CN102084436A - 聚(5,5′-二(噻吩-2-基)苯并[2,1-b;3,4-b′]二噻吩)及其作为高性能可溶液加工半导体聚合物的用途 - Google Patents
聚(5,5′-二(噻吩-2-基)苯并[2,1-b;3,4-b′]二噻吩)及其作为高性能可溶液加工半导体聚合物的用途 Download PDFInfo
- Publication number
- CN102084436A CN102084436A CN2009801259716A CN200980125971A CN102084436A CN 102084436 A CN102084436 A CN 102084436A CN 2009801259716 A CN2009801259716 A CN 2009801259716A CN 200980125971 A CN200980125971 A CN 200980125971A CN 102084436 A CN102084436 A CN 102084436A
- Authority
- CN
- China
- Prior art keywords
- alkyl
- group
- aryl
- purposes
- independently selected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000642 polymer Polymers 0.000 title claims description 22
- 125000000175 2-thienyl group Chemical group S1C([*])=C([H])C([H])=C1[H] 0.000 title abstract 2
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 31
- 125000006649 (C2-C20) alkynyl group Chemical group 0.000 claims abstract description 9
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 claims abstract description 9
- 125000006376 (C3-C10) cycloalkyl group Chemical group 0.000 claims abstract description 6
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims description 57
- -1 thiophene-2-yl Chemical group 0.000 claims description 55
- 239000004065 semiconductor Substances 0.000 claims description 43
- 229930192474 thiophene Natural products 0.000 claims description 29
- 125000005605 benzo group Chemical group 0.000 claims description 24
- 239000000463 material Substances 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 16
- 239000010409 thin film Substances 0.000 claims description 14
- 125000001072 heteroaryl group Chemical group 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 13
- 238000000151 deposition Methods 0.000 claims description 8
- 238000004528 spin coating Methods 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 6
- 230000003252 repetitive effect Effects 0.000 claims description 6
- 238000007766 curtain coating Methods 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 4
- 238000003618 dip coating Methods 0.000 claims description 3
- 239000000835 fiber Substances 0.000 claims description 3
- 239000007772 electrode material Substances 0.000 claims description 2
- 125000003118 aryl group Chemical group 0.000 abstract description 20
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 abstract 2
- 125000006708 (C5-C14) heteroaryl group Chemical group 0.000 abstract 2
- 125000003860 C1-C20 alkoxy group Chemical group 0.000 abstract 2
- 125000005915 C6-C14 aryl group Chemical group 0.000 abstract 2
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 abstract 1
- 239000002585 base Substances 0.000 description 36
- 238000007639 printing Methods 0.000 description 17
- 238000002360 preparation method Methods 0.000 description 16
- 239000000243 solution Substances 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 229910052799 carbon Inorganic materials 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 10
- 125000000753 cycloalkyl group Chemical group 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 9
- 230000005669 field effect Effects 0.000 description 9
- 239000000178 monomer Substances 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- OHZAHWOAMVVGEL-UHFFFAOYSA-N 2,2'-bithiophene Chemical compound C1=CSC(C=2SC=CC=2)=C1 OHZAHWOAMVVGEL-UHFFFAOYSA-N 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 125000003638 stannyl group Chemical group [H][Sn]([H])([H])* 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 125000003342 alkenyl group Chemical group 0.000 description 7
- 125000000304 alkynyl group Chemical group 0.000 description 7
- 229920001577 copolymer Polymers 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 239000004793 Polystyrene Substances 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 230000008901 benefit Effects 0.000 description 6
- 239000003990 capacitor Substances 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 229920002223 polystyrene Polymers 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N pyridine Substances C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 238000005160 1H NMR spectroscopy Methods 0.000 description 5
- UYEZRRZWTSRZQT-UHFFFAOYSA-N 3-bromo-2-thiophen-2-ylthiophene Chemical compound C1=CSC(C=2SC=CC=2)=C1Br UYEZRRZWTSRZQT-UHFFFAOYSA-N 0.000 description 5
- 150000003851 azoles Chemical class 0.000 description 5
- 150000001721 carbon Chemical group 0.000 description 5
- 239000002322 conducting polymer Substances 0.000 description 5
- 229920001940 conductive polymer Polymers 0.000 description 5
- 239000003989 dielectric material Substances 0.000 description 5
- 239000002019 doping agent Substances 0.000 description 5
- 125000005842 heteroatom Chemical group 0.000 description 5
- 238000007641 inkjet printing Methods 0.000 description 5
- 150000003254 radicals Chemical class 0.000 description 5
- 229910052717 sulfur Inorganic materials 0.000 description 5
- COIOYMYWGDAQPM-UHFFFAOYSA-N tris(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C=1C(=CC=CC=1)C)C1=CC=CC=C1C COIOYMYWGDAQPM-UHFFFAOYSA-N 0.000 description 5
- PBKONEOXTCPAFI-UHFFFAOYSA-N 1,2,4-trichlorobenzene Chemical class ClC1=CC=C(Cl)C(Cl)=C1 PBKONEOXTCPAFI-UHFFFAOYSA-N 0.000 description 4
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 4
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 239000002800 charge carrier Substances 0.000 description 4
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- YCOZIPAWZNQLMR-UHFFFAOYSA-N heptane - octane Natural products CCCCCCCCCCCCCCC YCOZIPAWZNQLMR-UHFFFAOYSA-N 0.000 description 4
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 125000003367 polycyclic group Chemical group 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 239000011669 selenium Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- BGHCVCJVXZWKCC-UHFFFAOYSA-N tetradecane Chemical compound CCCCCCCCCCCCCC BGHCVCJVXZWKCC-UHFFFAOYSA-N 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 229920000144 PEDOT:PSS Polymers 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000295 complement effect Effects 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000000813 microcontact printing Methods 0.000 description 3
- 238000007645 offset printing Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000005693 optoelectronics Effects 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 229910052711 selenium Inorganic materials 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000011877 solvent mixture Substances 0.000 description 3
- 0 *c(cc(-c([s]1)cc(*)c1Br)[s]1)c1Br Chemical compound *c(cc(-c([s]1)cc(*)c1Br)[s]1)c1Br 0.000 description 2
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 2
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical compound C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 description 2
- YMMGRPLNZPTZBS-UHFFFAOYSA-N 2,3-dihydrothieno[2,3-b][1,4]dioxine Chemical compound O1CCOC2=C1C=CS2 YMMGRPLNZPTZBS-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910020366 ClO 4 Inorganic materials 0.000 description 2
- 241001269238 Data Species 0.000 description 2
- 229910018286 SbF 6 Inorganic materials 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 239000005864 Sulphur Substances 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- MCEWYIDBDVPMES-UHFFFAOYSA-N [60]pcbm Chemical compound C123C(C4=C5C6=C7C8=C9C%10=C%11C%12=C%13C%14=C%15C%16=C%17C%18=C(C=%19C=%20C%18=C%18C%16=C%13C%13=C%11C9=C9C7=C(C=%20C9=C%13%18)C(C7=%19)=C96)C6=C%11C%17=C%15C%13=C%15C%14=C%12C%12=C%10C%10=C85)=C9C7=C6C2=C%11C%13=C2C%15=C%12C%10=C4C23C1(CCCC(=O)OC)C1=CC=CC=C1 MCEWYIDBDVPMES-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 125000002047 benzodioxolyl group Chemical group O1OC(C2=C1C=CC=C2)* 0.000 description 2
- 150000005347 biaryls Chemical group 0.000 description 2
- 239000011469 building brick Substances 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- KWTSZCJMWHGPOS-UHFFFAOYSA-M chloro(trimethyl)stannane Chemical compound C[Sn](C)(C)Cl KWTSZCJMWHGPOS-UHFFFAOYSA-M 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000004440 column chromatography Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 239000013530 defoamer Substances 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 239000002270 dispersing agent Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- NDJKXXJCMXVBJW-UHFFFAOYSA-N heptadecane Chemical compound CCCCCCCCCCCCCCCCC NDJKXXJCMXVBJW-UHFFFAOYSA-N 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- CBFCDTFDPHXCNY-UHFFFAOYSA-N icosane Chemical compound CCCCCCCCCCCCCCCCCCCC CBFCDTFDPHXCNY-UHFFFAOYSA-N 0.000 description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- UBJFKNSINUCEAL-UHFFFAOYSA-N lithium;2-methylpropane Chemical compound [Li+].C[C-](C)C UBJFKNSINUCEAL-UHFFFAOYSA-N 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- RZJRJXONCZWCBN-UHFFFAOYSA-N octadecane Chemical compound CCCCCCCCCCCCCCCCCC RZJRJXONCZWCBN-UHFFFAOYSA-N 0.000 description 2
- 125000000160 oxazolidinyl group Chemical group 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 125000004043 oxo group Chemical group O=* 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 2
- 229920000767 polyaniline Polymers 0.000 description 2
- 229920006389 polyphenyl polymer Polymers 0.000 description 2
- 229920000128 polypyrrole Polymers 0.000 description 2
- 229920000123 polythiophene Polymers 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- SMUQFGGVLNAIOZ-UHFFFAOYSA-N quinaldine Chemical compound C1=CC=CC2=NC(C)=CC=C21 SMUQFGGVLNAIOZ-UHFFFAOYSA-N 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 238000010129 solution processing Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 125000000335 thiazolyl group Chemical group 0.000 description 2
- IIYFAKIEWZDVMP-UHFFFAOYSA-N tridecane Chemical compound CCCCCCCCCCCCC IIYFAKIEWZDVMP-UHFFFAOYSA-N 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- CSNIZNHTOVFARY-UHFFFAOYSA-N 1,2-benzothiazole Chemical compound C1=CC=C2C=NSC2=C1 CSNIZNHTOVFARY-UHFFFAOYSA-N 0.000 description 1
- NDOVLWQBFFJETK-UHFFFAOYSA-N 1,4-thiazinane 1,1-dioxide Chemical compound O=S1(=O)CCNCC1 NDOVLWQBFFJETK-UHFFFAOYSA-N 0.000 description 1
- YHIIJNLSGULWAA-UHFFFAOYSA-N 1,4-thiazinane 1-oxide Chemical compound O=S1CCNCC1 YHIIJNLSGULWAA-UHFFFAOYSA-N 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 1
- 125000005955 1H-indazolyl group Chemical group 0.000 description 1
- KAESVJOAVNADME-UHFFFAOYSA-N 1H-pyrrole Natural products C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 1
- JCZAVVUIFWZMQI-UHFFFAOYSA-N 1h-thieno[2,3-d]imidazole Chemical compound N1C=NC2=C1C=CS2 JCZAVVUIFWZMQI-UHFFFAOYSA-N 0.000 description 1
- 125000003229 2-methylhexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- XCMISAPCWHTVNG-UHFFFAOYSA-N 3-bromothiophene Chemical compound BrC=1C=CSC=1 XCMISAPCWHTVNG-UHFFFAOYSA-N 0.000 description 1
- KQBVVLOYXDVATK-UHFFFAOYSA-N 4,5,6,7-tetrahydro-1h-indole Chemical compound C1CCCC2=C1C=CN2 KQBVVLOYXDVATK-UHFFFAOYSA-N 0.000 description 1
- OURXRFYZEOUCRM-UHFFFAOYSA-N 4-hydroxymorpholine Chemical compound ON1CCOCC1 OURXRFYZEOUCRM-UHFFFAOYSA-N 0.000 description 1
- 229910017008 AsF 6 Inorganic materials 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical class C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- 229910019800 NbF 5 Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920002367 Polyisobutene Polymers 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- KDCGOANMDULRCW-UHFFFAOYSA-N Purine Natural products N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 1
- 229910018287 SbF 5 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 1
- 238000006619 Stille reaction Methods 0.000 description 1
- 238000006069 Suzuki reaction reaction Methods 0.000 description 1
- AVRWEULSKHQETA-UHFFFAOYSA-N Thiophene-2 Chemical compound S1C=2CCCCCC=2C(C(=O)OC)=C1NC(=O)C1=C(F)C(F)=C(F)C(F)=C1F AVRWEULSKHQETA-UHFFFAOYSA-N 0.000 description 1
- 229910007926 ZrCl Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- OIPILFWXSMYKGL-UHFFFAOYSA-N acetylcholine Chemical compound CC(=O)OCC[N+](C)(C)C OIPILFWXSMYKGL-UHFFFAOYSA-N 0.000 description 1
- 229960004373 acetylcholine Drugs 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 230000003190 augmentative effect Effects 0.000 description 1
- 239000000022 bacteriostatic agent Substances 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- MXMZCLLIUQEKSN-UHFFFAOYSA-N benzimidazoline Chemical compound C1=CC=C2NCNC2=C1 MXMZCLLIUQEKSN-UHFFFAOYSA-N 0.000 description 1
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 1
- 125000000499 benzofuranyl group Chemical group O1C(=CC2=C1C=CC=C2)* 0.000 description 1
- 125000004619 benzopyranyl group Chemical group O1C(C=CC2=C1C=CC=C2)* 0.000 description 1
- 125000001164 benzothiazolyl group Chemical group S1C(=NC2=C1C=CC=C2)* 0.000 description 1
- 125000004196 benzothienyl group Chemical group S1C(=CC2=C1C=CC=C2)* 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 125000002619 bicyclic group Chemical group 0.000 description 1
- SHOMMGQAMRXRRK-UHFFFAOYSA-N bicyclo[3.1.1]heptane Chemical compound C1C2CC1CCC2 SHOMMGQAMRXRRK-UHFFFAOYSA-N 0.000 description 1
- 230000003115 biocidal effect Effects 0.000 description 1
- 239000003139 biocide Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- 125000000480 butynyl group Chemical group [*]C#CC([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 150000001768 cations Chemical group 0.000 description 1
- 125000003016 chromanyl group Chemical group O1C(CCC2=CC=CC=C12)* 0.000 description 1
- 125000000259 cinnolinyl group Chemical class N1=NC(=CC2=CC=CC=C12)* 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 235000019628 coolness Nutrition 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229920006037 cross link polymer Polymers 0.000 description 1
- 238000006880 cross-coupling reaction Methods 0.000 description 1
- 125000001047 cyclobutenyl group Chemical group C1(=CCC1)* 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- CHVJITGCYZJHLR-UHFFFAOYSA-N cyclohepta-1,3,5-triene Chemical compound C1C=CC=CC=C1 CHVJITGCYZJHLR-UHFFFAOYSA-N 0.000 description 1
- 125000003678 cyclohexadienyl group Chemical group C1(=CC=CCC1)* 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Natural products CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- WMKGGPCROCCUDY-PHEQNACWSA-N dibenzylideneacetone Chemical compound C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1 WMKGGPCROCCUDY-PHEQNACWSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005685 electric field effect Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 150000002240 furans Chemical class 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 description 1
- 125000002632 imidazolidinyl group Chemical group 0.000 description 1
- 125000002636 imidazolinyl group Chemical group 0.000 description 1
- 125000005945 imidazopyridyl group Chemical group 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 125000003387 indolinyl group Chemical group N1(CCC2=CC=CC=C12)* 0.000 description 1
- HOBCFUWDNJPFHB-UHFFFAOYSA-N indolizine Chemical compound C1=CC=CN2C=CC=C21 HOBCFUWDNJPFHB-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000003049 inorganic solvent Substances 0.000 description 1
- 229910001867 inorganic solvent Inorganic materials 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 125000000904 isoindolyl group Chemical group C=1(NC=C2C=CC=CC12)* 0.000 description 1
- 125000005956 isoquinolyl group Chemical group 0.000 description 1
- 125000001786 isothiazolyl group Chemical group 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- XZWYZXLIPXDOLR-UHFFFAOYSA-N metformin Chemical compound CN(C)C(=N)NC(N)=N XZWYZXLIPXDOLR-UHFFFAOYSA-N 0.000 description 1
- WPHGSKGZRAQSGP-UHFFFAOYSA-N methylenecyclohexane Natural products C1CCCC2CC21 WPHGSKGZRAQSGP-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 125000002757 morpholinyl group Chemical group 0.000 description 1
- VAMFXQBUQXONLZ-UHFFFAOYSA-N n-alpha-eicosene Natural products CCCCCCCCCCCCCCCCCCC=C VAMFXQBUQXONLZ-UHFFFAOYSA-N 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000006574 non-aromatic ring group Chemical group 0.000 description 1
- LQERIDTXQFOHKA-UHFFFAOYSA-N nonadecane Chemical compound CCCCCCCCCCCCCCCCCCC LQERIDTXQFOHKA-UHFFFAOYSA-N 0.000 description 1
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 1
- 125000005482 norpinyl group Chemical group 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000010525 oxidative degradation reaction Methods 0.000 description 1
- RGSFGYAAUTVSQA-UHFFFAOYSA-N pentamethylene Natural products C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 125000005981 pentynyl group Chemical group 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- XUWHAWMETYGRKB-UHFFFAOYSA-N piperidin-2-one Chemical compound O=C1CCCCN1 XUWHAWMETYGRKB-UHFFFAOYSA-N 0.000 description 1
- 125000005936 piperidyl group Chemical group 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001291 polyvinyl halide Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 150000003214 pyranose derivatives Chemical class 0.000 description 1
- 125000004309 pyranyl group Chemical class O1C(C=CC=C1)* 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000003072 pyrazolidinyl group Chemical group 0.000 description 1
- 125000002755 pyrazolinyl group Chemical group 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- 125000002098 pyridazinyl group Chemical group 0.000 description 1
- YEYHFKBVNARCNE-UHFFFAOYSA-N pyrido[2,3-b]pyrazine Chemical compound N1=CC=NC2=CC=CN=C21 YEYHFKBVNARCNE-UHFFFAOYSA-N 0.000 description 1
- BWESROVQGZSBRX-UHFFFAOYSA-N pyrido[3,2-d]pyrimidine Chemical compound C1=NC=NC2=CC=CN=C21 BWESROVQGZSBRX-UHFFFAOYSA-N 0.000 description 1
- 125000000719 pyrrolidinyl group Chemical group 0.000 description 1
- 125000001422 pyrrolinyl group Chemical group 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000001338 self-assembly Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000005958 tetrahydrothienyl group Chemical group 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 125000001113 thiadiazolyl group Chemical group 0.000 description 1
- DBDCNCCRPKTRSD-UHFFFAOYSA-N thieno[3,2-b]pyridine Chemical compound C1=CC=C2SC=CC2=N1 DBDCNCCRPKTRSD-UHFFFAOYSA-N 0.000 description 1
- 229940125670 thienopyridine Drugs 0.000 description 1
- 239000002175 thienopyridine Substances 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- BRNULMACUQOKMR-UHFFFAOYSA-N thiomorpholine Chemical compound C1CSCCN1 BRNULMACUQOKMR-UHFFFAOYSA-N 0.000 description 1
- 150000003577 thiophenes Chemical class 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- RCHUVCPBWWSUMC-UHFFFAOYSA-N trichloro(octyl)silane Chemical compound CCCCCCCC[Si](Cl)(Cl)Cl RCHUVCPBWWSUMC-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- RSJKGSCJYJTIGS-UHFFFAOYSA-N undecane Chemical compound CCCCCCCCCCC RSJKGSCJYJTIGS-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D495/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
- C07D495/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D495/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
- C07D495/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
- C07D495/04—Ortho-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
- C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
- C08G61/123—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds
- C08G61/126—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds with a five-membered ring containing one sulfur atom in the ring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
- H01B1/12—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
- H01B1/12—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
- H01B1/124—Intrinsically conductive polymers
- H01B1/127—Intrinsically conductive polymers comprising five-membered aromatic rings in the main chain, e.g. polypyrroles, polythiophenes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/464—Lateral top-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/151—Copolymers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
- H10K85/6576—Polycyclic condensed heteroaromatic hydrocarbons comprising only sulfur in the heteroaromatic polycondensed ring system, e.g. benzothiophene
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Thin Film Transistor (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Photovoltaic Devices (AREA)
Abstract
包含式(I)的基团作为重复单元并且具有5,000-200,000g/mol的数均分子量Mn的聚(5,5′-二(噻吩-2-基)苯并[2,1-b;3,4-b’]二噻吩),其中R独立地选自a)C1-20烷基,b)C2-20链烯基,c)C2-20炔基,d)C1-20烷氧基,e)-Y-C3-10环烷基,f)-Y-C6-14芳基,g)-Y-3-12元环杂烷基或h)-Y-5-14元杂芳基,其中C1-20烷基、C2-20链烯基、C2-20炔基、C3-10环烷基、C6-14芳基、3-12元环杂烷基和5-14元杂芳基各自任选被1-4个基团R1取代,R1独立地选自a)S(O)m-C1-20烷基,b)S(O)m-OC1-20烷基,c)S(O)m-OC6-14芳基,d)C(O)-OC1-20烷基,e)C(O)-OC6-14芳基,f)C1-20烷基,g)C2-20链烯基,h)C2-20炔基,i)C1-20烷氧基,j)C3-10环烷基,k)C6-14芳基,l)3-12元环杂烷基或m)5-14元杂芳基,Y独立地选自二价C1-6烷基,或共价键;和m独立地选自0、1或2。
Description
本发明涉及聚(5,5′-二(噻吩-2-基)苯并[2,1-b;3,4-b′]二噻吩)及其作为高性能可溶液加工半导体聚合物的用途。
在二十世纪下半叶开发(微)电子器件的惊人结构单元是基于无机电极、绝缘体和半导体的场效应晶体管(FET)。已经证明这些材料可靠、高效且具有根据众所周知的Moore定律周期性提高的性能。不与常规硅技术竞争,基于分子材料和聚合物材料的有机FET(OFET)可能大规模应用于低性能存储元件以及集成光电子器件,如在有源阵列有机发光二极管显示器、RFID标签、智能ID标签和传感器中的像素驱动器(pixel drive)和开关元件。
作为开发几种导电性或半导体性有机聚合物的结果,它们在有机薄膜晶体管(OTFT)中作为有源层并因而作为半导体的应用赢得越来越多的关注。
在OTFT中使用有机半导体相比于迄今为止所使用的无机半导体具有一些优点。它们可以以从纤维到薄膜的任何形式加工,具有高机械柔韧性,能以低成本生产且重量轻。然而,显著的优点是可以通过在大气压力下例如通过印刷技术在聚合物基底上由溶液沉积各层而生产整个半导体组件,从而得到可廉价生产的FET。
电子器件的性能主要取决于载流子在半导体材料中的迁移率以及开启状态和关闭状态之间的电流比(开/关比)。因此,理想的半导体在关闭状态下具有最小导电性且在开启状态下具有最大载流子迁移率(迁移率大于10-3cm2V-1s-1,开/关比大于102)。此外,半导体材料必须对氧化相对稳定,即必须具有足够高的电离电位,因为其氧化降解降低组件性能。
EP1510535A1描述了迁移率为3×10-3或1.7×10-2cm2V-1s-1且开/关比为约106的聚噻吩并(2,3-b)噻吩。WO2006/094645A1描述了具有一个或多个硒吩-2,5-二基和一个或多个噻吩-2,5-二基的聚合物,而WO 2006/131185公开了聚噻吩并(3,4-d)噻唑且US 2005/0082525A1公开了苯并(1,2-b,4,5-b’)二噻吩。
WO2007/105386公开了具有下列重复单元且重均分子量为至多105g/mol的取代苯并[2,1-b;3,4-b′]二噻吩的均聚物和共聚物:
两种报道的材料均具有10-5-10-3cm2/Vs的载流子迁移率。
此外,报道了重均分子量仅为4100g/mol的与联噻吩的共聚物:
该材料在场效应晶体管中仅显示出非常差的性能(迁移率:1.6×10-5,开/关比:100)。
本发明的目的是提供用作有机半导体材料的新化合物,它们易于合成,具有高迁移率、良好的氧化稳定性且可以容易地加工。
该目的由一种包含式(I)的基团作为重复单元并且具有5,000-200,000g/mol的数均分子量Mn的聚(5,5′-二(噻吩-2-基)苯并[2,1-b;3,4-b’]二噻吩)实现:
其中
R独立地选自a)C1-20烷基,b)C2-20链烯基,c)C2-20炔基,d)C1-20烷氧基,e)-Y-C3-10环烷基,f)-Y-C6-14芳基,g)-Y-3-12元环杂烷基或h)-Y-5-14元杂芳基,
其中C1-20烷基、C2-20链烯基、C2-20炔基、C3-10环烷基、C6-14芳基、3-12元环杂烷基和5-14元杂芳基各自任选被1-4个基团R1取代,
R1独立地选自a)S(O)m-C1-20烷基,b)S(O)m-OC1-20烷基,c)S(O)m-OC6-14芳基,d)C(O)-OC1-20烷基,e)C(O)-OC6-14芳基,f)C1-20烷基,g)C2-20链烯基,h)C2-20炔基,i)C1-20烷氧基,j)C3-10环烷基,k)C6-14芳基,l)3-12元环杂烷基或m)5-14元杂芳基,
Y独立地选自二价C1-6烷基,或共价键;和
m独立地选自0、1或2。
优选的聚(5,5′-二(噻吩-2-基)苯并[2,1-b;3,4-b′]二噻吩)是包含如下式(I)的重复单元的那些,其中
R独立地选自如上所定义的a)C1-20烷基,d)C1-20烷氧基,f)-Y-C6-14芳基,其中C1-20烷基和C6-14芳基各自任选被1-4个基团R1取代,和
R1独立地选自d)-C(O)-OC1-20烷基,e)-C(O)-OC6-14芳基,f)C1-20烷基,i)C1-20烷氧基,k)C6-14芳基。
更优选的重复单元是如下式(I)的那些,其中
R独立地选自如上所定义的a)C1-20烷基,d)C1-20烷氧基,
其中C1-20烷基或C1-20烷氧基各自任选被1-4个基团R1取代,和R1独立地选自f)C1-20烷基,i)C1-20烷氧基,
特别优选的重复单元是如下式(I)的那些,其中
R独立地选自如上所定义的a)C1-20烷基,和
其中C1-20烷基各自任选被1-4个基团R1取代,和
R1独立地选自f)C1-20烷基。
特别优选的取代基R为任选被1-4个基团R1取代的C6-20烷基,其中R1为H或C1-C6烷基。
本发明聚(5,5′-二(噻吩-2-基)苯并[2,1-b;3,4-b’]二噻吩)的优点是在场效应晶体管中的载流子迁移率显著提高。
数均分子量Mn优选为10,000-100,000g/mol。
“链烯基”指具有一个或多个碳-碳双键的直链或支链烷基。实例是乙烯基、丙烯基、丁烯基、戊烯基、己烯基、丁二烯基、戊二烯基和己二烯基。所述一个或多个碳-碳双键可位于内部(如在2-丁烯中)或端部(如在1-丁烯中)。在各种实施方案中,链烯基可具有2-20个碳原子。在一些实施方案中,链烯基可以如本文所公开那样被取代。链烯基通常不被另一链烯基、烷基或炔基取代。
“炔基”指具有一个或多个碳-碳叁键的直链或支链烷基。实例包括乙炔基、丙炔基、丁炔基、戊炔基。所述一个或多个碳-碳叁键可位于内部(如在2-丁炔中)或端部(如在1-丁炔中)。在各种实施方案中,炔基可具有2-20个碳原子。在一些实施方案中,炔基可以如本文所公开那样被取代。炔基通常不被另一炔基、烷基或链烯基取代。
“环烷基”指非芳族碳环基团,包括环化烷基、链烯基和炔基。优选的环烷基可具有3-10个碳原子。环烷基可以是单环的(例如环己基)或多环的(例如含有稠合、桥接和/或螺环体系),其中碳原子位于环体系的内部或外部。环烷基的任何合适环位置可以共价连接于确定的化学结构。环烷基的实例包括环丙基、环丁基、环戊基、环己基、环庚基、环戊烯基、环己烯基、环己二烯基、环庚三烯基、降冰片烷基(norbornyl)、降蒎烷基(norpinyl)、降蒈烷基(norcaryl)、金刚烷基和螺[4.5]癸烷基,以及它们的同系物、异构体等。环烷基可以如本文所公开那样被取代。
“杂原子”指碳或氢以外的任何元素的原子且包括例如氮、氧、硅、硫、磷和硒。
“环杂烷基”指含有至少一个选自O、S、Se、N、P和Si(例如O、S和N)的环杂原子且任选含有一个或多个双键或叁键的非芳族环烷基。环杂烷基可具有3-12个环原子。环杂烷基环中的一个或多个N、P、S或Se原子(例如N或S)可被氧化(例如吗啉N-氧化物、硫吗啉S-氧化物、硫吗啉S,S-二氧化物)。环杂烷基的氮或磷原子可具有取代基,尤其是烷基。环杂烷基还可含有一个或多个氧代基团,如氧代哌啶基、氧代唑烷基、二氧代-(1H,3H)-嘧啶基、氧代-2(1H)-吡啶基等。优选的环杂烷基尤其包括吗啉基、硫吗啉基、吡喃基、咪唑烷基、咪唑啉基、唑烷基、吡唑烷基、吡唑啉基、吡咯烷基、吡咯啉基、四氢呋喃基、四氢噻吩基、哌啶基、哌嗪基。环杂烷基可被取代或未被取代。
“芳基”指其中两个或更多个芳族烃环稠合在一起(即具有共同的键)或至少一个芳族单环烃环与一个或多个环烷基和/或环杂烷基环稠合的芳族单环烃环体系或多环体系。芳基可以在可包括多个稠环的其环体系中具有6-14个碳原子。仅具有芳族碳环的优选芳基包括苯基、1-萘基(双环)、2-萘基(双环)、蒽基(三环)、菲基(三环)。其中至少一个芳族碳环与一个或多个环烷基和/或环杂烷基环稠合的优选多环体系尤其包括环戊烷的苯并衍生物(即为5,6-双环环烷基/芳族环体系的2,3-二氢化茚基),环己烷的苯并衍生物(即为6,6-双环环烷基/芳族环体系的四氢萘基),咪唑啉的苯并衍生物(即为5,6-双环环杂烷基/芳族环体系的苯并咪唑啉基)和吡喃的苯并衍生物(即为6,6-双环环杂烷基/芳族环体系的苯并吡喃基)。进一步优选的芳基包括苯并二烷基、苯并间二氧杂环戊烯基(benzodioxolyl)、苯并二氢吡喃基、二氢吲哚基等。在一些实施方案中,芳基可以如本文所公开那样被取代。在一些实施方案中,芳基可以具有一个或多个卤素取代基并且可称为“卤代芳基”。全卤代芳基,即其中所有氢原子被卤原子替换的芳基(例如-C6F5)包括在“卤代芳基”的定义内。在某些实施方案中,芳基被另一芳基取代且可称为联芳基。在联芳基中的芳基各自可被取代或未被取代。
“杂芳基”指含有至少一个环杂原子的芳族单环或多环体系。所述杂原子优选选自氧(O)、氮(N)、硫(S)、硅(Si)和硒(Se)或多环体系,而不限于此。多环杂芳基包括两个或更多个稠合在一起的杂芳基环和与一个或多个芳族碳环、非芳族碳环和/或非芳族环杂烷基环稠合的单环杂芳基环。杂芳基可具有5-14个环原子且含有1-5个环杂原子。杂芳基的特殊实例例如包括如下所示的5或6元单环体系和5-6双环体系:
其中T为O、S、NH、N-烷基、N-芳基、N-(芳基烷基)(例如N-苄基)、SiH2、SiH-(烷基)、Si(烷基)2、SiH-(芳基烷基)、Si-(芳基烷基)2或Si(烷基)(芳基烷基)。该类杂芳基环的实例包括吡咯基、呋喃基、噻吩基、吡啶基、嘧啶基、哒嗪基、吡嗪基、三唑基、四唑基、吡唑基、咪唑基、异噻唑基、噻唑基、噻二唑基、异唑基、唑基、二唑基、吲哚基、异氮杂茚基、苯并呋喃基、苯并噻吩基、喹啉基、2-甲基喹啉基、异喹啉基、喹喔啉基、喹唑啉基、苯并三唑基、苯并咪唑基、苯并噻唑基、苯并异噻唑基、苯并异唑基、苯并二唑基、苯并唑基、噌啉基、1H-吲唑基、2H-吲唑基、中氮茚基、异苯并呋喃基、1,5-二氮杂萘基、2,3-二氮杂萘基、蝶啶基、嘌呤基、唑并吡啶基、噻唑并吡啶基、咪唑并吡啶基、呋喃并吡啶基、噻吩并吡啶基、吡啶并嘧啶基、吡啶并吡嗪基、吡啶并哒嗪基、噻吩并噻唑基、噻吩并唑基、噻吩并咪唑基等。杂芳基的其他实例包括4,5,6,7-四氢吲哚基、四氢喹啉基、苯并噻吩并吡啶基、苯并呋喃并吡啶基等。在一些实施方案中,杂芳基可如本文所公开那样被取代。
R特别优选为直链或支链C6-C20烷基,例如正己基、正庚基、正辛基、正壬基、正癸基、正十一烷基、正十二烷基、正十三烷基、正十四烷基、正十五烷基、正十六烷基、正十七烷基、正十八烷基、正十九烷基、正二十烷基、1-甲基戊基、1-甲基己基、2-甲基戊基、2-乙基己基和2,7-二甲基辛基。特别优选2,6-二甲基辛基、1-乙基己基、1-甲基己基、2-乙基戊基、2-甲基己基、正癸基、正十二烷基、正十四烷基和2-乙基己基,最优选正十二烷基。
“迁移率”指由外部刺激如电场诱发的载流子如在p型半导体材料情况下的空穴(或正电荷单元)和在n型半导体材料情况下的电子在电场的影响下移动通过该材料的速度的度量。
本发明进一步提供了本发明共聚物作为半导体或电荷传输材料的用途,尤其是在光学、电光或电子组件中,作为薄膜晶体管的用途,尤其是在平面视频显示单元中,或用于射频识别标签(RFID标签)或用于有机发光二极管(OLED)如电致发光显示器或液晶显示器背光用半导体组件中的用途,用于光伏组件或传感器中的用途,在电池中作为电极材料的用途,作为光波导的用途,用于电子照相应用如电子照相记录的用途。
本发明进一步提供了包含本发明聚合物的光学、电光或电子组件。该类组件例如可以为FET、集成电路(IC)、TFT、OLED或对准层(alignment layer)。
本发明聚合物特别适合作为半导体,因为它们具有该目的所要求的迁移率。
该聚合物可以被现有技术已知的几种基团封端。优选的端基是H、取代或未取代的苯基或取代或未取代的噻吩,但不限于此。
本发明聚(5,5′-二(噻吩-2-基)苯并[2,1-b;3,4-b′]二噻吩)可通过已知方法制备。优选的合成途径如下所述:
在该方案中,R为C6-C20烷基。
由噻吩-3-甲醛制备[2,2′]联噻吩基-3,3′-二甲醛描述于M.C.Gallazzi,F.Toscano,D.Paganuzzi,C.Bertarelli,A.Farina,G.Zotti,Macromol.Chem.Phys.2001,202,2074中。
由2,2′-联噻吩基-3,3′-二甲醛制备苯并[2,1-b;3,4-b′]二噻吩描述于S.Yoshida,M.Fujii,Y.Aso,T.Otsubo,F.Ogura,J.Org.Chem.1994,59,3077中。
5,5′-二(三甲基甲锡烷基)苯并-2,2’-二噻吩可以通过将叔丁基锂加入在无水THF中的苯并[2,1-b;3,4-b′]二噻吩而制备,此时形成沉淀。向该悬浮液中以固体加入三甲基氯化锡。
由3-溴噻吩制备3-烷基噻吩描述于C.Van Pham,H.B.Mark,H.Zimmer,Synth.Comm.1986,16,689中。
由3-烷基噻吩经由4,4′-二烷基联噻吩制备4,4′-二烷基-5,5′-二溴-2,2′-联噻吩描述于J.H.Wan,J.C.Feng,G.A.Wen,W.Wei,Q.L.Fan,C.M.Wang,H.Y.Wang,R.Zhu,X.D.Yuan,C.H.Huang,W.Huang,J.Org.Chem.2006,71,7124中。
聚(5,5′-二(3-十二烷基噻吩-2-基)苯并[2,1-b;3,4-b′]二噻吩)在三邻甲苯基膦和Pd2(dba)3(dba=二亚苄基丙酮)存在下由5,5′-二(三甲基甲锡烷基)苯并[2,1-b;3,4-b′]二噻吩和4,4′-二烷基-5,5′-二溴-2,2′-联噻吩制备。
该共聚物可经由交叉偶联聚合反应如Stille或Suzuki反应合成,其中使芳基二卤化物与有机锡化合物或硼酸二酯/酸在碱和少量金属催化剂存在下反应。该反应通常在溶剂或溶剂混合物中在20-150℃的反应温度下进行。
对合成高分子量聚合物必要的是所用单体的高纯度以及因此合适的提纯方法。单体(即5,5′-二卤代-2,2′-联噻吩和5,5′-二(三烷基)苯并噻吩)的纯度通常>99%。可以通过在低温下由乙腈重复再结晶(优选至少3次)获得高纯度的5,5′-二(三甲基甲锡烷基)苯并-2,2’-二噻吩。该提纯以无色针状物形式得到单体。
4,4′-烷基-5,5′-二溴-2,2′-联噻吩单体可通过柱色谱法(正己烷,二氧化硅)提纯并随后由乙酸乙酯重复再结晶而以非常高的纯度得到。
使用纯度显著低于99%的单体导致分子量低得多的聚合物。
第二个重要因素是调节单体比例。等摩尔的混合物得到所需分子量。
分子量可以通过调节1∶1单体混合物的浓度而再现性地得到。为了得到15-20kg/mol的高数均分子量,单体的最佳总浓度为10-20重量%。
本发明包括本发明聚合物的氧化形式和还原形式二者。电子的缺乏或过量导致形成具有高导电性的离域离子。这可通过用常规掺杂剂掺杂而实现。掺杂剂和掺杂方法是公知常识且例如由EP-A 0 528 662、US 5198153或WO 96/21659已知。合适的掺杂方法例如包括用掺杂气体掺杂,在包含掺杂剂的溶液中电化学掺杂,通过热扩散以及通过掺杂剂离子注入半导体材料中。
在使用电子作为载流子的情况下,优选使用卤素(例如I2、Cl2、Br2、ICl、ICl3、IBr和IF),路易斯酸(例如PF5、AsF5、SbF5、BF3、BCl3、SbCl5、BBr3和SO3),无机酸(例如HF、HCl、HNO3、H2SO4、HClO4、FSO3H和ClSO3H),有机酸或氨基酸,过渡金属化合物(例如FeCl3、FeOCl、Fe(ClO4)3、Fe(4-CH3C6H4SO3)3、TiCl4、ZrCl4、HfCl4、NbF5、NbCl5、TaCl5、MoF5、MoCl5、WF5、WCl6、UF6和LnCl3(其中Ln为镧系元素),阴离子(例如Cl-、Br-、I-、I3 -、HSO4 -、SO4 2-、NO3 -、ClO4 -、BF4 -、PF6 -、AsF6 -、SbF6 -、FeCl4 -、Fe(CN)6 3-,以及不同磺酸的阴离子如芳基-SO3 -。在使用空穴作为载流子的情况下,作为掺杂剂的例如是阳离子(例如H+、Li+、Na+、K+、Rb+和Cs+),碱金属(例如Li、Na、K、Rb和Cs),碱土金属(例如Ca、Sr和Ba),O2,XeOF4,(NO2 +)(SbF6 -),(NO2 +)(SbCl6 -),(NO2 +)(BF4 -),AgClO4,H2IrCl6,La(NO3)3,FSO2OOSO2F,Eu,乙酰胆碱,R4N+,R4P+,R6As+和R3S+,其中R为烷基。
本发明共聚物的导电形式可用作有机导体,例如在有机发光二极管(OLED)中的电荷注入层和ITO平面化层,平面屏和触摸屏,抗静电膜,印刷电路和电容器,但不限于此。
本发明共聚物可用于生产光学、电子和半导体材料,尤其是作为场效应晶体管(FET)中的电荷传输材料,例如作为集成电路(IC)、ID标签或TFT的组件。或者它们可用于电致发光显示器中的有机发光二极管(OLED)或用作背光,例如液晶显示器(LCD),用于光伏应用或传感器,用于电子照相记录和其他半导体应用。
因为本发明共聚物具有良好的溶解性,因此它们可作为溶液施涂于基底上。因此可用廉价方法,例如旋涂施涂各层。
合适的溶剂或溶剂混合物例如包括烷烃、芳烃,尤其是其氟化衍生物。
包含半导体材料的FET和其他组件如二极管可以有利地用于ID标签或安全标记中以显示有价值物品如钞票、信用卡、身份文件如ID卡或驾驶执照或具有金钱利益的其他文件如橡皮图章、邮票或票券等的真实性和防止伪造。
或者,本发明聚合物可以用于有机发光二极管(OLED)中,例如用于显示器中或用作液晶显示器(LCD)的背光。通常而言,OLED具有多层结构。发光层通常嵌入一个或多个电子-和/或空穴传输层之间。当施加电压时,电子或空穴可在发射层的方向迁移,其中它们在发射层中复合而激发并且发光化合物随后发光。该聚合物、材料和层可以根据其电学和光学性能用于一个或多个传输层和/或发射层。当该化合物、材料或层为电致发光的或具有电致发光基团或化合物时,它们特别适于发射层。
类似于用于OLED中的合适聚合物的加工,选择属于公知常识且例如描述于Synthetic Materials,111-112(2000),31-34或J.Appl.Phys.,88(2000)7124-7128中。
对有机半导体已经使用包括由各种溶液加工技术进行沉积在内的各种沉积技术。例如,印刷电子技术大多集中在喷墨印刷,主要是因为该技术对特征布置(feature position)和多层定位(multilayer registration)提供了更大的控制。喷墨印刷是无接触方法,其提供的益处是不要求预制底版(与接触印刷技术相比),以及对油墨喷射的数字控制,从而提供按需喷墨印刷。微分配是另一种无接触印刷方法。然而,接触印刷技术所具有的优点是非常适合非常快速的卷绕加工。示例性接触印刷技术包括但不限于丝网印刷、凹版印刷、胶印、柔性版印刷、平版印刷、凹版移印和微接触印刷。本文所用“印刷”包括无接触方法如喷墨印刷、微分配等,以及接触方法如丝网印刷、凹版印刷、胶印、柔性版印刷、平版印刷、凹版移印、微接触印刷等。其他溶液加工技术例如包括旋涂、液滴流延(drop-casting)、区域流延(zone casting)、浸涂、刮涂或喷涂。
使用本文所公开的化合物的各种制品,包括电子器件、光学器件和光电子器件如场效应晶体管(例如薄膜晶体管),光伏器件,有机发光二极管(OLED),互补金属氧化物半导体(CMOS),互补反相器,D触发器,整流器和环形振荡器正如其制造方法一样也在本教导的范围内。
因此,本教导进一步提供了制备半导体材料的方法。该方法可包括制备一种包括一种或多种溶于或分散于液体介质如溶剂或溶剂混合物中的本文所公开的化合物的组合物,将该组合物沉积于基底上以提供半导体材料前体并加工(例如加热)该半导体前体以提供包括本文所公开的化合物的半导体材料(例如薄膜半导体)。在各种实施方案中,液体介质为有机溶剂、无机溶剂如水或其组合。在一些实施方案中,该组合物可以进一步包括一种或多种独立地选自洗涤剂、分散剂、粘合剂、相容剂、固化剂、引发剂、保湿剂、消泡剂、润湿剂、pH调节剂、生物杀伤剂和抑菌剂的添加剂。例如,可包括表面活性剂和/或其他聚合物(例如聚苯乙烯、聚乙烯、聚-α-甲基苯乙烯、聚异丁烯、聚丙烯、聚甲基丙烯酸甲酯等)作为分散剂、粘合剂、相容剂和/或消泡剂。在一些实施方案中,沉积步骤可通过印刷进行,包括喷墨印刷和各种接触印刷技术(例如丝网印刷、凹版印刷、胶印、凹版移印、平版印刷、柔性版印刷和微接触印刷)。在其他实施方案中,沉积步骤可通过旋涂、液滴流延、区域流延、浸涂、刮涂或喷涂进行。
本教导进一步提供了包括具有本教导的半导体材料和基底组件和/或介电组件的组合件的制品,例如本文所述的各种器件。基底组件可选自掺杂的硅、铟锡氧化物(ITO)、ITO涂覆的玻璃、ITO涂覆的聚酰亚胺或其他塑料、单独或涂覆在聚合物或其他基底上的铝或其他金属、掺杂的聚噻吩等。介电组件可由无机介电材料如各种氧化物(例如SiO2、Al2O3、HfO2),有机介电材料如各种聚合物材料(例如聚碳酸酯、聚酯、聚苯乙烯、聚卤代乙烯、聚丙烯酸酯),自组装超晶格/自组装纳米介电材料(SAS/SAND)(例如如Yoon,M-H.等,PNAS,102(13):4678-4682(2005)所述,其全部公开内容在此引作参考)以及杂化有机/无机介电材料(例如如美国专利申请序列号11/642,504所述,其全部公开内容在此引作参考)制备。在一些实施方案中,介电组件可包括美国专利申请序列号11/315,076、60/816,952和60/861,308所述的交联聚合物共混物,其全部公开内容各自在此引作参考。该组合件还可以包括一个或多个电触点。源电极、漏电极和栅电极的合适材料包括金属(例如Au、Al、Ni、Cu),透明导电氧化物(例如ITO、IZO、ZITO、GZO、GIO、GITO),以及导电聚合物(例如聚(3,4-亚乙二氧基噻吩)聚(苯乙烯磺酸盐)(PEDOT:PSS)、聚苯胺(PANI)、聚吡咯(PPy)。一种或多种本文所述组合件可以包括在各种有机电子、光学和光电子器件如有机薄膜晶体管(OTFT),具体为有机场效应晶体管(OFET),以及传感器,电容器,单极电路,互补电路(例如反相电路)等中。
其中可使用本教导的材料的其他制品是光伏器件或太阳能电池。本教导的组件可以呈现宽的光学吸收和/或非常正向偏移的还原电位,这使得它们对该类应用而言是合乎需要的。因此,本文所公开的物质可在包括形成p-n结的相邻n型半导体材料的光伏设计中用作p型半导体。该化合物可呈薄膜半导体形式,其可沉积在基底上形成组合件。在该类器件中利用本教导的小分子为熟练技术人员所知晓。
因此,本教导的另一方面涉及制造掺有本教导的半导体材料的有机场效应晶体管的方法。本教导的半导体材料可用于制造各种类型的有机场效应晶体管,包括顶层栅极顶接触电容器结构、顶层栅极底接触电容器结构、底层栅极顶接触电容器结构和底层栅极底接触电容器结构。图1说明了4种常见类型的OFET结构:顶接触底层栅极结构(a),底接触底层栅极结构(b),底接触顶层栅极结构(c)和顶接触顶层栅极结构(d)。如图1所示,OFET可包括介电层(例如在图1a、1b、1c和1d中分别示为8、8′、8″和8″′),半导体层(例如在图1a、1b、1c和1d中分别示为6、6′、6″和6″′),栅极触点(例如在图1a、1b、1c和1d中分别示为10、10′、10″和10″′),基底(例如在图1a、1b、1c和1d中分别示为12、12′、12″和12″′)以及源极触点和漏极触点(例如在图1a、1b、1c和1d中分别示为2、2′、2″、2″′、4、4′、4″和4″′)。
在一些实施方案中,OTFT器件可以用本发明化合物在掺杂的硅基底上制造,其中在顶接触几何结构中使用SiO2作为介电材料。在特殊实施方案中,掺入至少一种本教导的材料的半导体有源层可在室温或升高的温度下沉积。在其他实施方案中,掺入至少一种本教导的化合物的半导体有源层可通过本文所述的旋涂或印刷施用。对于顶接触器件,可以使用阴影掩模在膜的顶部对金属触点进行图案化。
所有定量数据(百分数、ppm等)基于重量、基于混合物的总重量,除非另有指明。
本文所引用的所有文献作为参考引入本专利申请中。所有定量数据(百分数、ppm等)基于重量、基于混合物的总重量,除非另有指明。
实施例
实施例1
制备5,5′-二(三甲基甲锡烷基)苯并-2,2’-二噻吩
在氩气下将250mg(1.3mmol)苯并[2,1-b;3,4-b′]二噻吩溶于10ml无水THF中。将该溶液冷却至-78℃,然后加入2.3ml叔丁基锂(3.9mmol,3eq),此时形成白色沉淀。将该悬浮液在-78℃下再搅拌2小时,将900mg(4.5mmol)三甲基氯化锡作为固体加入。将该溶液过夜缓慢温热到室温。将30ml二氯甲烷加入该溶液中,用碳酸氢钠萃取,干燥并蒸发溶剂。将残余物由乙腈在4℃下结晶3次,得到无色针状物(300mg,44%)。Mp=87℃;MS(FD,8kV)m/z 516.1g/mol-C16H22S2Sn2的计算值:515.9g/mol;1H-NMR(250MHz,CD2Cl2,RT):δ7.74(s,2H),δ7.53(s,2H),δ0.45(s,18H);13C-NMR(62.5MHz,CD2Cl2,RT):δ138.9,138.8,138.3,133.3,120.1,-8.0
实施例2
由3-烷基噻吩经由4,4′-二烷基联噻吩制备4,4′-二烷基-5,5′-二溴-2,2′-联噻吩如J.H.Wan,J.C.Feng,G.A.Wen,W.Wei,Q.L.Fan,C.M.Wang,H.Y.Wang,R.Zhu,X.D.Yuan,C.H.Huang,W.Huang,J.Org.Chem.2006,71,7124所述进行。
为了得到纯度>99%的单体,通过柱层析法(正己烷,二氧化硅)提纯4,4′-二烷基-5,5′-二溴-2,2′-联噻吩并由乙酸乙酯结晶3次而得到结晶产物。
实施例3
制备聚(5,5′-二(3-十二烷基噻吩-2-基)苯并[2,1-b;3,4-b′]二噻吩)
在氩气下将103.17mg(0.2mmol)5,5′-二(三甲基甲锡烷基)苯并-2,2’-二噻吩和132.14mg(0.2mmol)4,4′-二(十二烷基)-5,5′-二溴-2,2′-联噻吩溶于2ml无水1,2-二氯苯中。加入5mg(16μmol)三邻甲苯基膦和4mg(4mmol)Pd2(dba)3。将所得混合物加热到140℃并保持3天。将该溶液用1,2-二氯苯稀释并在甲醇中沉淀。在过滤之后将聚合物在甲醇中再沉淀2次并干燥。得到120mg红色固体(87%)。GPC(1,2,4-三氯苯,135℃)分析得到Mn=21000g/mol且Mw=54000g/mol,以聚苯乙烯为标样。1H-NMR(500MHz,80℃,1,2,4-三氯苯-d3)δ7.79(s,2H),δ7.59(s,2H),δ7.29(s,2H),δ3.09(t,J=6.8Hz,4H),δ1.96(quin,J=6.7Hz,4H),δ1.65(quin,J=6.9Hz,4H),δ1.54(quin,J=6.7Hz,4H),δ1.5-1.3(m,28H),δ1.01(t,J=6.8Hz,6H)
实施例4
制备聚(5,5′-二(3-癸基噻吩-2-基)苯并[2,1-b;3,4-b′]二噻吩)
在氩气下将103.17mg(0.2mmol)5,5′-二(三甲基甲锡烷基)苯并-2,2’-二噻吩和120.92mg(0.2mmol)4,4′-二癸基-5,5′-二溴-2,2’-联噻吩溶于2ml无水1,2-二氯苯中,加入5mg(16μmol)三邻甲苯基膦和4mg(4mmol)Pd2(dba)3。将所得混合物加热到140℃并保持3天。将该溶液用1,2-二氯苯稀释并在甲醇中沉淀。在过滤之后将聚合物在甲醇中再沉淀2次并在高真空中干燥。得到100mg红色固体(79%)。GPC(1,2,4-三氯苯,135℃)分析得到Mn=13kg/mol且Mw=29kg/mol,以聚苯乙烯为标样。1H-NMR(500MHz,100℃,1,2-二氯苯-d4)δ7.65(s,2H),δ7.46(s,2H),δ7.17(s,2H),δ2.93(t,J=7.6Hz,4H),δ1.79(quin,J=7.3Hz,4H),δ1.47(quin,J=7.2Hz,4H),δ1.37(quin,J=6.5Hz,4H),δ1.5-1.3(m,20H),δ0.85(t,J=6.6Hz,6H)
实施例5
制备聚(5,5′-二(3-十四烷基噻吩-2-基)苯并[2,1-b;3,4-b′]二噻吩)
如上所述使103.17mg(0.2mmol)5,5′-二(三甲基甲锡烷基)苯并-2,2’-二噻吩和143.36mg(0.2mmol)4,4′-二(十四烷基)-5,5′-二溴-2,2′-联噻吩与5mg(16μmol)三邻甲苯基膦和4mg(4mmol)Pd2(dba)3在2ml无水1,2-二氯苯中反应。
在如上所述的相同后处理程序之后,得到135mg(91%)红色固体。GPC(1,2,4-三氯苯,135℃)分析得到Mn=20kg/mol且Mw=44kg/mol,以聚苯乙烯为标样。1H-NMR(500MHz,100℃,1,2-二氯苯-d4)δ7.66(s,2H),δ7.46(s,2H),δ7.18(s,2H),δ2.93(t,J=6.9Hz,4H),δ1.79(quin,J=6.7Hz,4H),δ1.48(quin,J=6.5Hz,4H),δ1.38(quin,J=6.5Hz,4H),δ1.5-1.3(m,36H),δ0.85(t,J=6.5Hz,6H)
实施例6
制备聚(5,5′-二(3-十六烷基噻吩-2-基)苯并[2,1-b;3,4-b′]二噻吩)
如上所述使103.17mg(0.2mmol)5,5′-二(三甲基甲锡烷基)苯并-2,2′-二噻吩和154.58mg(0.2mmol)4,4′-二(十六烷基)-5,5′-二溴-2,2′-联噻吩与5mg(16μmol)三邻甲苯基膦和4mg(4mmol)Pd2(dba)3在2ml无水1,2-二氯苯中反应。
在如上所述的相同后处理程序之后,得到140mg(87%)红色固体。GPC(1,2,4-三氯苯,135℃)分析得到Mn=16kg/mol和Mw=34kg/mol,以聚苯乙烯为标样。1H-NMR(500MHz,100℃,1,2-二氯苯-d4)δ7.66(s,2H),δ7.47(s,2H),δ7.17(s,2H),δ2.94(t,J=7.2Hz,4H),δ1.80(quin,J=7.1Hz,4H),δ1.46(quin,J=6.8Hz,4H),δ1.38(quin,J=6.5Hz,4H),δ1.5-1.3(m,44H),δ0.85(t,J=6.5Hz,6H)
实施例7
FET器件制备和测量I
有机场效应晶体管(OFET)提供允许经由电流-电压响应的评价对材料的电荷传输特性进行详细分析的简单器件结构。OFET的功能是作为栅电压的函数调制源电极和漏电极之间的半导体导电性。在该实施例中使用其中将源电极和漏电极气相沉积在半导体膜顶部上的顶接触/底层栅极构造器件。选择OFET结构以获得聚合物传导能力但不限制该材料类别的使用领域。
对于在该实施例中制造和研究的器件而言,栅极为高度掺杂的硅,而介电层为300nm厚的SiO2膜。通过将根据实施例3制备的聚合物在邻二氯苯中的溶液(1mg/mL)以1000rpm的旋转速率旋涂到正辛基三氯硅烷蒸气处理过的基底上而制备半导体聚合物膜。通过在半导体薄膜上通过阴影掩模气相沉积Au(3×10-6乇,~100nm厚)制造顶接触TFT,得到沟道宽度为25-200μm且长度为约1-5mm的器件。用Keithley 2612机器在环境条件下进行电测量。使用Id对Vg的传输图计算所有器件的饱和迁移率、阈值电压和电流开关比。为了对比各系列的电性能,对Vd计算所有参数,以确保该器件在饱和状态(Vd>Vg)下操作。图2示出了在真空下测量的该类器件的示例性传输和输出图。载流子迁移率高达5×10-2cm2/Vs且在环境条件下I开/I关>104。
迁移率/cm2/Vs | I开/I关 | 阈值电压/V |
4.9×10-2 | 105 | 8 |
图3示出了在环境条件下测量的示例性传输(右,Vsd=-10V,-60V)和输出(左,Vsg=0,-10,-20,-30,-40,-50,-60V)图。
实施例8
FET器件制备和测量II
对于所有器件,将具有200nm厚热生长二氧化硅层的重度掺杂的硅晶片用作基底。在120℃下由气相沉积六甲基二硅氮烷。通过旋涂(3000rpm,60s)5mg/ml根据实施例3-6制备的聚合物的1,2-二氯苯溶液(约47.5nm厚)而制备半导体聚合物膜。在使基底在100℃下退火30分钟并缓慢冷却(1℃/min)之后,通过在半导体薄膜上通过阴影掩模气相沉积金(3×10-6乇,~100nm厚)而制造源电极和漏电极,得到沟道长度25-75μm且宽度约0.5-1.5mm(W/L=20)的器件。所有制备和使用Keithley 4200半导体参数分析仪的电测量在氮气气氛下在黄光中进行。
在该晶片的5个不同位置测量器件性能,将平均结果和标准偏差总结于下表1中。
表1
R | μ饱和,cm2/Vs | I开/关 |
C10H21 | 0.070±0.009 | (1.7±1.0)·105 |
C12H25 | 0.106±0.012 | (1.8±1.3)·105 |
C14H29 | 0.094±0.005 | (9.2±1.2)·105 |
C16H33 | 0.066±0.008 | (3.4±3.6)·105 |
实施例9
太阳能电池器件制备和测量
首先在超声浴中用丙酮和异丙醇清洁图案化的ITO基底,然后用氧等离子体进行10分钟的清洁处理。然后由水溶液旋涂(5000rpm)厚度约40nm的聚(3,4-亚乙二氧基噻吩)聚(苯乙烯磺酸盐)(PEDOT:PSS)(BaytronP,H.C.Starck)导电层。将基底在150℃下于空气中干燥10分钟,然后移到手套箱中旋涂光活化层。然后在700rpm下将包含聚苯并二噻吩(8mg/mL)和[70][6,6]-苯基-C61-丁酸甲酯(PCBM)(16mg/mL)的二氯甲苯溶液旋涂于PEDOT:PSS层顶部。然后通过掩模将银层(约100nm)蒸发到表面形成阴极。在手套箱中每2分钟逐步进行沉积后退火。器件的有效面积为约6mm2,其由蚀刻的ITO和顶部电极之间的重叠限定。这些面积的准确值使用显微镜测定以进行随后计算。通过透镜使入射光聚焦于各器件的有效面积上。用Keithley 236源测量单元(Source-Measure Unit)记录电流-波长曲线。将卤钨灯用作光源,通过TRIAX 180单色仪提供300-800nm的单色光。使用校准的硅二极管测定入射光强度。最大强度在约600nm下为1W/m2。太阳光使用575W金属卤化物灯并结合光学二向色性过滤器由太阳能模拟器(德国Lichttechnik)得到,从而产生接近总辐射AM1.5G的光谱分布。将光强度调节为1000W/m2。
基于聚苯并二噻吩作为供体和[70]PCBM作为受体的本体异质结太阳能电池在逐步沉积后退火时在1000W/m2的AM1.5模拟太阳照射下显示出2.68%的功率转换效率,短路电流Isc=8.53mA/cm2,开路电压Voc=0.67V且填充因子FF=0.46。在420nm下实现27%的最高外量子效率(EQE)(图4)。
图4a、b示出了ITO/PEDOT-PSS/D:A/Ag光伏器件在1000W/m2的AM1.5模拟太阳照射下的电流密度-电压曲线(a)和EQE-波长曲线(b)。在图4a中,电流密度(mA/cm2)针对电压(V)绘图。在图4b中,外部量子效率(EQE)(%)针对波长(nm)绘图。
Claims (10)
1.包含式(I)的基团作为重复单元并且具有5,000-200,000g/mol的数均分子量Mn的聚(5,5′-二(噻吩-2-基)苯并[2,1-b;3,4-b’]二噻吩):
其中
R独立地选自a)C1-20烷基,b)C2-20链烯基,c)C2-20炔基,d)C1-20烷氧基,e)-Y-C3-10环烷基,f)-Y-C6-14芳基,g)-Y-3-12元环杂烷基或h)-Y-5-14元杂芳基,
其中C1-20烷基、C2-20链烯基、C2-20炔基、C3-10环烷基、C6-14芳基、3-12元环杂烷基和5-14元杂芳基各自任选被1-4个基团R1取代,
R1独立地选自a)S(O)m-C1-20烷基,b)S(O)m-OC1-20烷基,c)S(O)m-OC6-14芳基,d)C(O)-OC1-20烷基,e)C(O)-OC6-14芳基,f)C1-20烷基,g)C2-20链烯基,h)C2-20炔基,i)C1-20烷氧基,j)C3-10环烷基,k)C6-14芳基,l)3-12元环杂烷基或m)5-14元杂芳基,
Y独立地选自二价C1-6烷基,或共价键;和
m独立地选自0、1或2。
2.权利要求1的聚合物作为半导体或电荷传输材料的用途,作为薄膜晶体管(TFT)的用途,或在有机发光二极管(OLED)用半导体组件中的用途,用于光伏组件或传感器中的用途,在电池中作为电极材料的用途,作为光波导的用途或用于电子照相应用的用途。
3.一种组合物,包含溶于或分散于液体介质中的一种或多种权利要求1的聚合物。
4.一种薄膜半导体,包含一种或多种权利要求1的聚合物。
5.一种组合件,包含基底和沉积在所述基底上的权利要求4的薄膜半导体。
6.一种制备权利要求5的组合件的方法,包括将权利要求1的聚合物溶于液体介质中以形成溶液,将所述溶液沉积在基底上并除去溶剂而在基底上形成薄膜半导体。
7.根据权利要求6的方法,其中所述溶液通过旋涂、液滴流延、浸涂或印刷沉积。
8.一种场效应晶体管器件,包含权利要求4的薄膜半导体或权利要求5的组合件。
9.一种光伏器件,包含权利要求4的薄膜半导体或权利要求5的组合件。
10.一种有机发光二极管器件,包含权利要求4的薄膜半导体或权利要求5的组合件。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08159524 | 2008-07-02 | ||
EP08159524.1 | 2008-07-02 | ||
EP09153369.5 | 2009-02-20 | ||
EP09153369 | 2009-02-20 | ||
PCT/EP2009/057984 WO2010000669A1 (en) | 2008-07-02 | 2009-06-25 | Poly(5,5'bis(thiophen-2-yl)-benzo[2,1-b;3,4-b']dithiophene) and its use as high performance solution processable semiconducting polymer |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102084436A true CN102084436A (zh) | 2011-06-01 |
CN102084436B CN102084436B (zh) | 2012-10-17 |
Family
ID=40999846
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2009801259716A Active CN102084436B (zh) | 2008-07-02 | 2009-06-25 | 聚(5,5′-二(噻吩-2-基)苯并[2,1-b;3,4-b′]二噻吩)及其作为高性能可溶液加工半导体聚合物的用途 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8598304B2 (zh) |
EP (1) | EP2297748B1 (zh) |
JP (1) | JP5735418B2 (zh) |
KR (1) | KR101561323B1 (zh) |
CN (1) | CN102084436B (zh) |
TW (1) | TWI476225B (zh) |
WO (1) | WO2010000669A1 (zh) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103664994A (zh) * | 2012-08-31 | 2014-03-26 | 昆山维信诺显示技术有限公司 | 苯并二噻吩类衍生物有机电致发光材料及其应用 |
CN104513512A (zh) * | 2013-10-04 | 2015-04-15 | 日产化学工业株式会社 | 电荷传输性清漆、电荷传输性薄膜和有机电致发光元件 |
CN105914052A (zh) * | 2016-04-18 | 2016-08-31 | 深圳清华大学研究院 | 聚合物电极膜及其制备方法 |
CN106103538A (zh) * | 2014-03-21 | 2016-11-09 | 株式会社Lg化学 | 聚合物和包含其的有机太阳能电池 |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101719379B1 (ko) | 2008-12-18 | 2017-03-23 | 바스프 에스이 | 디티에닐비닐렌 공중합체로부터 제조된 반도체 물질 |
WO2010125011A2 (de) | 2009-04-28 | 2010-11-04 | Basf Se | Verfahren zur herstellung von halbleitenden schichten |
JP5728003B2 (ja) | 2009-06-05 | 2015-06-03 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | 縮合ビチオフェンビニレンコポリマー |
US8653227B2 (en) | 2009-06-15 | 2014-02-18 | Basf Se | Process for preparing regioregular poly-(3-substituted) thiophenes, selenophenes, thiazoles and selenazoles |
EP2449561A2 (en) * | 2009-06-30 | 2012-05-09 | Plextronics, Inc. | Polymers comprising at least one bithiophene repeat unit, methods synthetising said polymers and compositions comprising the same |
CN102639591B (zh) | 2009-12-02 | 2015-05-13 | 巴斯夫欧洲公司 | 二噻吩并苯并噻吩并[3,2-b]噻吩共聚物及其作为高性能可溶液加工半导体聚合物的用途 |
US8729220B2 (en) | 2010-03-31 | 2014-05-20 | Basf Se | Annellated dithiophene copolymers |
EP2553743A1 (en) | 2010-03-31 | 2013-02-06 | Basf Se | Annealed dithiophene copolymers |
CN102844312B (zh) | 2010-04-19 | 2015-04-15 | 默克专利股份有限公司 | 苯并二噻吩的聚合物及其作为有机半导体的用途 |
JP5638695B2 (ja) * | 2010-06-25 | 2014-12-10 | オーシャンズ キング ライティング サイエンス アンド テクノロジー シーオー.,エルティーディー | ベンゾジチオフェン及びチエノピラジンをベースとした共役ポリマー、その調製方法及びその使用 |
US10753023B2 (en) | 2010-08-13 | 2020-08-25 | Kimberly-Clark Worldwide, Inc. | Toughened polylactic acid fibers |
US8394918B2 (en) | 2011-02-28 | 2013-03-12 | Corning Incorporated | Five-ring fused heteroaromatic compounds and conjugated polymers thereof |
CN103476823A (zh) * | 2011-04-18 | 2013-12-25 | 默克专利股份有限公司 | 共轭聚合物 |
US9573158B2 (en) | 2014-01-03 | 2017-02-21 | The Regents Of The University Of California | High mobility polymer thin-film transistors with capillarity-mediated self-assembly |
US10186661B2 (en) | 2015-03-02 | 2019-01-22 | The Regents Of The University Of California | Blade coating on nanogrooved substrates yielding aligned thin films of high mobility semiconducting polymers |
KR101424978B1 (ko) * | 2012-05-24 | 2014-07-31 | 경상대학교산학협력단 | 길만시약 화합물을 이용한 헤테로 융합고리 화합물의 신규한 제조방법 |
US9881712B2 (en) * | 2012-07-20 | 2018-01-30 | Rohm And Haas Electronic Materials Llc | Highly crystalline electrically conducting polymers, methods of manufacture thereof and articles comprising the same |
US9559306B2 (en) | 2012-09-07 | 2017-01-31 | The Regents Of The University Of California | Field-effect transistors based on macroscopically oriented polymers with high saturation mobility |
US10128441B2 (en) | 2012-09-07 | 2018-11-13 | The Regents Of The University Of California | Field-effect transistors based on macroscopically oriented polymers |
CN103848969B (zh) * | 2012-11-28 | 2016-03-30 | 海洋王照明科技股份有限公司 | 一种含噻唑并噻唑-二苯并噻吩苯并二噻吩聚合物及其制备与应用 |
WO2014102625A1 (en) | 2012-12-24 | 2014-07-03 | Indian Institute Of Technology Kanpur | Thin film transistor with a current-induced channel |
TWI508993B (zh) * | 2013-10-30 | 2015-11-21 | Univ Nat Taiwan | 予體-受體交替共軛高分子及使用其所製成之太陽能電池元件 |
US10355214B2 (en) * | 2014-03-27 | 2019-07-16 | Lg Chem, Ltd. | Copolymer and organic solar cell comprising same |
US11296290B2 (en) | 2018-03-07 | 2022-04-05 | Clap Co., Ltd. | Patterning method for preparing top-gate, bottom-contact organic field effect transistors |
EP3762980B1 (en) | 2018-03-08 | 2023-08-09 | Clap Co., Ltd. | Organic field effect transistor comprising semiconducting single-walled carbon nanotubes and organic semiconducting material |
JP2021530577A (ja) | 2018-06-26 | 2021-11-11 | クラップ カンパニー リミテッドClap Co., Ltd. | 誘電体としてのビニルエーテル系高分子 |
DE102018008146A1 (de) * | 2018-10-15 | 2020-04-16 | Giesecke+Devrient Currency Technology Gmbh | Sicherheitselement mit Mikroreflektoren zur perspektivischen Darstellung eines Motivs |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US388744A (en) * | 1888-08-28 | Anvil heel-shouldering machine in the manufacture of lasts | ||
US373276A (en) * | 1887-11-15 | Toaster | ||
US5198153A (en) | 1989-05-26 | 1993-03-30 | International Business Machines Corporation | Electrically conductive polymeric |
JP3224829B2 (ja) | 1991-08-15 | 2001-11-05 | 株式会社東芝 | 有機電界効果型素子 |
JPH07188399A (ja) * | 1993-12-27 | 1995-07-25 | Unitika Ltd | 光照射部が導電性に変化する成形性またはフィルム形成性組成物 |
WO1996021659A1 (en) | 1995-01-10 | 1996-07-18 | University Of Technology, Sydney | Organic semiconductor |
ATE452154T1 (de) | 2003-10-15 | 2010-01-15 | Merck Patent Gmbh | Polybenzodithiophene |
KR20070112791A (ko) | 2005-03-11 | 2007-11-27 | 메르크 파텐트 게엠베하 | 티오펜 및 셀레노펜 함유 단량체, 올리고머 및 중합체 |
EP1891077B1 (en) | 2005-06-09 | 2010-04-21 | Merck Patent GmbH | Monomers , oligomers and polymers of thieno (3, 4-d) thiazole |
JP4889085B2 (ja) * | 2005-10-07 | 2012-02-29 | 株式会社リコー | ベンゾジチオフェン化合物 |
WO2007105386A1 (ja) | 2006-03-10 | 2007-09-20 | Osaka University | 縮合環化合物及びその製造方法、重合体、これらを含む有機薄膜、並びに、これを備える有機薄膜素子及び有機薄膜トランジスタ |
JP5164134B2 (ja) * | 2006-03-10 | 2013-03-13 | 住友化学株式会社 | 縮合環化合物及びその製造方法、重合体、これらを含む有機薄膜、並びに、これを備える有機薄膜素子及び有機薄膜トランジスタ |
US7820782B2 (en) * | 2006-10-25 | 2010-10-26 | Xerox Corporation | Poly(dithienylbenzo[1,2-b:4,5-b′]dithiophene) polymers |
US7834132B2 (en) * | 2006-10-25 | 2010-11-16 | Xerox Corporation | Electronic devices |
JP5472874B2 (ja) | 2006-10-25 | 2014-04-16 | 三星電子株式会社 | 電子デバイス |
WO2009016107A1 (en) | 2007-07-30 | 2009-02-05 | Basf Se | Method for depositing a semiconducting layer from a liquid |
-
2009
- 2009-06-25 JP JP2011515388A patent/JP5735418B2/ja active Active
- 2009-06-25 WO PCT/EP2009/057984 patent/WO2010000669A1/en active Application Filing
- 2009-06-25 EP EP09772369.6A patent/EP2297748B1/en active Active
- 2009-06-25 US US13/002,392 patent/US8598304B2/en active Active
- 2009-06-25 CN CN2009801259716A patent/CN102084436B/zh active Active
- 2009-06-25 KR KR1020117002353A patent/KR101561323B1/ko active IP Right Grant
- 2009-07-02 TW TW098122452A patent/TWI476225B/zh active
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103664994A (zh) * | 2012-08-31 | 2014-03-26 | 昆山维信诺显示技术有限公司 | 苯并二噻吩类衍生物有机电致发光材料及其应用 |
CN104513512A (zh) * | 2013-10-04 | 2015-04-15 | 日产化学工业株式会社 | 电荷传输性清漆、电荷传输性薄膜和有机电致发光元件 |
CN104513512B (zh) * | 2013-10-04 | 2018-10-09 | 日产化学工业株式会社 | 电荷传输性清漆、电荷传输性薄膜和有机电致发光元件 |
CN106103538A (zh) * | 2014-03-21 | 2016-11-09 | 株式会社Lg化学 | 聚合物和包含其的有机太阳能电池 |
CN106103538B (zh) * | 2014-03-21 | 2018-09-25 | 株式会社Lg化学 | 聚合物和包含其的有机太阳能电池 |
CN105914052A (zh) * | 2016-04-18 | 2016-08-31 | 深圳清华大学研究院 | 聚合物电极膜及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
EP2297748B1 (en) | 2017-01-04 |
US8598304B2 (en) | 2013-12-03 |
TWI476225B (zh) | 2015-03-11 |
EP2297748A1 (en) | 2011-03-23 |
JP5735418B2 (ja) | 2015-06-17 |
WO2010000669A1 (en) | 2010-01-07 |
KR20110043631A (ko) | 2011-04-27 |
US20110168264A1 (en) | 2011-07-14 |
TW201008978A (en) | 2010-03-01 |
JP2011526631A (ja) | 2011-10-13 |
KR101561323B1 (ko) | 2015-10-16 |
CN102084436B (zh) | 2012-10-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN102084436B (zh) | 聚(5,5′-二(噻吩-2-基)苯并[2,1-b;3,4-b′]二噻吩)及其作为高性能可溶液加工半导体聚合物的用途 | |
US8389670B2 (en) | Dithienobenzo-thieno[3,2-B]thiophene-copolymer and its use as high performance solution processable semiconducting polymer | |
CN102083838B (zh) | 基于二噻吩并[2,3-d:2′,3′-d′]苯并[1,2-b:4,5-b′]二噻吩的高性能可溶液加工半导体 | |
EP3134458B1 (en) | Photovoltaic cell with benzodithiophene-containing polymer | |
CN101977961B (zh) | 取代的低聚-或聚噻吩 | |
EP2611880B1 (en) | Novel photoactive polymer and photovoltaic cell containing the same | |
KR20130040830A (ko) | 어닐링된 디티오펜 공중합체 | |
CN103635505B (zh) | 二噻吩并邻苯二甲酰亚胺半导体聚合物 | |
KR101810900B1 (ko) | 전도성 고분자 화합물, 이를 포함하는 유기태양전지 및 이의 제조방법 | |
US8729220B2 (en) | Annellated dithiophene copolymers | |
Dutta et al. | Novel naphtho [1, 2-b: 5, 6-b′] dithiophene core linear donor–π–acceptor conjugated small molecules with thiophene-bridged bithiazole acceptor: design, synthesis, and their application in bulk heterojunction organic solar cells | |
KR101855404B1 (ko) | 유기반도체 화합물 및 그를 포함하는 유기전자소자 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20211028 Address after: Seoul, South Kerean Patentee after: Clap Ltd. Patentee after: MAX-PLANCK-GESELLSCHAFT ZUR FORDERUNG DER WISSENSCHAFT E.V. Address before: Ludwigshafen, Germany Patentee before: BASF SE Patentee before: MAX-PLANCK-GESELLSCHAFT ZUR FORDERUNG DER WISSENSCHAFT E.V. |
|
TR01 | Transfer of patent right |