zh) | 2011-02-09 | 2011-06-08 | 半导体发光器件 |
Country Status (8)
Country | Link |
---|---|
US (2) | US8860075B2 (zh) |
EP (1) | EP2673813B1 (zh) |
JP (1) | JP5603793B2 (zh) |
KR (1) | KR20130097815A (zh) |
CN (1) | CN103403895B (zh) |
HK (1) | HK1190821A1 (zh) |
TW (1) | TWI429108B (zh) |
WO (1) | WO2012107967A1 (zh) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9111950B2 (en) * | 2006-09-28 | 2015-08-18 | Philips Lumileds Lighting Company, Llc | Process for preparing a semiconductor structure for mounting |
JP5662277B2 (ja) | 2011-08-08 | 2015-01-28 | 株式会社東芝 | 半導体発光装置及び発光モジュール |
JP2013065726A (ja) | 2011-09-16 | 2013-04-11 | Toshiba Corp | 半導体発光装置及びその製造方法 |
US20130240934A1 (en) * | 2012-03-14 | 2013-09-19 | Samsung Electronics Co., Ltd. | Light emitting element package and method of manufacturing the same |
TWI489658B (zh) * | 2012-05-25 | 2015-06-21 | Toshiba Kk | 半導體發光裝置及光源單元 |
US9093618B2 (en) * | 2012-08-24 | 2015-07-28 | Tsmc Solid State Lighting Ltd. | Method and apparatus for fabricating phosphor-coated LED dies |
CN203456494U (zh) * | 2012-12-26 | 2014-02-26 | 东莞市正光光电科技有限公司 | 覆晶式led芯片 |
JP2015195332A (ja) | 2014-03-27 | 2015-11-05 | 株式会社東芝 | 半導体発光装置及びその製造方法 |
JP6384202B2 (ja) * | 2014-08-28 | 2018-09-05 | 日亜化学工業株式会社 | 発光装置の製造方法 |
US9704823B2 (en) * | 2015-03-21 | 2017-07-11 | Nxp B.V. | Reduction of defects in wafer level chip scale package (WLCSP) devices |
US10615308B2 (en) | 2015-06-01 | 2020-04-07 | Nichia Corporation | Light emitting device |
DE102015114579B4 (de) * | 2015-09-01 | 2021-07-01 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Halbleiterchip |
JP6904720B2 (ja) * | 2017-02-14 | 2021-07-21 | シチズン電子株式会社 | 発光体 |
DE102018131579A1 (de) * | 2018-12-10 | 2020-06-10 | Osram Opto Semiconductors Gmbh | Optoelektronisches bauteil und verfahren zur herstellung eines optoelektronischen bauteils |
US11804416B2 (en) * | 2020-09-08 | 2023-10-31 | UTAC Headquarters Pte. Ltd. | Semiconductor device and method of forming protective layer around cavity of semiconductor die |
CN112134024B (zh) * | 2020-09-25 | 2022-07-29 | 合肥工业大学 | 一种基于全石墨的三维结构宽带超材料吸波体 |
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US6331450B1 (en) * | 1998-12-22 | 2001-12-18 | Toyoda Gosei Co., Ltd. | Method of manufacturing semiconductor device using group III nitride compound |
CN1768434A (zh) * | 2003-03-28 | 2006-05-03 | 吉尔科有限公司 | 发光二极管功率封装 |
EP2194586A1 (en) * | 2008-12-08 | 2010-06-09 | Kabushiki Kaisha Toshiba | Semiconductor device and method for manufacturing the same |
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JP3342322B2 (ja) | 1996-11-27 | 2002-11-05 | シャープ株式会社 | Led素子表示装置の製造方法 |
JP2000244012A (ja) | 1998-12-22 | 2000-09-08 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体素子の製造方法 |
TW465123B (en) * | 2000-02-02 | 2001-11-21 | Ind Tech Res Inst | High power white light LED |
JP3589187B2 (ja) | 2000-07-31 | 2004-11-17 | 日亜化学工業株式会社 | 発光装置の形成方法 |
JP4305102B2 (ja) | 2003-09-03 | 2009-07-29 | 豊田合成株式会社 | 半導体発光素子用複合基板及びその製造方法、並びに半導体発光素子の製造方法 |
JP2005079551A (ja) | 2003-09-03 | 2005-03-24 | Toyoda Gosei Co Ltd | 半導体発光素子形成用複合基板及びその製造方法、並びに半導体発光素子の製造方法。 |
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JP2007123704A (ja) * | 2005-10-31 | 2007-05-17 | Stanley Electric Co Ltd | 表面実装型led |
TWI301331B (en) * | 2006-05-17 | 2008-09-21 | Epistar Corp | Light emitting device |
TWI508321B (zh) * | 2008-07-21 | 2015-11-11 | Mutual Pak Technology Co Ltd | 發光二極體及其形成方法 |
JP4724222B2 (ja) | 2008-12-12 | 2011-07-13 | 株式会社東芝 | 発光装置の製造方法 |
JP4686643B2 (ja) * | 2009-07-03 | 2011-05-25 | シャープ株式会社 | 半導体発光素子搭載用基板、バックライトシャーシ、表示装置、及び、テレビ受信装置 |
JP4686625B2 (ja) | 2009-08-03 | 2011-05-25 | 株式会社東芝 | 半導体発光装置の製造方法 |
JP5534763B2 (ja) | 2009-09-25 | 2014-07-02 | 株式会社東芝 | 半導体発光装置の製造方法及び半導体発光装置 |
JP5378130B2 (ja) | 2009-09-25 | 2013-12-25 | 株式会社東芝 | 半導体発光装置 |
JP2011071272A (ja) | 2009-09-25 | 2011-04-07 | Toshiba Corp | 半導体発光装置及びその製造方法 |
JP5349260B2 (ja) | 2009-11-19 | 2013-11-20 | 株式会社東芝 | 半導体発光装置及びその製造方法 |
JP5414579B2 (ja) | 2009-11-19 | 2014-02-12 | 株式会社東芝 | 半導体発光装置 |
JP5101645B2 (ja) | 2010-02-24 | 2012-12-19 | 株式会社東芝 | 半導体発光装置 |
JP5197654B2 (ja) | 2010-03-09 | 2013-05-15 | 株式会社東芝 | 半導体発光装置及びその製造方法 |
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JP5356312B2 (ja) | 2010-05-24 | 2013-12-04 | 株式会社東芝 | 半導体発光装置 |
JP5325834B2 (ja) | 2010-05-24 | 2013-10-23 | 株式会社東芝 | 半導体発光装置及びその製造方法 |
JP5281612B2 (ja) | 2010-05-26 | 2013-09-04 | 株式会社東芝 | 半導体発光装置及びその製造方法 |
JP5426481B2 (ja) | 2010-05-26 | 2014-02-26 | 株式会社東芝 | 発光装置 |
JP2011253925A (ja) | 2010-06-02 | 2011-12-15 | Toshiba Corp | 発光装置の製造方法 |
TW201145614A (en) | 2010-06-03 | 2011-12-16 | Toshiba Kk | Method for manufacturing light-emitting device and light-emitting device manufactured by the same |
JP5390472B2 (ja) | 2010-06-03 | 2014-01-15 | 株式会社東芝 | 半導体発光装置及びその製造方法 |
JP5337105B2 (ja) | 2010-06-03 | 2013-11-06 | 株式会社東芝 | 半導体発光装置 |
JP2011253975A (ja) | 2010-06-03 | 2011-12-15 | Toshiba Corp | 発光装置およびその製造方法 |
US20110298001A1 (en) | 2010-06-03 | 2011-12-08 | Kabushiki Kaisha Toshiba | Method for manufacturing light-emitting device and light-emitting device manufactured by the same |
JP5337106B2 (ja) | 2010-06-04 | 2013-11-06 | 株式会社東芝 | 半導体発光装置 |
JP5185338B2 (ja) * | 2010-08-09 | 2013-04-17 | 株式会社東芝 | 発光装置 |
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2011
- 2011-02-09 JP JP2011025812A patent/JP5603793B2/ja active Active
- 2011-06-08 EP EP11741296.5A patent/EP2673813B1/en active Active
- 2011-06-08 WO PCT/JP2011/003245 patent/WO2012107967A1/en active Application Filing
- 2011-06-08 KR KR1020137020951A patent/KR20130097815A/ko active IP Right Grant
- 2011-06-08 CN CN201180066819.2A patent/CN103403895B/zh active Active
- 2011-06-23 TW TW100121995A patent/TWI429108B/zh active
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2013
- 2013-08-08 US US13/962,643 patent/US8860075B2/en active Active
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2014
- 2014-04-17 HK HK14103687.6A patent/HK1190821A1/zh unknown
- 2014-09-09 US US14/481,712 patent/US9263640B2/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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US6331450B1 (en) * | 1998-12-22 | 2001-12-18 | Toyoda Gosei Co., Ltd. | Method of manufacturing semiconductor device using group III nitride compound |
CN1768434A (zh) * | 2003-03-28 | 2006-05-03 | 吉尔科有限公司 | 发光二极管功率封装 |
EP2194586A1 (en) * | 2008-12-08 | 2010-06-09 | Kabushiki Kaisha Toshiba | Semiconductor device and method for manufacturing the same |
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JP2012164911A (ja) | 2012-08-30 |
US9263640B2 (en) | 2016-02-16 |
JP5603793B2 (ja) | 2014-10-08 |
CN103403895A (zh) | 2013-11-20 |
TWI429108B (zh) | 2014-03-01 |
HK1190821A1 (zh) | 2014-08-08 |
WO2012107967A1 (en) | 2012-08-16 |
US20130320383A1 (en) | 2013-12-05 |
TW201234661A (en) | 2012-08-16 |
US20140374789A1 (en) | 2014-12-25 |
US8860075B2 (en) | 2014-10-14 |
EP2673813B1 (en) | 2016-05-04 |
EP2673813A1 (en) | 2013-12-18 |
KR20130097815A (ko) | 2013-09-03 |
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