CN102415221B - 用于检测用于电流的柔性连接中断的配置及其方法 - Google Patents

用于检测用于电流的柔性连接中断的配置及其方法 Download PDF

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Publication number
CN102415221B
CN102415221B CN201080017788.7A CN201080017788A CN102415221B CN 102415221 B CN102415221 B CN 102415221B CN 201080017788 A CN201080017788 A CN 201080017788A CN 102415221 B CN102415221 B CN 102415221B
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CN
China
Prior art keywords
flexible connector
testing circuit
current
coil
connector
Prior art date
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Application number
CN201080017788.7A
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English (en)
Chinese (zh)
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CN102415221A (zh
Inventor
赛义德·贾法·雅法良-特哈妮
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Lam Research Corp
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Lam Research Corp
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Publication date
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Priority to CN201410485836.5A priority Critical patent/CN104360211B/zh
Publication of CN102415221A publication Critical patent/CN102415221A/zh
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/50—Testing of electric apparatus, lines, cables or components for short-circuits, continuity, leakage current or incorrect line connections
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/50—Testing of electric apparatus, lines, cables or components for short-circuits, continuity, leakage current or incorrect line connections
    • G01R31/52—Testing for short-circuits, leakage current or ground faults
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/50—Testing of electric apparatus, lines, cables or components for short-circuits, continuity, leakage current or incorrect line connections
    • G01R31/54—Testing for continuity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Testing Of Short-Circuits, Discontinuities, Leakage, Or Incorrect Line Connections (AREA)
  • Drying Of Semiconductors (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
CN201080017788.7A 2009-04-28 2010-04-26 用于检测用于电流的柔性连接中断的配置及其方法 Active CN102415221B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410485836.5A CN104360211B (zh) 2009-04-28 2010-04-26 用于检测用于电流的柔性连接中断的配置及其方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/431,593 US8466697B2 (en) 2009-04-28 2009-04-28 Arrangements for detecting discontinuity of flexible connections for current flow and methods thereof
US12/431,593 2009-04-28
PCT/US2010/032413 WO2010129229A2 (en) 2009-04-28 2010-04-26 Arrangements for detecting discontinuity of flexible connections for current flow and methods thereof

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201410485836.5A Division CN104360211B (zh) 2009-04-28 2010-04-26 用于检测用于电流的柔性连接中断的配置及其方法

Publications (2)

Publication Number Publication Date
CN102415221A CN102415221A (zh) 2012-04-11
CN102415221B true CN102415221B (zh) 2014-11-19

Family

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Family Applications (2)

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CN201080017788.7A Active CN102415221B (zh) 2009-04-28 2010-04-26 用于检测用于电流的柔性连接中断的配置及其方法
CN201410485836.5A Active CN104360211B (zh) 2009-04-28 2010-04-26 用于检测用于电流的柔性连接中断的配置及其方法

Family Applications After (1)

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CN201410485836.5A Active CN104360211B (zh) 2009-04-28 2010-04-26 用于检测用于电流的柔性连接中断的配置及其方法

Country Status (7)

Country Link
US (1) US8466697B2 (enExample)
JP (1) JP5781064B2 (enExample)
KR (1) KR101617231B1 (enExample)
CN (2) CN102415221B (enExample)
SG (1) SG175164A1 (enExample)
TW (1) TWI489117B (enExample)
WO (1) WO2010129229A2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102018733B1 (ko) 2013-06-13 2019-09-06 삼성디스플레이 주식회사 플렉서블 표시장치
CN105116271B (zh) * 2015-08-07 2019-04-26 深圳一电航空技术有限公司 桨叶检测装置及方法、桨叶组件、飞行器及其控制方法
KR102417178B1 (ko) * 2015-09-03 2022-07-05 삼성전자주식회사 마이크로파 탐침, 그 탐침을 구비한 플라즈마 모니터링 시스템, 및 그 시스템을 이용한 반도체 소자 제조방법
US20210073610A1 (en) * 2017-12-27 2021-03-11 Semiconductor Energy Laboratory Co., Ltd. Thin film manufacturing apparatus and thin film manufacturing apparatus using neural network
CN115825529B (zh) * 2022-12-25 2023-11-17 北京屹唐半导体科技股份有限公司 射频探头、射频匹配器、射频电源及射频测量仪

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5486756A (en) * 1992-07-10 1996-01-23 Sumitomo Special Metals Co., Ltd. DC current sensor
US6876205B2 (en) * 2003-06-06 2005-04-05 Advanced Energy Industries, Inc. Stored energy arc detection and arc reduction circuit
CN1647252A (zh) * 2002-04-24 2005-07-27 独立行政法人科学技术振兴机构 窗型探针、等离子体监视装置及等离子体处理装置
US7145345B2 (en) * 2003-12-23 2006-12-05 General Electric Company Current transformers for partial discharge detection on aircraft cables and wires
US7271580B1 (en) * 2001-10-26 2007-09-18 Schweitzer Engineering Laboratories, Inc. Apparatus and method for programmable trip settings in a faulted circuit indicator
CN101187013A (zh) * 2006-11-20 2008-05-28 应用材料股份有限公司 具有接地构件完整性指示器的等离子体处理室及其使用方法
US20080179005A1 (en) * 2004-02-20 2008-07-31 Tokyo Electron Limited Plasma processing apparatus and control method thereof
WO2009032095A1 (en) * 2007-09-04 2009-03-12 Lam Research Corporation Method and apparatus for diagnosing status of parts in real time in plasma processing equipment

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09257861A (ja) * 1996-03-21 1997-10-03 Toshiba Corp 心線損傷検出装置
JPH1079350A (ja) 1996-09-04 1998-03-24 Kokusai Electric Co Ltd プラズマ処理装置
US6221221B1 (en) * 1998-11-16 2001-04-24 Applied Materials, Inc. Apparatus for providing RF return current path control in a semiconductor wafer processing system
JP2002202328A (ja) * 2000-12-28 2002-07-19 Japan System Engineering Kk 磁界型電流センサ
KR100483355B1 (ko) 2002-11-14 2005-04-15 학교법인 성균관대학 자장강화된 외장형 선형 안테나를 구비하는 대면적 처리용유도 결합 플라즈마 소오스
US7972470B2 (en) * 2007-05-03 2011-07-05 Applied Materials, Inc. Asymmetric grounding of rectangular susceptor

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5486756A (en) * 1992-07-10 1996-01-23 Sumitomo Special Metals Co., Ltd. DC current sensor
US7271580B1 (en) * 2001-10-26 2007-09-18 Schweitzer Engineering Laboratories, Inc. Apparatus and method for programmable trip settings in a faulted circuit indicator
CN1647252A (zh) * 2002-04-24 2005-07-27 独立行政法人科学技术振兴机构 窗型探针、等离子体监视装置及等离子体处理装置
US6876205B2 (en) * 2003-06-06 2005-04-05 Advanced Energy Industries, Inc. Stored energy arc detection and arc reduction circuit
US7145345B2 (en) * 2003-12-23 2006-12-05 General Electric Company Current transformers for partial discharge detection on aircraft cables and wires
US20080179005A1 (en) * 2004-02-20 2008-07-31 Tokyo Electron Limited Plasma processing apparatus and control method thereof
CN101187013A (zh) * 2006-11-20 2008-05-28 应用材料股份有限公司 具有接地构件完整性指示器的等离子体处理室及其使用方法
WO2009032095A1 (en) * 2007-09-04 2009-03-12 Lam Research Corporation Method and apparatus for diagnosing status of parts in real time in plasma processing equipment

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JP特开平10-79350A 1998.03.24 *

Also Published As

Publication number Publication date
WO2010129229A2 (en) 2010-11-11
US8466697B2 (en) 2013-06-18
CN102415221A (zh) 2012-04-11
WO2010129229A3 (en) 2011-02-03
KR20120020104A (ko) 2012-03-07
CN104360211A (zh) 2015-02-18
US20100271040A1 (en) 2010-10-28
TW201126179A (en) 2011-08-01
JP2012525683A (ja) 2012-10-22
SG175164A1 (en) 2011-11-28
TWI489117B (zh) 2015-06-21
JP5781064B2 (ja) 2015-09-16
CN104360211B (zh) 2017-11-24
KR101617231B1 (ko) 2016-05-02

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