CN102138203B - 结构化磨料制品、其制备方法、及其在晶片平面化中的用途 - Google Patents

结构化磨料制品、其制备方法、及其在晶片平面化中的用途 Download PDF

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Publication number
CN102138203B
CN102138203B CN200980134338.3A CN200980134338A CN102138203B CN 102138203 B CN102138203 B CN 102138203B CN 200980134338 A CN200980134338 A CN 200980134338A CN 102138203 B CN102138203 B CN 102138203B
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CN
China
Prior art keywords
abrasive
meth
acrylate
structured
translucent film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN200980134338.3A
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English (en)
Chinese (zh)
Other versions
CN102138203A (zh
Inventor
威廉·D·约瑟夫
朱莉·Y·乾
小吉米·R·巴兰
约翰·J·加格里亚蒂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of CN102138203A publication Critical patent/CN102138203A/zh
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Expired - Fee Related legal-status Critical Current
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Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00Grinding, lapping or polishing of wafers, substrates or parts of devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/24Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B24B37/245Pads with fixed abrasives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/205Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
CN200980134338.3A 2008-08-28 2009-07-30 结构化磨料制品、其制备方法、及其在晶片平面化中的用途 Expired - Fee Related CN102138203B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US9252108P 2008-08-28 2008-08-28
US61/092,521 2008-08-28
PCT/US2009/052188 WO2010025003A2 (en) 2008-08-28 2009-07-30 Structured abrasive article, method of making the same, and use in wafer planarization

Publications (2)

Publication Number Publication Date
CN102138203A CN102138203A (zh) 2011-07-27
CN102138203B true CN102138203B (zh) 2015-02-04

Family

ID=41722203

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200980134338.3A Expired - Fee Related CN102138203B (zh) 2008-08-28 2009-07-30 结构化磨料制品、其制备方法、及其在晶片平面化中的用途

Country Status (7)

Country Link
US (1) US8251774B2 (enExample)
EP (1) EP2327088B1 (enExample)
JP (1) JP5351967B2 (enExample)
KR (1) KR101602001B1 (enExample)
CN (1) CN102138203B (enExample)
TW (1) TWI429735B (enExample)
WO (1) WO2010025003A2 (enExample)

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Also Published As

Publication number Publication date
WO2010025003A3 (en) 2010-04-22
JP2012501252A (ja) 2012-01-19
US8251774B2 (en) 2012-08-28
US20100056024A1 (en) 2010-03-04
KR20110055686A (ko) 2011-05-25
EP2327088B1 (en) 2019-01-09
TWI429735B (zh) 2014-03-11
TW201012908A (en) 2010-04-01
EP2327088A4 (en) 2017-06-14
EP2327088A2 (en) 2011-06-01
JP5351967B2 (ja) 2013-11-27
KR101602001B1 (ko) 2016-03-17
WO2010025003A2 (en) 2010-03-04
CN102138203A (zh) 2011-07-27

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