CN103328664B - 用于euv光刻的反射镜的基底 - Google Patents

用于euv光刻的反射镜的基底 Download PDF

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Publication number
CN103328664B
CN103328664B CN201280006089.1A CN201280006089A CN103328664B CN 103328664 B CN103328664 B CN 103328664B CN 201280006089 A CN201280006089 A CN 201280006089A CN 103328664 B CN103328664 B CN 103328664B
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CN
China
Prior art keywords
base body
alloy
substrate
phase
euv
Prior art date
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CN201280006089.1A
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English (en)
Chinese (zh)
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CN103328664A (zh
Inventor
C.埃克斯坦
H.马尔特
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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Filing date
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Priority to CN201910693451.0A priority Critical patent/CN110376670B/zh
Priority to CN201510870929.4A priority patent/CN105353433B/zh
Publication of CN103328664A publication Critical patent/CN103328664A/zh
Application granted granted Critical
Publication of CN103328664B publication Critical patent/CN103328664B/zh
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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C14/00—Alloys based on titanium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C21/00—Alloys based on aluminium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C21/00—Alloys based on aluminium
    • C22C21/12—Alloys based on aluminium with copper as the next major constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C9/00—Alloys based on copper
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Sampling And Sample Adjustment (AREA)
CN201280006089.1A 2011-01-21 2012-01-14 用于euv光刻的反射镜的基底 Active CN103328664B (zh)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201910693451.0A CN110376670B (zh) 2011-01-21 2012-01-14 用于极紫外光刻的反射镜的基底
CN201510870929.4A CN105353433B (zh) 2011-01-21 2012-01-14 用于极紫外光刻的反射镜的基底

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201161434869P 2011-01-21 2011-01-21
US61/434,869 2011-01-21
DE102011002953.2 2011-01-21
DE201110002953 DE102011002953A1 (de) 2011-01-21 2011-01-21 Substrat für Spiegel für die EUV-Lithographie
PCT/EP2012/050533 WO2012098062A2 (en) 2011-01-21 2012-01-14 Substrate for mirrors for euv lithography

Related Child Applications (2)

Application Number Title Priority Date Filing Date
CN201510870929.4A Division CN105353433B (zh) 2011-01-21 2012-01-14 用于极紫外光刻的反射镜的基底
CN201910693451.0A Division CN110376670B (zh) 2011-01-21 2012-01-14 用于极紫外光刻的反射镜的基底

Publications (2)

Publication Number Publication Date
CN103328664A CN103328664A (zh) 2013-09-25
CN103328664B true CN103328664B (zh) 2016-01-20

Family

ID=46510655

Family Applications (3)

Application Number Title Priority Date Filing Date
CN201280006089.1A Active CN103328664B (zh) 2011-01-21 2012-01-14 用于euv光刻的反射镜的基底
CN201910693451.0A Active CN110376670B (zh) 2011-01-21 2012-01-14 用于极紫外光刻的反射镜的基底
CN201510870929.4A Active CN105353433B (zh) 2011-01-21 2012-01-14 用于极紫外光刻的反射镜的基底

Family Applications After (2)

Application Number Title Priority Date Filing Date
CN201910693451.0A Active CN110376670B (zh) 2011-01-21 2012-01-14 用于极紫外光刻的反射镜的基底
CN201510870929.4A Active CN105353433B (zh) 2011-01-21 2012-01-14 用于极紫外光刻的反射镜的基底

Country Status (9)

Country Link
US (3) US20130301151A1 (enExample)
EP (2) EP3489374B1 (enExample)
JP (1) JP6023083B2 (enExample)
KR (1) KR102080180B1 (enExample)
CN (3) CN103328664B (enExample)
DE (1) DE102011002953A1 (enExample)
ES (1) ES2933686T3 (enExample)
PL (1) PL3489374T3 (enExample)
WO (1) WO2012098062A2 (enExample)

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* Cited by examiner, † Cited by third party
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DE102009040785A1 (de) * 2009-09-09 2011-03-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Substrat aus einer Aluminium-Silizium-Legierung oder kristallinem Silizium, Metallspiegel, Verfahren zu dessen Herstellung sowie dessen Verwendung
DE102011002953A1 (de) * 2011-01-21 2012-07-26 Carl Zeiss Smt Gmbh Substrat für Spiegel für die EUV-Lithographie
DE102013107192A1 (de) * 2013-07-08 2015-01-08 Carl Zeiss Laser Optics Gmbh Reflektives optisches Element für streifenden Einfall im EUV-Wellenlängenbereich
DE102013215541A1 (de) * 2013-08-07 2015-02-12 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
WO2017158989A1 (ja) * 2016-03-16 2017-09-21 東洋アルミニウム株式会社 紫外線反射材用アルミニウム箔およびその製造方法
DE102016209359A1 (de) * 2016-05-31 2017-11-30 Carl Zeiss Smt Gmbh EUV-Kollektor
EP3791218B9 (de) 2018-05-09 2025-10-15 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Spiegelträger für einen optischen spiegel aus einem verbundwerkstoff und verfahren zu dessen herstellung
WO2020046739A2 (en) * 2018-08-27 2020-03-05 Materion Corporation Uv reflective mirrors for display fabrication
WO2021121986A1 (en) * 2019-12-19 2021-06-24 Asml Netherlands B.V. Enhanced thermal conductivity in vacuum
CN112662918A (zh) * 2020-12-02 2021-04-16 国网电力科学研究院武汉南瑞有限责任公司 Al2O3-TiC颗粒增强铝基复合材料及其制备方法
WO2025201772A1 (en) 2024-03-28 2025-10-02 Asml Netherlands B.V. Substrate and method for a high power laser system

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Also Published As

Publication number Publication date
WO2012098062A2 (en) 2012-07-26
JP6023083B2 (ja) 2016-11-09
EP2665839B1 (en) 2018-12-26
US10935704B2 (en) 2021-03-02
EP3489374A1 (en) 2019-05-29
US20130301151A1 (en) 2013-11-14
KR102080180B1 (ko) 2020-02-24
CN103328664A (zh) 2013-09-25
CN110376670A (zh) 2019-10-25
EP3489374B1 (en) 2022-09-21
ES2933686T3 (es) 2023-02-13
KR20140018245A (ko) 2014-02-12
CN105353433B (zh) 2019-08-23
DE102011002953A1 (de) 2012-07-26
CN105353433A (zh) 2016-02-24
US20170160447A1 (en) 2017-06-08
US20210149093A1 (en) 2021-05-20
CN110376670B (zh) 2022-03-22
WO2012098062A3 (en) 2012-10-18
EP2665839A2 (en) 2013-11-27
PL3489374T3 (pl) 2023-01-30
JP2014506724A (ja) 2014-03-17

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