CN102160962A - 多晶硅生产线尾气回收净化处理装置 - Google Patents
多晶硅生产线尾气回收净化处理装置 Download PDFInfo
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- CN102160962A CN102160962A CN2011100652285A CN201110065228A CN102160962A CN 102160962 A CN102160962 A CN 102160962A CN 2011100652285 A CN2011100652285 A CN 2011100652285A CN 201110065228 A CN201110065228 A CN 201110065228A CN 102160962 A CN102160962 A CN 102160962A
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- Prior art keywords
- hydrochloric acid
- pipeline
- tail gas
- connects
- heat exchanger
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 29
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 332
- 238000011084 recovery Methods 0.000 claims abstract description 79
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 53
- 238000004064 recycling Methods 0.000 claims abstract description 39
- 239000005046 Chlorosilane Substances 0.000 claims abstract description 27
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims abstract description 27
- 230000008676 import Effects 0.000 claims description 44
- 239000000243 solution Substances 0.000 claims description 40
- 238000004140 cleaning Methods 0.000 claims description 39
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 27
- 229920005591 polysilicon Polymers 0.000 claims description 26
- 239000003513 alkali Substances 0.000 claims description 19
- 238000005406 washing Methods 0.000 claims description 16
- 239000002826 coolant Substances 0.000 claims description 11
- 238000007710 freezing Methods 0.000 claims description 7
- 230000008014 freezing Effects 0.000 claims description 7
- 239000012266 salt solution Substances 0.000 claims description 4
- 239000006096 absorbing agent Substances 0.000 claims description 3
- 239000012530 fluid Substances 0.000 claims description 3
- 239000006227 byproduct Substances 0.000 abstract description 2
- 238000000746 purification Methods 0.000 abstract description 2
- 239000006229 carbon black Substances 0.000 abstract 2
- 230000003472 neutralizing effect Effects 0.000 abstract 1
- 235000011167 hydrochloric acid Nutrition 0.000 description 114
- 239000007789 gas Substances 0.000 description 90
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 11
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 11
- 238000000034 method Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 4
- 239000005052 trichlorosilane Substances 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000006386 neutralization reaction Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 235000012241 calcium silicate Nutrition 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000007726 management method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000010865 sewage Substances 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
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- Silicon Compounds (AREA)
Abstract
Description
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN 201110065228 CN102160962B (zh) | 2011-03-14 | 2011-03-14 | 多晶硅生产线尾气回收净化处理装置 |
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CN 201110065228 CN102160962B (zh) | 2011-03-14 | 2011-03-14 | 多晶硅生产线尾气回收净化处理装置 |
Publications (2)
Publication Number | Publication Date |
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CN102160962A true CN102160962A (zh) | 2011-08-24 |
CN102160962B CN102160962B (zh) | 2013-03-20 |
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CN 201110065228 Expired - Fee Related CN102160962B (zh) | 2011-03-14 | 2011-03-14 | 多晶硅生产线尾气回收净化处理装置 |
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CN (1) | CN102160962B (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102992267A (zh) * | 2011-09-10 | 2013-03-27 | 赤峰盛森硅业科技发展有限公司 | 气相二氧化硅生产中HCl的回收工艺及设备 |
CN103803558A (zh) * | 2013-12-20 | 2014-05-21 | 浙江中天氟硅材料有限公司 | 一种利用有机硅含尘尾气水解物制备沉淀法白炭黑的方法 |
CN105129807A (zh) * | 2015-08-03 | 2015-12-09 | 昆明冶研新材料股份有限公司 | 一种利用氯硅烷残液制备超细二氧化硅的方法 |
CN108926982A (zh) * | 2017-05-25 | 2018-12-04 | 新特能源股份有限公司 | 从气相白炭黑生产尾气中分离氯化氢的装置和方法 |
CN111841249A (zh) * | 2019-04-26 | 2020-10-30 | 宁德时代新能源科技股份有限公司 | 尾气净化系统 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101628710A (zh) * | 2009-08-03 | 2010-01-20 | 中国石化集团南京设计院 | 含氯硅烷的氯化氢气体生产高纯度浓盐酸的方法 |
CN101791487A (zh) * | 2010-03-30 | 2010-08-04 | 中国天辰工程有限公司 | 回收多晶硅生产的尾气中氯化氢的方法 |
JP2010184831A (ja) * | 2009-02-12 | 2010-08-26 | Osaka Titanium Technologies Co Ltd | 高純度多結晶シリコン製造方法 |
US20110000257A1 (en) * | 2009-07-02 | 2011-01-06 | American Air Liquide, Inc. | Effluent Gas Recovery System in Polysilicon and Silane Plants |
CN202070281U (zh) * | 2011-03-14 | 2011-12-14 | 蒋超 | 多晶硅生产线尾气回收净化处理装置 |
-
2011
- 2011-03-14 CN CN 201110065228 patent/CN102160962B/zh not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010184831A (ja) * | 2009-02-12 | 2010-08-26 | Osaka Titanium Technologies Co Ltd | 高純度多結晶シリコン製造方法 |
US20110000257A1 (en) * | 2009-07-02 | 2011-01-06 | American Air Liquide, Inc. | Effluent Gas Recovery System in Polysilicon and Silane Plants |
CN101628710A (zh) * | 2009-08-03 | 2010-01-20 | 中国石化集团南京设计院 | 含氯硅烷的氯化氢气体生产高纯度浓盐酸的方法 |
CN101791487A (zh) * | 2010-03-30 | 2010-08-04 | 中国天辰工程有限公司 | 回收多晶硅生产的尾气中氯化氢的方法 |
CN202070281U (zh) * | 2011-03-14 | 2011-12-14 | 蒋超 | 多晶硅生产线尾气回收净化处理装置 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102992267A (zh) * | 2011-09-10 | 2013-03-27 | 赤峰盛森硅业科技发展有限公司 | 气相二氧化硅生产中HCl的回收工艺及设备 |
CN103803558A (zh) * | 2013-12-20 | 2014-05-21 | 浙江中天氟硅材料有限公司 | 一种利用有机硅含尘尾气水解物制备沉淀法白炭黑的方法 |
CN103803558B (zh) * | 2013-12-20 | 2016-03-09 | 浙江中天氟硅材料有限公司 | 一种利用有机硅含尘尾气水解物制备沉淀法白炭黑的方法 |
CN105129807A (zh) * | 2015-08-03 | 2015-12-09 | 昆明冶研新材料股份有限公司 | 一种利用氯硅烷残液制备超细二氧化硅的方法 |
CN105129807B (zh) * | 2015-08-03 | 2017-09-26 | 昆明冶研新材料股份有限公司 | 一种利用氯硅烷残液制备超细二氧化硅的方法 |
CN108926982A (zh) * | 2017-05-25 | 2018-12-04 | 新特能源股份有限公司 | 从气相白炭黑生产尾气中分离氯化氢的装置和方法 |
CN111841249A (zh) * | 2019-04-26 | 2020-10-30 | 宁德时代新能源科技股份有限公司 | 尾气净化系统 |
Also Published As
Publication number | Publication date |
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CN102160962B (zh) | 2013-03-20 |
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