CN101802716B - 光刻设备和器件制造方法 - Google Patents

光刻设备和器件制造方法 Download PDF

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Publication number
CN101802716B
CN101802716B CN2008801072758A CN200880107275A CN101802716B CN 101802716 B CN101802716 B CN 101802716B CN 2008801072758 A CN2008801072758 A CN 2008801072758A CN 200880107275 A CN200880107275 A CN 200880107275A CN 101802716 B CN101802716 B CN 101802716B
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China
Prior art keywords
radiation
wall
lithographic apparatus
flow
radiation source
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CN2008801072758A
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English (en)
Chinese (zh)
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CN101802716A (zh
Inventor
Y·J·G·范德维杰威
T·A·R·范因佩尔
J·B·P·范斯库特
G·H·P·M·斯温克尔斯
H·G·诗密尔
D·莱伯斯克依
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ASML Netherlands BV
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ASML Netherlands BV
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Publication of CN101802716A publication Critical patent/CN101802716A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H05G2/0092—Housing of the apparatus for producing X-rays; Environment inside the housing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H05G2/0094—Reduction, prevention or protection from contamination; Cleaning

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
CN2008801072758A 2007-09-17 2008-09-17 光刻设备和器件制造方法 Active CN101802716B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/898,933 US8115900B2 (en) 2007-09-17 2007-09-17 Lithographic apparatus and device manufacturing method
US11/898,933 2007-09-17
PCT/NL2008/050611 WO2009038460A1 (en) 2007-09-17 2008-09-17 Lithographic apparatus and device manufacturing method

Publications (2)

Publication Number Publication Date
CN101802716A CN101802716A (zh) 2010-08-11
CN101802716B true CN101802716B (zh) 2012-10-24

Family

ID=39925005

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2008801072758A Active CN101802716B (zh) 2007-09-17 2008-09-17 光刻设备和器件制造方法

Country Status (7)

Country Link
US (2) US8115900B2 (enExample)
JP (1) JP5393685B2 (enExample)
KR (1) KR101497595B1 (enExample)
CN (1) CN101802716B (enExample)
NL (1) NL1035943A1 (enExample)
TW (1) TWI394012B (enExample)
WO (1) WO2009038460A1 (enExample)

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US8115900B2 (en) * 2007-09-17 2012-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2004085A (en) * 2009-03-11 2010-09-14 Asml Netherlands Bv Radiation source, lithographic apparatus, and device manufacturing method.
US8587768B2 (en) 2010-04-05 2013-11-19 Media Lario S.R.L. EUV collector system with enhanced EUV radiation collection
KR20130040883A (ko) * 2010-04-08 2013-04-24 에이에스엠엘 네델란즈 비.브이. Ｅｕⅴ 방사선 소스 및 ｅｕⅴ 방사선 생성 방법
US8258485B2 (en) * 2010-08-30 2012-09-04 Media Lario Srl Source-collector module with GIC mirror and xenon liquid EUV LPP target system
US8344339B2 (en) * 2010-08-30 2013-01-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin rod EUV LPP target system
US9516730B2 (en) * 2011-06-08 2016-12-06 Asml Netherlands B.V. Systems and methods for buffer gas flow stabilization in a laser produced plasma light source
JP6253641B2 (ja) * 2012-05-21 2017-12-27 エーエスエムエル ネザーランズ ビー．ブイ． リフレクタ、ペリクル、リソグラフィマスク、膜、スペクトル純度フィルタ、および、装置
US9148941B2 (en) * 2013-01-22 2015-09-29 Asml Netherlands B.V. Thermal monitor for an extreme ultraviolet light source
US10101664B2 (en) * 2014-11-01 2018-10-16 Kla-Tencor Corporation Apparatus and methods for optics protection from debris in plasma-based light source
US11397385B2 (en) 2016-06-17 2022-07-26 Taiwan Semiconductor Manufacturing Company, Ltd Apparatus and a method of forming a particle shield
CN117202469A (zh) * 2017-01-06 2023-12-08 Asml荷兰有限公司 引导装置和相关联的系统
US10955749B2 (en) 2017-01-06 2021-03-23 Asml Netherlands B.V. Guiding device and associated system
NL2020238A (en) * 2017-01-06 2018-07-23 Asml Netherlands Bv Guiding device and associated system
DE102018208710A1 (de) 2018-06-04 2019-12-05 Carl Zeiss Smt Gmbh Blende zur Anordnung in einer Engstelle eines EUV-Beleuchtungsbündels
EP3798730A1 (en) 2019-09-30 2021-03-31 ASML Netherlands B.V. Radiation conduit
EP3919978A1 (en) * 2020-06-05 2021-12-08 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and a method of forming a particle shield
US11662668B2 (en) 2021-08-30 2023-05-30 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography contamination control
WO2024251485A1 (en) * 2023-06-09 2024-12-12 Asml Netherlands B.V. Lithographic apparatus, and method of expelling a contaminant in a lithographic apparatus

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Also Published As

Publication number Publication date
US20120147348A1 (en) 2012-06-14
TW200921292A (en) 2009-05-16
JP2010539700A (ja) 2010-12-16
US8749756B2 (en) 2014-06-10
NL1035943A1 (nl) 2009-03-18
CN101802716A (zh) 2010-08-11
TWI394012B (zh) 2013-04-21
US8115900B2 (en) 2012-02-14
KR101497595B1 (ko) 2015-03-04
JP5393685B2 (ja) 2014-01-22
KR20100085045A (ko) 2010-07-28
WO2009038460A1 (en) 2009-03-26
US20090073396A1 (en) 2009-03-19

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