CN103113401B - 生产高纯有机硅的方法及装置 - Google Patents
生产高纯有机硅的方法及装置 Download PDFInfo
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- CN103113401B CN103113401B CN201310090684.4A CN201310090684A CN103113401B CN 103113401 B CN103113401 B CN 103113401B CN 201310090684 A CN201310090684 A CN 201310090684A CN 103113401 B CN103113401 B CN 103113401B
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- organosilicon
- purity
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- chelating agent
- metal chelating
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- 238000000034 method Methods 0.000 title claims abstract description 22
- 239000002184 metal Substances 0.000 claims abstract description 25
- 229910052751 metal Inorganic materials 0.000 claims abstract description 25
- 239000002738 chelating agent Substances 0.000 claims abstract description 17
- 238000009833 condensation Methods 0.000 claims abstract description 10
- 230000005494 condensation Effects 0.000 claims abstract description 10
- 238000000746 purification Methods 0.000 claims abstract description 10
- 238000001914 filtration Methods 0.000 claims abstract description 5
- 238000010438 heat treatment Methods 0.000 claims abstract description 5
- 238000004519 manufacturing process Methods 0.000 claims description 15
- 150000003983 crown ethers Chemical group 0.000 claims description 10
- 239000011552 falling film Substances 0.000 claims description 8
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 5
- 239000012535 impurity Substances 0.000 abstract description 15
- 230000003068 static effect Effects 0.000 abstract description 14
- 238000002156 mixing Methods 0.000 abstract description 3
- 238000003860 storage Methods 0.000 description 18
- 229910021645 metal ion Inorganic materials 0.000 description 10
- 239000013067 intermediate product Substances 0.000 description 8
- 239000010453 quartz Substances 0.000 description 6
- 238000010992 reflux Methods 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000000945 filler Substances 0.000 description 4
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 4
- -1 siloxanes Chemical class 0.000 description 4
- 239000003039 volatile agent Substances 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XEZNGIUYQVAUSS-UHFFFAOYSA-N 18-crown-6 Chemical compound C1COCCOCCOCCOCCOCCO1 XEZNGIUYQVAUSS-UHFFFAOYSA-N 0.000 description 2
- 230000000536 complexating effect Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- WURBVZBTWMNKQT-UHFFFAOYSA-N 1-(4-chlorophenoxy)-3,3-dimethyl-1-(1,2,4-triazol-1-yl)butan-2-one Chemical compound C1=NC=NN1C(C(=O)C(C)(C)C)OC1=CC=C(Cl)C=C1 WURBVZBTWMNKQT-UHFFFAOYSA-N 0.000 description 1
- 229910018557 Si O Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000008246 gaseous mixture Substances 0.000 description 1
- HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Abstract
Description
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201310090684.4A CN103113401B (zh) | 2013-03-20 | 2013-03-20 | 生产高纯有机硅的方法及装置 |
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CN201310090684.4A CN103113401B (zh) | 2013-03-20 | 2013-03-20 | 生产高纯有机硅的方法及装置 |
Publications (2)
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CN103113401A CN103113401A (zh) | 2013-05-22 |
CN103113401B true CN103113401B (zh) | 2016-05-18 |
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CN201310090684.4A Active CN103113401B (zh) | 2013-03-20 | 2013-03-20 | 生产高纯有机硅的方法及装置 |
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CN (1) | CN103113401B (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103788124B (zh) * | 2014-01-16 | 2016-11-02 | 上海爱默金山药业有限公司 | 一种电子级八甲基环四硅氧烷的提纯方法 |
CN104558015B (zh) * | 2015-01-22 | 2017-11-07 | 中国科学院上海有机化学研究所 | 一种高纯有机硅单体的制备方法 |
CN112142976B (zh) * | 2020-09-18 | 2022-07-15 | 湖北兴瑞硅材料有限公司 | 一种电子级甲基硅油的连续化制备方法 |
CN112569621B (zh) * | 2020-11-23 | 2021-12-03 | 湖北兴瑞硅材料有限公司 | 一种二甲基环硅氧烷连续脱水装置及脱水工艺 |
CN113061148A (zh) * | 2021-03-05 | 2021-07-02 | 洛阳中硅高科技有限公司 | 八甲基环四硅氧烷提纯设备和提纯方法 |
WO2024035253A1 (es) * | 2022-08-11 | 2024-02-15 | Especialidades Químicas Globales De México, S.A.P.I. De C.V. | Proceso de purificacion y deodorizacion de silicona proveniente de lavado de lineas de fabricacion de cosmeticos |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050054211A1 (en) * | 2003-09-04 | 2005-03-10 | Mindi Xu | Purification of silicon-containing materials |
CN101065324A (zh) * | 2004-11-19 | 2007-10-31 | Memc电子材料有限公司 | 提纯三氯硅烷和四氯化硅的方法和设备 |
CN101362675A (zh) * | 2008-09-16 | 2009-02-11 | 江阴市润玛电子材料有限公司 | 超净高纯异丙醇的制备方法及其装置 |
CN101407526A (zh) * | 2007-10-12 | 2009-04-15 | 赢创德固赛有限责任公司 | 从有机硅烷中去除有机极性化合物和杂质金属 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2787067B2 (ja) * | 1989-06-21 | 1998-08-13 | 富士シリシア化学株式会社 | 有機ケイ素化合物の精製方法 |
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2013
- 2013-03-20 CN CN201310090684.4A patent/CN103113401B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050054211A1 (en) * | 2003-09-04 | 2005-03-10 | Mindi Xu | Purification of silicon-containing materials |
CN101065324A (zh) * | 2004-11-19 | 2007-10-31 | Memc电子材料有限公司 | 提纯三氯硅烷和四氯化硅的方法和设备 |
CN101407526A (zh) * | 2007-10-12 | 2009-04-15 | 赢创德固赛有限责任公司 | 从有机硅烷中去除有机极性化合物和杂质金属 |
CN101362675A (zh) * | 2008-09-16 | 2009-02-11 | 江阴市润玛电子材料有限公司 | 超净高纯异丙醇的制备方法及其装置 |
Non-Patent Citations (2)
Title |
---|
四氯化硅的合成与精制;于剑昆;《无机盐工业》;20071231;第39卷(第12期);第5-8页 * |
络合法纯化二氯二氢硅;孙福楠;《化工新型材料》;19971221(第5期);第25-26页 * |
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Owner name: SHANGHAI ADVANCED RESEARCH INSTITUTE, CHINESE ACAD Free format text: FORMER OWNER: SHANGHAI ZHONGKE INSTITUTE FOR ADVANCED STUDY Effective date: 20131029 |
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Effective date of registration: 20131029 Address after: 201210 Shanghai city Pudong New Area Hartcourt Road No. 99 Applicant after: Shanghai Advanced Research Institute, Chinese Academy of Sciences Applicant after: Shanghai Apimerit Inc. Address before: 201210 Shanghai city Pudong New Area Hartcourt Road No. 99 Applicant before: Shanghai Zhongke Institute for Advanced Study Applicant before: Shanghai Apimerit Inc. |
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