CN101937912A - 基于单元的集成电路内的电源单元的布置 - Google Patents
基于单元的集成电路内的电源单元的布置 Download PDFInfo
- Publication number
- CN101937912A CN101937912A CN2010101950573A CN201010195057A CN101937912A CN 101937912 A CN101937912 A CN 101937912A CN 2010101950573 A CN2010101950573 A CN 2010101950573A CN 201010195057 A CN201010195057 A CN 201010195057A CN 101937912 A CN101937912 A CN 101937912A
- Authority
- CN
- China
- Prior art keywords
- power supply
- row
- unit
- cells
- cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/90—Masterslice integrated circuits
- H10D84/903—Masterslice integrated circuits comprising field effect technology
- H10D84/907—CMOS gate arrays
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/10—Integrated device layouts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/528—Layout of the interconnection structure
- H01L23/5286—Arrangements of power or ground buses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009-137210 | 2009-06-08 | ||
| JP2009137210A JP2010283269A (ja) | 2009-06-08 | 2009-06-08 | 半導体装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101937912A true CN101937912A (zh) | 2011-01-05 |
Family
ID=43300224
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010101950573A Pending CN101937912A (zh) | 2009-06-08 | 2010-05-31 | 基于单元的集成电路内的电源单元的布置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20100308667A1 (enExample) |
| JP (1) | JP2010283269A (enExample) |
| CN (1) | CN101937912A (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104517963A (zh) * | 2013-09-27 | 2015-04-15 | 飞思卡尔半导体公司 | 状态保持电源选通单元 |
| CN109786369A (zh) * | 2017-11-14 | 2019-05-21 | 台湾积体电路制造股份有限公司 | 包括标准单元的半导体器件 |
| CN110634860A (zh) * | 2018-06-25 | 2019-12-31 | 株式会社索思未来 | 半导体装置 |
| US12211851B2 (en) | 2017-11-14 | 2025-01-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device including standard cells |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108292629B (zh) * | 2015-11-25 | 2021-11-05 | 株式会社索思未来 | 半导体集成电路装置 |
| US10109619B2 (en) | 2016-06-06 | 2018-10-23 | Qualcomm Incorporated | Methods and apparatus for using split N-well cells in a merged N-well block |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1283308A (zh) * | 1997-12-26 | 2001-02-07 | 株式会社日立制作所 | 半导体集成电路 |
| US20080093632A1 (en) * | 2006-10-19 | 2008-04-24 | Nec Electronics Corporation | Size-reduced layout of cell-based integrated circuit with power switch |
| US20090078968A1 (en) * | 2001-03-05 | 2009-03-26 | Panasonic Corporation | Integrated circuit device and method for forming the same |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001148464A (ja) * | 1999-11-18 | 2001-05-29 | Toshiba Microelectronics Corp | 半導体集積回路 |
| JP4820542B2 (ja) * | 2004-09-30 | 2011-11-24 | パナソニック株式会社 | 半導体集積回路 |
| JP2007095787A (ja) * | 2005-09-27 | 2007-04-12 | Nec Electronics Corp | 半導体集積回路 |
-
2009
- 2009-06-08 JP JP2009137210A patent/JP2010283269A/ja active Pending
-
2010
- 2010-05-28 US US12/789,727 patent/US20100308667A1/en not_active Abandoned
- 2010-05-31 CN CN2010101950573A patent/CN101937912A/zh active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1283308A (zh) * | 1997-12-26 | 2001-02-07 | 株式会社日立制作所 | 半导体集成电路 |
| US20090078968A1 (en) * | 2001-03-05 | 2009-03-26 | Panasonic Corporation | Integrated circuit device and method for forming the same |
| US20080093632A1 (en) * | 2006-10-19 | 2008-04-24 | Nec Electronics Corporation | Size-reduced layout of cell-based integrated circuit with power switch |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104517963A (zh) * | 2013-09-27 | 2015-04-15 | 飞思卡尔半导体公司 | 状态保持电源选通单元 |
| CN104517963B (zh) * | 2013-09-27 | 2018-09-18 | 恩智浦美国有限公司 | 状态保持电源选通单元 |
| CN109786369A (zh) * | 2017-11-14 | 2019-05-21 | 台湾积体电路制造股份有限公司 | 包括标准单元的半导体器件 |
| CN109786369B (zh) * | 2017-11-14 | 2024-01-09 | 台湾积体电路制造股份有限公司 | 包括标准单元的半导体器件 |
| US11935893B2 (en) | 2017-11-14 | 2024-03-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device including standard cells |
| US12211851B2 (en) | 2017-11-14 | 2025-01-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device including standard cells |
| CN110634860A (zh) * | 2018-06-25 | 2019-12-31 | 株式会社索思未来 | 半导体装置 |
| CN110634860B (zh) * | 2018-06-25 | 2023-04-07 | 株式会社索思未来 | 半导体装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010283269A (ja) | 2010-12-16 |
| US20100308667A1 (en) | 2010-12-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| USRE49821E1 (en) | Semiconductor integrated circuit | |
| US10998340B2 (en) | Semiconductor device including standard cells having different cell height | |
| JP5322441B2 (ja) | 半導体装置のレイアウト構造 | |
| US7280329B2 (en) | Integrated circuit device having input/output electrostatic discharge protection cell equipped with electrostatic discharge protection element and power clamp | |
| US7456447B2 (en) | Semiconductor integrated circuit device | |
| US8102024B2 (en) | Semiconductor integrated circuit and system LSI including the same | |
| US10796994B2 (en) | Semiconductor device and IO-cell | |
| CN101937912A (zh) | 基于单元的集成电路内的电源单元的布置 | |
| CN101355083A (zh) | 半导体器件 | |
| JP5519120B2 (ja) | 半導体装置 | |
| CN106935583A (zh) | 半导体集成电路器件 | |
| US20250351328A1 (en) | Semiconductor devices with frontside and backside power rails | |
| JP5131814B2 (ja) | 半導体装置 | |
| JP2008103569A (ja) | 半導体装置 | |
| US7525198B2 (en) | Wiring structure of a semiconductor device | |
| CN101483170A (zh) | 半导体装置 | |
| JP3672788B2 (ja) | 半導体装置のセルレイアウト構造およびレイアウト設計方法 | |
| JP2000223575A (ja) | 半導体装置の設計方法、半導体装置および半導体装置の製造方法 | |
| US7797660B2 (en) | Semiconductor integrated circuit for controlling substrate bias | |
| US20070029621A1 (en) | Semiconductor integrated circuit device | |
| JPWO2000065650A1 (ja) | 半導体装置およびその製造方法 | |
| WO2000065650A1 (fr) | Dispositif semi-conducteur et procede de fabrication | |
| US20250192045A1 (en) | Semiconductor integrated circuit device | |
| WO2008012899A1 (fr) | Dispositif de circuit à semi-conducteurs, système de dispositif de circuit à semi-conducteurs et procédé de fabrication pour le dispositif de circuit à semi-conducteurs | |
| KR20150139434A (ko) | 인터페이스 회로소자를 갖는 집적회로와, 그 인터페이스 회로소자용 인터페이스 셀 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20110105 |