CN102863023A - 一种电子级砷烷的合成和提纯方法 - Google Patents
一种电子级砷烷的合成和提纯方法 Download PDFInfo
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- CN102863023A CN102863023A CN2012103980835A CN201210398083A CN102863023A CN 102863023 A CN102863023 A CN 102863023A CN 2012103980835 A CN2012103980835 A CN 2012103980835A CN 201210398083 A CN201210398083 A CN 201210398083A CN 102863023 A CN102863023 A CN 102863023A
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- arsine
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- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical class [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 title claims abstract description 90
- 238000000034 method Methods 0.000 title claims abstract description 25
- 238000000746 purification Methods 0.000 title claims abstract description 21
- 230000015572 biosynthetic process Effects 0.000 title abstract description 6
- 238000003786 synthesis reaction Methods 0.000 title abstract 3
- 239000007789 gas Substances 0.000 claims abstract description 46
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical class O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims abstract description 30
- 238000001179 sorption measurement Methods 0.000 claims abstract description 30
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000002808 molecular sieve Substances 0.000 claims abstract description 24
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 claims abstract description 24
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000007788 liquid Substances 0.000 claims abstract description 16
- 239000012535 impurity Substances 0.000 claims abstract description 14
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 14
- 229910002092 carbon dioxide Inorganic materials 0.000 claims abstract description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000001301 oxygen Substances 0.000 claims abstract description 8
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 8
- 239000000843 powder Substances 0.000 claims abstract description 8
- CVXNLQMWLGJQMZ-UHFFFAOYSA-N arsenic zinc Chemical compound [Zn].[As] CVXNLQMWLGJQMZ-UHFFFAOYSA-N 0.000 claims description 13
- 235000011089 carbon dioxide Nutrition 0.000 claims description 10
- 239000006096 absorbing agent Substances 0.000 claims description 9
- 239000001569 carbon dioxide Substances 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 9
- 238000001704 evaporation Methods 0.000 claims description 7
- 230000008020 evaporation Effects 0.000 claims description 7
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims description 6
- 238000007789 sealing Methods 0.000 claims description 5
- 238000000926 separation method Methods 0.000 claims description 5
- 239000001117 sulphuric acid Substances 0.000 claims description 5
- 235000011149 sulphuric acid Nutrition 0.000 claims description 5
- 238000010790 dilution Methods 0.000 claims description 3
- 239000012895 dilution Substances 0.000 claims description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 2
- 238000003756 stirring Methods 0.000 claims description 2
- 239000000126 substance Substances 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- 229910001868 water Inorganic materials 0.000 abstract 2
- RHKSESDHCKYTHI-UHFFFAOYSA-N 12006-40-5 Chemical compound [Zn].[As]=[Zn].[As]=[Zn] RHKSESDHCKYTHI-UHFFFAOYSA-N 0.000 abstract 1
- 150000003568 thioethers Chemical class 0.000 abstract 1
- 239000000463 material Substances 0.000 description 10
- -1 crude arsenic alkane Chemical class 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 4
- 238000005485 electric heating Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000000284 extract Substances 0.000 description 3
- 230000008014 freezing Effects 0.000 description 3
- 238000007710 freezing Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000005303 weighing Methods 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 2
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- 150000001875 compounds Chemical class 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 229910001385 heavy metal Inorganic materials 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910000846 In alloy Inorganic materials 0.000 description 1
- LULLIKNODDLMDQ-UHFFFAOYSA-N arsenic(3+) Chemical compound [As+3] LULLIKNODDLMDQ-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
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- Separation Of Gases By Adsorption (AREA)
Abstract
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CN201210398083.5A CN102863023B (zh) | 2012-10-18 | 2012-10-18 | 一种电子级砷烷的合成和提纯方法 |
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CN201210398083.5A CN102863023B (zh) | 2012-10-18 | 2012-10-18 | 一种电子级砷烷的合成和提纯方法 |
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CN102863023A true CN102863023A (zh) | 2013-01-09 |
CN102863023B CN102863023B (zh) | 2014-07-30 |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106226138A (zh) * | 2016-08-23 | 2016-12-14 | 上海正帆科技股份有限公司 | 电子级砷烷中痕量金属杂质含量的取样装置和分析方法 |
CN110642227A (zh) * | 2019-09-25 | 2020-01-03 | 博纯材料股份有限公司 | 一种砷烷的合成提纯方法 |
WO2020062502A1 (zh) * | 2018-09-26 | 2020-04-02 | 深圳市永盛隆科技有限公司 | 砷烷的制备方法 |
CN113694554A (zh) * | 2021-10-09 | 2021-11-26 | 中昊光明化工研究设计院有限公司 | 高纯度砷烷提纯及收集装置 |
CN114804200A (zh) * | 2022-04-12 | 2022-07-29 | 沧州渤海新区盛泰化工有限公司 | 一种连续生产超纯砷烷的方法及装置 |
CN119774549A (zh) * | 2025-03-01 | 2025-04-08 | 中南大学 | 气态砷化物的纯化方法及装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6278116A (ja) * | 1985-09-28 | 1987-04-10 | Showa Denko Kk | アルシンの精製方法 |
JPH11130437A (ja) * | 1997-10-22 | 1999-05-18 | Furukawa Co Ltd | 排酸の処理法 |
-
2012
- 2012-10-18 CN CN201210398083.5A patent/CN102863023B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6278116A (ja) * | 1985-09-28 | 1987-04-10 | Showa Denko Kk | アルシンの精製方法 |
JPH11130437A (ja) * | 1997-10-22 | 1999-05-18 | Furukawa Co Ltd | 排酸の処理法 |
Non-Patent Citations (4)
Title |
---|
《低温与特气》 20070228 于剑昆 "高纯砷烷的合成与开发进展" 第16-21页 1-8 第25卷, 第1期 * |
《保定师范专科学校学报》 20020430 胡玉亭 "高纯砷烷的合成" 第45-46页 1-8 第15卷, 第2期 * |
于剑昆: ""高纯砷烷的合成与开发进展"", 《低温与特气》, vol. 25, no. 1, 28 February 2007 (2007-02-28), pages 16 - 21 * |
胡玉亭: ""高纯砷烷的合成"", 《保定师范专科学校学报》, vol. 15, no. 2, 30 April 2002 (2002-04-30), pages 45 - 46 * |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106226138A (zh) * | 2016-08-23 | 2016-12-14 | 上海正帆科技股份有限公司 | 电子级砷烷中痕量金属杂质含量的取样装置和分析方法 |
CN106226138B (zh) * | 2016-08-23 | 2019-06-28 | 上海正帆科技股份有限公司 | 电子级砷烷中痕量金属杂质含量的取样装置和分析方法 |
WO2020062502A1 (zh) * | 2018-09-26 | 2020-04-02 | 深圳市永盛隆科技有限公司 | 砷烷的制备方法 |
CN110642227A (zh) * | 2019-09-25 | 2020-01-03 | 博纯材料股份有限公司 | 一种砷烷的合成提纯方法 |
CN113694554A (zh) * | 2021-10-09 | 2021-11-26 | 中昊光明化工研究设计院有限公司 | 高纯度砷烷提纯及收集装置 |
CN114804200A (zh) * | 2022-04-12 | 2022-07-29 | 沧州渤海新区盛泰化工有限公司 | 一种连续生产超纯砷烷的方法及装置 |
CN119774549A (zh) * | 2025-03-01 | 2025-04-08 | 中南大学 | 气态砷化物的纯化方法及装置 |
CN119774549B (zh) * | 2025-03-01 | 2025-05-16 | 中南大学 | 气态砷化物的纯化方法及装置 |
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CN102863023B (zh) | 2014-07-30 |
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Owner name: HEFEI ZHENGFAN ELECTRONIC MATERIAL CO., LTD. Free format text: FORMER OWNER: SHANGHAI ZHENGFAN TECHNOLOGY CO., LTD. Effective date: 20150106 Free format text: FORMER OWNER: HEFEI ZHENGFAN ELECTRONIC MATERIAL CO., LTD. Effective date: 20150106 |
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Effective date of registration: 20150106 Address after: 231600 Hefei circular economy demonstration garden, Anhui, Hefei, on the south side of No. five road, west of three road Patentee after: Hefei Zhengfan Electronic Material Co., Ltd. Address before: 201108 Minhang District Spring Road, No. 56, Shanghai Patentee before: Shanghai Zhengfan Technology Co., Ltd. Patentee before: Hefei Zhengfan Electronic Material Co., Ltd. |