WO2013016973A1 - 一种制备高衍射效率全息光聚合物材料的可见光光引发体系 - Google Patents
一种制备高衍射效率全息光聚合物材料的可见光光引发体系 Download PDFInfo
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- WO2013016973A1 WO2013016973A1 PCT/CN2012/076050 CN2012076050W WO2013016973A1 WO 2013016973 A1 WO2013016973 A1 WO 2013016973A1 CN 2012076050 W CN2012076050 W CN 2012076050W WO 2013016973 A1 WO2013016973 A1 WO 2013016973A1
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- Prior art keywords
- visible light
- diffraction efficiency
- photosensitizer
- photoinitiating system
- high diffraction
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title abstract 3
- 239000002861 polymer material Substances 0.000 title abstract 3
- 239000003504 photosensitizing agent Substances 0.000 claims abstract description 16
- 239000000463 material Substances 0.000 claims description 20
- 239000003999 initiator Substances 0.000 claims description 19
- -1 Ν-phenylglycine Chemical compound 0.000 claims description 8
- OXCSUXIQYMOULR-UHFFFAOYSA-N 2-(3-bromoanilino)acetic acid Chemical compound OC(=O)CNC1=CC=CC(Br)=C1 OXCSUXIQYMOULR-UHFFFAOYSA-N 0.000 claims description 3
- FWALJUXKWWBNEO-UHFFFAOYSA-N 2-(4-chloroanilino)acetic acid Chemical compound OC(=O)CNC1=CC=C(Cl)C=C1 FWALJUXKWWBNEO-UHFFFAOYSA-N 0.000 claims description 3
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- DXUMYHZTYVPBEZ-UHFFFAOYSA-N 2,4,6-tris(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 DXUMYHZTYVPBEZ-UHFFFAOYSA-N 0.000 claims description 2
- VKDFZMMOLPIWQQ-UHFFFAOYSA-N 2-acetamido-2-phenylacetic acid Chemical compound CC(=O)NC(C(O)=O)C1=CC=CC=C1 VKDFZMMOLPIWQQ-UHFFFAOYSA-N 0.000 claims description 2
- WTSAZHHRVUKVMP-UHFFFAOYSA-N C(C)N(CC)CC.[Ir] Chemical compound C(C)N(CC)CC.[Ir] WTSAZHHRVUKVMP-UHFFFAOYSA-N 0.000 claims description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical group [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052762 osmium Inorganic materials 0.000 claims description 2
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims description 2
- 229910052707 ruthenium Inorganic materials 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- ANCBHJKEYPZCTE-UHFFFAOYSA-N ethyl 5-carbamoyl-4-methyl-2-[(2,3,4,5,6-pentafluorobenzoyl)amino]thiophene-3-carboxylate Chemical compound CC1=C(C(N)=O)SC(NC(=O)C=2C(=C(F)C(F)=C(F)C=2F)F)=C1C(=O)OCC ANCBHJKEYPZCTE-UHFFFAOYSA-N 0.000 claims 1
- 150000003949 imides Chemical class 0.000 claims 1
- 239000000178 monomer Substances 0.000 abstract description 12
- 150000003254 radicals Chemical class 0.000 abstract description 12
- 238000012644 addition polymerization Methods 0.000 abstract description 3
- 238000005191 phase separation Methods 0.000 abstract description 3
- 125000003118 aryl group Chemical group 0.000 abstract description 2
- 230000000694 effects Effects 0.000 abstract description 2
- 230000005281 excited state Effects 0.000 abstract description 2
- 230000005283 ground state Effects 0.000 abstract description 2
- 229920000642 polymer Polymers 0.000 abstract description 2
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 230000001934 delay Effects 0.000 abstract 1
- 239000011230 binding agent Substances 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 239000000839 emulsion Substances 0.000 description 6
- 239000004372 Polyvinyl alcohol Substances 0.000 description 5
- 229920002451 polyvinyl alcohol Polymers 0.000 description 5
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 4
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 3
- QRHHZFRCJDAUNA-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 QRHHZFRCJDAUNA-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- MLSGRWDEDYJNER-UHFFFAOYSA-N ethyl 2-anilinoacetate Chemical compound CCOC(=O)CNC1=CC=CC=C1 MLSGRWDEDYJNER-UHFFFAOYSA-N 0.000 description 3
- DXPPIEDUBFUSEZ-UHFFFAOYSA-N 6-methylheptyl prop-2-enoate Chemical compound CC(C)CCCCCOC(=O)C=C DXPPIEDUBFUSEZ-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 2
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 125000000335 thiazolyl group Chemical group 0.000 description 2
- 125000001544 thienyl group Chemical group 0.000 description 2
- FIDRAVVQGKNYQK-UHFFFAOYSA-N 1,2,3,4-tetrahydrotriazine Chemical compound C1NNNC=C1 FIDRAVVQGKNYQK-UHFFFAOYSA-N 0.000 description 1
- OXBLVCZKDOZZOJ-UHFFFAOYSA-N 2,3-Dihydrothiophene Chemical compound C1CC=CS1 OXBLVCZKDOZZOJ-UHFFFAOYSA-N 0.000 description 1
- NTBJLOYULOHXEK-UHFFFAOYSA-N 2-(chloroamino)-2-phenylacetic acid Chemical compound OC(=O)C(NCl)C1=CC=CC=C1 NTBJLOYULOHXEK-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- STHWVYJPPPDLSL-UHFFFAOYSA-N CC(C)CCCC(C)OC(=O)C=C Chemical compound CC(C)CCCC(C)OC(=O)C=C STHWVYJPPPDLSL-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- GHAZCVNUKKZTLG-UHFFFAOYSA-N N-ethyl-succinimide Natural products CCN1C(=O)CCC1=O GHAZCVNUKKZTLG-UHFFFAOYSA-N 0.000 description 1
- HDFGOPSGAURCEO-UHFFFAOYSA-N N-ethylmaleimide Chemical compound CCN1C(=O)C=CC1=O HDFGOPSGAURCEO-UHFFFAOYSA-N 0.000 description 1
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 238000012650 click reaction Methods 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 238000001093 holography Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- CTJBEGUOBOCOSW-UHFFFAOYSA-N n,n-diethylethanamine;hydrazine Chemical compound NN.CCN(CC)CC CTJBEGUOBOCOSW-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 description 1
- QNILTEGFHQSKFF-UHFFFAOYSA-N n-propan-2-ylprop-2-enamide Chemical compound CC(C)NC(=O)C=C QNILTEGFHQSKFF-UHFFFAOYSA-N 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/18—Particular processing of hologram record carriers, e.g. for obtaining blazed holograms
- G03H1/181—Pre-exposure processing, e.g. hypersensitisation
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/2403—Layers; Shape, structure or physical properties thereof
- G11B7/24035—Recording layers
- G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions, e.g. volume storage
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer
Definitions
- the present invention is in the field of functional materials and relates to a visible light photoinitiating system for preparing high refractive efficiency holographic photopolymer materials.
- Holographic photopolymer material is a recording medium that uses laser holography to store holographic information. It has high diffraction efficiency and environmental stability, usually by photoinitiating system, polymerizable monomer, binder, plasticizer and Other functional components (including but not limited to liquid crystals, Si0 2 , Ti0 2 , POSS, and carbon nanotubes) constitute the precursor and are then produced by coherent irradiation of two or more lasers.
- the gelation process of the polymer network competes with the diffusion process of monomers and other functional components. Only when the diffusion rate is greater than the gel rate, the phase separation can be improved.
- a holographic photopolymer material of diffraction efficiency is a recording medium that uses laser holography to store holographic information. It has high diffraction efficiency and environmental stability, usually by photoinitiating system, polymerizable monomer, binder, plasticizer and Other functional components (including but not limited to liquid crystals, Si0 2 , Ti0 2 , POSS, and carbon nano
- Natarajan et al. used a gel reaction time of a thiol-ene click reaction regulation system (Chem. Mater. 2003, 15(12): 2477-2484; Macromolecules 2007, 40 (4): 1121-1127.), but the "reversible covalent bond" formed after the reaction of the thiol-olefin reacts under the stress and non-uniform illumination through the RAFT process, causing the material to undergo macroscopic deformation (Adv. Mater. 2011). , 23(17): 1977-1981.), which affects the stability of holographic gratings and limits the application of holographic photopolymer materials. Scott et al.
- An object of the present invention is to provide a visible light emitting system for preparing a high diffraction efficiency holographic photopolymer material.
- the visible light photoinitiating system for preparing a high diffraction efficiency holographic photopolymer material provided by the present invention is composed of a photosensitive agent and a co-initiator.
- the photoinitiator system of the present invention is characterized in that: the mass ratio of the photosensitizer to the co-initiator is
- the photosensitizer of the present invention is one or more of Cl, C2, C3, C4 and C5, and Cl, C2
- the co-initiator of the present invention is ruthenium, osmium, iridium-triethylamine, oxime-methylmaleimide, oxime-ethylmaleimide, triethanolamine, guanidine-phenylglycine, acetophenone Glycine, p-chlorophenylglycine, 3-bromophenylglycine, 3-nitrilephenylglycine, ⁇ -phenylglycine ethyl ester, 2,4,6-tris(trichloromethyl)-1,3, One or more of 5-triazine and 2-(4'-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine.
- the visible light photoinitiation system of the present invention can be used to initiate acrylates (e.g., methyl methacrylate, butyl acrylate, isooctyl acrylate, ethyl dimethacrylate, trimethylol propyl methacrylate) And pentaerythritol tetraacrylate, etc.), acrylamide (eg, methacrylamide, hydrazine-isopropylacrylamide, methylidene bisacrylamide, etc.), fluorene-vinyl monomer (eg, ⁇ -vinylpyrrole Ketones, oxime-vinylcarbazoles, and the like, and other monomers capable of undergoing free radical polymerization are suitable for preparing holographic photopolymer materials.
- acrylates e.g., methyl methacrylate, butyl acrylate, isooctyl acrylate, ethyl dimethacrylate, trimethylol propyl
- the principle of the present invention is that the photosensitizer absorbs photons and changes from a ground state to an excited state, and then undergoes electron and proton transfer with a co-initiator to form a sulfhydryl (or aryl) radical R and a carbonyl radical ⁇ ;
- the radical R initiates an addition polymerization reaction of a monomer capable of undergoing radical polymerization, and the radical enthalpy prevents the chain growth reaction of the macromolecular radical to a certain extent due to steric hindrance.
- An advantage of the present invention is that the photopolymerization rate and gel time can be adjusted by adjusting the content of the photosensitizer and the co-initiator, thereby producing a high diffraction efficiency holographic photopolymer material.
- 1 wt.% of co-priming Agent (1:2:3 of hydrazine, hydrazine, hydrazine-triethylamine, N-methylmaleimide and 3-bromophenylglycine) constitutes a visible light photoinitiator system (mass agent to co-initiator mass ratio is 1 : 10 ) , added to 70 wt.% of monomer (1:3:1 methyl methacrylate, methacrylamide and N-vinylpyrrolidone) and 30 wt.% of polyethylene
- the alcohol binder mixing system ultrasonically mixed to form a uniform mixed emulsion, and a film with a thickness of 20 ⁇ m was formed and placed in a 441.6 nm laser interference field for holographic exposure with an exposure intensity of 50
- the holographic exposure the exposure intensity was 50 mW/cm 2 , and the exposure time was 30 s, and a holographic photopolymer material having a grating pitch of 1 ⁇ m was obtained, and the diffraction efficiency was 76%.
- Example 5
- Co-initiator (1:1:1 p-chlorophenylglycine, N-phenylglycine ethyl ester and 2-(4'-methoxyphenyl)-4,6-bis(trichloromethyl)- 1,3,5-triazine) constitutes a visible light photoinitiation system (mass agent to co-initiator mass ratio of 1:4), which is added to 60 wt.% of monomer (1:2:4 butyl acrylate) , 2-isooctyl acrylate and N-vinylcarbazole) and 30 wt.% polyvinyl alcohol binder mixed system, ultrasonically mixed to form a homogeneous mixed emulsion, and a film with a thickness of 20 ⁇ m was placed.
- the holographic exposure in the 441.6 nm laser interference field was 100 mW/cm 2 and the exposure time was 30 s.
- the holographic photopolymer material with a grating pitch of 1 ⁇ m was obtained, and the diffraction efficiency was 89%.
Abstract
本发明提供了一种制备高衍射效率全息光聚合物的可见光光引发体系。本发明涉及的光引发体系由光敏剂和共引发剂组成,其原理是光敏剂吸收光子后由基态变为激发态,再与共引发剂作用发生电子和质子转移,生成一个垸基(或芳基)自由基R和一个羰自由基K;其中,自由基R引发可以进行自由基聚合的单体发生加成聚合反应,而自由基K由于位阻作用在一定程度上阻止大分子自由基的链增长反应,从而延迟光聚合反应的凝胶时间,有助于提高聚合物与功能组分之间的相分离。采用该可见光光引发体系,可制得高衍射效率全息光聚合物材料。
Description
一种制备髙衍射效率全息光聚合物材料的可见光光引发体系 【技术领域】
本发明属功能材料领域, 涉及制备高衍射效率全息光聚合物材料的可见光光 引发体系。
【背景技术】
全息光聚合物材料是采用激光全息技术存储全息信息的一种记录介质, 其具 有较高的衍射效率和环境稳定性, 通常由光引发体系、 可聚合单体、 粘结剂、 增塑剂及其他功能组分 (涵盖但不局限于液晶、 Si02、 Ti02、 POSS和碳纳米管 等) 构成前躯体, 然后在两束或两束以上激光的相干辐照下制得。 在全息光聚 合物材料的制备材料中, 聚合物网络的凝胶过程与单体及其他功能组分的扩散 过程存在竞争, 只有当扩散速率大于凝胶速率时, 才能完善相分离, 制得高衍 射效率的全息光聚合物材料。为解决聚合反应的凝胶问题, Natarajan等采用硫醇 -烯烃 (thiol-ene)的 click反应调控体系的凝胶时间(Chem. Mater. 2003, 15(12): 2477-2484; Macromolecules 2007, 40(4): 1121-1127.), 但是硫醇-烯烃反应后形成 的 "可逆共价键"在应力和非均匀光照下会经过 RAFT过程进行重组, 促使材料 发生宏观形变 (Adv. Mater. 2011, 23(17): 1977-1981.), 从而影响了全息光栅的稳 定性, 限制了全息光聚合物材料的应用。 Scott等发现紫外光产生的自由基可以 阻聚可见光引发的加成聚合反应, 并采用 364nm激光产生的自由基来降低由 473nm激光引发的光聚合反应活性, 有效地延迟了体系聚合反应的凝胶时间 (Science 2009, 324(5929): 913-917.),但该方法需要采用两种不同波长的激光,增 加了设备成本。 基于以上问题, 我们发明了一种通过延迟光聚合反应凝胶时间
来提高全息光聚合物材料相分离程度的光引发体系, 其在单一激光下同时产生 引发、 阻聚光聚合反应的两种不同自由基, 实现了光聚合反应凝胶时间的连续 可调, 制得了高衍射效率的全息光聚合物材料。
【发明内容】
本发明的任务是提供一种制备高衍射效率全息光聚合物材料的可见光光引 发体系。
实现本发明的技术方案是:
本发明提供的制备高衍射效率全息光聚合物材料的可见光光引发体系由光 敏剂及共引发剂组成。
(C4) (C5 )
其中, 取代基 、 R2、 R3、 、 R5、 R6可以相同或不同, 可以共同、 分别或独 立为 -SH、 -CN、 -N02、 -CnH2n+1(n=0~8)、 -CnH2n+1O(n=0~8)、 N(CnH2n+1)2(n=0~8)、 苯基、 噻吩基和噻唑基中的一种。
本发明所述的共引发剂为 Ν,Ν,Ν-三乙胺、 Ν-甲基马来酰亚胺、 Ν-乙基马来 酰亚胺、 三乙醇胺、 Ν-苯基甘氨酸、 乙酰苯基甘氨酸、 对氯苯基甘氨酸、 3-溴苯 基甘氨酸、 3-腈基苯基甘氨酸、 Ν-苯基甘氨酸乙酯、 2,4,6-三 (三氯甲基) -1 ,3,5-三 嗪和 2-(4'-甲氧基苯基) -4,6-双 (三氯甲基) - 1,3,5-三嗪中的一种或几种。 本发明的可见光光引发体系可用于引发丙烯酸酯 (如: 甲基丙烯酸甲酯、 丙 烯酸丁酯、 2-丙烯酸异辛酯、 二甲基丙烯酸乙酯、 三羟甲基丙垸三甲基丙烯酸酯 和季戊四醇四丙烯酸酯等)、 丙烯酰胺 (如: 甲基丙烯酰胺、 Ν-异丙基丙烯酰胺、 甲叉双丙烯酰胺等)、 Ν-乙烯基类单体 (如: Ν-乙烯基吡咯垸酮、 Ν-乙烯基咔唑等) 以及其他能进行自由基聚合反应的单体, 适合制备全息光聚合物材料。 本发明的原理是光敏剂吸收光子后由基态变为激发态, 再与共引发剂作用发 生电子和质子转移, 生成一个垸基 (或芳基) 自由基 R和一个羰自由基 Κ; 其 中, 自由基 R引发可以进行自由基聚合的单体发生加成聚合反应, 而自由基 Κ 由于位阻作用在一定程度上阻止大分子自由基的链增长反应。 本发明的优势是可通过调节光敏剂和共引发剂的含量来调节光聚合速率和 凝胶时间, 进而制得高衍射效率全息光聚合物材料。
【具体实 式】
实施例 1 :
采用 0.1 \¥^%的光敏剂 ( 1 :2的 C1和 C2 , 且 R1=R4=N(C2H5)2, R2=R3=H)、 1 wt.%的共引发剂(1 :2:3的 Ν,Ν,Ν-三乙胺、 N-甲基马来酰亚胺和 3-溴苯基甘氨酸) 组成可见光光引发体系 (光敏剂与共引发剂质量比为 1 : 10 ) , 将其加入到由 70 wt.%的单体(1 :3: 1的甲基丙烯酸甲酯、 甲基丙烯酰胺和 N-乙烯基吡咯垸酮)和 30 wt.%的聚乙烯醇粘结剂混合体系中, 超声混合形成均匀混合乳液, 制成厚度 为 20 μ m 的薄膜, 置于 441.6 nm激光干涉场中全息曝光, 曝光强度为 50 mW/cm2, 曝光时间为 30 s, 制得光栅间距为 1微米的全息光聚合物材料, 其衍
射效率为 29%。
实施实例 2:
采用 1 \¥^%的光敏剂(2:3的 C2和 C4) (且 =( 8 7, R2=噻唑基, R3=OH)、 0.1 wt.%的共引发剂 (2:2:1的 N-乙基马来酰亚胺、 N-苯基甘氨酸和 2,4,6-三 (三 氯甲基 )-1,3,5-三嗪)组成可见光光引发体系(光敏剂与共引发剂质量比为 10:1 ), 将其加入到由 70 wt.%的单体(1:2: 1的丙烯酸丁酯、 2-丙烯酸异辛酯和 N-异丙 基丙烯酰胺)和 30 wt.%的聚乙烯醇粘结剂混合体系中, 超声混合形成均匀混合 乳液, 制成厚度为 20 μ m的薄膜, 置于 441.6 nm激光干涉场中全息曝光, 曝 光强度为 50 mW/cm2, 曝光时间为 30 s, 制得光栅间距为 1微米的全息光聚合 物材料, 其衍射效率为 90%。 实施例 3:
采用 10 \¥^%的光敏剂 C3 (且 =( 8 70, R2=NH2, R3=噻吩基)、 0.5 \¥^%的 共引发剂 (2:1:1的三乙醇胺、 乙酰苯基甘氨酸和 3-腈基苯基甘氨酸) 组成可见 光光引发体系 (光敏剂与共引发剂质量比为 20:1 ) , 将其加入到由 60 wt.%的单 体 (1:1:4的二甲基丙烯酸乙酯、 三羟甲基丙垸三甲基丙烯酸和乙烯基咔唑等) 和 29.5 wt.%的聚乙烯醇粘结剂混合体系中, 超声混合形成均匀混合乳液, 制成 厚度为 20 μ ιη的薄膜, 置于 441.6 nm激光干涉场中全息曝光, 曝光强度为 50 mW/cm2, 曝光时间为 30 s, 制得光栅间距为 1微米的全息光聚合物材料, 其衍 射效率为 80%。 实施实例 4:
采用 0.5 \¥^%的光敏剂 C4 (且 =Ν(( 8Η17)2, R2=N02, R3=H)、 10 wt.%的共 引发剂 (1:1:1 的对氯苯基甘氨酸、 N-苯基甘氨酸乙酯和 2-(4'-甲氧基苯基) -4,6- 双 (三氯甲基) -1,3,5-三嗪) 组成可见光光引发体系 (光敏剂与共引发剂质量比为 1:20) , 将其加入到由 60 wt.%的单体 (3:1:4的 N-乙烯基咔唑、 季戊四醇四丙 烯酸酯和甲叉双丙烯酰胺) 和 29.5 wt.%的聚乙烯醇粘结剂混合体系中, 超声混 合形成均匀混合乳液, 制成厚度为 20 μ m的薄膜, 置于 441.6 nm激光干涉场
中全息曝光, 曝光强度为 50 mW/cm2, 曝光时间为 30 s, 制得光栅间距为 1微 米的全息光聚合物材料, 其衍射效率为 76%。 实施例 5:
采用 2 \¥^%的光敏剂 ( 1:1禾口 C1禾口 C5, 且 苯基, R2=R3=R5=H, R4=CN, R6=SH)、8 wt.%的共引发剂(1:1:1的对氯苯基甘氨酸、 N-苯基甘氨酸乙酯和 2-(4'- 甲氧基苯基) -4,6-双 (三氯甲基) -1,3,5-三嗪)组成可见光光引发体系 (光敏剂与共 引发剂质量比为 1:4) , 将其加入到由 60 wt.%的单体 (1:2:4的丙烯酸丁酯、 2- 丙烯酸异辛酯和 N-乙烯基咔唑)和 30 wt.%的聚乙烯醇粘结剂混合体系中,超声 混合形成均匀混合乳液, 制成厚度为 20 μ m的薄膜, 置于 441.6 nm激光干涉 场中全息曝光, 曝光强度为 100 mW/cm2, 曝光时间为 30 s, 制得光栅间距为 1 微米的全息光聚合物材料, 其衍射效率为 89%。 实施例 6:
采用 0.5 \¥^%的光敏剂 C4 (且 =Ν(( 8Η17)2, R2=N02, R3=H)、 10 wt.%的共 引发剂 (N-苯基甘氨酸乙酯) 组成可见光光引发体系 (光敏剂与共引发剂质量 比为 1:20) , 将其加入到由 60 wt.%的单体 (3:1:4的 N-乙烯基咔唑、 季戊四醇 四丙烯酸酯和甲叉双丙烯酰胺) 和 29.5 wt.%的聚乙烯醇粘结剂混合体系中, 超 声混合形成均匀混合乳液, 制成厚度为 20 μ m的薄膜, 置于 441.6 nm激光干 涉场中全息曝光, 曝光强度为 50 mW/cm2, 曝光时间为 30 s, 制得光栅间距为 1 微米的全息光聚合物材料, 其衍射效率为 86%。
Claims
1、 一种制备高衍射效率全息光聚合物材料的可见光光引发体系, 其特征 是: 所述的可见光光引发体系由光敏剂和共引发剂组成。
2、 根据权利 1所述的可见光光引发体系, 其特征是: 光敏剂与共引发剂 的质量比为 20:1~1:20。
3、 根据权利要求 1或 2所述的光引发体系, 其特征是: 所述的光敏剂为 Cl、 C2、 C3、 C4禾卩 C5中的一禾中或几禾中, 所述的 Cl、 C2、 C3、 C4禾卩 C5分另 lj 具
(C5 ) 取代基 、 R2、 R3、 R4、 R5、 R6相同或不同, 可以共同、分别或独立为 -SH、 -CN、 -N02、 -CnH2n+1(n=0~8)、 -CnH2n+1O(n=0~8)、 N(CnH2n+1)2(n=0~8)、 苯基、 噻
4、 根据权利要求 1 所述的可见光光引发体系, 其特征是: 所述的共引发 剂为 Ν,Ν,Ν-三乙胺、 Ν-甲基马来酰亚胺、 Ν-乙基马来酰亚胺、 三乙醇胺、 Ν-苯 基甘氨酸、 乙酰苯基甘氨酸、 对氯苯基甘氨酸、 3-溴苯基甘氨酸、 3-腈基苯基甘 氨酸、 Ν-苯基甘氨酸乙酯、 2,4,6-三 (三氯甲基) -1,3,5-三嗪和 2-(4'-甲氧基苯基) -4,6- 双 (三氯甲基) -1,3,5-三嗪中的一种或几种。
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