CN102959751A - 压电膜器件和压电膜装置 - Google Patents
压电膜器件和压电膜装置 Download PDFInfo
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- CN102959751A CN102959751A CN2011800290263A CN201180029026A CN102959751A CN 102959751 A CN102959751 A CN 102959751A CN 2011800290263 A CN2011800290263 A CN 2011800290263A CN 201180029026 A CN201180029026 A CN 201180029026A CN 102959751 A CN102959751 A CN 102959751A
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- Prior art keywords
- piezoelectric film
- film
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- face
- knn
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- 239000000758 substrate Substances 0.000 claims abstract description 67
- -1 niobium oxide compound Chemical class 0.000 claims abstract description 15
- 229910000484 niobium oxide Inorganic materials 0.000 claims abstract description 14
- 239000000203 mixture Substances 0.000 claims abstract description 9
- 229910052783 alkali metal Inorganic materials 0.000 claims description 12
- 239000013078 crystal Substances 0.000 claims description 10
- 238000001514 detection method Methods 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 238000010276 construction Methods 0.000 claims description 3
- 239000003513 alkali Substances 0.000 abstract 2
- 239000011734 sodium Substances 0.000 description 39
- 238000000034 method Methods 0.000 description 35
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 32
- 238000002441 X-ray diffraction Methods 0.000 description 24
- 239000010955 niobium Substances 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 10
- 238000004544 sputter deposition Methods 0.000 description 10
- 239000011230 binding agent Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000000151 deposition Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 241000877463 Lanio Species 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 238000001755 magnetron sputter deposition Methods 0.000 description 5
- 229910052700 potassium Inorganic materials 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 229910002367 SrTiO Inorganic materials 0.000 description 2
- 238000002083 X-ray spectrum Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000003595 mist Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910004121 SrRuO Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000004320 controlled atmosphere Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000002447 crystallographic data Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 238000002354 inductively-coupled plasma atomic emission spectroscopy Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 210000004877 mucosa Anatomy 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- BITYAPCSNKJESK-UHFFFAOYSA-N potassiosodium Chemical compound [Na].[K] BITYAPCSNKJESK-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000010183 spectrum analysis Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000010897 surface acoustic wave method Methods 0.000 description 1
- 230000010415 tropism Effects 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/495—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on vanadium, niobium, tantalum, molybdenum or tungsten oxides or solid solutions thereof with other oxides, e.g. vanadates, niobates, tantalates, molybdates or tungstates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
- H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
- H10N30/076—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by vapour phase deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
- H10N30/204—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
- H10N30/2041—Beam type
- H10N30/2042—Cantilevers, i.e. having one fixed end
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/704—Piezoelectric or electrostrictive devices based on piezoelectric or electrostrictive films or coatings
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
- H10N30/8542—Alkali metal based oxides, e.g. lithium, sodium or potassium niobates
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3201—Alkali metal oxides or oxide-forming salts thereof
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3251—Niobium oxides, niobates, tantalum oxides, tantalates, or oxide-forming salts thereof
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/658—Atmosphere during thermal treatment
- C04B2235/6588—Water vapor containing atmospheres
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/74—Physical characteristics
- C04B2235/76—Crystal structural characteristics, e.g. symmetry
- C04B2235/761—Unit-cell parameters, e.g. lattice constants
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/74—Physical characteristics
- C04B2235/76—Crystal structural characteristics, e.g. symmetry
- C04B2235/768—Perovskite structure ABO3
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/74—Physical characteristics
- C04B2235/79—Non-stoichiometric products, e.g. perovskites (ABO3) with an A/B-ratio other than 1
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Compositions Of Oxide Ceramics (AREA)
Abstract
Description
Claims (8)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010155165A JP5056914B2 (ja) | 2010-07-07 | 2010-07-07 | 圧電薄膜素子および圧電薄膜デバイス |
JP2010-155165 | 2010-07-07 | ||
PCT/JP2011/057950 WO2012005032A1 (ja) | 2010-07-07 | 2011-03-30 | 圧電膜素子および圧電膜デバイス |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102959751A true CN102959751A (zh) | 2013-03-06 |
CN102959751B CN102959751B (zh) | 2014-04-16 |
Family
ID=45441018
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201180029026.3A Active CN102959751B (zh) | 2010-07-07 | 2011-03-30 | 压电膜器件和压电膜装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20130106242A1 (zh) |
JP (1) | JP5056914B2 (zh) |
CN (1) | CN102959751B (zh) |
DE (1) | DE112011102278B4 (zh) |
WO (1) | WO2012005032A1 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106025059A (zh) * | 2015-03-27 | 2016-10-12 | 精工爱普生株式会社 | 压电元件、压电元件应用器件以及压电元件的制造方法 |
CN118359435A (zh) * | 2024-06-18 | 2024-07-19 | 湖南省美程陶瓷科技有限公司 | 一种高压电性能的knn基压电陶瓷材料及其制备方法 |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5531653B2 (ja) * | 2010-02-02 | 2014-06-25 | 日立金属株式会社 | 圧電薄膜素子、その製造方法及び圧電薄膜デバイス |
WO2012141105A1 (ja) * | 2011-04-15 | 2012-10-18 | 株式会社村田製作所 | 圧電体薄膜素子 |
JP5553099B2 (ja) * | 2012-09-20 | 2014-07-16 | 日立金属株式会社 | 圧電体薄膜付き基板の製造方法、及び圧電体薄膜素子の製造方法 |
WO2015033791A1 (ja) * | 2013-09-09 | 2015-03-12 | 株式会社村田製作所 | 圧電薄膜素子及びその製造方法 |
JP6202202B2 (ja) * | 2014-05-19 | 2017-09-27 | 株式会社村田製作所 | 圧電薄膜、圧電薄膜素子及びターゲット並びに圧電薄膜及び圧電薄膜素子の製造方法 |
JP6239566B2 (ja) * | 2015-10-16 | 2017-11-29 | 株式会社サイオクス | 圧電薄膜付き積層基板、圧電薄膜素子およびその製造方法 |
JP2018133458A (ja) * | 2017-02-15 | 2018-08-23 | セイコーエプソン株式会社 | 圧電素子、及び圧電素子応用デバイス |
JP2018160535A (ja) | 2017-03-22 | 2018-10-11 | セイコーエプソン株式会社 | 圧電素子、及び圧電素子応用デバイス |
JP6904101B2 (ja) * | 2017-06-26 | 2021-07-14 | セイコーエプソン株式会社 | 液体噴射ヘッド、液体噴射装置および圧電デバイス |
JP2019021994A (ja) | 2017-07-12 | 2019-02-07 | 株式会社サイオクス | 圧電膜を有する積層基板、圧電膜を有する素子および圧電膜を有する積層基板の製造方法 |
JP6502460B2 (ja) * | 2017-11-01 | 2019-04-17 | 株式会社サイオクス | 圧電薄膜付き積層基板および圧電薄膜素子 |
US10566180B2 (en) | 2018-07-11 | 2020-02-18 | Thermo Finnigan Llc | Adjustable multipole assembly for a mass spectrometer |
JP6758444B2 (ja) * | 2019-03-20 | 2020-09-23 | 住友化学株式会社 | 圧電薄膜付き積層基板および圧電薄膜素子 |
JP7528556B2 (ja) * | 2020-06-17 | 2024-08-06 | セイコーエプソン株式会社 | 圧電素子、圧電素子応用デバイス |
JP7320091B2 (ja) * | 2021-02-10 | 2023-08-02 | 住友化学株式会社 | 圧電薄膜付き積層基板、圧電薄膜付き積層基板の製造方法、圧電薄膜素子、スパッタリングターゲット材、およびスパッタリングターゲット材の製造方法 |
Citations (5)
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CN1979908A (zh) * | 2005-12-06 | 2007-06-13 | 精工爱普生株式会社 | 压电层压体、表面声波元件、压电谐振器及压电传动装置 |
JP2009049065A (ja) * | 2007-08-14 | 2009-03-05 | Hitachi Cable Ltd | 圧電薄膜素子 |
JP2009246112A (ja) * | 2008-03-31 | 2009-10-22 | Denso Corp | 積層型圧電素子の製造方法 |
CN101599527A (zh) * | 2008-06-05 | 2009-12-09 | 日立电线株式会社 | 压电薄膜元件 |
US20100019624A1 (en) * | 2008-07-28 | 2010-01-28 | Ngk Insulators, Ltd. | Piezoelectric/electrostrictive ceramics sintered body and method of calculating diffuse scattering intensity ratio |
Family Cites Families (5)
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JP4735840B2 (ja) | 2005-12-06 | 2011-07-27 | セイコーエプソン株式会社 | 圧電体積層体、表面弾性波素子、薄膜圧電共振子および圧電アクチュエータ |
JP2008159807A (ja) | 2006-12-22 | 2008-07-10 | Hitachi Cable Ltd | 圧電薄膜素子及び圧電薄膜素子を用いて製造したアクチュエータとセンサ |
JP5264673B2 (ja) * | 2009-01-12 | 2013-08-14 | 株式会社デンソー | 圧電セラミックス、その製造方法、積層型圧電素子、及びその製造方法 |
DE102010000783A1 (de) * | 2009-01-12 | 2010-09-16 | Denso Corporation, Kariya-City | Piezokeramik, kristallorientierte Keramik, mehrlagiges Piezoelement sowie Verfahren zu dessen Herstellung |
JP5572998B2 (ja) * | 2009-05-22 | 2014-08-20 | Tdk株式会社 | 圧電磁器組成物及び圧電素子 |
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2010
- 2010-07-07 JP JP2010155165A patent/JP5056914B2/ja active Active
-
2011
- 2011-03-30 US US13/808,718 patent/US20130106242A1/en not_active Abandoned
- 2011-03-30 CN CN201180029026.3A patent/CN102959751B/zh active Active
- 2011-03-30 WO PCT/JP2011/057950 patent/WO2012005032A1/ja active Application Filing
- 2011-03-30 DE DE112011102278.6T patent/DE112011102278B4/de active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1979908A (zh) * | 2005-12-06 | 2007-06-13 | 精工爱普生株式会社 | 压电层压体、表面声波元件、压电谐振器及压电传动装置 |
JP2009049065A (ja) * | 2007-08-14 | 2009-03-05 | Hitachi Cable Ltd | 圧電薄膜素子 |
JP2009246112A (ja) * | 2008-03-31 | 2009-10-22 | Denso Corp | 積層型圧電素子の製造方法 |
CN101599527A (zh) * | 2008-06-05 | 2009-12-09 | 日立电线株式会社 | 压电薄膜元件 |
JP2009295786A (ja) * | 2008-06-05 | 2009-12-17 | Hitachi Cable Ltd | 圧電薄膜素子 |
US20100019624A1 (en) * | 2008-07-28 | 2010-01-28 | Ngk Insulators, Ltd. | Piezoelectric/electrostrictive ceramics sintered body and method of calculating diffuse scattering intensity ratio |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106025059A (zh) * | 2015-03-27 | 2016-10-12 | 精工爱普生株式会社 | 压电元件、压电元件应用器件以及压电元件的制造方法 |
CN106025059B (zh) * | 2015-03-27 | 2020-03-31 | 精工爱普生株式会社 | 压电元件、压电元件应用器件以及压电元件的制造方法 |
CN118359435A (zh) * | 2024-06-18 | 2024-07-19 | 湖南省美程陶瓷科技有限公司 | 一种高压电性能的knn基压电陶瓷材料及其制备方法 |
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JP5056914B2 (ja) | 2012-10-24 |
JP2012019050A (ja) | 2012-01-26 |
WO2012005032A1 (ja) | 2012-01-12 |
DE112011102278B4 (de) | 2020-02-06 |
CN102959751B (zh) | 2014-04-16 |
US20130106242A1 (en) | 2013-05-02 |
DE112011102278T5 (de) | 2013-05-23 |
DE112011102278T8 (de) | 2013-08-01 |
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