CN102636598B - 一种用于多种高纯度含氟电子气体分析的气相色谱阀路系统及其使用方法 - Google Patents
一种用于多种高纯度含氟电子气体分析的气相色谱阀路系统及其使用方法 Download PDFInfo
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- 239000007789 gas Substances 0.000 title claims abstract description 37
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 13
- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 13
- 239000011737 fluorine Substances 0.000 title claims abstract description 13
- 238000000034 method Methods 0.000 title claims abstract description 13
- 238000004817 gas chromatography Methods 0.000 title claims abstract description 7
- 239000012535 impurity Substances 0.000 claims abstract description 62
- 239000012159 carrier gas Substances 0.000 claims abstract description 45
- 239000001307 helium Substances 0.000 claims abstract description 7
- 229910052734 helium Inorganic materials 0.000 claims abstract description 7
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims abstract description 7
- 238000004587 chromatography analysis Methods 0.000 claims description 80
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 58
- 238000000926 separation method Methods 0.000 claims description 54
- 239000000470 constituent Substances 0.000 claims description 31
- 238000004458 analytical method Methods 0.000 claims description 27
- 239000000203 mixture Substances 0.000 claims description 25
- 238000001514 detection method Methods 0.000 claims description 17
- 238000010926 purge Methods 0.000 claims description 17
- 229910018503 SF6 Inorganic materials 0.000 claims description 12
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 claims description 12
- 229960000909 sulfur hexafluoride Drugs 0.000 claims description 12
- 239000002808 molecular sieve Substances 0.000 claims description 10
- 230000001105 regulatory effect Effects 0.000 claims description 10
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 claims description 10
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 claims description 8
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 claims description 8
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims description 7
- QYSGYZVSCZSLHT-UHFFFAOYSA-N octafluoropropane Chemical compound FC(F)(F)C(F)(F)C(F)(F)F QYSGYZVSCZSLHT-UHFFFAOYSA-N 0.000 claims description 7
- 229960004065 perflutren Drugs 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000000741 silica gel Substances 0.000 claims description 5
- 229910002027 silica gel Inorganic materials 0.000 claims description 5
- 238000009776 industrial production Methods 0.000 abstract 1
- 238000005259 measurement Methods 0.000 abstract 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 55
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 12
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical class FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 11
- 238000005070 sampling Methods 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- -1 CF 4 Chemical compound 0.000 description 6
- 229910002092 carbon dioxide Inorganic materials 0.000 description 6
- 239000001569 carbon dioxide Substances 0.000 description 6
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 description 6
- 239000003921 oil Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 3
- 230000009972 noncorrosive effect Effects 0.000 description 3
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 238000004868 gas analysis Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000004341 Octafluorocyclobutane Substances 0.000 description 1
- 238000000540 analysis of variance Methods 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- BCCOBQSFUDVTJQ-UHFFFAOYSA-N octafluorocyclobutane Chemical compound FC1(F)C(F)(F)C(F)(F)C1(F)F BCCOBQSFUDVTJQ-UHFFFAOYSA-N 0.000 description 1
- 235000019407 octafluorocyclobutane Nutrition 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
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CN104678034B (zh) * | 2013-11-27 | 2017-12-15 | 上海宝钢工业技术服务有限公司 | 测定高纯气体中杂质成分的分析系统及测定方法 |
CN104198638B (zh) * | 2014-08-20 | 2015-11-18 | 国家电网公司 | 一种检测六氟化硫分解产物的色谱分析系统及方法 |
CN104267132B (zh) * | 2014-08-26 | 2016-08-24 | 广东电网公司电力科学研究院 | 检测sf6分解产物的色谱分析方法 |
CN104155402B (zh) * | 2014-08-27 | 2015-10-07 | 上海华爱色谱分析技术有限公司 | 用于sf6分解产物分析的氦离子化气相色谱系统 |
CN105181851A (zh) * | 2015-10-13 | 2015-12-23 | 神华集团有限责任公司 | 环境中氮氧化物的测定方法 |
CN107121520A (zh) * | 2017-06-23 | 2017-09-01 | 洛阳黎明大成氟化工有限公司 | 一种高纯三氟化氮分析用无氧吸附的气相色谱阀路系统及其使用方法 |
CN109633423B (zh) * | 2018-11-14 | 2020-09-08 | 中国南方电网有限责任公司超高压输电公司检修试验中心 | 一种断路器喷口烧蚀状态评估系统 |
CN110108813B (zh) * | 2019-05-23 | 2024-02-13 | 沈阳工业大学 | 检测全氟异丁腈和二氧化碳混合气体分解物的装置及方法 |
CN110726794B (zh) * | 2019-10-23 | 2022-01-25 | 朗析仪器(上海)有限公司 | 六氟化硫混合气体中分解产物全分析的分析系统 |
CN112485348B (zh) * | 2020-11-05 | 2023-08-08 | 北京高麦克仪器科技有限公司 | Nf3中杂质分离分析方法 |
CN112858555B (zh) * | 2021-01-08 | 2023-06-09 | 烟台万华电子材料有限公司 | 一种高纯乙硅烷的分析方法 |
CN112946126B (zh) * | 2021-02-02 | 2022-07-15 | 福建德尔科技有限公司 | 高纯三氟化氯中杂质定量、定性装置及方法 |
CN113406250B (zh) * | 2021-06-21 | 2023-01-31 | 北京卫星环境工程研究所 | 一种检测八氟异丁烯微泄漏装置及其检测泄漏量的方法 |
CN113419019B (zh) * | 2021-08-10 | 2022-08-19 | 云南大学 | 一种检测高纯四氟化锗杂质含量的气相色谱系统及方法 |
CN115308321A (zh) * | 2022-07-04 | 2022-11-08 | 浙江赛鹭鑫仪器有限公司 | 一种氟气及氟化物分析系统及方法 |
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CN101629936B (zh) * | 2009-08-12 | 2012-01-11 | 上海华爱色谱分析技术有限公司 | 脉冲氦离子化气相色谱仪 |
IT1398065B1 (it) * | 2010-02-08 | 2013-02-07 | Geolog S P A | Gas cromatografo da campo a ionizzazione di fiamma per l'analisi di idrocarburi gassosi pesanti. |
CN201689079U (zh) * | 2010-03-24 | 2010-12-29 | 上海宝钢工业检测公司 | 天然气成分的气相色谱分析装置 |
CN101893614B (zh) * | 2010-07-16 | 2013-05-15 | 上海炫一电子科技有限公司 | 一种检测腐蚀性气体中杂质的方法 |
CN202631492U (zh) * | 2012-04-10 | 2012-12-26 | 黎明化工研究院 | 一种用于多种高纯度含氟电子气体分析的气相色谱阀路系统 |
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Address after: 471012 room 103, office building, Geely Industrial Park, liming research and Design Institute of chemical industry, South Road, Geely science and Technology Park, Geely District, Luoyang City, Henan Province Patentee after: Luoyang Haohua Gas Technology Co.,Ltd. Address before: 471012 room 103, office building, Geely Industrial Park, liming research and Design Institute of chemical industry, South Road, Geely science and Technology Park, Geely District, Luoyang City, Henan Province Patentee before: LUOYANG DAWN DACHENG FLUORINE CHEMICAL Co.,Ltd. |
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