CN102523756B - 感光性树脂组合物及使用该感光性树脂组合物的丝网印刷用印版 - Google Patents

感光性树脂组合物及使用该感光性树脂组合物的丝网印刷用印版 Download PDF

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Publication number
CN102523756B
CN102523756B CN201180002246.7A CN201180002246A CN102523756B CN 102523756 B CN102523756 B CN 102523756B CN 201180002246 A CN201180002246 A CN 201180002246A CN 102523756 B CN102523756 B CN 102523756B
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China
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methyl
acrylate
ester
acrylic acid
composition
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Chinese (zh)
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CN102523756A (zh
Inventor
近江护
大上丰司
沈君浩
山冈亚夫
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Murakami Co Ltd
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Murakami Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CN201180002246.7A 2010-09-03 2011-01-11 感光性树脂组合物及使用该感光性树脂组合物的丝网印刷用印版 Active CN102523756B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010197874A JP2012053404A (ja) 2010-09-03 2010-09-03 感光性樹脂組成物およびこの感光性樹脂組成物を用いたスクリーン印刷用ステンシル
JP2010-197874 2010-09-03
PCT/JP2011/050265 WO2012029330A1 (fr) 2010-09-03 2011-01-11 Composition de résine photosensible, et pochoir pour impression d'écran utilisant ladite composition de résine photosensible

Publications (2)

Publication Number Publication Date
CN102523756A CN102523756A (zh) 2012-06-27
CN102523756B true CN102523756B (zh) 2014-11-26

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CN201180002246.7A Active CN102523756B (zh) 2010-09-03 2011-01-11 感光性树脂组合物及使用该感光性树脂组合物的丝网印刷用印版

Country Status (3)

Country Link
JP (1) JP2012053404A (fr)
CN (1) CN102523756B (fr)
WO (1) WO2012029330A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103389619B (zh) * 2012-05-10 2015-12-16 中国石油化工集团公司 一种多元醇聚合物感光胶及其制备方法
CN104583243B (zh) * 2012-09-28 2016-08-24 富士胶片株式会社 固化性树脂组合物、水溶性油墨组合物、油墨组及图像形成方法
JP6545506B2 (ja) * 2015-03-31 2019-07-17 株式会社Adeka 重合体及び光硬化性組成物
JP2017003911A (ja) * 2015-06-15 2017-01-05 株式会社ムラカミ 感光性樹脂組成物、感光性フィルム、スクリーン印刷用版材および感光性レジストフィルム
JP6681527B2 (ja) * 2015-06-15 2020-04-15 株式会社ムラカミ 感光性樹脂組成物、感光性フィルム、スクリーン印刷用版材、スクリーン印刷用ステンシルおよび感光性レジストフィルム、ならびにそれらの製造方法
CN110007559A (zh) * 2019-04-16 2019-07-12 田菱智能科技(昆山)有限公司 一种具有高保存稳定性的感光性树脂组合物及其制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491629A (en) * 1982-02-22 1985-01-01 Tokyo Shibaura Denki Kabushiki Kaisha Water soluble photoresist composition with bisazide, diazo, polymer and silane
CN1230568A (zh) * 1998-03-12 1999-10-06 互应化学工业株式会社 光敏树脂组合物和用于生产印刷电路板的光刻胶油墨
JP2001133976A (ja) * 1999-11-05 2001-05-18 Murakami:Kk 感光性樹脂組成物及びそれを用いたスクリーン印刷用版並びにスクリーン印刷用版の製造方法
US6238841B1 (en) * 1998-05-12 2001-05-29 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58143340A (ja) * 1982-02-22 1983-08-25 Toshiba Corp ホトレジスト組成物
JPS59185332A (ja) * 1983-04-06 1984-10-20 Agency Of Ind Science & Technol 感光性樹脂組成物
JPH11327151A (ja) * 1998-05-15 1999-11-26 Sanyo Chem Ind Ltd 感光性組成物
JP4012626B2 (ja) * 1998-06-02 2007-11-21 互応化学工業株式会社 スクリーン印刷版製造用の感光性樹脂組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491629A (en) * 1982-02-22 1985-01-01 Tokyo Shibaura Denki Kabushiki Kaisha Water soluble photoresist composition with bisazide, diazo, polymer and silane
CN1230568A (zh) * 1998-03-12 1999-10-06 互应化学工业株式会社 光敏树脂组合物和用于生产印刷电路板的光刻胶油墨
US6238841B1 (en) * 1998-05-12 2001-05-29 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
JP2001133976A (ja) * 1999-11-05 2001-05-18 Murakami:Kk 感光性樹脂組成物及びそれを用いたスクリーン印刷用版並びにスクリーン印刷用版の製造方法

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WO2012029330A1 (fr) 2012-03-08
JP2012053404A (ja) 2012-03-15
CN102523756A (zh) 2012-06-27

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