CN102344504A - 一种制备高衍射效率全息光聚合物材料的可见光光引发体系 - Google Patents

一种制备高衍射效率全息光聚合物材料的可见光光引发体系 Download PDF

Info

Publication number
CN102344504A
CN102344504A CN2011102156538A CN201110215653A CN102344504A CN 102344504 A CN102344504 A CN 102344504A CN 2011102156538 A CN2011102156538 A CN 2011102156538A CN 201110215653 A CN201110215653 A CN 201110215653A CN 102344504 A CN102344504 A CN 102344504A
Authority
CN
China
Prior art keywords
visible light
radical
coinitiator
diffraction efficiency
photopolymer material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN2011102156538A
Other languages
English (en)
Other versions
CN102344504B (zh
Inventor
解孝林
彭海炎
周兴平
郑成赋
葛宏伟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huazhong University of Science and Technology
Original Assignee
Huazhong University of Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Huazhong University of Science and Technology filed Critical Huazhong University of Science and Technology
Priority to CN2011102156538A priority Critical patent/CN102344504B/zh
Publication of CN102344504A publication Critical patent/CN102344504A/zh
Priority to US14/131,676 priority patent/US9753431B2/en
Priority to PCT/CN2012/076050 priority patent/WO2013016973A1/zh
Application granted granted Critical
Publication of CN102344504B publication Critical patent/CN102344504B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/18—Particular processing of hologram record carriers, e.g. for obtaining blazed holograms
    • G03H1/181—Pre-exposure processing, e.g. hypersensitisation
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2403—Layers; Shape, structure or physical properties thereof
    • G11B7/24035—Recording layers
    • G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions, e.g. volume storage
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

Abstract

本发明提供了一种制备高衍射效率全息光聚合物的可见光光引发体系。本发明涉及的光引发体系由光敏剂和共引发剂组成，其原理是光敏剂吸收光子后由基态变为激发态，再与共引发剂作用发生电子和质子转移，生成一个烷基（或芳基）自由基R和一个羰自由基K；其中，自由基R引发可以进行自由基聚合的单体发生加成聚合反应，而自由基K由于位阻作用在一定程度上阻止大分子自由基的链增长反应，从而延迟光聚合反应的凝胶时间，有助于提高聚合物与功能组分之间的相分离。采用该可见光光引发体系，可制得高衍射效率全息光聚合物材料。

Description

一种制备高衍射效率全息光聚合物材料的可见光光引发体系
技术领域
本发明属功能材料领域，涉及制备高衍射效率全息光聚合物材料的可见光光引发体系。
背景技术
全息光聚合物材料是采用激光全息技术存储全息信息的一种记录介质，其具有较高的衍射效率和环境稳定性，通常由光引发体系、可聚合单体、粘结剂、增塑剂及其他功能组分(涵盖但不局限于液晶、SiO2、TiO2、POSS和碳纳米管等)构成前躯体，然后在两束或两束以上激光的相干辐照下制得。在全息光聚合物材料的制备材料中，聚合物网络的凝胶过程与单体及其他功能组分的扩散过程存在竞争，只有当扩散速率大于凝胶速率时，才能完善相分离，制得高衍射效率的全息光聚合物材料。为解决聚合反应的凝胶问题，Natarajan等采用硫醇-烯烃(thiol-ene)的click反应调控体系的凝胶时间(Chem.Mater.2003，15(12)：2477-2484；Macromolecules 2007，40(4)：1121-1127.)，但是硫醇-烯烃反应后形成的“可逆共价键”在应力和非均匀光照下会经过RAFT过程进行重组，促使材料发生宏观形变(Adv.Mater.2011，23(17)：1977-1981.)，从而影响了全息光栅的稳定性，限制了全息光聚合物材料的应用。Scott等发现紫外光产生的自由基可以阻聚可见光引发的加成聚合反应，并采用364nm激光产生的自由基来降低由473nm激光引发的光聚合反应活性，有效地延迟了体系聚合反应的凝胶时间(Science 2009，324(5929)：913-917.)，但该方法需要采用两种不同波长的激光，增加了设备成本。基于以上问题，我们发明了一种通过延迟光聚合反应凝胶时间来提高全息光聚合物材料相分离程度的光引发体系，其在单一激光下同时产生引发、阻聚光聚合反应的两种不同自由基，实现了光聚合反应凝胶时间的连续可调，制得了高衍射效率的全息光聚合物材料。
发明内容
本发明的任务是提供一种制备高衍射效率全息光聚合物材料的可见光光引发体系。
实现本发明的技术方案是：
本发明提供的制备高衍射效率全息光聚合物材料的可见光光引发体系由光敏剂及共引发剂组成。
本发明所述的光引发体系，其特征是：光敏剂与共引发剂的质量比为20∶1～1∶20。
本发明所述的光敏剂为C1、C2、C3、C4和C5中的一种或几种，且C1、C2、C3、C4和C5分别具有以下结构：
其中，取代基R1、R2、R3、R4、R5、R6可以相同或不同，可以共同、分别或独立为-SH、-CN、-NO2、-CnH2n+1(n＝0～8)、-CnH2n+1O(n＝0～8)、N(CnH2n+1)2(n＝0～8)、苯基、噻吩基和噻唑基中的一种。
本发明所述的共引发剂为N，N，N-三乙胺、N-甲基马来酰亚胺、N-乙基马来酰亚胺、三乙醇胺、N-苯基甘氨酸、乙酰苯基甘氨酸、对氯苯基甘氨酸、3-溴苯基甘氨酸、3-腈基苯基甘氨酸、N-苯基甘氨酸乙酯、2，4，6-三(三氯甲基)-1，3，5-三嗪和2-(4′-甲氧基苯基)-4，6-双(三氯甲基)-1，3，5-三嗪中的一种或几种。
本发明的可见光光引发体系可用于引发丙烯酸酯(如：甲基丙烯酸甲酯、丙烯酸丁酯、2-丙烯酸异辛酯、二甲基丙烯酸乙酯、三羟甲基丙烷三甲基丙烯酸酯和季戊四醇四丙烯酸酯等)、丙烯酰胺(如：甲基丙烯酰胺、N-异丙基丙烯酰胺、甲叉双丙烯酰胺等)、N-乙烯基类单体(如：N-乙烯基吡咯烷酮、N-乙烯基咔唑等)以及其他能进行自由基聚合反应的单体，适合制备全息光聚合物材料。
本发明的原理是光敏剂吸收光子后由基态变为激发态，再与共引发剂作用发生电子和质子转移，生成一个烷基(或芳基)自由基R和一个羰自由基K；其中，自由基R引发可以进行自由基聚合的单体发生加成聚合反应，而自由基K由于位阻作用在一定程度上阻止大分子自由基的链增长反应。
本发明的优势是可通过调节光敏剂和共引发剂的含量来调节光聚合速率和凝胶时间，进而制得高衍射效率全息光聚合物材料。
具体实施方式
实施例1：
采用0.1wt.％的光敏剂(1∶2的C1和C2，且R1＝R4＝N(C2H5)2，R2＝R3＝H)、1wt.％的共引发剂(1∶2∶3的N，N，N-三乙胺、N-甲基马来酰亚胺和3-溴苯基甘氨酸)组成可见光光引发体系(光敏剂与共引发剂质量比为1∶10)，将其加入到由70wt.％的单体(1∶3∶1的甲基丙烯酸甲酯、甲基丙烯酰胺和N-乙烯基吡咯烷酮)和30wt.％的聚乙烯醇粘结剂混合体系中，超声混合形成均匀混合乳液，制成厚度为20μm的薄膜，置于441.6nm激光干涉场中全息曝光，曝光强度为50mW/cm2，曝光时间为30s，制得光栅间距为1微米的全息光聚合物材料，其衍射效率为29％。
实施实例2：
采用1wt.％的光敏剂(2∶3的C2和C4)(且R1＝C8H17，R2＝噻唑基，R3＝OH)、0.1wt.％的共引发剂(2∶2∶1的N-乙基马来酰亚胺、N-苯基甘氨酸和2，4，6-三(三氯甲基)-1，3，5-三嗪)组成可见光光引发体系(光敏剂与共引发剂质量比为10∶1)，将其加入到由70wt.％的单体(1∶2：1的丙烯酸丁酯、2-丙烯酸异辛酯和N-异丙基丙烯酰胺)和30wt.％的聚乙烯醇粘结剂混合体系中，超声混合形成均匀混合乳液，制成厚度为20μm的薄膜，置于441.6nm激光干涉场中全息曝光，曝光强度为50mW/cm2，曝光时间为30s，制得光栅间距为1微米的全息光聚合物材料，其衍射效率为90％。
实施例3：
采用10wt.％的光敏剂C3(且R1＝C8H17O，R2＝NH2，R3＝噻吩基)、0.5wt.％的共引发剂(2∶1∶1的三乙醇胺、乙酰苯基甘氨酸和3-腈基苯基甘氨酸)组成可见光光引发体系(光敏剂与共引发剂质量比为20∶1)，将其加入到由60wt.％的单体(1∶1∶4的二甲基丙烯酸乙酯、三羟甲基丙烷三甲基丙烯酸和乙烯基咔唑等)和29.5wt.％的聚乙烯醇粘结剂混合体系中，超声混合形成均匀混合乳液，制成厚度为20μm的薄膜，置于441.6nm激光干涉场中全息曝光，曝光强度为50mW/cm2，曝光时间为30s，制得光栅间距为1微米的全息光聚合物材料，其衍射效率为80％。
实施实例4：
采用0.5wt.％的光敏剂C4(且R1＝N(C8H17)2，R2＝NO2，R3＝H)、10wt.％的共引发剂(1∶1∶1的对氯苯基甘氨酸、N-苯基甘氨酸乙酯和2-(4′-甲氧基苯基)-4，6-双(三氯甲基)-1，3，5-三嗪)组成可见光光引发体系(光敏剂与共引发剂质量比为1∶20)，将其加入到由60wt.％的单体(3∶1∶4的N-乙烯基咔唑、季戊四醇四丙烯酸酯和甲叉双丙烯酰胺)和29.5wt.％的聚乙烯醇粘结剂混合体系中，超声混合形成均匀混合乳液，制成厚度为20μm的薄膜，置于441.6nm激光干涉场中全息曝光，曝光强度为50mW/cm2，曝光时间为30s，制得光栅间距为1微米的全息光聚合物材料，其衍射效率为76％。
实施例5：
采用2wt.％的光敏剂(1∶1和C1和C5，且R1＝苯基，R2＝R3＝R5＝H，R4＝CN，R6＝SH)、8wt.％的共引发剂(1∶1∶1的对氯苯基甘氨酸、N-苯基甘氨酸乙酯和2-(4′-甲氧基苯基)-4，6-双(三氯甲基)-1，3，5-三嗪)组成可见光光引发体系(光敏剂与共引发剂质量比为1∶4)，将其加入到由60wt.％的单体(1∶2∶4的丙烯酸丁酯、2-丙烯酸异辛酯和N-乙烯基咔唑)和30wt.％的聚乙烯醇粘结剂混合体系中，超声混合形成均匀混合乳液，制成厚度为20μm的薄膜，置于441.6nm激光干涉场中全息曝光，曝光强度为100mW/cm2，曝光时间为30s，制得光栅间距为1微米的全息光聚合物材料，其衍射效率为89％。
实施例6：
采用0.5wt.％的光敏剂C4(且R1＝N(C8H17)2，R2＝NO2，R3＝H)、10wt.％的共引发剂(N-苯基甘氨酸乙酯)组成可见光光引发体系(光敏剂与共引发剂质量比为1∶20)，将其加入到由60wt.％的单体(3∶1∶4的N-乙烯基咔唑、季戊四醇四丙烯酸酯和甲叉双丙烯酰胺)和29.5wt.％的聚乙烯醇粘结剂混合体系中，超声混合形成均匀混合乳液，制成厚度为20μm的薄膜，置于441.6nm激光干涉场中全息曝光，曝光强度为50mW/cm2，曝光时间为30s，制得光栅间距为1微米的全息光聚合物材料，其衍射效率为86％。

Claims (4)

1.一种制备高衍射效率全息光聚合物材料的可见光光引发体系，其特征是：所述的可见光光引发体系由光敏剂和共引发剂组成。
2.根据权利1所述的可见光光引发体系，其特征是：光敏剂与共引发剂的质量比为20∶1～1∶20。
3.根据权利要求1或2所述的光引发体系，其特征是：所述的光敏剂为C1、C2、C3、C4和C5中的一种或几种，所述的C1、C2、C3、C4和C5分别具有以下结构
Figure FDA0000079601740000011
取代基R1、R2、R3、R4、R5、R6相同或不同，可以共同、分别或独立为-SH、-CN、-NO2、-CnH2n+1(n＝0～8)、-CnH2n+1O(n＝0～8)、N(CnH2n+1)2(n＝0～8)、苯基、噻吩基和噻唑基中的一种。
4.根据权利要求1所述的可见光光引发体系，其特征是：所述的共引发剂为N，N，N-三乙胺、N-甲基马来酰亚胺、N-乙基马来酰亚胺、三乙醇胺、N-苯基甘氨酸、乙酰苯基甘氨酸、对氯苯基甘氨酸、3-溴苯基甘氨酸、3-腈基苯基甘氨酸、N-苯基甘氨酸乙酯、2，4，6-三(三氯甲基)-1，3，5-三嗪和2-(4′-甲氧基苯基)-4，6-双(三氯甲基)-1，3，5-三嗪中的一种或几种。
CN2011102156538A 2011-07-29 2011-07-29 一种制备高衍射效率全息光聚合物材料的可见光光引发体系 Active CN102344504B (zh)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN2011102156538A CN102344504B (zh) 2011-07-29 2011-07-29 一种制备高衍射效率全息光聚合物材料的可见光光引发体系
US14/131,676 US9753431B2 (en) 2011-07-29 2012-05-25 Visible light photoinitiating system for preparing high diffraction efficiency hologram optical polymer material
PCT/CN2012/076050 WO2013016973A1 (zh) 2011-07-29 2012-05-25 一种制备高衍射效率全息光聚合物材料的可见光光引发体系

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2011102156538A CN102344504B (zh) 2011-07-29 2011-07-29 一种制备高衍射效率全息光聚合物材料的可见光光引发体系

Publications (2)

Publication Number Publication Date
CN102344504A true CN102344504A (zh) 2012-02-08
CN102344504B CN102344504B (zh) 2013-03-13

Family

ID=45543606

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2011102156538A Active CN102344504B (zh) 2011-07-29 2011-07-29 一种制备高衍射效率全息光聚合物材料的可见光光引发体系

Country Status (3)

Country Link
US (1) US9753431B2 (zh)
CN (1) CN102344504B (zh)
WO (1) WO2013016973A1 (zh)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107544207A (zh) * 2017-08-30 2018-01-05 华中科技大学 一种基于硫醇烯烃点击反应的全息光聚合物
CN107603642A (zh) * 2017-08-30 2018-01-19 华中科技大学 一种高衍射效率低驱动电压的全息聚合物分散液晶及其制备
CN108931887A (zh) * 2017-05-22 2018-12-04 北京航空航天大学 红敏光致聚合物材料、制备方法及应用
CN110452317A (zh) * 2019-08-20 2019-11-15 华中科技大学 一种用于3d打印的可见光光引发体系及其应用

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109752779B (zh) * 2019-02-02 2022-04-29 北京工业大学 光信息记录介质、光栅结构、其制备方法以及应用
US20210363304A1 (en) * 2019-12-09 2021-11-25 Ares Materials Inc. Optically clear resin composition, flexible optical film and image display device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6806024B1 (en) * 1999-03-03 2004-10-19 Ciba Specialty Chemicals Corporation Oxime derivatives and the use thereof as photoinitiators
CN1634909A (zh) * 2003-12-26 2005-07-06 中国科学院理化技术研究所 以环烷烃酮类连接的3或4位羰基取代的香豆素酮及其合成方法和用途
CN1727366A (zh) * 2005-04-18 2006-02-01 常州华钛化学有限公司 香豆素染料/碘鎓盐复合物作为可见光敏聚合引发体系
CN1878854A (zh) * 2003-11-21 2006-12-13 三星电子株式会社 光聚合组合物和利用其制造的用于制造3d光存储器的光聚合记录介质
US20080305404A1 (en) * 2005-04-08 2008-12-11 Nitto Denko Corporation Hologram Recording Material

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6088005A (ja) * 1983-10-21 1985-05-17 Agency Of Ind Science & Technol 光硬化樹脂組成物
US6025406A (en) * 1997-04-11 2000-02-15 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy resins
US8962709B2 (en) * 2003-10-22 2015-02-24 The Regents Of The University Of Colorado, A Body Corporate Resin systems for dental restorative materials and methods using same
US20100215865A1 (en) * 2009-02-26 2010-08-26 Xerox Corporation Preparation of flexographic printing masters using an additive process
CN102344530B (zh) 2011-06-24 2014-11-05 北京化工大学 一种双组份调节剂合成溶聚丁苯橡胶的方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6806024B1 (en) * 1999-03-03 2004-10-19 Ciba Specialty Chemicals Corporation Oxime derivatives and the use thereof as photoinitiators
CN1878854A (zh) * 2003-11-21 2006-12-13 三星电子株式会社 光聚合组合物和利用其制造的用于制造3d光存储器的光聚合记录介质
CN1634909A (zh) * 2003-12-26 2005-07-06 中国科学院理化技术研究所 以环烷烃酮类连接的3或4位羰基取代的香豆素酮及其合成方法和用途
US20080305404A1 (en) * 2005-04-08 2008-12-11 Nitto Denko Corporation Hologram Recording Material
CN1727366A (zh) * 2005-04-18 2006-02-01 常州华钛化学有限公司 香豆素染料/碘鎓盐复合物作为可见光敏聚合引发体系

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108931887A (zh) * 2017-05-22 2018-12-04 北京航空航天大学 红敏光致聚合物材料、制备方法及应用
CN107544207A (zh) * 2017-08-30 2018-01-05 华中科技大学 一种基于硫醇烯烃点击反应的全息光聚合物
CN107603642A (zh) * 2017-08-30 2018-01-19 华中科技大学 一种高衍射效率低驱动电压的全息聚合物分散液晶及其制备
CN107603642B (zh) * 2017-08-30 2020-05-19 华中科技大学 一种高衍射效率低驱动电压的全息聚合物分散液晶及其制备
CN110452317A (zh) * 2019-08-20 2019-11-15 华中科技大学 一种用于3d打印的可见光光引发体系及其应用

Also Published As

Publication number Publication date
CN102344504B (zh) 2013-03-13
WO2013016973A1 (zh) 2013-02-07
US20140193748A1 (en) 2014-07-10
US9753431B2 (en) 2017-09-05

Similar Documents

Publication Publication Date Title
CN102344504B (zh) 一种制备高衍射效率全息光聚合物材料的可见光光引发体系
JP4893433B2 (ja) 体積型ホログラム記録材料及び体積型ホログラム記録媒体
US6221536B1 (en) Material exhibiting compensation for polymerization-induced shrinkage and recording medium formed therefrom
JP5568704B2 (ja) 光重合および暗反応の制御を備えたホログラフィック記録媒体
Wu et al. High‐Performance and Low Migration One‐Component Thioxanthone Visible Light Photoinitiators
Liu et al. High intensity response of photopolymer materials for holographic grating formation
JP2008511702A (ja) 薄膜形成物質及びこの物質で形成された薄膜を照射することによる表面レリーフの形成と光学的異方性構造の形成
Tomita et al. Very high contrast volume holographic gratings recorded in photopolymerizable nanocomposite materials
WO2008122226A1 (fr) Membrane sensible pour réfléchir un enregistrement d'hologramme et son procédé de préparation
Ortuno et al. Improving the performance of PVA/AA photopolymers for holographic recording
JP2014026116A (ja) 体積型ホログラム記録用感光性樹脂組成物、体積型ホログラム記録用感光性基板、及び、体積型ホログラム記録体。
CN107544207B (zh) 一种基于硫醇烯烃点击反应的全息光聚合物
Sarker et al. Synthesis of polymeric photoinitiators containing pendent chromophore− borate ion pairs: photochemistry and photopolymerization activities
US8404402B2 (en) Photopolymerisable system for hologram formation
Kahveci et al. Photoinitiated cationic polymerization of vinyl ethers using substituted vinyl halides in the presence of metallic zinc
JP4257295B2 (ja) 光屈折率変調重合体組成物、ホログラム記録材料および屈折率制御方法
Liu et al. Enhancement of holographic performance and stability of photopolymer materials by introducing epoxy resin and dyes
Keskin et al. 2-Mercaptothioxanthone as sensitizer and coinitiator for acylphosphine oxide photoinitiators for free radical polymerization
Barichard et al. Physico-chemical role of CdSe/ZnS quantum dots in the photo-polymerization process of acrylate composite materials
Jeong et al. Photopolymeric multifunctional dendrimer toward holographic applications
Hamri et al. Erythrosine/triethanolamine system to elaborate crosslinked poly (2‐hydroxyethylmethacrylate): UV‐photopolymerization and swelling studies
Macarie et al. The influence of temperature and photoinitiator concentration on photoinitiated polymerization of diacrylate monomer
CN110452317B (zh) 一种用于3d打印的可见光光引发体系及其应用
CN108931887B (zh) 红敏光致聚合物材料、制备方法及应用
JP2009222765A (ja) 光記録媒体、光記録方法、および光情報記録再生装置

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant