CN102246652A - Corn ditch interchanged planting method - Google Patents
Corn ditch interchanged planting method Download PDFInfo
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- CN102246652A CN102246652A CN 201110156838 CN201110156838A CN102246652A CN 102246652 A CN102246652 A CN 102246652A CN 201110156838 CN201110156838 CN 201110156838 CN 201110156838 A CN201110156838 A CN 201110156838A CN 102246652 A CN102246652 A CN 102246652A
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Abstract
The invention discloses a corn ditch interchanged planting method, and belongs to the technical field of corn cultivation. The method comprises the following steps of: after corn is harvested in autumn, ploughing stubbles and ridging in a corn field; and sowing on a new ridge in the following spring, and intertilling and performing topdressing during the breeding of the corn. By the corn ditch interchanged planting method, soil moisture loss caused by spring drought can be prevented, a plough bottom layer is broken, a plough layer is deepened, the continuous high yield of corn production is ensured, and the efficient and sustainable utilization of resources is realized.
Description
Technical field
The invention belongs to corn tillage and cultivation technical field, be specifically related to a kind of corn ditch platform and exchange kind of a method for planting.
Background technology
In existing tillage and cultivation technology, great majority adopt the ridge planting mode, the ditch platform does not change, the former ridge of stubble-cleaning in spring ridging, the plantation of former ridge, continuous for many years former ridge plantation can not get leisure, seedling band border can not get improving, cause soil physico-chemical property variation, topsoil shallow, the middle and later periods that influences corn grows, and output descends.
The existing methods of cultivation in China region of no relief mainly contain two kinds: the one, and former ridge is turned over, is harrowed the back flat planting and becomes the 60-70cm ridge; Second kind is two to plough into the 60-70cm ridge behind the stubble-cleaning, broadcasts on the ridge, is the plantation of former ridge.The main drawback one of first method is that cargo handling operation is many, cost is high, and two seasons of spring in autumn, soil moisture was scattered and disappeared in a large number, increases the weight of damage caused by a drought wholely; The 2nd, former for many years ridge tillage method, plow layer is shallow, and the following soil of 20cm forms tillage pan, and permeability is relatively poor.Two methods of ploughing into ridge, ridge upper seeding wheel behind the second method stubble-cleaning, the tradition that belongs to after improving is cultivated technology.Its main drawback is plow layer shallow (15-18cm), tillage pan thickening, and the overwhelming majority beats the ridge spring, and the loss of moisture is serious.It is too much that number of times is rolled in the field during mechanical work, and the bulk density of soil increases, and the ability of resisting natural disasters is low, the not high shakiness of output.
Summary of the invention
The purpose of this invention is to provide a kind of corn ditch platform and exchange kind of a method for planting, protect and improve the environment of arable soil, improve the natural precipitation utilization ratio and improve grain yield.
A kind of corn ditch platform exchanges kind of a method for planting, it is characterized in that, carries out according to following steps:
(1) stubble-cleaning and ridging: on the corn field of plantation in 1 year, after the autumn harvest, with corn field stubble-cleaning ridging, the position of former corn trench is changed to the position on ridge behind the ridging with stubble-cleaning ridging combined working machine, and the position on ridge is changed to the position of ditch;
(2) sowing: in 1 year spring, on the ridge, sow with essence amount or half smart amount mode with precision planter;
(3) intertillage is topdressed: topdress intertilling in ditch with cultivator-fertilizer during the maize growth;
(4) repeating step (1)-(3), the production of working continuously.
Described corn field is level land, depression, the level land, hilllock in the Plain, Northeast China or the North China Plain.
The degree of depth of described ridging is 20-40cm.
Beneficial effect of the present invention: exchange plantation by corn ditch platform of the present invention, realized seedling band and intertillage band transposition leisure, the soil utilization combines with protection, realizes the resource high-efficiency sustainable use.Farmland mechanical work link, employing precision drilling by reducing whole ground of spring significantly reduce production costs, and improve output benefit.Become the ridge then autumn with putting in order, new ridge is closed on the broken former ridge of stubble-cleaning after the autumn harvest, accomplishes moisture in the soil autumn in spring guarantor, and do not break ground the spring in 1 year, directly sowing on the new ridge that forms, prevent to accomplish to break ground less the band intertillage because spring drought causes soil moisture to scatter and disappear, intertillage advances to break tillage pan in conjunction with topdressing before the corn jointing, add deep plough level, create the topsoil soils reservoir, improve the natural precipitation utilization ratio.The tillage and cultivation method that new tillage and cultivation method of corn of the present invention and existing stubble-cleaning spring in autumn are beaten ridge or stubble-cleaning spring in spring Da Long ridge upper seeding wheel compares, and new tillage and cultivation method 0-40cm topsoil soils unit weight is at 1.2-1.3g/cm
3, the topsoil structure rationally; The time of infertility, soil moisture content improved 0.8-2.5 percentage point, and survival rate of seedlings improves 11.5%-15.8%, and output improves 5.5%-10.8%.
Description of drawings
Fig. 1 is that corn ditch platform exchanges 1 year maize planting situation schematic diagram of plantation;
Among the figure, the ridge of 1 year maize planting of 1-, 2-plantation in 1 year and your ditch, 3-milpa.
Fig. 2 is that corn ditch platform exchanges 1 year maize planting situation schematic diagram of plantation;
Among the figure, the position on the position of the ditch of the ditch of the ridge of 1 year maize planting of 3-, 1 year maize planting of 4-, 5-milpa, 1 year maize planting of 6-, the ridge of 1 year maize planting of 7-.
Embodiment
The present invention will be further described below in conjunction with the drawings and specific embodiments.
Embodiment 1
On the corn field of level land, Plain plantation, operate northeastward according to following steps:
(1) stubble-cleaning and ridging: on the corn field of plantation in 1 year, after the autumn harvest, with corn field stubble-cleaning ridging, the ridging degree of depth is 20cm with stubble-cleaning ridging combined working machine, and the position of former corn trench is changed to the position on ridge behind the ridging, and the position on ridge is changed to the position of ditch;
(2) sowing: in 1 year spring, on the ridge, sow in essence amount mode with precision planter;
(3) intertillage is topdressed: topdress intertilling in ditch with cultivator-fertilizer during the maize growth;
(4) repeating step (1)-(3), the production of working continuously.
This fact Example implementation process schematic diagram as depicted in figs. 1 and 2.
The farming kind method for planting that present embodiment corn ditch platform exchange kind of method for planting and existing stubble-cleaning spring in autumn are beaten ridge or stubble-cleaning spring in spring Da Long ridge upper seeding wheel compares, and present embodiment corn ditch platform exchanges kind of method for planting topsoil soils unit weight at 1.2g/cm
3, the topsoil structure rationally; The time of infertility, soil moisture content improved 1.5 percentage points, and survival rate of seedlings improves 11.5%, and output improves 5.5%.
Embodiment 2
On the corn field of depression, Plain plantation, operate northeastward according to following steps:
(1) stubble-cleaning and ridging: on the corn field of plantation in 1 year, after the autumn harvest, with corn field stubble-cleaning ridging, the ridging degree of depth is 30cm with stubble-cleaning ridging combined working machine, and the position of former corn trench is changed to the position on ridge behind the ridging, and the position on ridge is changed to the position of ditch;
(2) sowing: in 1 year spring, on the ridge, sow in essence amount mode with precision planter;
(3) intertillage is topdressed: topdress intertilling in ditch with cultivator-fertilizer during the maize growth;
(4) repeating step (1)-(3), the production of working continuously.
This fact Example implementation process schematic diagram as depicted in figs. 1 and 2.
The farming kind method for planting that present embodiment corn ditch platform exchange kind of method for planting and existing stubble-cleaning spring in autumn are beaten ridge or stubble-cleaning spring in spring Da Long ridge upper seeding wheel compares, and present embodiment corn ditch platform exchanges kind of method for planting topsoil soils unit weight at 1.25g/cm
3, the topsoil structure rationally; The time of infertility, soil moisture content improved 2.5 percentage points, and survival rate of seedlings improves 13%, and output improves 9%.
On the corn field of Plain flat hillock plantation, operate northeastward according to following steps:
(1) stubble-cleaning and ridging: on the corn field of plantation in 1 year, after the autumn harvest, with corn field stubble-cleaning ridging, the ridging degree of depth is 40cm with stubble-cleaning ridging combined working machine, and the position of former corn trench is changed to the position on ridge behind the ridging, and the position on ridge is changed to the position of ditch;
(2) sowing: in 1 year spring, on the ridge, sow in essence amount mode with precision planter;
(3) intertillage is topdressed: topdress intertilling in ditch with cultivator-fertilizer during the maize growth;
(4) repeating step (1)-(3), the production of working continuously.
This fact Example implementation process schematic diagram as depicted in figs. 1 and 2.
The farming kind method for planting that present embodiment corn ditch platform exchange kind of method for planting and existing stubble-cleaning spring in autumn are beaten ridge or stubble-cleaning spring in spring Da Long ridge upper seeding wheel compares, and present embodiment corn ditch platform exchanges kind of method for planting topsoil soils unit weight at 1.3g/cm
3, the topsoil structure rationally; The time of infertility, soil moisture content improved 0.8 percentage point, and survival rate of seedlings improves 15.8%, and output improves 10.8%.
Claims (3)
1. a corn ditch platform exchanges kind of a method for planting, it is characterized in that, carries out according to following steps:
(1) stubble-cleaning and ridging: on the corn field of plantation in 1 year, after the autumn harvest, with corn field stubble-cleaning ridging, the position of former corn trench is changed to the position on ridge behind the ridging with stubble-cleaning ridging combined working machine, and the position on ridge is changed to the position of ditch;
(2) sowing: in 1 year spring, on the ridge, sow with essence amount or half smart amount mode with precision planter;
(3) intertillage is topdressed: topdress intertilling in ditch with cultivator-fertilizer during the maize growth;
(4) repeating step (1)-(3), the production of working continuously.
2. exchange kind of a method for planting according to the described a kind of corn ditch platform of claim 1, it is characterized in that described corn field is level land, depression, the level land, hilllock in the Plain, Northeast China or the North China Plain.
3. exchange kind of a method for planting according to the described a kind of corn ditch platform of claim 1, it is characterized in that the degree of depth of described ridging is 20-40cm.
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110972846A (en) * | 2019-12-21 | 2020-04-10 | 吉林省农业科学院 | Corn ditch interchange planting method |
CN113079994A (en) * | 2021-04-12 | 2021-07-09 | 湖北省烟草科学研究院 | Alternate ditching and deep turning ridge planting crop cultivation method |
CN113367035A (en) * | 2021-07-12 | 2021-09-10 | 中国科学院东北地理与农业生态研究所 | Corn furrow mechanized planting method |
CN113711725A (en) * | 2021-09-28 | 2021-11-30 | 中国农业大学 | Method for year-round water accumulation and soil moisture preservation in semiarid windy sand area |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN1647602A (en) * | 2005-01-26 | 2005-08-03 | 吉林省农业科学院 | Method for tilling corn land |
CN101233811A (en) * | 2008-03-07 | 2008-08-06 | 吉林省农业科学院 | Corn stubble-remaining ridge side planting method |
-
2011
- 2011-06-13 CN CN 201110156838 patent/CN102246652A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1647602A (en) * | 2005-01-26 | 2005-08-03 | 吉林省农业科学院 | Method for tilling corn land |
CN101233811A (en) * | 2008-03-07 | 2008-08-06 | 吉林省农业科学院 | Corn stubble-remaining ridge side planting method |
Non-Patent Citations (2)
Title |
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《内蒙古农业科技》 19881231 李馨宇 秋施肥、深松垄作增产效果好 , 第03期 * |
《农机科技推广》 20100825 吉林省农机推广总站 吉林保护性耕作进入全面推广阶段 , 第8期 * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110972846A (en) * | 2019-12-21 | 2020-04-10 | 吉林省农业科学院 | Corn ditch interchange planting method |
CN113079994A (en) * | 2021-04-12 | 2021-07-09 | 湖北省烟草科学研究院 | Alternate ditching and deep turning ridge planting crop cultivation method |
CN113367035A (en) * | 2021-07-12 | 2021-09-10 | 中国科学院东北地理与农业生态研究所 | Corn furrow mechanized planting method |
CN113711725A (en) * | 2021-09-28 | 2021-11-30 | 中国农业大学 | Method for year-round water accumulation and soil moisture preservation in semiarid windy sand area |
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Application publication date: 20111123 |