TWI429735B - 結構化研磨物件、其製造方法及於晶圓平坦化中之用途 - Google Patents

結構化研磨物件、其製造方法及於晶圓平坦化中之用途 Download PDF

Info

Publication number
TWI429735B
TWI429735B TW098126988A TW98126988A TWI429735B TW I429735 B TWI429735 B TW I429735B TW 098126988 A TW098126988 A TW 098126988A TW 98126988 A TW98126988 A TW 98126988A TW I429735 B TWI429735 B TW I429735B
Authority
TW
Taiwan
Prior art keywords
abrasive
acrylate
meth
abrasive article
structured
Prior art date
Application number
TW098126988A
Other languages
English (en)
Chinese (zh)
Other versions
TW201012908A (en
Inventor
威廉 戴爾 喬瑟夫
吉米 瑞 二世 拜倫
茱莉 優 奎恩
約翰 詹姆士 蓋葛莉亞迪
Original Assignee
3M新設資產公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M新設資產公司 filed Critical 3M新設資產公司
Publication of TW201012908A publication Critical patent/TW201012908A/zh
Application granted granted Critical
Publication of TWI429735B publication Critical patent/TWI429735B/zh

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00Grinding, lapping or polishing of wafers, substrates or parts of devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/24Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B24B37/245Pads with fixed abrasives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/205Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
TW098126988A 2008-08-28 2009-08-11 結構化研磨物件、其製造方法及於晶圓平坦化中之用途 TWI429735B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US9252108P 2008-08-28 2008-08-28

Publications (2)

Publication Number Publication Date
TW201012908A TW201012908A (en) 2010-04-01
TWI429735B true TWI429735B (zh) 2014-03-11

Family

ID=41722203

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098126988A TWI429735B (zh) 2008-08-28 2009-08-11 結構化研磨物件、其製造方法及於晶圓平坦化中之用途

Country Status (7)

Country Link
US (1) US8251774B2 (enExample)
EP (1) EP2327088B1 (enExample)
JP (1) JP5351967B2 (enExample)
KR (1) KR101602001B1 (enExample)
CN (1) CN102138203B (enExample)
TW (1) TWI429735B (enExample)
WO (1) WO2010025003A2 (enExample)

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9073179B2 (en) 2010-11-01 2015-07-07 3M Innovative Properties Company Laser method for making shaped ceramic abrasive particles, shaped ceramic abrasive particles, and abrasive articles
WO2013003830A2 (en) 2011-06-30 2013-01-03 Saint-Gobain Ceramics & Plastics, Inc. Abrasive articles including abrasive particles of silicon nitride
US9517546B2 (en) 2011-09-26 2016-12-13 Saint-Gobain Ceramics & Plastics, Inc. Abrasive articles including abrasive particulate materials, coated abrasives using the abrasive particulate materials and methods of forming
CN102492233A (zh) * 2011-12-05 2012-06-13 张莉娟 复合磨粒、其制备方法及用途
PL2797716T3 (pl) 2011-12-30 2021-07-05 Saint-Gobain Ceramics & Plastics, Inc. Kompozytowe ukształtowane cząstki ścierne i sposób ich formowania
KR102074138B1 (ko) 2011-12-30 2020-02-07 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 형상화 연마입자 및 이의 형성방법
US8840696B2 (en) 2012-01-10 2014-09-23 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particles having particular shapes and methods of forming such particles
EP2802436B1 (en) 2012-01-10 2019-09-25 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particles having complex shapes
CN102604543B (zh) * 2012-04-11 2014-02-19 宣城晶瑞新材料有限公司 一种抛光液用高稳定纳米二氧化铈水性浆料制备方法
KR101813466B1 (ko) 2012-05-23 2017-12-29 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 형상화 연마입자들 및 이의 형성방법
WO2014005120A1 (en) 2012-06-29 2014-01-03 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particles having particular shapes and methods of forming such particles
CN104822495A (zh) * 2012-09-21 2015-08-05 3M创新有限公司 向固定磨料幅材中引入添加剂以改善cmp性能
EP2906392B1 (en) 2012-10-15 2025-04-16 Saint-Gobain Abrasives, Inc. Abrasive particles having particular shapes and methods of forming such particles
CN104994995B (zh) 2012-12-31 2018-12-14 圣戈本陶瓷及塑料股份有限公司 颗粒材料及其形成方法
WO2014161001A1 (en) 2013-03-29 2014-10-02 Saint-Gobain Abrasives, Inc. Abrasive particles having particular shapes and methods of forming such particles
WO2014197551A2 (en) 2013-06-07 2014-12-11 3M Innovative Properties Company Method of forming a recess in a substrate, abrasive wheel, and cover
TW201502263A (zh) 2013-06-28 2015-01-16 Saint Gobain Ceramics 包含成形研磨粒子之研磨物品
CN111978921A (zh) 2013-09-30 2020-11-24 圣戈本陶瓷及塑料股份有限公司 成形磨粒及其形成方法
USD742196S1 (en) * 2013-12-16 2015-11-03 3M Innovative Properties Company Sanding article with pattern
USD742195S1 (en) * 2013-12-16 2015-11-03 3M Innovation Properties Company Sanding article with pattern
KR102081045B1 (ko) 2013-12-31 2020-02-26 생-고뱅 어브레이시브즈, 인코포레이티드 형상화 연마 입자들을 포함하는 연마 물품
US9771507B2 (en) 2014-01-31 2017-09-26 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particle including dopant material and method of forming same
AU2015247739B2 (en) 2014-04-14 2017-10-26 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
AU2015247826A1 (en) 2014-04-14 2016-11-10 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
MX2016003928A (es) * 2014-05-01 2016-06-17 3M Innovative Properties Co Articulo abrasivo flexible y metodo de uso de este.
WO2015184355A1 (en) 2014-05-30 2015-12-03 Saint-Gobain Abrasives, Inc. Method of using an abrasive article including shaped abrasive particles
JP6718868B2 (ja) * 2014-10-21 2020-07-08 スリーエム イノベイティブ プロパティズ カンパニー 研磨プリフォーム、研磨物品を製造する方法、及び結合研磨物品
US9707529B2 (en) 2014-12-23 2017-07-18 Saint-Gobain Ceramics & Plastics, Inc. Composite shaped abrasive particles and method of forming same
US9914864B2 (en) 2014-12-23 2018-03-13 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particles and method of forming same
US9676981B2 (en) 2014-12-24 2017-06-13 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particle fractions and method of forming same
US10196551B2 (en) 2015-03-31 2019-02-05 Saint-Gobain Abrasives, Inc. Fixed abrasive articles and methods of forming same
TWI634200B (zh) 2015-03-31 2018-09-01 聖高拜磨料有限公司 固定磨料物品及其形成方法
EP3307483B1 (en) 2015-06-11 2020-06-17 Saint-Gobain Ceramics&Plastics, Inc. Abrasive article including shaped abrasive particles
KR102313436B1 (ko) 2016-05-10 2021-10-19 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 연마 입자들 및 그 형성 방법
EP4071224A3 (en) 2016-05-10 2023-01-04 Saint-Gobain Ceramics and Plastics, Inc. Methods of forming abrasive articles
CN109475998B (zh) 2016-07-20 2021-12-31 3M创新有限公司 成形玻璃化磨料团聚物、磨料制品和研磨方法
EP4349896A3 (en) 2016-09-29 2024-06-12 Saint-Gobain Abrasives, Inc. Fixed abrasive articles and methods of forming same
WO2018081246A1 (en) 2016-10-25 2018-05-03 3M Innovative Properties Company Shaped vitrified abrasive agglomerate with shaped abrasive particles, abrasive articles, and related methods
KR20180072243A (ko) * 2016-12-21 2018-06-29 엠.씨.케이 (주) 연마체 수지 조성물 및 이에 의해 제조된 패드
US10759024B2 (en) 2017-01-31 2020-09-01 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
US10563105B2 (en) 2017-01-31 2020-02-18 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
CN110719946B (zh) 2017-06-21 2022-07-15 圣戈本陶瓷及塑料股份有限公司 颗粒材料及其形成方法
CN112055737B (zh) 2018-03-01 2022-04-12 3M创新有限公司 具有成型磨料颗粒的成型硅质磨料团聚物、磨料制品及相关方法
US11926019B2 (en) 2019-12-27 2024-03-12 Saint-Gobain Ceramics & Plastics, Inc. Abrasive articles and methods of forming same
WO2021133876A1 (en) 2019-12-27 2021-07-01 Saint-Gobain Ceramics & Plastics, Inc. Abrasive articles and methods of forming same
EP4081370A4 (en) 2019-12-27 2024-04-24 Saint-Gobain Ceramics & Plastics Inc. ABRASIVE ARTICLES AND THEIR FORMATION PROCESSES
MX2024007593A (es) 2021-12-30 2024-08-20 Saint Gobain Abrasives Inc Artículos abrasivos y métodos de formación de los mismos.
EP4457054A4 (en) 2021-12-30 2026-01-14 Saint Gobain Abrasives Inc ABRASIVE ARTICLES AND THEIR FORMATION PROCESSES
CN118591436A (zh) 2021-12-30 2024-09-03 圣戈班磨料磨具有限公司 磨料制品及其形成方法
JPWO2024034618A1 (enExample) * 2022-08-09 2024-02-15

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2868772B2 (ja) * 1988-09-20 1999-03-10 大日本印刷株式会社 研磨テープの製造方法
US5152917B1 (en) 1991-02-06 1998-01-13 Minnesota Mining & Mfg Structured abrasive article
DE69419764T2 (de) * 1993-09-13 1999-12-23 Minnesota Mining And Mfg. Co., St. Paul Schleifartikel, verfahren zur herstellung desselben, verfahren zur verwendung desselben zum endbearbeiten, und herstellungswerkzeug
JP3874790B2 (ja) 1994-02-22 2007-01-31 スリーエム カンパニー 研磨物品、その製造方法および仕上げ用のその使用方法
US5551959A (en) * 1994-08-24 1996-09-03 Minnesota Mining And Manufacturing Company Abrasive article having a diamond-like coating layer and method for making same
US5645471A (en) 1995-08-11 1997-07-08 Minnesota Mining And Manufacturing Company Method of texturing a substrate using an abrasive article having multiple abrasive natures
US5958794A (en) 1995-09-22 1999-09-28 Minnesota Mining And Manufacturing Company Method of modifying an exposed surface of a semiconductor wafer
US5624303A (en) 1996-01-22 1997-04-29 Micron Technology, Inc. Polishing pad and a method for making a polishing pad with covalently bonded particles
US5692950A (en) 1996-08-08 1997-12-02 Minnesota Mining And Manufacturing Company Abrasive construction for semiconductor wafer modification
US6121143A (en) * 1997-09-19 2000-09-19 3M Innovative Properties Company Abrasive articles comprising a fluorochemical agent for wafer surface modification
US6329058B1 (en) 1998-07-30 2001-12-11 3M Innovative Properties Company Nanosize metal oxide particles for producing transparent metal oxide colloids and ceramers
US6458018B1 (en) * 1999-04-23 2002-10-01 3M Innovative Properties Company Abrasive article suitable for abrading glass and glass ceramic workpieces
US6213845B1 (en) 1999-04-26 2001-04-10 Micron Technology, Inc. Apparatus for in-situ optical endpointing on web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies and methods for making and using same
US6290572B1 (en) 2000-03-23 2001-09-18 Micron Technology, Inc. Devices and methods for in-situ control of mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies
ATE302092T1 (de) * 2000-04-28 2005-09-15 3M Innovative Properties Co Schleifmittel und verfahren zum schleifen von glas
US6497957B1 (en) * 2000-10-04 2002-12-24 Eastman Kodak Company Antireflection article of manufacture
US20020072296A1 (en) 2000-11-29 2002-06-13 Muilenburg Michael J. Abrasive article having a window system for polishing wafers, and methods
KR100867339B1 (ko) 2000-12-01 2008-11-06 도요 고무 고교 가부시키가이샤 연마 패드 및 그 제조 방법
JP2002254316A (ja) * 2001-02-28 2002-09-10 Hitachi Maxell Ltd 研磨シ―ト
US6884723B2 (en) 2001-12-21 2005-04-26 Micron Technology, Inc. Methods for planarization of group VIII metal-containing surfaces using complexing agents
US6949128B2 (en) * 2001-12-28 2005-09-27 3M Innovative Properties Company Method of making an abrasive product
US6866559B2 (en) 2002-02-04 2005-03-15 Kla-Tencor Technologies Windows configurable to be coupled to a process tool or to be disposed within an opening in a polishing pad
US7131889B1 (en) 2002-03-04 2006-11-07 Micron Technology, Inc. Method for planarizing microelectronic workpieces
US20040005769A1 (en) 2002-07-03 2004-01-08 Cabot Microelectronics Corp. Method and apparatus for endpoint detection
US20040127045A1 (en) 2002-09-12 2004-07-01 Gorantla Venkata R. K. Chemical mechanical planarization of wafers or films using fixed polishing pads and a nanoparticle composition
US7066801B2 (en) 2003-02-21 2006-06-27 Dow Global Technologies, Inc. Method of manufacturing a fixed abrasive material
US6910951B2 (en) 2003-02-24 2005-06-28 Dow Global Technologies, Inc. Materials and methods for chemical-mechanical planarization
US6918821B2 (en) 2003-11-12 2005-07-19 Dow Global Technologies, Inc. Materials and methods for low pressure chemical-mechanical planarization
US20060030156A1 (en) 2004-08-05 2006-02-09 Applied Materials, Inc. Abrasive conductive polishing article for electrochemical mechanical polishing
US7591865B2 (en) * 2005-01-28 2009-09-22 Saint-Gobain Abrasives, Inc. Method of forming structured abrasive article
MX2007012389A (es) * 2005-04-08 2007-12-13 Saint Gobain Abrasives Inc Articulo abrasivo que tiene cromoforo activado por reaccion.
US7344574B2 (en) * 2005-06-27 2008-03-18 3M Innovative Properties Company Coated abrasive article, and method of making and using the same
US20070066186A1 (en) 2005-09-22 2007-03-22 3M Innovative Properties Company Flexible abrasive article and methods of making and using the same
JP2007273910A (ja) * 2006-03-31 2007-10-18 Fujifilm Corp 研磨用組成液
KR100772034B1 (ko) * 2006-12-08 2007-10-31 주식회사 썬텍인더스트리 코팅된 3차원 연마재 구조물을 갖는 연마포지의 제조방법
US8083820B2 (en) * 2006-12-22 2011-12-27 3M Innovative Properties Company Structured fixed abrasive articles including surface treated nano-ceria filler, and method for making and using the same
US7497885B2 (en) * 2006-12-22 2009-03-03 3M Innovative Properties Company Abrasive articles with nanoparticulate fillers and method for making and using them
US8986407B2 (en) * 2008-04-18 2015-03-24 Saint-Gobain Abrasives, Inc. High porosity abrasive articles and methods of manufacturing same

Also Published As

Publication number Publication date
WO2010025003A3 (en) 2010-04-22
JP2012501252A (ja) 2012-01-19
US8251774B2 (en) 2012-08-28
US20100056024A1 (en) 2010-03-04
KR20110055686A (ko) 2011-05-25
EP2327088B1 (en) 2019-01-09
TW201012908A (en) 2010-04-01
CN102138203B (zh) 2015-02-04
EP2327088A4 (en) 2017-06-14
EP2327088A2 (en) 2011-06-01
JP5351967B2 (ja) 2013-11-27
KR101602001B1 (ko) 2016-03-17
WO2010025003A2 (en) 2010-03-04
CN102138203A (zh) 2011-07-27

Similar Documents

Publication Publication Date Title
CN102138203B (zh) 结构化磨料制品、其制备方法、及其在晶片平面化中的用途
TWI532597B (zh) 具有用於化學機械平坦化之界面活性劑的固定式研磨墊
US8083820B2 (en) Structured fixed abrasive articles including surface treated nano-ceria filler, and method for making and using the same
KR100491452B1 (ko) 웨이퍼 표면 개질용 플루오로화합물을 포함하는 연마 용품
JP4933716B2 (ja) 研磨パッド
TWI460261B (zh) 修飾適用於半導體製造之表面之組合物及方法
KR20150058302A (ko) 개선된 cmp 성능을 위한 고정 연마 웹으로의 첨가제의 혼입
US7497885B2 (en) Abrasive articles with nanoparticulate fillers and method for making and using them
TW202328248A (zh) 化學機械拋光墊及其製備
TW202328247A (zh) 化學機械拋光墊及其製備
TW309631B (en) Method of modifying an exposed surface of a semiconductor wafer

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees