CN102557000A - 富勒烯衍生物的制造方法 - Google Patents
富勒烯衍生物的制造方法 Download PDFInfo
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- CN102557000A CN102557000A CN2011103487364A CN201110348736A CN102557000A CN 102557000 A CN102557000 A CN 102557000A CN 2011103487364 A CN2011103487364 A CN 2011103487364A CN 201110348736 A CN201110348736 A CN 201110348736A CN 102557000 A CN102557000 A CN 102557000A
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- fullerene derivate
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- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical class C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 title claims abstract description 44
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- 239000002019 doping agent Substances 0.000 claims abstract description 24
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/36—Selection of substances as active materials, active masses, active liquids
- H01M4/58—Selection of substances as active materials, active masses, active liquids of inorganic compounds other than oxides or hydroxides, e.g. sulfides, selenides, tellurides, halogenides or LiCoFy; of polyanionic structures, e.g. phosphates, silicates or borates
- H01M4/583—Carbonaceous material, e.g. graphite-intercalation compounds or CFx
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/152—Fullerenes
- C01B32/154—Preparation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
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Abstract
本发明涉及富勒烯衍生物的制造方法。特别地,本发明描述了一种用于制造卤化富勒烯的改进方法,特征在于使富勒烯与至少一种卤原子反应。本发明包括一种用于选择性地获得卤化富勒烯且同时分离由此制得的卤化富勒烯的制造方法。本发明包括一种如下的制造方法,由其可以反应且同时分离相对大量的材料。本发明描述了使用富勒烯C60F36作为用于半导体有机组件中的空穴传输层的p-掺杂剂,其中所述半导体有机组件具有这种层布置:其包括电极和对电极,以及布置在电极和对电极之间的一系列有机层。
Description
技术领域
本发明涉及富勒烯衍生物的制造方法。
背景技术
在过去的几年里,例如有机发光二极管(OLED)和有机太阳能电池的有机半导体组件的性能和工作寿命已经经历了重大改善。一种关键因素是由有机材料构成的电荷传输层的传导率增加了[K.Walzer,B.Maennig,M.Pfeiffer,K.Leo,Chem.Rev.107,1233(2007)]。为此目的,电荷传输层的p-和n-掺杂的观念是恰当的。分子掺杂使得基质中的电荷载流子的密度增加,且这补偿了基质的不良的本征电荷载流子迁移率。分子掺杂的观念使得传输层的传导率增加几个数量级[M.Pfeiffer,K.Leo,X.Zhou,J.S.Huang,M.Hofmann,A.Werner,J.Blochwitz-Nimoth,Org.Electron.4,89(2003)]。因为OLED的工作电压减小且有机太阳能电池的串联电阻降低,从而这导致性能大幅增加。用于电荷载流子的注入势垒降低且形成耗尽区,所述耗尽区能通过隧道工艺由电荷载流子容易地克服。[J.Blochwitz,T.Fritz,M.Pfeiffer,K.Leo,D.M.Alloway,P.A.Lee,N.R.Amstrong,Org.Electron.2,97(2001)].且现在可用的最有效的单色[R.Meerheim,R.Nitsche,K.Leo,Appl.Phys.Lett.93,043310(2008)]和白色[S.Reineke,F.Lindner,G.Schwartz,N.Seidler,K.Walzer,B.Lüssem,K.Leo,Nature 459,234(2009)]OLED和有机太阳能电池[2010年4月由HeliatekGmbH新闻发布:http://heliatek.de]使用这种掺杂层。可以通过同时蒸发两种材料来实现掺杂。气相掺杂剂以低比率与基质混合且被沉积在一个表面上。如果是p型掺杂(空穴传输),这种基质可包含例如N,N,N′,N’-四-(4-甲氧基苯基)对二氨基联苯(MeO-TPD)。为了使掺杂可能基质必须具有等于(+/-0.3eV)或小于掺杂剂的电子亲和势的电离能。相对于二茂铁(Fc/Fc+),p-掺杂剂(富勒烯衍生物)应当具有大于或等于约-0.3V、优选大于或等于约0.0V、更优选大于或等于约0.24V的还原电势。掺杂分子应当能够均匀地进入到基质中且应当具有低扩散倾向。具有高电子亲和势(EA)的一些p-掺杂分子是公知的,例如相对弱的电子受体四氰基对苯二醌二甲烷(TCNQ)[M.Maitrot,G.Guillaud,B.Boudjema,J.J.André,J.Simon,J.Appl.Phys.60,2396(1986);R.C.Weland,J.L.Gillson,J.Am.Chem.Soc.98,3916(1976)]或氟化改性3,6-二氟-2,5,7,7,8,8,-六氰基对苯二醌二甲烷(F2-HCNQ)[Z.Q.Gao,B.X.Mi,G.Z.Xu,Y.Q.Wan,M.L.Gong,K.W.Cheah,C.H.Chen,Chem.Commun.,117(2008)]和经常使用的2,3,5,6-四氟-7,7,8,8-四氰基对苯二醌二甲烷(F4-TCNQ)[J.Blochwitz,M.Pfeiffer,T.Fritz,K.Leo,Appl.Phys.Lett.73,729(1998);W.Y.Gao和A.Kahn,Appl.Phys.Lett.79,4040(2001)]。由于它的低分子量,这种材料类具有高蒸气压且趋向于引起气相沉积腔以及其后沉积的层的非受控污染。在这种情况下,组件的各层的污染会导致激子受到抑制,且因此损害组件性能[B.X.Mi,Z.Q.Gao,K.W.Cheah,C.H.Chen,Appl.Phys.Lett.94,073507(2009)]。掺杂有这种材料类的层也具有低的热稳定性[P.Wellmann,M.Hofmann,O.Zeika,A.Werner,J.Birnstock,R.Meerheim,G.He,K.Walzer,M.Pfeiffer,K.Leo,J.Soc.Inf.Disp.13,393(2005)]。这缩短了组件的工作寿命。
全氟富勒烯也具有相似的约5eV的电子亲和势[N.Liu,Y.Morio,F.Okino,H.Touhara,O.V.Boltalina,V.K.Pavlovich,Synth.Metals 86,2289(1997)]。之前已经研究将全氟富勒烯C60F36用作通过基于溶液的工艺沉积的聚合物层中的p-掺杂剂[O.Solomeshch,Y.J.Yu,A.A.Goryunkov,L.N.Sidorov,R.F.Tuktarov,D.H.Choi,J.-I1 Jin,N.Tessler,Adv.Mater.21,4456(2009)]。文献包含少量的关于氟化富勒烯的制造的公开报道。Boltalina等人使用各种氟铅酸盐[P.A.Troshin,O.V.Boltalina,N.V.Polykova,Z.E.Klinkina,J.Fluor.Chem.110,157,(2001)]、镧系元素的氟化物[A.A.Goryunkov,Z.Mazej,B.Zemva,S.H.Strauss,O.V.Boltalina,Mendeleev Commun.16,159(2006)]或者过渡金属氟化物与氟气体结合[N.S.Chilingarov,A.V.Nikitin,J.V.Rau,I.V.Golyshevsky,A.V.Kepman,F.M.Spiridonov,L.N.Sidorov,J.Fluor.Chem.113,219(2002)]以合成氟化富勒烯。前述所引用的所有方法是基于在氟化期间或用于合适试剂氟化的合成期间使用分子氟气体。氟被归类为高毒性且对在设备设置中通常使用的非常多的材料产生腐蚀作用。必须的车间安全防范使得这些制造实例很不切合实际且昂贵得惊人。同时,这些方法显示出仅仅对C60F36具有中等优良的选择性且具有小于30%的非常低至中等的产率。Boltalina等人公开了另一种用于合成C60F36的不使用氟气体的方法,其中一端被封闭的镍管填充有粉状氟化锰(III)和C60[O.Boltalina,A.Borschevskii,L.Sidrov,J.Street,R.Taylor,Chem.comm.,529(1996)]。将填充的镍管放置在玻璃升华管中。在管状炉中,在10-2毫巴的压力下,在30分钟内将所述玻璃管加热到330℃,且将其保持在该温度24小时。在这段时间内,各种氟化富勒烯混合物凝结在冷的玻璃壁上。根据质谱仪分析,这种混合物由51%的C60F36、33%的C60(未反应的富勒烯)、8%的C60F34以及15%的C60F32组成。所描述的所有的方法都具有无法加大量到毫摩尔级的缺点。
发明内容
因此本发明的目的是提供一种用于制造富勒烯衍生物的改进的方法。通过根据权利要求1和相应从属权利要求的制造方法来实现该目的。
在用于制造富勒烯衍生物的方法中,使富勒烯与至少一种卤素在反应器中反应,其中至少一种另外的化学元素也被添加到反应器中。
本方法的优点包括制造不涉及使用氟气体,提高了产率,以及所制造的物质具有更高的纯度。
富勒烯优选选自公式Cm,其中m选自36、60、70、76、78、80、82、84、86、90、94或能够形成这种球形分子的任何整数。优选,m=60、70、76、80、82、84、86、90或者94。
所述卤素选自F、Cl、Br,优选F。优选以卤素-金属离子-盐化合物(上下文中被称为卤素化合物)的形式使用卤素。金属离子可以选自如下离子:铬(Cr)、锰(Mn)、钌(Ru)、钼(Mo)、铁(Fe)、钨(W)、钴(Co)、铑(Rh)、铱(Ir)、镍(Ni)、钯(Pd)、铂(Pt)、铜(Cu)、银(Ag)、金(Au)、铊(Tl)、锡(Sn)、锑(Sb)、碲(Te)、铅(Pb)、铋(Bi)、镧(La)、铈(Ce)、镨(Pr)、钕(Nd)、钐(Sm)、铕(Eu)、钆(Gd)、铽(Tb)、镝(Dy)、钬(Ho)、铒(Er)、铥(Tm)、镱(Yb)、镥(Lu)。优选化合物为MnF3。
以任何尺寸的线材、切屑或粉末的形式使用所述另外的化学元素。能够以纯的形式、作为合金或作为混合物将其加入。
所述另外的化学元素优选选自如下元素:钛(Ti)、锆(Zr)、钒(V)、铌(Nb)、钽(Ta)、铬(Cr)、钼(Mo)、钨(W)、锰(Mn)、铼(Re)、铁(Fe)、钌(Ru)、锇(Os)、钴(Co)、铑(Rh)、铱(Ir)、镍(Ni)、钯(Pd)、铂(Pt)、铜(Cu)、银(Ag)、金(Au)、锌(Zn)、镉(Cd)、铝(Al)、镓(Ga)、铟(In)、铊(Tl)、锗(Ge)、锡(Sn)、铅(Pb)、砷(As)、锑(Sb)、铋(Bi)、硒(Se)、碲(Te)、镧(La)、铈(Ce)、镨(Pr)、钕(Nd)、钐(Sm)、铕(Eu)、钆(Gd)、铽(Tb)、镝(Dy)、钬(Ho)、铒(Er)、铥(Tm)、镱(Yb)、镥(Lu)。特别优选镍(Ni)。
富勒烯-卤素衍生物优选具有通式CmFn,其中n可以为1至m。C60F36(m=60,n=36)和C60F34至48(m=60,n=34)。
在本发明的一个实施方式中,在反应前将富勒烯与至少一种另外的化学元素混合。优选在反应前将富勒烯、至少一种另外的化学元素和卤素化合物混和。
反应器是在反应期间与外界环境(例如,大气)隔绝的化学反应器。所述化学反应器可以是例如锅炉、管或一些其它容器。也可以使用许多被连接起来的容器。
在本发明的一个优选构造中,反应器是延长的容器,例如升华管。其中通过升华进行制造同时分离。
公开了所述富勒烯衍生物用于有机半导体层中。所述富勒烯衍生物可以形成有机半导体层。
与本发明一致的是有机半导体层是由作为基质的有机空穴传输半导体材料和作为p-掺杂剂的富勒烯衍生物构成的掺杂层。可通过执行本发明的方法制造具有增大的电荷载流子密度和有效的电荷载流子迁移率的掺杂半导体材料。
所述富勒烯衍生物可有利地作为有机二极管、有机光敏组件的成分,尤其是太阳能电池、光探测器或发光二极管的成分。
包含至少一种有机半导体层的组件被认为是有机组件。为了本发明的目的,富勒烯及其衍生物也被包含在有机的定义中。有机半导体层也包含被称为“小分子”的有机分子,或者也包含有机聚合物,其中所述有机分子和有机聚合物可以是单层或者与其它有机(例如US2005 0110009中所述)或具有半导体或类金属性能的无机材料的混合。有机发光二极管通常由许多不同的有机材料层构成,至少一层(发光层)含有当对其施加电压时可被诱导发光的电致发光物质(Tang,US 4,769,292)。例如US 7,074,500中描述了一种高效率的OLED。太阳能电池的构造是本领域技术人员公知的,参见EP1861886和EP1859494。特别优选的组件是Walzer等人所描述的掺杂组件[Chem.Rev.107,1233(2007)]。
有利地所述富勒烯衍生物构成电池的一部分,优选为阴极[N.Liu,H.Touhara,F.Okino,S.Kawasaki,Y.Nakacho,J.Electrochem.Soc.143,2267(1996)]。
附图说明
图1:用于在毫摩尔级别制造C60F36的设备的示意图。
图2:反应产品的质谱仪分析。
图3:p-掺杂剂C60F36的分子结构以及p-掺杂剂F4-TCNQ和MeO-TPD的结构的ORTEP图。
图4:使用UPS和XPS的p-掺杂剂F4-TCNQ和C60F36的污染情况的测量。
图5:BF-DPB的结构。
图6:含有F4-TCNQ或C60F36的空穴传输层的热稳定性。
图7:OLED的层构造和组成,以及Bphen,螺TAD,α-NPD和Ir(MDQ)2acac的结构。
图8:OLED的电致发光光谱的对比。
图9:两个OLED的特性I(V)曲线和发光对比。
图10:OLED的能量产额和外量子效率的对比。
图11:有机太阳能电池的层结构和组成,以及ZnPc的结构。
图12:使用太阳光模拟器(AM1.5)发光下以及在黑暗中的两个有机太阳能电池的特性I(V)曲线的对比,以及所有的特性性能参数的对比。
图13:以年代顺序排列的老化期间,特性参数的对比。
具体实施方式
合成C60F36的实施例
在24小时内、10-3毫巴的压力以及200℃的温度下,从用于合成的MnF3(ABCR,98%)中萃取微量的水和氧。从化学供应商(例如美国Dye Source公司)处购买富勒烯C60,以及通过三次升华纯化。在氮气气氛中将富勒烯C60(1.00g;1.388mmol)和MnF3(5.59g;60.15mmol)放入磨齿机中彻底地粉碎。在镍坩埚中将镍粉末(6.6g;10%)加入到混合物中且将被填充的镍坩埚放置到图1所示的升华装置中。在4×10-4毫巴的压力下将升华管加热到330℃,持续24小时,在这段时间内氟化反应产物在升华管的冷却器部分上凝结成微黄色-白色固体(0.76g)形式。使与冷凝物一起装载的环形物经历另一升华步骤,最后分离出0.75g(0.534mmol,38%的理论产率)的产品。为了分析残留的升华产品,将样品完全溶解到甲苯中且在质谱仪中完全蒸发。图2中测量且示出了整个全部的离子电流。存在于样品中的所有化合物的强度比对应如下组成:84%的C60F36、14%的C60F34和2%的C60。
处理实施例1
将掺杂剂C60F36的污染特性信息与F4-TCNQ对比。此目的是为了检查掺杂剂C60F36和F4-TCNQ的挥发性以及提供如下证据,与F4-TCNQ不同,C60F36不显示任何腔室污染。
使用X-射线光电光谱法(XPS),在未掺杂的MeO-TPD层中通过它们的氟信息来检查掺杂剂C60F36和F4-TCNQ的挥发性。图4显示了在10nm厚本征MeO-TPD层上XPS测量获得的1s氟核心信号的对比。在未加热源下不含有两种掺杂剂或含有两个之一的腔室中制造这些产品。结合能为689.5eV的显著氟信号仅在腔室中存在F4-TCNQ的经过蒸发的层上可观测到。在紫外光电子能谱(UPS)中此层也以朝向MeO-TPD的最高占有分子轨道(HOMO)的费米能量(EB=0eV)有0.53eV的显著偏移的形式表现出掺杂效应。这种污染证明了F4-TCNQ的污染能与在C60F36存在的情况下经历蒸发的样品相反。在来自具有C60F36的腔室的样品中,在XPS中没有观测到氟信号以及在UPS中没有观测到HOMO偏移,也就是说观测到在MeO-TPD层上没有污染。与F4-TCNQ相比,C60F36的非常低的挥发性在处理空穴传输层的问题中表现出显著的优点。
处理实施例2
具有C60F36-掺杂空穴传输层的热稳定信息与F4-TCNQ对比。目的是介绍掺杂有C60F36的空穴传输层的热稳定性。
为了测试热稳定性,选择基质材料为N,N’-((联苯基-N,N’-二)9,9,-二甲基-芴-2-基)-对二氨基联苯(BF-DPB),这是因为它具有高的玻璃化转变温度(TG=160℃)(US20020171358A1)。因此依赖于温度直到TG的它的导电性能可归因于掺杂剂。具有26mol%比的F4-TCNQ和具有21mol%比的C60F36的两层展示出在室温下类似的传导率3×10-6Scm-1(图6)。在此上下文中,C60F36的较低掺杂是掺杂剂的较高掺杂效率的表达。由于F4-TCNQ的LUMO能量上近似等同于通过UPS确定的BF-DPB(-5.23eV)的HOMO能级,因而在此系统中所导致的电荷传输是低效率的。因而可以假设C60F36比F4-TCNQ具有更强的电子亲和势。随着温度升高,两个层的传导率增大,对于F4-TCNQ和C60F36具有265meV和692meV直到最大的激活能,且如果温度继续升高则传导率崩溃(collapse)。在BF-DPB/F4-TCNQ层中观测到较低稳定性,在145℃传导率下降。在BF-DPB/C60F36层中,直到180℃才会发生崩溃,因而高于基质材料的TG。因此传导率的下降不直接归因于C60F36掺杂剂。
处理实施例3
在OLED中使用C60F36-掺杂空穴传输层的信息与F4-TCNQ对比。具有橙红发射光的磷光p-i-n OLED用于与组件中的掺杂剂对比。
在图7中图示了所制造的组件的层结构。有机层位于玻璃衬底上,且在90nm厚的氧化铟锡(ITO)阳极和100nm厚的银覆盖接触之间。60nm厚的MeO-TPD层掺杂有1重量%的F4-TCNQ或8重量%的C60F36用作空穴传输层(HTL),从而获得约2×10-5Scm-1的传导率。65nm厚的铯掺杂的4,7-联苯基-1,10-邻二氮杂菲(BPhen)用作电子传输层(ETL),且具有类似的传导率。为了将注入电荷集中到发射层(EML)中,2,2’,7,7’-四-(N,N-二苯基氨基)-9,9’-螺二芴(螺-TAD)和BPhen构成的10nm厚的电子和空穴阻挡层(EBL,HBL)包含在EML的一侧。20nm厚的EML由N,N’-二(萘-2-基)-N,N’-联苯基-对二氨基联苯(α-NPD)组成,其掺杂有10重量%的三线态发光体二(2-甲基二苯并-[f,h]喹喔啉)乙酰丙酮合铱(III)(Ir(MDQ)2(acac))。如图8所示,两个OLED显示出同样的电致发光光谱,这防止了C60F36的寄生吸收。两个对比组件的电流-电压曲线是类似的(图9),但是具有C60F36掺杂剂的I(V)特性曲线更陡峭,这表明对于相同的层传导率,其空穴注入更好。更大的空穴注入增大了电荷载流子密度且改变了电荷载流子在EML中的平衡,这使得C60F36OLED的效率更高(图10)。
处理实施例4
在有机太阳能电池中使用C60F36掺杂的空穴传输层的信息与F4-TCNQ对比。获得的组件的工作寿命测量因此显示出使用酞菁锌(ZnPc)混合层和C60作为施体-受体-吸收对的组件的稳定性。
图11中显示了由此制造的组件的层结构。掺杂有2重量%的F4-TCNQ或8重量%的C60F36的60nm厚的MeO-TPD层用作空穴传输层(HTL)。30nm厚的C60和ZnPc(1∶1)混合层用作吸收层,其邻近30nm厚的本征C60层。掺杂有3重量%的3,6-二(二甲基氨基)吖啶(AOB)的15nm厚的C60层确保电子的传输。反射电极由100nm厚的铝层形成。如图12所示,两个太阳能电池的所有参数是类似的且仅表现出最小的不同,这落在测量误差的范围之内。断路端电压(openterminal voltage)(VOC)不受掺杂物质的影响。掺杂C60F36使得非常轻微地降低了串联电阻。
太阳能电池在50℃时且在为具有输出为500mWcm-2的白光LED供电发光的条件下老化。图13图示了有机太阳能电池的耐用性的不同。由于F4-TCNQ的低的玻璃化转变温度,所以具有这种掺杂剂的太阳能电池具有小于100小时的使用寿命,使得这种材料完全不适合商业使用。相反地,含有C60F36的电池具有超过500小时时段的恒定电池参数。因而,这些电池的稳定性显著大于含有F4-TCNQ的电池。
考虑到它作为p-i-n OLED和有机太阳能电池中的p-掺杂剂的使用,因而可以断定代替F4-TCNQ与改进的组件性能以及组件的更好的稳定性相关。此外,C60F36掺杂剂的低的蒸气压意味着在制造工艺中不会污染腔室。
Claims (12)
1.一种用于制造富勒烯衍生物的方法,其中在反应器中使富勒烯与至少一种卤原子反应,其特征在于向所述反应器中添加至少一种另外的化学元素。
2.根据权利要求1所述的用于制造富勒烯衍生物的方法,其特征在于所述至少一种卤原子选自F、Cl、Br。
3.根据前述权利要求中任一项所述的用于制造富勒烯衍生物的方法,其特征在于所述富勒烯是具有通式Cm的球形碳簇,其中m选自36、60、70、76、78、80、82、84或者适于形成此种球形分子的任何其它自然数。
4.根据前述权利要求中任一项所述的用于制造富勒烯衍生物的方法,其特征在于所述卤原子以至少一种盐或盐混合物的形式使用,其中所述盐包含金属离子且其中所述金属离子选自Cr、Mn、Ru、Mo、Fe、W、Co、Rh、Ir、Ni、Pd、Pt、Cu、Ag、Au、Tl、Sn、Sb、Te、Pb、Bi、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu。
5.根据前述权利要求中任一项所述的用于制造富勒烯衍生物的方法,其特征在于所述至少一种另外的化学元素是以任何尺寸的线材、切屑或者粉末的形式的如下元素或这些元素的混合物:Ti、Zr、V、Nb、Ta、Cr、Mo、W、Mn、Re、Fe、Ru、Os、Co、Rh、Ir、Ni、Pd、Pt、Cu、Ag、Au、Zn、Cd、Al、Ga、In、Tl、Ge、Sn、Pb、As、Sb、Bi、Se、Te、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu。
6.根据前述权利要求中任一项所述的用于制造富勒烯衍生物的方法,其中所述另外的化学元素是镍。
7.根据前述权利要求中任一项所述的用于制造富勒烯衍生物的方法,其中通过升华进行制造同时分离。
8.一种有机半导体层,特征在于其含有根据前述权利要求1至7中任一项所述的方法制造的材料。
9.一种掺杂的有机半导体层,特征在于其含有有机空穴传输半导体材料和根据前述权利要求1至7中至少一项所述的方法制造的富勒烯衍生物。
10.根据权利要求9所述的掺杂有机半导体层,其特征在于所述富勒烯衍生物是用于有机空穴传输半导体材料的p-掺杂剂。
11.具有多层结构的有机二极管、有机光敏组件,尤其是太阳能电池、光探测器或发光二极管,其中至少一个层含有根据前述权利要求中任一项所述制得的富勒烯衍生物。
12.一种含有富勒烯衍生物的电池,其由根据前述权利要求1至7中任一项所述的方法制造。
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CN117690985A (zh) * | 2023-12-21 | 2024-03-12 | 佛山职业技术学院 | 一种薄膜太阳能电池 |
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