CN102870030B - 成像光学系统和具有这种成像光学系统的用于微光刻的投射曝光设备 - Google Patents

成像光学系统和具有这种成像光学系统的用于微光刻的投射曝光设备 Download PDF

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Publication number
CN102870030B
CN102870030B CN201180020318.0A CN201180020318A CN102870030B CN 102870030 B CN102870030 B CN 102870030B CN 201180020318 A CN201180020318 A CN 201180020318A CN 102870030 B CN102870030 B CN 102870030B
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China
Prior art keywords
mirror
imaging
optical system
image
imaging optical
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CN201180020318.0A
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English (en)
Chinese (zh)
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CN102870030A (zh
Inventor
H-J.曼
D.谢弗
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN201180020318.0A 2010-04-22 2011-04-02 成像光学系统和具有这种成像光学系统的用于微光刻的投射曝光设备 Active CN102870030B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US32670010P 2010-04-22 2010-04-22
US61/326,700 2010-04-22
PCT/EP2011/001671 WO2011131289A1 (en) 2010-04-22 2011-04-02 Imaging optics, and a projection exposure apparatus for microlithography having such an imaging optics

Publications (2)

Publication Number Publication Date
CN102870030A CN102870030A (zh) 2013-01-09
CN102870030B true CN102870030B (zh) 2015-04-08

Family

ID=44115700

Family Applications (1)

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CN201180020318.0A Active CN102870030B (zh) 2010-04-22 2011-04-02 成像光学系统和具有这种成像光学系统的用于微光刻的投射曝光设备

Country Status (6)

Country Link
US (2) US9013677B2 (enExample)
JP (2) JP5469778B2 (enExample)
KR (1) KR101383479B1 (enExample)
CN (1) CN102870030B (enExample)
TW (1) TWI481896B (enExample)
WO (1) WO2011131289A1 (enExample)

Families Citing this family (8)

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Publication number Priority date Publication date Assignee Title
KR101383479B1 (ko) * 2010-04-22 2014-04-08 칼 짜이스 에스엠티 게엠베하 이미징 옵틱스 및 이러한 이미징 옵틱스를 가지는 마이크로리소그래피를 위한 투영 노광 장치
US9007497B2 (en) * 2010-08-11 2015-04-14 Media Lario S.R.L. Three-mirror anastigmat with at least one non-rotationally symmetric mirror
DE102012208793A1 (de) 2012-05-25 2013-11-28 Carl Zeiss Smt Gmbh Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithographie mit einer derartigen abbildenden Optik
DE102014208770A1 (de) * 2013-07-29 2015-01-29 Carl Zeiss Smt Gmbh Projektionsoptik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen Projektionsoptik
DE102015226531A1 (de) * 2015-04-14 2016-10-20 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
DE102015221983A1 (de) * 2015-11-09 2017-05-11 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
DE102020102247A1 (de) 2020-01-30 2021-08-05 Sick Ag Optoelektronischer Sensor und Verfahren zur Erfassung von Objekten
DE102024203605A1 (de) * 2024-04-18 2025-10-23 Carl Zeiss Smt Gmbh Abbildende Optik für die Projektionslithographie

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001185480A (ja) * 1999-10-15 2001-07-06 Nikon Corp 投影光学系及び該光学系を備える投影露光装置
WO2009089999A1 (en) * 2008-01-16 2009-07-23 Carl Zeiss Smt Ag Projection exposure system for microlithography with a measurement device
WO2010006678A1 (en) * 2008-07-16 2010-01-21 Carl Zeiss Smt Ag Imaging optics

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Publication number Priority date Publication date Assignee Title
US5071240A (en) 1989-09-14 1991-12-10 Nikon Corporation Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image
DE69132160T2 (de) * 1991-07-19 2000-09-28 At & T Corp., New York Lithographie mit ringförmigen Bildfeld
US6985210B2 (en) * 1999-02-15 2006-01-10 Carl Zeiss Smt Ag Projection system for EUV lithography
DE10052289A1 (de) * 2000-10-20 2002-04-25 Zeiss Carl 8-Spiegel-Mikrolithographie-Projektionsobjektiv
DE10139177A1 (de) 2001-08-16 2003-02-27 Zeiss Carl Objektiv mit Pupillenobskuration
JP2003233002A (ja) * 2002-02-07 2003-08-22 Canon Inc 反射型投影光学系、露光装置及びデバイス製造方法
DE10219514A1 (de) * 2002-04-30 2003-11-13 Zeiss Carl Smt Ag Beleuchtungssystem, insbesondere für die EUV-Lithographie
DE102005042005A1 (de) 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
KR101127346B1 (ko) 2005-09-13 2012-03-29 칼 짜이스 에스엠티 게엠베하 마이크로리소그라피 투영 광학 시스템, 디바이스 제작 방법 및 광학 표면을 설계하기 위한 방법
US7920338B2 (en) * 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
EP1950594A1 (de) 2007-01-17 2008-07-30 Carl Zeiss SMT AG Abbildende Optik, Projektionsbelichtunsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik, Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage, durch das Herstellungsverfahren gefertigtes mikrostrukturiertes Bauelement sowie Verwendung einer derartigen abbildenden Optik
KR101393999B1 (ko) * 2007-08-20 2014-05-14 칼 짜이스 에스엠티 게엠베하 반사 코팅을 갖는 미러 소자들을 구비하는 투영 대물렌즈
DE102008046699B4 (de) * 2008-09-10 2014-03-13 Carl Zeiss Smt Gmbh Abbildende Optik
DE102009008644A1 (de) 2009-02-12 2010-11-18 Carl Zeiss Smt Ag Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithografie mit einer derartigen abbildenden Optik
KR101383479B1 (ko) * 2010-04-22 2014-04-08 칼 짜이스 에스엠티 게엠베하 이미징 옵틱스 및 이러한 이미징 옵틱스를 가지는 마이크로리소그래피를 위한 투영 노광 장치

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001185480A (ja) * 1999-10-15 2001-07-06 Nikon Corp 投影光学系及び該光学系を備える投影露光装置
WO2009089999A1 (en) * 2008-01-16 2009-07-23 Carl Zeiss Smt Ag Projection exposure system for microlithography with a measurement device
WO2010006678A1 (en) * 2008-07-16 2010-01-21 Carl Zeiss Smt Ag Imaging optics

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
《Future Giant Telescopes: Integration of MCAO into Telescope Design》;Alexander V. Goncharov等;《Proc.of SPIE》;20081231;第7100卷;全文 *

Also Published As

Publication number Publication date
US20130050671A1 (en) 2013-02-28
TW201226968A (en) 2012-07-01
JP2013526022A (ja) 2013-06-20
CN102870030A (zh) 2013-01-09
JP2014081658A (ja) 2014-05-08
WO2011131289A1 (en) 2011-10-27
KR101383479B1 (ko) 2014-04-08
TWI481896B (zh) 2015-04-21
US20150219999A1 (en) 2015-08-06
JP5469778B2 (ja) 2014-04-16
US9535337B2 (en) 2017-01-03
US9013677B2 (en) 2015-04-21
KR20130008052A (ko) 2013-01-21

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