CN101824141B - 制备聚酯的方法 - Google Patents
制备聚酯的方法 Download PDFInfo
- Publication number
- CN101824141B CN101824141B CN2010101630151A CN201010163015A CN101824141B CN 101824141 B CN101824141 B CN 101824141B CN 2010101630151 A CN2010101630151 A CN 2010101630151A CN 201010163015 A CN201010163015 A CN 201010163015A CN 101824141 B CN101824141 B CN 101824141B
- Authority
- CN
- China
- Prior art keywords
- polyester
- dianhydride
- reaction
- glycol
- mixture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/78—Preparation processes
- C08G63/81—Preparation processes using solvents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
- C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
- C08G63/46—Polyesters chemically modified by esterification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
- C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/78—Preparation processes
- C08G63/82—Preparation processes characterised by the catalyst used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/91—Polymers modified by chemical after-treatment
- C08G63/914—Polymers modified by chemical after-treatment derived from polycarboxylic acids and polyhydroxy compounds
- C08G63/916—Dicarboxylic acids and dihydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/0427—Coating with only one layer of a composition containing a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2383/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2467/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31786—Of polyester [e.g., alkyd, etc.]
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/817,987 US7081511B2 (en) | 2004-04-05 | 2004-04-05 | Process for making polyesters |
US10/817,987 | 2004-04-05 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNA2005800124944A Division CN1946759A (zh) | 2004-04-05 | 2005-03-31 | 制备聚酯的方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101824141A CN101824141A (zh) | 2010-09-08 |
CN101824141B true CN101824141B (zh) | 2012-07-04 |
Family
ID=34962724
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2010101630151A Active CN101824141B (zh) | 2004-04-05 | 2005-03-31 | 制备聚酯的方法 |
CNA2005800124944A Pending CN1946759A (zh) | 2004-04-05 | 2005-03-31 | 制备聚酯的方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNA2005800124944A Pending CN1946759A (zh) | 2004-04-05 | 2005-03-31 | 制备聚酯的方法 |
Country Status (9)
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7264913B2 (en) * | 2002-11-21 | 2007-09-04 | Az Electronic Materials Usa Corp. | Antireflective compositions for photoresists |
JP4703284B2 (ja) * | 2005-06-22 | 2011-06-15 | セントラル硝子株式会社 | ポリエステル化合物およびそれを用いたレジスト材料 |
US7638262B2 (en) * | 2006-08-10 | 2009-12-29 | Az Electronic Materials Usa Corp. | Antireflective composition for photoresists |
US20080286689A1 (en) * | 2007-05-14 | 2008-11-20 | Hong Zhuang | Antireflective Coating Compositions |
US20090035704A1 (en) * | 2007-08-03 | 2009-02-05 | Hong Zhuang | Underlayer Coating Composition Based on a Crosslinkable Polymer |
US8039201B2 (en) * | 2007-11-21 | 2011-10-18 | Az Electronic Materials Usa Corp. | Antireflective coating composition and process thereof |
US8329387B2 (en) | 2008-07-08 | 2012-12-11 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
US8221965B2 (en) * | 2008-07-08 | 2012-07-17 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
US20100092894A1 (en) * | 2008-10-14 | 2010-04-15 | Weihong Liu | Bottom Antireflective Coating Compositions |
US20100143546A1 (en) | 2008-12-09 | 2010-06-10 | The Coca-Cola Company | Container and composition for enhanced gas barrier properties |
US8110265B2 (en) | 2008-12-09 | 2012-02-07 | The Coca-Cola Company | Pet container and compositions having enhanced mechanical properties and gas barrier properties |
US8551686B2 (en) * | 2009-10-30 | 2013-10-08 | Az Electronic Materials Usa Corp. | Antireflective composition for photoresists |
US8507192B2 (en) * | 2010-02-18 | 2013-08-13 | Az Electronic Materials Usa Corp. | Antireflective compositions and methods of using same |
US9170494B2 (en) | 2012-06-19 | 2015-10-27 | Az Electronic Materials (Luxembourg) S.A.R.L. | Antireflective compositions and methods of using same |
US11203661B2 (en) | 2016-07-13 | 2021-12-21 | Akzo Nobel Coatings International B.V. | Process for the manufacture of an epoxy-functional polyester, epoxy-functional polyester obtained by such process and coating composition comprising such epoxy-functional polyester |
CN115215970B (zh) * | 2022-09-21 | 2022-12-06 | 山东旺林新材料有限公司 | 一种采光型不饱和聚酯树脂及其制备方法 |
Family Cites Families (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2585323A (en) | 1949-05-31 | 1952-02-12 | California Research Corp | Linear pyromellitic polyesters and their derivatives |
BE585234A (US07081511-20060725-C00001.png) * | 1958-12-02 | |||
US3483169A (en) | 1967-08-21 | 1969-12-09 | Case Leslie C | Polyester-polyethers and process of preparing the same |
US3497472A (en) | 1967-12-05 | 1970-02-24 | Sun Oil Co | Polyesters of adamantanediols and aromatic tetracarboxylic acid dianhydrides |
JPS5517768B2 (US07081511-20060725-C00001.png) * | 1972-10-20 | 1980-05-14 | ||
US3919172A (en) | 1972-10-30 | 1975-11-11 | California Inst Of Techn | Method of preparing polyesters from polymeric polyols and dianhydrides |
US3856752A (en) | 1973-10-01 | 1974-12-24 | Ciba Geigy Corp | Soluble polyimides derived from phenylindane diamines and dianhydrides |
US4196129A (en) | 1977-01-21 | 1980-04-01 | California Institute Of Technology | Prepolymer dianhydrides |
US4491628A (en) | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
JPS5988770A (ja) | 1982-11-13 | 1984-05-22 | Canon Inc | 電子写真複写装置 |
DE3621039A1 (de) * | 1986-06-24 | 1988-01-07 | Bayer Ag | Verfahren zur herstellung von hydroxylgruppen aufweisenden oligoestern und deren verwendung |
JPS63132915A (ja) * | 1986-11-25 | 1988-06-04 | New Japan Chem Co Ltd | 新規なポリエステルアクリレ−ト系化合物 |
US4912160A (en) | 1987-11-16 | 1990-03-27 | The Sherwin-Williams Company | Acid-functional polymers from hydroxy polymers and cyclic anhydrides |
DE3817012A1 (de) | 1988-05-19 | 1989-11-30 | Basf Ag | Positiv und negativ arbeitende strahlungsempfindliche gemische sowie verfahren zur herstellung von reliefmustern |
EP0440374B1 (en) | 1990-01-30 | 1997-04-16 | Wako Pure Chemical Industries Ltd | Chemical amplified resist material |
JP3000745B2 (ja) | 1991-09-19 | 2000-01-17 | 富士通株式会社 | レジスト組成物とレジストパターンの形成方法 |
FR2694012B1 (fr) | 1992-07-23 | 1994-08-26 | Kermel Snc | Solutions de polyimide et leur procédé d'obtention. |
US5294680A (en) | 1992-07-24 | 1994-03-15 | International Business Machines Corporation | Polymeric dyes for antireflective coatings |
DE4224761A1 (de) | 1992-07-27 | 1994-02-03 | Basf Ag | Verwendung von Polykondensaten und neue Polykondensate |
DE69424937T2 (de) | 1993-04-21 | 2001-01-11 | Univ Akron Akron | Polyamidfolie mit negativer doppelbrechung |
US5395918A (en) | 1994-04-21 | 1995-03-07 | The University Of Akron | Organo-soluble polyimides from substituted dianhydrides |
JP3804138B2 (ja) | 1996-02-09 | 2006-08-02 | Jsr株式会社 | ArFエキシマレーザー照射用感放射線性樹脂組成物 |
AU725653B2 (en) | 1996-03-07 | 2000-10-19 | B.F. Goodrich Company, The | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
US5843624A (en) | 1996-03-08 | 1998-12-01 | Lucent Technologies Inc. | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material |
KR100265597B1 (ko) | 1996-12-30 | 2000-09-15 | 김영환 | Arf 감광막 수지 및 그 제조방법 |
JPH10273525A (ja) * | 1997-03-31 | 1998-10-13 | Jsr Corp | アルカリ可溶性重合体 |
US5935760A (en) | 1997-10-20 | 1999-08-10 | Brewer Science Inc. | Thermosetting polyester anti-reflective coatings for multilayer photoresist processes |
EP1058701B2 (en) | 1998-02-23 | 2011-03-16 | Stepan Company | Low viscosity polyester polyols and methods for preparing same |
US5962621A (en) | 1998-04-28 | 1999-10-05 | The Dow Chemical Company | Process for preparing hydroxy-functionalized polyesters |
IL141803A0 (en) | 1998-09-23 | 2002-03-10 | Du Pont | Photoresists, polymers and processes for microlithography |
AU4678100A (en) | 1999-05-04 | 2000-11-17 | E.I. Du Pont De Nemours And Company | Fluorinated polymers, photoresists and processes for microlithography |
JP2001316465A (ja) * | 2000-05-10 | 2001-11-13 | Toyo Ink Mfg Co Ltd | ポリエステル |
US7264913B2 (en) | 2002-11-21 | 2007-09-04 | Az Electronic Materials Usa Corp. | Antireflective compositions for photoresists |
-
2004
- 2004-04-05 US US10/817,987 patent/US7081511B2/en active Active
-
2005
- 2005-03-15 TW TW94107857A patent/TWI375693B/zh active
- 2005-03-31 EP EP20050718352 patent/EP1751210B1/en active Active
- 2005-03-31 WO PCT/IB2005/000879 patent/WO2005097867A1/en active Application Filing
- 2005-03-31 JP JP2007506856A patent/JP5003958B2/ja active Active
- 2005-03-31 CN CN2010101630151A patent/CN101824141B/zh active Active
- 2005-03-31 DE DE200560023438 patent/DE602005023438D1/de active Active
- 2005-03-31 KR KR1020067023010A patent/KR101178123B1/ko active IP Right Grant
- 2005-03-31 CN CNA2005800124944A patent/CN1946759A/zh active Pending
- 2005-04-04 MY MYPI20051503A patent/MY134455A/en unknown
Also Published As
Publication number | Publication date |
---|---|
JP5003958B2 (ja) | 2012-08-22 |
US7081511B2 (en) | 2006-07-25 |
EP1751210A1 (en) | 2007-02-14 |
CN1946759A (zh) | 2007-04-11 |
US20050234201A1 (en) | 2005-10-20 |
DE602005023438D1 (de) | 2010-10-21 |
MY134455A (en) | 2007-12-31 |
KR20070012447A (ko) | 2007-01-25 |
JP2007531815A (ja) | 2007-11-08 |
TW200604241A (en) | 2006-02-01 |
TWI375693B (en) | 2012-11-01 |
CN101824141A (zh) | 2010-09-08 |
EP1751210B1 (en) | 2010-09-08 |
WO2005097867A1 (en) | 2005-10-20 |
KR101178123B1 (ko) | 2012-09-07 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: AZ ELECTRONIC MATERIALS IP CO., LTD. Free format text: FORMER OWNER: AZ ELECTRONIC MATERIALS USA CO. Effective date: 20141125 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20141125 Address after: Tokyo, Japan Patentee after: AZ Electronic Materials IP Co., Ltd. Address before: American New Jersey Patentee before: AZ Electronic Materials USA |
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ASS | Succession or assignment of patent right |
Owner name: MERCK PATENT GMBH Free format text: FORMER OWNER: AZ ELECTRONIC MATERIALS IP CO., LTD. Effective date: 20150408 |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20150408 Address after: Darmstadt Patentee after: Merck Patent GmbH Address before: Tokyo, Japan Patentee before: AZ Electronic Materials IP Co., Ltd. |