TWI481896B - 成像光學構件、具有其之微影投射曝光裝置與製造結構化組件之方法 - Google Patents
成像光學構件、具有其之微影投射曝光裝置與製造結構化組件之方法 Download PDFInfo
- Publication number
- TWI481896B TWI481896B TW100113866A TW100113866A TWI481896B TW I481896 B TWI481896 B TW I481896B TW 100113866 A TW100113866 A TW 100113866A TW 100113866 A TW100113866 A TW 100113866A TW I481896 B TWI481896 B TW I481896B
- Authority
- TW
- Taiwan
- Prior art keywords
- mirror
- imaging
- image
- optical member
- imaging optical
- Prior art date
Links
- 238000003384 imaging method Methods 0.000 title claims description 217
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 238000001393 microlithography Methods 0.000 title 1
- 230000003287 optical effect Effects 0.000 claims description 145
- 238000005286 illumination Methods 0.000 claims description 16
- 238000001459 lithography Methods 0.000 claims description 4
- 210000001747 pupil Anatomy 0.000 description 21
- 239000000758 substrate Substances 0.000 description 6
- 238000011144 upstream manufacturing Methods 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000010606 normalization Methods 0.000 description 2
- 241000700608 Sagitta Species 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000007620 mathematical function Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US32670010P | 2010-04-22 | 2010-04-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201226968A TW201226968A (en) | 2012-07-01 |
| TWI481896B true TWI481896B (zh) | 2015-04-21 |
Family
ID=44115700
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100113866A TWI481896B (zh) | 2010-04-22 | 2011-04-21 | 成像光學構件、具有其之微影投射曝光裝置與製造結構化組件之方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US9013677B2 (enExample) |
| JP (2) | JP5469778B2 (enExample) |
| KR (1) | KR101383479B1 (enExample) |
| CN (1) | CN102870030B (enExample) |
| TW (1) | TWI481896B (enExample) |
| WO (1) | WO2011131289A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101383479B1 (ko) * | 2010-04-22 | 2014-04-08 | 칼 짜이스 에스엠티 게엠베하 | 이미징 옵틱스 및 이러한 이미징 옵틱스를 가지는 마이크로리소그래피를 위한 투영 노광 장치 |
| US9007497B2 (en) * | 2010-08-11 | 2015-04-14 | Media Lario S.R.L. | Three-mirror anastigmat with at least one non-rotationally symmetric mirror |
| DE102012208793A1 (de) | 2012-05-25 | 2013-11-28 | Carl Zeiss Smt Gmbh | Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithographie mit einer derartigen abbildenden Optik |
| DE102014208770A1 (de) * | 2013-07-29 | 2015-01-29 | Carl Zeiss Smt Gmbh | Projektionsoptik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen Projektionsoptik |
| DE102015226531A1 (de) * | 2015-04-14 | 2016-10-20 | Carl Zeiss Smt Gmbh | Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik |
| DE102015221983A1 (de) * | 2015-11-09 | 2017-05-11 | Carl Zeiss Smt Gmbh | Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik |
| DE102020102247A1 (de) | 2020-01-30 | 2021-08-05 | Sick Ag | Optoelektronischer Sensor und Verfahren zur Erfassung von Objekten |
| DE102024203605A1 (de) * | 2024-04-18 | 2025-10-23 | Carl Zeiss Smt Gmbh | Abbildende Optik für die Projektionslithographie |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060232867A1 (en) * | 2004-12-23 | 2006-10-19 | Hans-Jurgen Mann | Catoptric objectives and systems using catoptric objectives |
| WO2010006678A1 (en) * | 2008-07-16 | 2010-01-21 | Carl Zeiss Smt Ag | Imaging optics |
| TW201015235A (en) * | 2008-09-10 | 2010-04-16 | Zeiss Carl Smt Ag | Imaging optical system |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5071240A (en) | 1989-09-14 | 1991-12-10 | Nikon Corporation | Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image |
| DE69132160T2 (de) * | 1991-07-19 | 2000-09-28 | At & T Corp., New York | Lithographie mit ringförmigen Bildfeld |
| US6985210B2 (en) * | 1999-02-15 | 2006-01-10 | Carl Zeiss Smt Ag | Projection system for EUV lithography |
| JP2001185480A (ja) * | 1999-10-15 | 2001-07-06 | Nikon Corp | 投影光学系及び該光学系を備える投影露光装置 |
| DE10052289A1 (de) * | 2000-10-20 | 2002-04-25 | Zeiss Carl | 8-Spiegel-Mikrolithographie-Projektionsobjektiv |
| DE10139177A1 (de) | 2001-08-16 | 2003-02-27 | Zeiss Carl | Objektiv mit Pupillenobskuration |
| JP2003233002A (ja) * | 2002-02-07 | 2003-08-22 | Canon Inc | 反射型投影光学系、露光装置及びデバイス製造方法 |
| DE10219514A1 (de) * | 2002-04-30 | 2003-11-13 | Zeiss Carl Smt Ag | Beleuchtungssystem, insbesondere für die EUV-Lithographie |
| KR101127346B1 (ko) | 2005-09-13 | 2012-03-29 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그라피 투영 광학 시스템, 디바이스 제작 방법 및 광학 표면을 설계하기 위한 방법 |
| US7920338B2 (en) * | 2006-03-28 | 2011-04-05 | Carl Zeiss Smt Gmbh | Reduction projection objective and projection exposure apparatus including the same |
| EP1950594A1 (de) | 2007-01-17 | 2008-07-30 | Carl Zeiss SMT AG | Abbildende Optik, Projektionsbelichtunsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik, Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage, durch das Herstellungsverfahren gefertigtes mikrostrukturiertes Bauelement sowie Verwendung einer derartigen abbildenden Optik |
| KR101393999B1 (ko) * | 2007-08-20 | 2014-05-14 | 칼 짜이스 에스엠티 게엠베하 | 반사 코팅을 갖는 미러 소자들을 구비하는 투영 대물렌즈 |
| DE102008004762A1 (de) * | 2008-01-16 | 2009-07-30 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Mikrolithographie mit einer Messeinrichtung |
| DE102009008644A1 (de) | 2009-02-12 | 2010-11-18 | Carl Zeiss Smt Ag | Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithografie mit einer derartigen abbildenden Optik |
| KR101383479B1 (ko) * | 2010-04-22 | 2014-04-08 | 칼 짜이스 에스엠티 게엠베하 | 이미징 옵틱스 및 이러한 이미징 옵틱스를 가지는 마이크로리소그래피를 위한 투영 노광 장치 |
-
2011
- 2011-04-02 KR KR1020127027211A patent/KR101383479B1/ko active Active
- 2011-04-02 JP JP2013505351A patent/JP5469778B2/ja active Active
- 2011-04-02 WO PCT/EP2011/001671 patent/WO2011131289A1/en not_active Ceased
- 2011-04-02 CN CN201180020318.0A patent/CN102870030B/zh active Active
- 2011-04-21 TW TW100113866A patent/TWI481896B/zh active
-
2012
- 2012-09-04 US US13/602,553 patent/US9013677B2/en active Active
-
2014
- 2014-01-31 JP JP2014016997A patent/JP2014081658A/ja active Pending
-
2015
- 2015-03-19 US US14/662,514 patent/US9535337B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060232867A1 (en) * | 2004-12-23 | 2006-10-19 | Hans-Jurgen Mann | Catoptric objectives and systems using catoptric objectives |
| WO2010006678A1 (en) * | 2008-07-16 | 2010-01-21 | Carl Zeiss Smt Ag | Imaging optics |
| TW201015235A (en) * | 2008-09-10 | 2010-04-16 | Zeiss Carl Smt Ag | Imaging optical system |
Non-Patent Citations (1)
| Title |
|---|
| GONCHAROV: "Future Giant Telescopes: integration of MCAO in Telescope Design", SPIE, PO BOX 10 BELLINGHAM WA 98227-0010 USA, 12 December 2008 * |
Also Published As
| Publication number | Publication date |
|---|---|
| US20130050671A1 (en) | 2013-02-28 |
| TW201226968A (en) | 2012-07-01 |
| JP2013526022A (ja) | 2013-06-20 |
| CN102870030A (zh) | 2013-01-09 |
| JP2014081658A (ja) | 2014-05-08 |
| WO2011131289A1 (en) | 2011-10-27 |
| KR101383479B1 (ko) | 2014-04-08 |
| US20150219999A1 (en) | 2015-08-06 |
| CN102870030B (zh) | 2015-04-08 |
| JP5469778B2 (ja) | 2014-04-16 |
| US9535337B2 (en) | 2017-01-03 |
| US9013677B2 (en) | 2015-04-21 |
| KR20130008052A (ko) | 2013-01-21 |
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