CN101971061B - 光学片 - Google Patents

光学片 Download PDF

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Publication number
CN101971061B
CN101971061B CN200980108531.XA CN200980108531A CN101971061B CN 101971061 B CN101971061 B CN 101971061B CN 200980108531 A CN200980108531 A CN 200980108531A CN 101971061 B CN101971061 B CN 101971061B
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CN
China
Prior art keywords
optical sheet
layer
light
optical
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN200980108531.XA
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English (en)
Chinese (zh)
Other versions
CN101971061A (zh
Inventor
金京和
金炅钟
金大植
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kolon Corp
Original Assignee
Kolon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kolon Corp filed Critical Kolon Corp
Publication of CN101971061A publication Critical patent/CN101971061A/zh
Application granted granted Critical
Publication of CN101971061B publication Critical patent/CN101971061B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/04—Prisms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
    • G02B5/0231—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures the surface having microprismatic or micropyramidal shape
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0236—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
    • G02B5/0242—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element by means of dispersed particles
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0273—Diffusing elements; Afocal elements characterized by the use
    • G02B5/0278—Diffusing elements; Afocal elements characterized by the use used in transmission
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/04—Prisms
    • G02B5/045—Prism arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Dispersion Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Laminated Bodies (AREA)
CN200980108531.XA 2008-01-10 2009-01-09 光学片 Expired - Fee Related CN101971061B (zh)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
KR20080002944 2008-01-10
KR10-2008-0002944 2008-01-10
KR20080010507 2008-02-01
KR10-2008-0010507 2008-02-01
KR20080010508 2008-02-01
KR10-2008-0010508 2008-02-01
KR10-2009-0001690 2009-01-09
KR1020090001690A KR101066635B1 (ko) 2008-01-10 2009-01-09 광학 시트
PCT/KR2009/000119 WO2009088247A2 (ko) 2008-01-10 2009-01-09 광학 시트

Publications (2)

Publication Number Publication Date
CN101971061A CN101971061A (zh) 2011-02-09
CN101971061B true CN101971061B (zh) 2014-04-16

Family

ID=41336135

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200980108531.XA Expired - Fee Related CN101971061B (zh) 2008-01-10 2009-01-09 光学片

Country Status (7)

Country Link
US (1) US8526111B2 (enExample)
EP (1) EP2237081A4 (enExample)
JP (1) JP5379162B2 (enExample)
KR (1) KR101066635B1 (enExample)
CN (1) CN101971061B (enExample)
TW (1) TWI418889B (enExample)
WO (1) WO2009088247A2 (enExample)

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TWI357507B (en) * 2007-05-23 2012-02-01 Kolon Inc Optical sheet
TWI408405B (zh) * 2009-10-27 2013-09-11 Eternal Chemical Co Ltd 光學膜複合物
KR101208174B1 (ko) * 2010-07-28 2012-12-04 엘지이노텍 주식회사 광학시트 및 이를 포함하는 발광소자패키지
JP5544239B2 (ja) * 2010-07-29 2014-07-09 富士フイルム株式会社 重合性組成物
JP5639413B2 (ja) * 2010-08-24 2014-12-10 株式会社小糸製作所 照明器具用カバーおよび照明器具
JP5750848B2 (ja) * 2010-08-26 2015-07-22 住友化学株式会社 画像表示装置用光学部材
JP2012098516A (ja) * 2010-11-02 2012-05-24 Sang Bo Co Ltd 多重曲率を有する光学シート
KR101246588B1 (ko) * 2011-09-02 2013-03-25 도레이첨단소재 주식회사 고차폐 발포성 광학필름, 그의 제조방법 및 그를 구비한 ｌｃｄ ｔｖ용 백라이트 유닛
JP5959821B2 (ja) * 2011-09-30 2016-08-02 恵和株式会社 プリズムシート及びこれを用いたバックライトユニット
KR101961931B1 (ko) * 2011-12-20 2019-03-26 미래나노텍(주) 조명용 광학부재 및 이를 이용하는 조명장치
JP6379458B2 (ja) * 2012-09-13 2018-08-29 日立化成株式会社 パターンを有する樹脂層を製造する方法、及びそれに用いられる樹脂組成物
KR20140135546A (ko) * 2013-05-16 2014-11-26 제일모직주식회사 복합광학시트 및 이를 포함하는 광학 디스플레이 장치
CN104165330A (zh) * 2014-06-27 2014-11-26 合肥京东方显示光源有限公司 光学组件、背光模组及显示装置
CN106842383B (zh) * 2015-12-07 2018-09-21 中华映管股份有限公司 光学膜及其制作方法
KR102042955B1 (ko) * 2019-01-09 2019-11-08 이승현 부분 용융 접착을 통한 소프트 연질 적층 라벨지
JP2021021767A (ja) * 2019-07-25 2021-02-18 恵和株式会社 光拡散シート
KR102192424B1 (ko) 2020-03-20 2020-12-17 이승현 입자 집합체에 대한 선택적 절취가 가능한 분리 라벨지 시스템
CN111487711A (zh) 2020-05-29 2020-08-04 北京小米移动软件有限公司 光学部件、背光模组、电子设备及光学部件的制作方法
KR102262084B1 (ko) 2020-07-15 2021-06-07 이승현 역학적 구조 변형을 통한 선택적 굽힘 기능이 구비된 라벨지 시스템
KR102232579B1 (ko) 2020-09-07 2021-03-25 이승현 선택적 물리적 라인의 형성을 통한 선택적 표면 적층 시스템
CN113504591B (zh) * 2021-07-08 2023-03-21 江西盛汇光学科技协同创新有限公司 扩散增亮复合型光学膜片及其制备方法
CN116243412B (zh) * 2023-03-13 2025-09-09 湖南壹鑫科技有限公司 一种高雾度、高亮度的扩散膜、其制备方法及背光模组

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CN1715962A (zh) * 2004-06-28 2006-01-04 颖台科技股份有限公司 具有表面高硬度的光扩散板及其制造方法
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CN101004461A (zh) * 2007-01-22 2007-07-25 长兴光学材料（苏州）有限公司 抗刮薄膜及液晶显示器

Also Published As

Publication number Publication date
EP2237081A2 (en) 2010-10-06
US20110051247A1 (en) 2011-03-03
US8526111B2 (en) 2013-09-03
JP5379162B2 (ja) 2013-12-25
WO2009088247A2 (ko) 2009-07-16
TWI418889B (zh) 2013-12-11
TW200942922A (en) 2009-10-16
JP2011509436A (ja) 2011-03-24
EP2237081A4 (en) 2014-07-16
KR101066635B1 (ko) 2011-09-22
WO2009088247A3 (ko) 2009-10-08
KR20090077709A (ko) 2009-07-15
CN101971061A (zh) 2011-02-09

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