CN102091923B - 多层涂覆切削工具 - Google Patents
多层涂覆切削工具 Download PDFInfo
- Publication number
- CN102091923B CN102091923B CN201010583228.XA CN201010583228A CN102091923B CN 102091923 B CN102091923 B CN 102091923B CN 201010583228 A CN201010583228 A CN 201010583228A CN 102091923 B CN102091923 B CN 102091923B
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- CN
- China
- Prior art keywords
- region
- coating
- cutting tool
- coated cutting
- layer
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000005520 cutting process Methods 0.000 title claims abstract description 31
- 239000000203 mixture Substances 0.000 claims abstract description 63
- 238000000576 coating method Methods 0.000 claims abstract description 54
- 239000011248 coating agent Substances 0.000 claims abstract description 52
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 45
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 35
- 238000000034 method Methods 0.000 claims abstract description 21
- 150000004767 nitrides Chemical class 0.000 claims abstract description 17
- 230000000737 periodic effect Effects 0.000 claims abstract description 10
- 238000010276 construction Methods 0.000 claims description 38
- 239000000463 material Substances 0.000 claims description 33
- 239000002356 single layer Substances 0.000 claims description 32
- 239000010410 layer Substances 0.000 claims description 31
- 229910052719 titanium Inorganic materials 0.000 claims description 30
- 229910052804 chromium Inorganic materials 0.000 claims description 27
- 239000000956 alloy Substances 0.000 claims description 8
- 238000005516 engineering process Methods 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 229910000997 High-speed steel Inorganic materials 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 239000011247 coating layer Substances 0.000 claims description 6
- 229910052582 BN Inorganic materials 0.000 claims description 5
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 5
- 239000011195 cermet Substances 0.000 claims description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 4
- 238000010422 painting Methods 0.000 claims description 3
- 229910017083 AlN Inorganic materials 0.000 claims description 2
- 229910052727 yttrium Inorganic materials 0.000 abstract description 6
- 239000000758 substrate Substances 0.000 abstract description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000010936 titanium Substances 0.000 description 41
- 239000011651 chromium Substances 0.000 description 28
- 238000005240 physical vapour deposition Methods 0.000 description 18
- 238000005553 drilling Methods 0.000 description 14
- 238000000151 deposition Methods 0.000 description 13
- 230000008021 deposition Effects 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 239000012634 fragment Substances 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 229910000851 Alloy steel Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 238000000168 high power impulse magnetron sputter deposition Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000012805 post-processing Methods 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910010038 TiAl Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000005480 shot peening Methods 0.000 description 1
- 238000004901 spalling Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 1
- 229940094989 trimethylsilane Drugs 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5873—Removal of material
- C23C14/588—Removal of material by mechanical treatment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0068—Reactive sputtering characterised by means for confinement of gases or sputtered material, e.g. screens, baffles
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0073—Reactive sputtering by exposing the substrates to reactive gases intermittently
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0084—Producing gradient compositions
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/027—Graded interfaces
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
- C23C14/0652—Silicon nitride
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3435—Applying energy to the substrate during sputtering
- C23C14/345—Applying energy to the substrate during sputtering using substrate bias
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
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Abstract
本发明涉及一种多层涂覆切削工具。具体地,本发明涉及一种涂覆切削工具,该切削工具包含基材和PVD涂层,该PVD涂层包含最外区域C,该最外区域C是如下元素的氮化物、碳化物或者硼化物或者其混合物,所述元素为Si和至少两种另外的选自Al、Y和周期表的第4、5和6族的元素,并且区域C不具有Si的平均含量的组成梯度。区域C具有交替的单个层X和Y的层状非周期性多层结构,所述层X和Y具有彼此不同的组成。所述涂层还包含最靠近所述基底的区域A和过渡区域B,其中:-区域A基本不含Si,并且-区域B包括Si的平均含量的组成梯度,其中Si的平均含量朝向区域C增加。本发明还涉及制造根据以上所述的涂覆切削工具的方法。
Description
技术领域
本发明涉及一种涂覆有PVD涂层的切削工具,所述PVD涂层具有非周期性多层结构,该结构朝向基材具有增加的韧度。特别地,本发明涉及这样一种涂层,该涂层包含具有组成梯度的(Ti,Al,Cr,Si)N层。
背景技术
切削工具通常具有利用物理气相沉积(PVD)或者化学气相沉积(CVD)沉积的涂层以增加所述工具的寿命。用于切削工具的普通的PVD涂层是Ti、Al、Cr和Si的氮化物。特别地,含有硅的氮化物已知具有高的硬度并且还具有非常良好的耐磨性。具有高硬度的(Ti,Al,Cr,Si)N PVD涂层在本技术领域中是已知的。
EP 1939328 A1描述了一种包含基材和涂层的切削工具。所述涂层包含具有不同组成的交替的单个金属氮化物层X和Y的非周期性多层结构,其中所述涂层的平均组成是(Ti(1-a-b-c)AlaCrbSic)N,其中0<a<0.5、0<b<0.15、0.01<c<0.17,并且a+b+c<1。
US 2006/0222893 A1公开了一种多层涂层,该多层涂层包含重复的层堆叠体,该层堆叠体包含至少一个50-150nm的(Al,Cr)N层和/或至少一个75-200nm的(Ti,Si)N层的层,和至少一个(Al,Cr,Ti,Si)N+(Ti,Si)N+(Al,Cr,Ti,Si)N+(Al,Cr)N的层堆叠体。该混合的(Al,Cr,Ti,Si)N层具有多层结构并且是通过同时操作所有的靶而实现的。所述(Al,Cr,Ti,Si)N层具有20+10nm的厚度。
EP 1 726 686 A1公开了一种硬质涂覆部件,该部件包含如下涂层,所述涂层包含最下层、中间叠层和最外层,其中所述最下层和最外层是均质层。所述中间叠层包含交替的层A和B,所述层A和B是金属组成AlwCrxTiySiz的氮化物、硼化物、碳化物和氧化物。
虽然这种硬质涂层具有非常好的耐磨性,但是它们还可能是脆性的,当被沉积到具有高韧度的基材上以及被沉积到具有锐利几何形状的基材上时,这可能引起问题,例如剥落。如果所述涂层还具有高的残留压缩应力,则所述剥落将更严重,特别是在钻具上的刃口、拐角等周围处。
发明内容
本发明的一个目的在于提供一种具有如下涂层的涂覆切削工具,所述涂层具有改进的耐剥落性而不降低表面硬度。本发明的另一个目的在于提供一种更加适用于韧性基材的硬质涂层。这是通过如在独立权利要求中限定的涂覆切削工具和方法实现的。
根据本发明的涂覆切削工具包含基材和PVD涂层,该PVD涂层包含最外区域C,该最外区域C是如下元素的氮化物、碳化物或者硼化物或者其混合物,所述元素为Si和至少两种另外的选自Al、Y和周期表的第4、5和6族的元素,并且其中区域C不具有Si的平均含量的组成梯度。区域C具有交替的单个层X和Y的非周期性多层结构,其中所述层X和Y具有彼此不同的组成。所述涂层还包含最靠近所述基材的区域A和过渡区域B,其中:
-区域A基本不含Si,并且
-区域B包含Si的平均含量的组成梯度,其中Si的平均含量朝向区域C增加。
区域B优选也具有带有交替的单个层X和Y的非周期性多层结构,其中所述层X和Y具有彼此不同的组成。
根据本发明的方法包括以下步骤:提供硬质合金、金属陶瓷、陶瓷、立方氮化硼或者高速钢的基材,通过PVD技术将包含最外区域C的涂层沉积到所述基材上,所述最外区域C是如下元素的氮化物、碳化物或者硼化物或者其混合物,所述元素为Si和至少两种另外的选自Al、Y和周期表的第4、5和6族的元素,其中区域C不具有Si的平均含量的组成梯度,并且其中区域C具有交替的单个层X和Y的非周期性多层结构,所述层X和Y具有彼此不同的组成。所述涂层还包含最靠近所述基材的区域A和在区域A和区域C之间的过渡区域B,其中:
-区域A基本不含Si,并且
-区域B包含Si的平均含量的组成梯度,其中Si的平均含量朝向区域C增加。
区域B优选也具有交替的单个层X和Y的非周期性多层结构,其中所述层X和Y具有彼此不同的组成。
由于本发明,特别地由于Si的组成梯度,即使在韧性基材上,提供具有改进的耐磨性的含Si硬质涂覆层也是可能的。
本发明的一个优点在于,所述涂层适用于锐缘。
在从属权利要求中限定了本发明的具体实施方式。当将以下本发明的详细说明与随后的附图和权利要求相结合地考虑时,本发明的其它目的、优点和新颖的特征将变得明显。
附图说明
现在将参考附图描述本发明的优选实施方式,其中:
图1示意性图示了涂覆以根据本发明的包含区域A、区域B和区域C的涂层的基材。
具体实施方式
本发明涉及一种包含PVD涂层的涂覆切削工具,所述PVD涂层具有非周期性多层结构,其朝向所述基材具有增加的韧度。参考图1,所述PVD涂层包含最外区域C,该最外区域C是如下元素的氮化物、碳化物或者硼化物或者其混合物,所述元素为Si和至少两种另外的选自Al、Y和周期表的第4、5和6族的元素,并且其中区域C不具有Si的平均含量的组成梯度。区域C具有交替的单个层X和Y的非周期性多层结构,所述层X和Y具有彼此不同的组成。所述涂层还包含最靠近基材的区域A和过渡区域B,其中:
-区域A基本不含Si,并且
-区域B包含Si的平均含量的组成梯度,其中Si的平均含量朝向区域C增加。
区域B优选也具有交替的单个层X和Y的非周期性多层结构,所述层X和Y具有彼此不同的组成。
组成梯度在这里指的是Si的平均含量,即在所述涂层的一个片段上而非在明确点中测量的Si的平均含量,是增加的或者是降低的。例如,根据本发明的多层结构可以包含连续的、向上和向下相对于彼此在Si浓度方面不同的单个层,但是在多个单个层上测量的平均Si浓度增加或者降低。
如果从仅仅一种靶组成沉积,区域A可以是均质的,或者如果从具有不同组成的两个或者更多个靶沉积,区域A可以具有多层结构。在一个实施方式中,区域A具有非周期性多层结构。
关于非周期性,应该理解在所述多层结构中的特定的单个层的厚度与在紧邻所述特定的单个层的下面或上面的单个层的厚度均不具有任何关系。所述多层结构在至少10个连续的单个层的序列中不具有任何重复周期。
多层结构在这里指的是包含至少5个单个层的结构。然而,它可以包含高达数千个单个层。
适当地,所述单个层的平均厚度大于0.1nm,但是小于200nm,优选大于0.5nm,但是小于100nm,最优选大于1nm,但是小于30nm。在所述多层结构中的任何十个连续层的总和优选小于300nm。
区域A基本不含Si。一些硅可能由于污染或者扩散而存在,而非被特意地添加到区域A。基本不含在这里指的是Si的含量小于金属元素的总量的1原子%,优选小于0.5原子%,并且最优选Si的含量在杂质的水平上。
在本发明的一个实施方式中,区域A基本不含Si和Cr。基本不含Cr在这里具有与关于Si相同的含义。
区域A优选包含TiN、(Ti,Al)N、Ti、AlN、Al、CrN、(Cr,Al)N或者Cr中的一种或者组合。与所述外部区域相比,区域A应该具有高的韧度。高的韧度指的是所述涂层在机械载荷下具有高的耐破裂性。
区域C是适当地具有高的硬度的涂覆层。高的硬度在这里指的是该硬度适当地高于30GPa。
区域B是在区域A和C之间的过渡区域,其包含Si的组成梯度,从而区域B的最靠近区域A的部分至少具有接近区域A的Si组成,并且区域B的最靠近区域C的部分至少具有接近区域C的Si组成。由于生产技术,平均含量Si的梯度不是完全线性的,但是在一个实施方式中优选为尽可能线性的。所述Si含量将在所述单个子层之间变化,然而在几个子层上测量的平均Si含量在整个区域B上增加。区域B也包含交替的层X和Y的非周期性多层结构,即层状结构。
区域B也可以包含所述至少两种另外的元素的梯度。例如,在不同区域中相邻部分的除了Si以外的其它元素的含量可以在组成方面相互适合。
在本发明的一个实施方式中,区域B的最靠近区域A的部分基本不含Si。
在本发明的另一个实施方式中,区域B的最靠近区域A的部分基本不含Si和Cr。
在所述三个区域A、B和C之间不存在明显的边界,相反在不同的区域之间的过渡应该是尽可能平滑的。当确定不同区域的厚度时,在区域A和区域B之间的边界被定义为如下点,在这里区域A的组成显著地改变,即在这里所述梯度开始,优选在所述点处,不是区域A中的那些元素的另外的元素被引入。
在区域B和C之间的边界被定义为如下点,在这里所述涂层不再含有任何元素的平均组成的梯度。
区域A+区域B的总厚度适当地在总涂层厚度的20到95%之间,优选在30到80%之间,更优选为40到80%,并且最优选在40和60%之间。
区域A适当地在区域A+区域B的总厚度的1到50%之间,优选在3和30%之间,最优选在5和15%之间。
整个涂层的总厚度是0.5到20μm,优选是1到10μm,最优选是2到5μm。
在这里给出的所有的厚度均涉及在从靶处于直视线中的、适度平坦的表面上进行的测量。对于在沉积期间在针销棒(pins sticks)上安装刀片,这意味着已经在直接面向所述靶的侧面的中部上测量了厚度。对于不规则的表面,例如在例如钻具和端铣刀上的那些,在这里给出的厚度指的是在任何适度平坦的表面上或者在具有相对大曲率并且从任何边缘或者拐角离开一定距离的表面上测量的厚度。例如,在钻具上,已经在周边上进行了测量,而在端铣刀上,已经在侧面上进行了测量。这里的测量是在抛光的横截面上进行的。
由于低的厚度,在没有来自相邻层的贡献的情况下,不容易测量在所述多层结构中的每一个单个层的组成。能够测量的是在所述多层结构的一个片段之上的平均组成。可以从所使用的靶的组成估计每个单个层的组成,但是这没有给出准确的组成。当已经沉积了厚度足以进行分析的更厚的层时,已经显示出,与所述靶的材料的组成相比,沉积层的组成可以有若干百分比的差异。由于这个事实,在下文中述及的根据本发明的多层结构的单个层的任何组成是从在沉积期间使用的靶的组成估计的。
所述涂层包含如下元素的氮化物、碳化物或者硼化物或者其混合物,所述元素为Si和至少两种另外的选自Al、Y和周期表的第4、5和6族的元素。所述元素适当地是Si和至少两种如下元素:Ti、Al和Cr。优选地,所述涂层包含元素Si、Ti、Al和Cr。
在本发明的一个实施方式中,所述涂层是氮化物。
在本发明的另一个实施方式中,所述涂层是包含如下元素的氮化物,所述元素为Si、Ti、Al和Cr。
在本发明的一个实施方式中,在区域C中的多层结构的平均组成是(Ti(1-a-b-c)AlaCrbSic)N,其中0<a<0.5,优选0.05<a<0.4,最优选0.25<a<0.3,其中0<b<0.15,优选0.02<b<0.10,最优选0.04<b<0.08,其中0.01<c<0.17,优选0.02<c<0.10,最优选0.04<c<0.08,并且a+b+c<1。
在本发明的一个实施方式中,在区域C中的多层结构的平均组成是(Ti(1-a-b-c)AlaCrbSic)N,其中0<a<0.5,优选0.05<a<0.4,最优选0.25<a<0.3,其中0<b<0.17,优选0.06<b<0.15,最优选0.10<b<0.15,其中0.01<c<0.17,优选0.02<c<0.10,最优选0.04<c<0.08,并且a+b+c<1。
所述多层结构的平均化学组成是在所述涂层的横截面上使用EDS(能量色散谱)测量的。
在本发明的一个实施方式中,在区域B和区域C中的单个层X和Y的组成可以是CrN、(Al,Cr)N、(Ti,Si)N、(Al,Ti,Si)N、TiN、(Al,Si)N和(Al,Ti,Cr,Si)N中的任何一种。
在本发明的一个实施方式中,区域C包含交替的(Al,Cr)N和(Ti,Si)N单个层的多层结构。
在本发明的一个实施方式中,所述基材是硬质合金、金属陶瓷、陶瓷或者立方氮化硼或者高速钢的切削工具刀片。
在本发明的一个实施方式中,所述基材是硬质合金或者高速钢的钻具或者端铣刀。
本发明还涉及制造如上所述的涂覆切削工具的方法。该方法包括以下步骤:提供硬质合金、金属陶瓷、陶瓷、立方氮化硼或者高速钢的基材,通过PVD技术将包含最外区域C的涂层沉积到所述基材上,所述最外区域C是如下元素的氮化物、碳化物或者硼化物或者其混合物,所述元素为Si和至少两种另外的选自Al、Y和周期表的第4、5和6族的元素,其中区域C不具有Si的平均含量的组成梯度,并且其中区域C具有交替的单个层X和Y的非周期性多层结构,所述层X和Y具有彼此不同的组成。所述涂层还包含最靠近所述基材的区域A和在区域A和区域C之间的过渡区域B,其中:
-区域A基本不含Si,并且
-区域B包含Si的平均含量的组成梯度,其中Si的平均含量朝向区域C增加。
区域B优选也具有交替的单个层X和Y的非周期性多层结构,即,是层状的,所述层X和Y具有彼此不同的组成。
在本发明的一个实施方式中,区域A基本不含Si和Cr。
区域A+区域B的总厚度适当地在总涂层厚度的20到95%之间,优选在30到80%之间,更加优选是40到80%,并且最优选在40和60%之间。
区域A适当地在区域A+区域B的总厚度的1到50%之间,优选在3和30%之间,最优选在5和15%之间。
本发明的方法能够应用于所有的普通PVD技术,例如阴极电弧蒸发、磁控溅射、高功率脉冲磁控溅射(HPPMS)、离子镀等。优选使用阴极电弧蒸发或者磁控溅射。工艺参数是在将PVD涂层沉积到基材上的技术领域中常规的并且取决于具体的沉积装备、涂层组成等。通常,沉积温度在100和900℃之间改变。
在沉积期间的压力通常为存在的工艺气体的0.1到10Pa之间。根据目标涂层组成,所述工艺气体可以是N2、Ar、C2H2、CH4或者含硅气体中的一种或者多种。
硅能够源自靶或者源自含硅工艺气体,例如三甲基硅烷。
包含所述多层结构的涂层可以通过不同的PVD技术并且交替地形成单个层而沉积。所述单个层厚度的非周期性序列可以通过随机地或者以预定的非重复方式打开和关闭单个层靶的闸板或者通过随机地或者以预定的非重复方式开关地切换所述靶而得以实现。另一种可能的方法是通过随机地或者以预定的非重复方式在所述靶前面旋转或者移动待被涂覆的基材。优选通过将所述基材置于3重(3-fold)旋转基材台上实现这一点,所述3重旋转基材台被布置以获得非周期性多层结构。所述3重旋转可以关于旋转速度和顺时针或者逆时针的旋转方向被调节。
所述多层结构以如下方式沉积,所述方式为所述单个层的平均厚度大于0.1nm,但是小于200nm,优选大于0.5nm,但是小于100nm,最优选大于1nm,但是小于30nm。在所述多层结构中的任何十个连续层的总和小于300nm。
不同的区域是通过从不同组合的活性靶进行沉积而形成的。非活性靶被关闭或者被完全或者部分地屏蔽。当区域A形成时,在沉积期间,优选仅仅纯Ti靶、纯Cr靶、CrAl或者TiAl靶是活性的。如果希望区域A是纯金属Ti,则不存在任何氮气,但是如果希望区域A是金属氮化物,则存在氮气。当开始形成区域B时,将含有其余元素的靶打开,或者将屏蔽罩逐渐地移除,并且通过将电流增加到那些靶上或者通过屏蔽的程度而逐渐地增加来自所述靶的材料流。
然后通过使用选自Si、Al、Y和周期表的第4、5或者6族的元素的靶通过在恒定电流下操作所述靶而沉积区域C。每个靶都可以各自包含一种、两种或者更多种元素。在所述靶中的金属元素的组成可以不同于在整个多层结构中的金属元素的平均组成并且仍然形成在本发明的范围内的涂层。然而区域C整体上将含有Si和至少两种另外的选自Al、Y和周期表的第4、5或者6族的元素。
在本发明的一个实施方式中,在N2或者混合的N2+Ar气体气氛中,在所述靶中的元素包含钛(Ti)、铝(Al)、硅(Si)、铬(Cr)或者其合金。靶可以包含碳和/或硼以分别形成碳化物或者硼化物。
在本发明的一个实施方式中,被用于形成区域C的靶是(Al,Ti)(Al,Cr)、(Ti,Si)、(Al,Ti,Si)、Ti、(Al,Si)和(Al,Ti,Cr,Si)中的任何一种。
在本发明的一个实施方式中,被用于形成区域C的靶是(Al,Cr)和(Ti,Si)。
在本发明的一个实施方式中,至少部分地通过添加含硅气体提供硅。然后通过调节所述含硅气体的流量而控制Si的量。
在本发明的一个实施方式中,在根据本发明的方法形成的区域C中的多层结构的平均组成是(Ti(1-a-b-c)AlaCrbSic)N,其中0<a<0.5,优选0.05<a<0.4,最优选0.25<a<0.3,其中0<b<0.15,优选0.02<b<0.10,最优选0.04<b<0.08,其中0.01<c<0.17,优选0.02<c<0.10,最优选0.04<c<0.08,并且a+b+c<1。
在另一个实施方式中,Cr含量是0<b<0.17,优选0.06<b<0.15,最优选0.10<b<0.15,在其它方面是相同的。
整个涂层的厚度是0.5到20μm,优选1到10μm,最优选2到5μm。
在本发明的一个实施方式中,在所述方法中使用的基材是硬质合金、金属陶瓷、陶瓷或者立方氮化硼的切削工具刀片。
在本发明的一个实施方式中,在所述方法中使用的基材是硬质合金或者高速钢的钻具或者端铣刀。
在本发明的一个实施方式中,所述方法还包括后处理步骤。该后处理步骤可以例如是刷光、吹洗、喷丸等。
实施例1(本发明)
使用Ti、Ti0.90Si0.10和Al0.70Cr0.30靶在PVD电弧蒸发装备中涂覆硬质合金钻具。在整个沉积中,沉积温度是450℃。在整个沉积期间,将所述钻具以3重旋转进行旋转以实现非周期性结构。
所述沉积以标准Ar等离子体蚀刻步骤开始以清洁基材表面。然后,在两个步骤中在-200到-100V的偏压下从Ti靶和氮气,由TiN形成区域A。当区域A已经达到大致0.15μm的厚度时,通过打开Al0.70Cr0.30靶而开始区域B的沉积,并且在到Al0.70Cr0.30靶的电流逐渐地增加时,从Al0.70Cr0.30靶和Ti靶这两者继续进行沉积。在一会之后,Ti0.90Si0.10靶也被打开并且将到Ti0.90Si0.10靶的电流逐渐地增加,直至区域A+区域B已经达到大致2μm的厚度。在区域B的沉积期间的偏置电压是-60V。
然后在使所述钻具进行3重旋转时通过在恒定电流下操作Al0.70Cr0.30和Ti0.90Si0.10靶沉积区域C,直至区域C已经达到大致2μm的厚度。在区域B的沉积期间的偏置电压是-40V。
实施例2(现有技术)
在与在实例1中相同的设备中涂覆具有与在实例1中相同的组成和几何形状的硬质合金钻具。以如在实例1中描述的相同的蚀刻步骤开始沉积。沉积温度是450℃并且偏置电压是-40V。
然后通过打开Al0.70Cr0.30和Ti0.90Si0.10靶这两者沉积涂层并且然后在使钻具进行3重旋转时通过在恒定电流下操作所述靶而沉积涂层,直至获得大致4μm的总涂层厚度。
实施例3
以以下切削数据在形成20mm通孔的切削操作中,与被称为对照的带有(Ti,A1)N涂层的市售钻具和被称为现有技术的如在EP1939328A1中描述的TiAlCrSiN多层的钻具一起,测试根据实例1和2制成的钻具:
工件材料 SS2244
切削速度 90m/min
进给量 0.15mm/转
内部冷却 2.8-3.51/min
工具寿命标准是以下标准中的任何一种:
在主刃口上vB(侧面磨损)>0.3mm;
在外角(outer corner)上vB>0.5mm或者相同尺寸的碎屑;和
差的碎片形成(如线状碎片)、声音或者作用力增加,这将产生其发展将会导致总体破坏的假设。
表1给出在达到任何刀具寿命标准之前钻出的孔的数目。
表1
孔的数目 | |
本发明 | 2000 |
现有技术 | 1370 |
对照 | 1360 |
从表1中可知在这个操作中根据本发明的涂层具有比现有技术的钻具和市售钻具(对照)更长的工具寿命。
虽然已经结合目前认为最实用和优选的实施例描述了本发明,但是应该理解,本发明将不限于所公开的实施方式,相反,本发明旨在涵盖在所附权利要求内的多种修改和等价布置。
Claims (15)
1.一种涂覆切削工具,其包含基材和PVD涂层,其中所述涂层包含最外区域C,所述最外区域C是如下元素的氮化物、碳化物或者硼化物或者其混合物,所述元素为Si和至少两种另外的选自Al、Y和周期表的第4、5和6族的元素,其中区域C不具有Si的平均含量的组成梯度,并且其中区域C具有交替的单个层X和Y的非周期性多层结构,所述层X和Y具有彼此不同的组成,其特征在于,所述涂层还包含最靠近所述基材的区域A和在区域A和区域C之间的过渡区域B,其中:
-区域A基本不含Si,并且
-区域B包含Si的平均含量的组成梯度,其中Si的平均含量朝向区域C增加。
2.根据权利要求1的涂覆切削工具,其中区域B具有交替的单个层X和Y的非周期性多层结构,所述层X和Y具有彼此不同的组成。
3.根据权利要求1或者2的涂覆切削工具,其中区域A包含TiN、(Ti,Al)N、Ti、AlN、Al、CrN、(Cr,Al)N或者Cr。
4.根据权利要求1或者2的涂覆切削工具,其中所述涂层是氮化物。
5.根据权利要求1或者2的涂覆切削工具,其中所述涂层是元素Si、Cr、Al和Ti的氮化物。
6.根据权利要求1或者2的涂覆切削工具,其中区域A+B的总厚度在总涂层厚度的20%到95%之间。
7.根据权利要求1或者2的涂覆切削工具,其中区域A在区域A和区域B的总厚度的1%到50%之间。
8.根据权利要求1或者2的涂覆切削工具,其中在所述多层的结构中的单个层的厚度大于0.1nm但是小于200nm。
9.根据权利要求1或者2的涂覆切削工具,其中总的层厚度是0.5μm到20μm。
10.一种制造涂覆切削工具的方法,该方法包括以下步骤:提供硬质合金、金属陶瓷、陶瓷、立方氮化硼或者高速钢的基材,通过PVD技术将包含最外区域C的涂层沉积到所述基材上,所述最外区域C是如下元素的氮化物、碳化物或者硼化物或者其混合物,所述元素为Si和至少两种另外的选自Al、Y和周期表的第4、5和6族的元素,其中区域C不具有Si的平均含量的组成梯度,并且其中区域C具有交替的单个层X和Y的非周期性多层结构,所述层X和Y具有彼此不同的组成,并且其中所述涂层还包含最靠近所述基材的区域A和在区域A和区域C之间的过渡区域B,其中:
-区域A基本不含Si,并且
-区域B包含Si的平均含量的组成梯度,其中Si的平均含量朝向区域C增加。
11.根据权利要求10的方法,其中区域B具有交替的单个层X和Y的非周期性多层结构,所述层X和Y具有彼此不同的组成。
12.根据权利要求10或者11的方法,其中区域A+B的总厚度在总涂层厚度的20%到95%之间。
13.根据权利要求10或者11的方法,其中区域A在区域A和区域B的总厚度的1%到50%之间。
14.根据权利要求10或者11的方法,其中在所述多层结构中的单个层的厚度大于0.1nm但是小于200nm。
15.根据权利要求10或者11的方法,其中所述涂层是元素Si、Cr、Al和Ti的氮化物。
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CN102886552B (zh) * | 2011-07-22 | 2016-01-06 | 三菱综合材料株式会社 | 润滑特性和耐磨性优异的表面包覆钻头 |
AT511605B1 (de) * | 2011-12-12 | 2013-01-15 | High Tech Coatings Gmbh | Kohlenstoffbasierende beschichtung |
JPWO2013153614A1 (ja) | 2012-04-09 | 2015-12-17 | オーエスジー株式会社 | 切削工具用硬質被膜及び硬質被膜被覆切削工具 |
CN102922052B (zh) * | 2012-09-28 | 2014-10-22 | 武汉大学 | 一种AlTiN-AlCrN超硬纳米多层复合涂层滚齿刀及其制备方法 |
DE102012109254A1 (de) * | 2012-09-28 | 2014-04-03 | Walter Ag | Werkzeug mit TiAlCrSiN-PVD-Beschichtung |
MX361325B (es) † | 2013-07-03 | 2018-11-20 | Oerlikon Surface Solutions Ag Pfaeffikon | Capas de tixsi1 - xn y su produccion. |
JP6102617B2 (ja) * | 2013-08-02 | 2017-03-29 | 三菱マテリアル株式会社 | 耐チッピング性にすぐれた表面被覆切削工具 |
JP6172519B2 (ja) * | 2013-09-20 | 2017-08-02 | 三菱マテリアル株式会社 | 高硬度鋼の切削加工ですぐれた耐チッピング性を長期に亘って発揮する表面被覆切削工具 |
CN103737092A (zh) * | 2013-11-13 | 2014-04-23 | 厦门金鹭特种合金有限公司 | 一种pcb用pvd涂层微型铣刀及其制备方法 |
EP3018233A1 (de) * | 2014-11-05 | 2016-05-11 | Walter Ag | Schneidwerkzeug mit mehrlagiger PVD-Beschichtung |
CN104789925B (zh) * | 2015-02-12 | 2017-08-25 | 青岛新晟威环保设备有限公司 | 一种用于金属阀门的pvd复合涂层及涂镀工艺 |
CN107636190B (zh) * | 2015-05-21 | 2020-10-30 | 瓦尔特公开股份有限公司 | 具有多层电弧pvd涂层的刀具 |
CN104846334B (zh) * | 2015-05-25 | 2017-06-23 | 苏州阿诺精密切削技术有限公司 | 钻头表面涂层及其加工工艺 |
RU2622526C2 (ru) * | 2015-10-27 | 2017-06-16 | федеральное государственное бюджетное образовательное учреждение высшего образования "Ульяновский государственный технический университет" | Способ получения многослойного покрытия для режущего инструмента |
RU2620527C2 (ru) * | 2015-10-27 | 2017-05-26 | федеральное государственное бюджетное образовательное учреждение высшего образования "Ульяновский государственный технический университет" | Способ получения многослойного покрытия для режущего инструмента |
RU2622538C1 (ru) * | 2015-12-15 | 2017-06-16 | федеральное государственное бюджетное образовательное учреждение высшего образования "Ульяновский государственный технический университет" | Способ получения многослойного покрытия для режущего инструмента |
RU2622533C1 (ru) * | 2015-12-15 | 2017-06-16 | федеральное государственное бюджетное образовательное учреждение высшего образования "Ульяновский государственный технический университет" | Способ получения многослойного покрытия для режущего инструмента |
RU2622539C1 (ru) * | 2015-12-15 | 2017-06-16 | федеральное государственное бюджетное образовательное учреждение высшего образования "Ульяновский государственный технический университет" | Способ получения многослойного покрытия для режущего инструмента |
WO2017150550A1 (ja) * | 2016-02-29 | 2017-09-08 | 三菱マテリアル株式会社 | 表面被覆切削工具 |
JP6452006B2 (ja) | 2016-02-29 | 2019-01-16 | 三菱マテリアル株式会社 | 表面被覆切削工具 |
EP3228726A1 (en) * | 2016-04-08 | 2017-10-11 | Seco Tools Ab | Coated cutting tool |
WO2018100849A1 (ja) | 2016-11-29 | 2018-06-07 | 住友電工ハードメタル株式会社 | 表面被覆切削工具 |
JP6766181B2 (ja) | 2017-01-16 | 2020-10-07 | オーエスジー株式会社 | 工具 |
RU2643758C1 (ru) * | 2017-03-10 | 2018-02-05 | федеральное государственное бюджетное образовательное учреждение высшего образования "Ульяновский государственный технический университет" | Способ получения многослойного покрытия для режущего инструмента |
ES2767356T3 (es) * | 2017-05-19 | 2020-06-17 | Walter Ag | Herramienta de corte de metal con revestimiento multicapa |
CN107201499B (zh) * | 2017-05-26 | 2019-09-17 | 东北大学 | 一种钛合金切削用成分梯度TiAlXN涂层刀具及其制备方法 |
KR102074132B1 (ko) * | 2017-12-28 | 2020-02-06 | 한국야금 주식회사 | 절삭공구용 경질피막 |
WO2020188313A2 (en) * | 2018-07-10 | 2020-09-24 | Next Biometrics Group Asa | Thermally conductive and protective coating for electronic device |
CN109161841B (zh) * | 2018-07-27 | 2020-07-21 | 广东工业大学 | 一种AlCrN/AlCrSiN超硬纳米复合多层涂层及其制备方法和应用 |
EP3842169A4 (en) * | 2018-08-24 | 2021-12-15 | Sumitomo Electric Hardmetal Corp. | CUTTING TOOL |
EP3736358A1 (en) * | 2019-05-08 | 2020-11-11 | Walter Ag | A coated cutting tool |
CN110616400B (zh) * | 2019-09-24 | 2021-08-24 | 中国科学院宁波材料技术与工程研究所 | 一种具有耐高温水蒸气氧化和强韧性的叠层防护涂层及制备方法和应用 |
CN111519145A (zh) * | 2020-05-28 | 2020-08-11 | 宁波迈柯新材料科技有限公司 | 压铸模具表面AlCrYN/AlCrSiN纳米复合梯度涂层及其制备方法 |
CN113529080B (zh) * | 2021-07-19 | 2023-03-31 | 厦门鸿鹭联创工具有限公司 | 一种用于pcb微型铣刀的涂层 |
DE102022113731A1 (de) | 2022-05-31 | 2023-11-30 | Hartmetall-Werkzeugfabrik Paul Horn Gmbh | Beschichtetes Werkzeugteil und Beschichtungsverfahren |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1876368A (zh) * | 2005-05-26 | 2006-12-13 | 日立工具股份有限公司 | 硬被膜覆盖部件 |
CN101090790A (zh) * | 2004-12-28 | 2007-12-19 | 住友电工硬质合金株式会社 | 涂覆切削工具及其制造方法 |
CN101209611A (zh) * | 2006-12-27 | 2008-07-02 | 山特维克知识产权股份有限公司 | 多层涂覆切削刀具 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3950385B2 (ja) * | 2002-08-02 | 2007-08-01 | 住友電工ハードメタル株式会社 | 表面被覆切削工具 |
JP4707541B2 (ja) | 2005-03-24 | 2011-06-22 | 日立ツール株式会社 | 硬質皮膜被覆部材 |
US7348074B2 (en) | 2005-04-01 | 2008-03-25 | Oc Oerlikon Balzers Ag | Multilayer hard coating for tools |
KR20100015344A (ko) * | 2007-04-18 | 2010-02-12 | 산드빅 인터렉츄얼 프로퍼티 에이비 | 코팅된 절삭 공구 및 이의 제조 방법 |
JP5070622B2 (ja) * | 2007-06-07 | 2012-11-14 | 住友電工ハードメタル株式会社 | 表面被覆切削工具 |
JP4440980B2 (ja) * | 2008-01-31 | 2010-03-24 | ユニオンツール株式会社 | 切削工具用硬質皮膜 |
KR101643010B1 (ko) * | 2008-04-18 | 2016-07-26 | 산드빅 인터렉츄얼 프로퍼티 에이비 | 코팅된 절삭 공구 및 그의 제조 방법 |
JP5315527B2 (ja) * | 2008-09-29 | 2013-10-16 | 住友電工ハードメタル株式会社 | 表面被覆切削工具 |
JPWO2010150335A1 (ja) * | 2009-06-22 | 2012-12-06 | 株式会社タンガロイ | 被覆立方晶窒化硼素焼結体工具 |
-
2009
- 2009-12-04 EP EP20090015041 patent/EP2336383A1/en not_active Withdrawn
-
2010
- 2010-11-29 EP EP20100192948 patent/EP2336382B1/en active Active
- 2010-12-03 US US12/959,835 patent/US8758890B2/en active Active
- 2010-12-03 KR KR1020100122465A patent/KR101820165B1/ko active IP Right Grant
- 2010-12-03 JP JP2010270389A patent/JP5714879B2/ja active Active
- 2010-12-06 CN CN201010583228.XA patent/CN102091923B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101090790A (zh) * | 2004-12-28 | 2007-12-19 | 住友电工硬质合金株式会社 | 涂覆切削工具及其制造方法 |
CN1876368A (zh) * | 2005-05-26 | 2006-12-13 | 日立工具股份有限公司 | 硬被膜覆盖部件 |
CN101209611A (zh) * | 2006-12-27 | 2008-07-02 | 山特维克知识产权股份有限公司 | 多层涂覆切削刀具 |
CN101578396A (zh) * | 2006-12-27 | 2009-11-11 | 山特维克知识产权股份有限公司 | 多层涂层切削刀具 |
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EP2336382A1 (en) | 2011-06-22 |
KR20110063367A (ko) | 2011-06-10 |
JP2011115941A (ja) | 2011-06-16 |
CN102091923A (zh) | 2011-06-15 |
EP2336382B1 (en) | 2015-01-07 |
JP5714879B2 (ja) | 2015-05-07 |
EP2336383A1 (en) | 2011-06-22 |
KR101820165B1 (ko) | 2018-01-18 |
US20110135898A1 (en) | 2011-06-09 |
US8758890B2 (en) | 2014-06-24 |
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