CN102346377A - 曝光装置及方法以及显示用面板基板制造装置及制造方法 - Google Patents

曝光装置及方法以及显示用面板基板制造装置及制造方法 Download PDF

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Publication number
CN102346377A
CN102346377A CN2011102172511A CN201110217251A CN102346377A CN 102346377 A CN102346377 A CN 102346377A CN 2011102172511 A CN2011102172511 A CN 2011102172511A CN 201110217251 A CN201110217251 A CN 201110217251A CN 102346377 A CN102346377 A CN 102346377A
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CN
China
Prior art keywords
exposure
substrate
scanning
catoptron
beam irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2011102172511A
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English (en)
Chinese (zh)
Inventor
工藤慎也
林知明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Hitachi High Tech Corp
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of CN102346377A publication Critical patent/CN102346377A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H01L21/0275—Photolithographic processes using lasers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN2011102172511A 2010-08-03 2011-07-29 曝光装置及方法以及显示用面板基板制造装置及制造方法 Pending CN102346377A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010174553A JP5433524B2 (ja) 2010-08-03 2010-08-03 露光装置及び露光方法並びに表示用パネル基板製造装置及び表示用パネル基板の製造方法
JP2010-174553 2010-08-03

Publications (1)

Publication Number Publication Date
CN102346377A true CN102346377A (zh) 2012-02-08

Family

ID=45545178

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2011102172511A Pending CN102346377A (zh) 2010-08-03 2011-07-29 曝光装置及方法以及显示用面板基板制造装置及制造方法

Country Status (4)

Country Link
JP (1) JP5433524B2 (ja)
KR (1) KR20120024393A (ja)
CN (1) CN102346377A (ja)
TW (1) TW201300961A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104950438A (zh) * 2014-03-28 2015-09-30 斯克林集团公司 光照射装置与绘制装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016071135A (ja) 2014-09-30 2016-05-09 株式会社Ｓｃｒｅｅｎホールディングス 描画方法
US10133187B2 (en) 2015-05-29 2018-11-20 SCREEN Holdings Co., Ltd. Light irradiation apparatus and drawing apparatus

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07135158A (ja) * 1993-11-09 1995-05-23 Canon Inc 走査型露光装置及び該走査型露光装置を用いるデバイス製造方法
JP2006005283A (ja) * 2004-06-21 2006-01-05 Canon Inc 投影露光装置
JP2006201586A (ja) * 2005-01-21 2006-08-03 Fuji Photo Film Co Ltd 露光装置
CN101052922A (zh) * 2005-01-25 2007-10-10 株式会社尼康 曝光装置与曝光方法以及微元件的制造方法
CN101218544A (zh) * 2005-06-24 2008-07-09 富士胶片株式会社 曝光方法和设备

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3938714B2 (ja) * 2002-05-16 2007-06-27 大日本スクリーン製造株式会社 露光装置
JP4638826B2 (ja) * 2005-02-04 2011-02-23 富士フイルム株式会社 描画装置及び描画方法
JP2006319098A (ja) * 2005-05-12 2006-11-24 Pentax Industrial Instruments Co Ltd 描画装置
JP4801931B2 (ja) * 2005-05-12 2011-10-26 株式会社オーク製作所 描画装置
JP2007078764A (ja) * 2005-09-12 2007-03-29 Fujifilm Corp 露光装置および露光方法
US7508491B2 (en) * 2006-04-12 2009-03-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilized to reduce quantization influence of datapath SLM interface to dose uniformity
JP2008065000A (ja) * 2006-09-06 2008-03-21 Fujifilm Corp 露光方法および露光装置
JPWO2008139955A1 (ja) * 2007-05-07 2010-08-05 株式会社目白プレシジョン 投影露光方法、アライメント方法及び投影露光装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07135158A (ja) * 1993-11-09 1995-05-23 Canon Inc 走査型露光装置及び該走査型露光装置を用いるデバイス製造方法
JP2006005283A (ja) * 2004-06-21 2006-01-05 Canon Inc 投影露光装置
JP2006201586A (ja) * 2005-01-21 2006-08-03 Fuji Photo Film Co Ltd 露光装置
CN101052922A (zh) * 2005-01-25 2007-10-10 株式会社尼康 曝光装置与曝光方法以及微元件的制造方法
CN101218544A (zh) * 2005-06-24 2008-07-09 富士胶片株式会社 曝光方法和设备

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104950438A (zh) * 2014-03-28 2015-09-30 斯克林集团公司 光照射装置与绘制装置

Also Published As

Publication number Publication date
JP5433524B2 (ja) 2014-03-05
KR20120024393A (ko) 2012-03-14
JP2012038759A (ja) 2012-02-23
TW201300961A (zh) 2013-01-01

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