CN102645839A - 一种掩模板及其制造方法 - Google Patents
一种掩模板及其制造方法 Download PDFInfo
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- CN102645839A CN102645839A CN2011101604109A CN201110160410A CN102645839A CN 102645839 A CN102645839 A CN 102645839A CN 2011101604109 A CN2011101604109 A CN 2011101604109A CN 201110160410 A CN201110160410 A CN 201110160410A CN 102645839 A CN102645839 A CN 102645839A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 32
- 238000000034 method Methods 0.000 claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 229910052751 metal Inorganic materials 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 19
- 230000005540 biological transmission Effects 0.000 claims description 11
- 239000012780 transparent material Substances 0.000 claims description 9
- 238000005530 etching Methods 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 238000005516 engineering process Methods 0.000 abstract description 24
- 239000010409 thin film Substances 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 14
- 238000009826 distribution Methods 0.000 description 12
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 239000011651 chromium Substances 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
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- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
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CN2011101604109A CN102645839B (zh) | 2011-06-15 | 2011-06-15 | 一种掩模板及其制造方法 |
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CN2011101604109A CN102645839B (zh) | 2011-06-15 | 2011-06-15 | 一种掩模板及其制造方法 |
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CN102645839A true CN102645839A (zh) | 2012-08-22 |
CN102645839B CN102645839B (zh) | 2013-11-27 |
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CN2011101604109A Expired - Fee Related CN102645839B (zh) | 2011-06-15 | 2011-06-15 | 一种掩模板及其制造方法 |
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106371283A (zh) * | 2016-11-23 | 2017-02-01 | 深圳市华星光电技术有限公司 | 一种半色调掩膜及显示面板、显示器 |
CN106681099A (zh) * | 2016-12-20 | 2017-05-17 | 厦门天马微电子有限公司 | 一种掩膜板和阵列基板 |
CN107085321A (zh) * | 2017-05-02 | 2017-08-22 | 惠科股份有限公司 | 光罩及其应用于主动开关阵列基板的制造方法 |
CN107807493A (zh) * | 2017-09-28 | 2018-03-16 | 京东方科技集团股份有限公司 | 掩膜板和曝光设备 |
CN108388077A (zh) * | 2018-03-26 | 2018-08-10 | 京东方科技集团股份有限公司 | 一种掩膜版及其制备方法、阵列基板的制备方法 |
CN109188854A (zh) * | 2018-10-18 | 2019-01-11 | 合肥鑫晟光电科技有限公司 | 掩膜板、显示基板及其制作方法、显示装置 |
CN113759655A (zh) * | 2021-08-19 | 2021-12-07 | 惠科股份有限公司 | 掩膜版、阵列基板的制作方法及显示面板 |
WO2024045984A1 (zh) * | 2022-08-31 | 2024-03-07 | 京东方科技集团股份有限公司 | 一种彩膜基板、显示面板及掩膜版 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1534366A (zh) * | 2003-04-01 | 2004-10-06 | Hoya株式会社 | 灰色调掩模的缺陷校正方法 |
US20050142681A1 (en) * | 2003-12-29 | 2005-06-30 | Jae-Moon Soh | Mask and method of manufacturing liquid crystal display device using the same |
JP2006350327A (ja) * | 2005-06-03 | 2006-12-28 | Samsung Electronics Co Ltd | 表示装置、その製造方法、及びその製造方法で使用されるマスク |
CN1912739A (zh) * | 2005-08-12 | 2007-02-14 | 株式会社半导体能源研究所 | 曝光掩模以及使用其的半导体器件的制造方法 |
CN101231458A (zh) * | 2007-01-24 | 2008-07-30 | Hoya株式会社 | 灰色调掩模及图案转印方法 |
CN101373325A (zh) * | 2007-08-21 | 2009-02-25 | 北京京东方光电科技有限公司 | 半色调掩模板结构及其制造方法 |
CN101738846A (zh) * | 2008-11-17 | 2010-06-16 | 北京京东方光电科技有限公司 | 掩模板及其制备方法 |
WO2010134779A2 (en) * | 2009-05-21 | 2010-11-25 | Lg Innotek Co., Ltd. | Half tone mask having multi half permeation part and manufacturing method of the same |
-
2011
- 2011-06-15 CN CN2011101604109A patent/CN102645839B/zh not_active Expired - Fee Related
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1534366A (zh) * | 2003-04-01 | 2004-10-06 | Hoya株式会社 | 灰色调掩模的缺陷校正方法 |
US20050142681A1 (en) * | 2003-12-29 | 2005-06-30 | Jae-Moon Soh | Mask and method of manufacturing liquid crystal display device using the same |
JP2006350327A (ja) * | 2005-06-03 | 2006-12-28 | Samsung Electronics Co Ltd | 表示装置、その製造方法、及びその製造方法で使用されるマスク |
CN1912739A (zh) * | 2005-08-12 | 2007-02-14 | 株式会社半导体能源研究所 | 曝光掩模以及使用其的半导体器件的制造方法 |
CN101231458A (zh) * | 2007-01-24 | 2008-07-30 | Hoya株式会社 | 灰色调掩模及图案转印方法 |
CN101373325A (zh) * | 2007-08-21 | 2009-02-25 | 北京京东方光电科技有限公司 | 半色调掩模板结构及其制造方法 |
CN101738846A (zh) * | 2008-11-17 | 2010-06-16 | 北京京东方光电科技有限公司 | 掩模板及其制备方法 |
WO2010134779A2 (en) * | 2009-05-21 | 2010-11-25 | Lg Innotek Co., Ltd. | Half tone mask having multi half permeation part and manufacturing method of the same |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106371283B (zh) * | 2016-11-23 | 2020-02-04 | 深圳市华星光电技术有限公司 | 一种半色调掩膜及显示面板、显示器 |
CN106371283A (zh) * | 2016-11-23 | 2017-02-01 | 深圳市华星光电技术有限公司 | 一种半色调掩膜及显示面板、显示器 |
CN106681099A (zh) * | 2016-12-20 | 2017-05-17 | 厦门天马微电子有限公司 | 一种掩膜板和阵列基板 |
CN106681099B (zh) * | 2016-12-20 | 2020-05-01 | 厦门天马微电子有限公司 | 一种掩膜板和阵列基板 |
CN107085321A (zh) * | 2017-05-02 | 2017-08-22 | 惠科股份有限公司 | 光罩及其应用于主动开关阵列基板的制造方法 |
WO2018201545A1 (zh) * | 2017-05-02 | 2018-11-08 | 惠科股份有限公司 | 光罩及其应用于主动开关阵列基板的制造方法 |
CN107807493A (zh) * | 2017-09-28 | 2018-03-16 | 京东方科技集团股份有限公司 | 掩膜板和曝光设备 |
CN108388077A (zh) * | 2018-03-26 | 2018-08-10 | 京东方科技集团股份有限公司 | 一种掩膜版及其制备方法、阵列基板的制备方法 |
CN109188854A (zh) * | 2018-10-18 | 2019-01-11 | 合肥鑫晟光电科技有限公司 | 掩膜板、显示基板及其制作方法、显示装置 |
WO2020078180A1 (zh) * | 2018-10-18 | 2020-04-23 | 京东方科技集团股份有限公司 | 掩膜板、显示基板及其制作方法、显示装置 |
CN109188854B (zh) * | 2018-10-18 | 2020-06-09 | 合肥鑫晟光电科技有限公司 | 掩膜板、显示基板及其制作方法、显示装置 |
CN113759655A (zh) * | 2021-08-19 | 2021-12-07 | 惠科股份有限公司 | 掩膜版、阵列基板的制作方法及显示面板 |
WO2024045984A1 (zh) * | 2022-08-31 | 2024-03-07 | 京东方科技集团股份有限公司 | 一种彩膜基板、显示面板及掩膜版 |
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Publication number | Publication date |
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CN102645839B (zh) | 2013-11-27 |
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